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    • 108. 发明授权
    • Non-destructive root cause analysis on blocked contact or via
    • 对破坏性接触或通过的非破坏性根本原因分析
    • US06777676B1
    • 2004-08-17
    • US10303267
    • 2002-11-21
    • Ying WangYeishin TungAnne Testoni
    • Ying WangYeishin TungAnne Testoni
    • G01N2300
    • G01N23/225H01J2237/2561
    • Disclosed are apparatus and methods for characterizing a potential defect of a semiconductor structure. A charged particle beam is scanned over a structure which has a potential defect. X-rays are detected from the scanned structure. The X-rays are in response to the charged particle beam being scanned over the structure. The potential defect of the scanned structure is characterized based on the detected X-rays. For example, it may be determined whether a potentially defective via has a SiO2 plug defect by comparing an X-ray count ratio of oxygen over silicon of the defective via with an X-ray count ratio of a known defect-free reference via. If the defective via has a relatively high ratio (more oxygen than silicon) as compared to the reference via, then it may be determined that a SiO2 plug defect is present within the defective via. Otherwise, the via may be defmed as having a different type of defect (e.g., not a SiO2 plug defect) or defined resulting in a “false” defect. Accordingly, specific embodiments of the present invention may be utilized to filter “false” defects from a defect sample.
    • 公开了用于表征半导体结构的潜在缺陷的装置和方法。 带电粒子束在具有潜在缺陷的结构上扫描。 从扫描结构检测X射线。 X射线响应于在结构上扫描的带电粒子束。 基于检测到的X射线来表征扫描结构的潜在缺陷。 例如,可以通过将有缺陷的通孔的硅上的氧的X射线计数比与已知的无缺陷参考通孔的X射线计数比进行比较,来确定潜在缺陷通孔是否具有SiO 2插塞缺陷。 如果故障通孔与参考通孔相比具有相对高的比率(比硅更多的氧),则可以确定在缺陷通孔内存在SiO 2插塞缺陷。 否则,可以将通孔定义为具有不同类型的缺陷(例如,不是SiO2插塞缺陷)或定义导致“假”缺陷。 因此,可以利用本发明的具体实施例来从缺陷样品中过滤“假”缺陷。
    • 110. 发明授权
    • Diffraction compensation of FBG phase masks for multi-channel sampling applications
    • 用于多通道采样应用的FBG相位掩模的衍射补偿
    • US06654521B2
    • 2003-11-25
    • US10056575
    • 2002-01-23
    • Yunlong ShengJoshua E. RothenbergHongPu LiYing WangJason Zweiback
    • Yunlong ShengJoshua E. RothenbergHongPu LiYing WangJason Zweiback
    • G02B634
    • G02B6/02085G02B6/02138
    • The present invention is directed to a system and method for designing efficient multi-channel FBG gratings using a pre-compensated phase mask for diffracting light for side-writing the grating on an optical fiber core. A desired phase function of the FBG is generated, specifically tailored to an effective spacing between the phase mask and the optical fiber core. From the phase function a phase mask is pre-compensated to offset diffraction effects associated with each longitudinal position of the FBG receiving light from two corresponding longitudinal positions of the phase mask substantially symmetrically spaced longitudinally relative to each particular longitudinal position of the FBG. The two corresponding longitudinal positions of the phase mask are spaced longitudinally from each other by a spacing determined by the effective spacing between the phase mask and fiber core and by the first order diffraction angle of light through the phase mask.
    • 本发明涉及一种用于使用预补偿相位掩模设计有效的多通道FBG光栅的系统和方法,用于衍射光以在光纤芯上侧写光栅。 产生FBG的期望相位函数,专门针对相位掩模和光纤芯之间的有效间隔。 从相位函数中,相位掩模被预补偿以抵消与FBG的每个纵向位置相关联的衍射效应,所述FBG接收来自相位掩模的两个相应纵向位置的光,其相对于FBG的每个特定纵向位置基本对称地间隔开。 相位掩模的两个对应的纵向位置彼此纵向间隔由相位掩模和光纤芯之间的有效间隔确定的间隔以及通过相位掩模的一阶衍射光角。