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    • 107. 发明授权
    • Method and device for measuring the thickness of thin films near a sample's edge and in a damascene-type structure
    • 用于测量样品边缘和镶嵌型结构附近薄膜厚度的方法和装置
    • US06734982B2
    • 2004-05-11
    • US09795015
    • 2001-02-28
    • Matthew J. BanetMartin FuchsJohn A. Rogers
    • Matthew J. BanetMartin FuchsJohn A. Rogers
    • G01B1106
    • G01B11/0666
    • A method for measuring a structure that contains overlying and underlying films in a region where the overlying film's thickness rapidly decreases until the underlying film is exposed (e.g., an edge-exclusion structure). The method includes the steps of: (1) exciting acoustic modes in a first portion of the region with at least one excitation laser beam; (2) detecting the acoustic modes with a probe laser beam that is either reflected or diffracted to generate a signal beam; (3) analyzing the signal beam to determine a property of the structure (e.g., the thickness of the overlying layer) in the first portion of the region; (4) translating the structure or the excitation and probe laser beams; and (5) repeating the exciting, detecting, and analyzing steps to determine a property of the structure in a second portion of the region.
    • 一种用于测量在覆盖膜的厚度迅速减小直到底层膜暴露的区域(例如,边缘排除结构)中的覆盖和下层膜的结构的测量方法。 该方法包括以下步骤:(1)利用至少一个激发激光束激发该区域的第一部分中的声模; (2)用反射或衍射的探针激光束检测声学模式以产生信号光束; (3)分析信号光束以确定该区域的第一部分中的结构的性质(例如,上覆层的厚度); (4)平移结构或激发和探测激光束; 和(5)重复激励,检测和分析步骤以确定该区域的第二部分中的结构的属性。