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    • 106. 发明授权
    • Hollow injection-molding method and pressurized fluid introducing and
discharging apparatus therefor
    • 中空注射成型法和加压流体引入和排出装置
    • US5409659A
    • 1995-04-25
    • US108570
    • 1993-08-27
    • Hiroyuki MatsumotoSusumu ImaiMasahiro Takeyasu
    • Hiroyuki MatsumotoSusumu ImaiMasahiro Takeyasu
    • B29C45/00B29C45/17B29C45/26B29C45/57B29C49/06B29C49/58B29C49/62B29L22/00B29D22/00
    • B29C45/1734B29C2045/1707
    • The invention relates to a hollow injection-molding method of forming a hollow portion in molten resin in a mold cavity by introducing a pressurized fluid, and also to a pressurized fluid introducing and discharging apparatus therefor, and has an object of eliminating the backflow of the molten resin into a pressurized fluid passage. A gap between a cylindrical sleeve and a shaft core inserted into the sleeve is used as the pressurized fluid passage. The front end of the shaft core is projected into a mold beyond the sleeve front end to serve as a guide face. By sliding the shaft core, the state of an opening portion of the pressurized fluid passage in the side of the mold is changed between a narrowed state where the pressurized fluid can pass through the opening portion but the molten resin cannot enter the opening portion and a widened state allowing the pressurized fluid to rapidly discharge. The guide face allows the pressurized fluid to be reliably introduced into the mold cavity.
    • PCT No.PCT / JP92 / 01693 Sec。 371日期:1993年8月27日 102(e)日期1993年8月27日PCT提交1992年12月24日PCT公布。 第WO93 / 12919号公报 日期:1993年7月8日。本发明涉及一种通过引入加压流体以及加压流体引入和排出装置在模腔中熔融树脂中形成中空部分的中空注射成型方法,并且具有 消除熔融树脂回流到加压流体通道中的目的。 使用插入到套筒中的圆柱形套筒和轴芯之间的间隙作为加压流体通道。 轴芯的前端突出到超过套筒前端的模具中,用作导向面。 通过滑动轴芯,加压流体通道在模具一侧的开口部分的状态在加压流体可以通过开口部分的变窄状态之间改变,但是熔融树脂不能进入开口部分,并且 加宽状态允许加压流体快速排出。 引导面允许加压流体可靠地引入模腔中。
    • 107. 发明授权
    • Charge transfer device imager with bias charge
    • 具有偏置电荷的电荷转移装置成像器
    • US4443886A
    • 1984-04-17
    • US318436
    • 1981-11-05
    • Hiroyuki MatsumotoMotoaki AbeTetsuo Ando
    • Hiroyuki MatsumotoMotoaki AbeTetsuo Ando
    • H01L21/339H01L27/148H01L29/762H01L31/10H04N5/335H04N5/341H04N5/365H04N5/3725G11C19/28H01L29/78
    • H04N3/1568H01L27/148
    • In a charge transfer device in which a plurality of electrodes are located on an insulating layer formed on a semiconductor substrate and an input portion and a transfer portion are provided, a predetermined amount of charge determined by a potential applied to the input portion is introduced into the portion beneath a predetermined electrode while driving an electrode on the transfer portion, such a potential is applied to all of the plurality of electrodes that surface areas of the substrate beneath the electrodes each become an accumulation state to thereby inject the predetermined amount of charge into the substrate, and a potential is applied to the electrodes after a predetermined period of time to partially catch injected charge beneath the electrodes and to use caught charge as a bias charge.A solid state image pick-up apparatus is also disclosed which includes the above-mentioned charge transfer device and carries out their operation in the vertical blanking period.
    • 在多个电极位于形成在半导体基板上的绝缘层上的电荷转移装置中,以及设置有输入部分和转印部分的电荷转移装置中,将由施加到输入部分的电位确定的预定量的电荷引入 在驱动转印部分上的电极的同时在预定电极下面的部分,将这样的电位施加到多个电极中的每个电极下方的基板的表面区域成为累积状态,从而将预定量的电荷注入 在预定时间段之后将电极施加到电极上以部分地捕获电极下方的注入电荷,并且使用捕获的电荷作为偏置电荷。 还公开了一种固态图像拾取装置,其包括上述电荷转移装置,并在垂直消隐期间进行其操作。
    • 110. 发明授权
    • Method for removing resist and for producing a magnetic recording medium, and systems thereof
    • 去除抗蚀剂和制造磁记录介质的方法及其系统
    • US08679732B2
    • 2014-03-25
    • US12820008
    • 2010-06-21
    • Joe InagakiHiroyuki MatsumotoKazuhiko Hasegawa
    • Joe InagakiHiroyuki MatsumotoKazuhiko Hasegawa
    • G03F7/42
    • G11B5/855G03F7/423G03F7/427
    • In one embodiment, a method for removing a resist includes irradiating, with an UV light having a wavelength of less than about 240 nm, a structure having a resist on a pattern surface in an atmosphere having oxygen. The resist is used as a mask as it remains above the pattern after the pattern has been transferred to a magnetic recording medium surface having a magnetic film thereon, and the irradiating is performed during production of the magnetic recording medium. In another embodiment, a method for forming a magnetic recording medium includes applying a resist to a surface of a magnetic film above a substrate, curing the resist by irradiating the resist with first UV light to form a pattern, transferring the pattern to the magnetic film using the pattern, and removing the resist by irradiating using second UV light having a shorter wavelength in an atmosphere including oxygen.
    • 在一个实施方案中,用于除去抗蚀剂的方法包括用波长小于约240nm的UV光照射在具有氧气的气氛中的图案表面上具有抗蚀剂的结构。 抗蚀剂在将图案转印到其上具有磁性膜的磁记录介质表面之后,作为掩模用作掩模,并且在制造磁记录介质期间进行照射。 在另一个实施例中,形成磁记录介质的方法包括在基片上方的磁性膜的表面上施加抗蚀剂,通过用第一UV光照射抗蚀剂来固化抗蚀剂以形成图案,将图案转印到磁性膜 使用图案,并通过在包括氧气的气氛中使用具有较短波长的第二UV光照射来除去抗蚀剂。