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    • 102. 发明申请
    • METHOD FOR MANUFACTURING MICROSTRUCTURE, AND METHOD FOR MANUFACTURING LIQUID JETTING HEAD
    • 制造微结构的方法和制造液体喷射头的方法
    • US20100287773A1
    • 2010-11-18
    • US12811255
    • 2009-03-26
    • Masahiko KubotaSatoshi Kokubo
    • Masahiko KubotaSatoshi Kokubo
    • B23P17/00
    • B41J2/1603B41J2/1634Y10T29/49155Y10T29/49401
    • A manufacturing method for a liquid ejecting head, wherein said liquid ejection head includes a flow passage wall member having an ejection outlet for ejecting liquid and the liquid flow path in fluid communication with the ejection outlet, said manufacturing including providing a substrate provision an organic resin material layer of organic resin material for forming the flow passage wall member; and forming the flow passage wall member by forming the flow path and the ejection outlet by removing partly said organic resin material layer by illuminating the organic resin material layer with a laser beam which has a pulse width of not less than 2 picosec and not more than 20 picosec and which has a focal point inside said organic resin material layer, with movement of the focal point of the laser beam.
    • 一种液体喷射头的制造方法,其中所述液体喷射头包括具有用于喷射液体的喷射出口和与喷射出口流体连通的液体流动通道的流动通道壁构件,所述制造包括提供提供有机树脂的基底 用于形成流路壁构件的有机树脂材料的材料层; 并且通过用脉冲宽度不小于2皮秒但不大于2皮秒的激光照射有机树脂材料层,通过形成流路和喷射出口来形成流路和喷射出口部分地去除所述有机树脂材料层 20皮秒,并且在激光束的焦点的运动下,在所述有机树脂材料层内具有焦点。
    • 103. 发明申请
    • METHOD OF MANUFACTURING SUBSTRATE FOR LIQUID DISCHARGE HEAD
    • 液体放电头的制造方法
    • US20100255616A1
    • 2010-10-07
    • US12721046
    • 2010-03-10
    • Satoshi KokuboMasahiko Kubota
    • Satoshi KokuboMasahiko Kubota
    • H01L21/308
    • B41J2/1631B41J2/1603B41J2/1629B41J2/1634
    • A method of manufacturing a substrate for a liquid discharge head having a supply port passing through a silicon substrate provided with an energy-generating element generating the energy used to discharge a liquid and allowing liquid to be supplied to the energy-generating element, includes preparing a silicon substrate in which a first etching mask having a first opening is provided on a first face, and a second etching mask having a second opening is provided on a second face that is the rear face of the first face; forming a first recess towards the second face from the first face within the first opening, and forming a second recess towards the first face from the second face within in the second opening; and performing crystalline anisotropic etching using the first and second etching masks as masks from both of the first and second faces, to form the supply port.
    • 一种液体排出头基板的制造方法,其具有通过硅基板的供给口,所述供给口具有产生用于排出液体并允许液体供给到所述发生元件的能量的能量产生元件,包括: 在第一面上设置有具有第一开口部的第一蚀刻掩模的硅基板,在作为第一面的背面的第二面上设置具有第二开口部的第二蚀刻掩模; 从所述第一开口内的所述第一面形成朝向所述第二面的第一凹部,以及在所述第二开口内从所述第二面形成朝向所述第一面的第二凹部; 以及使用所述第一和第二蚀刻掩模作为来自所述第一面和所述第二面的两者的掩模进行结晶各向异性蚀刻,以形成所述供给口。