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101. 发明申请

US20080239268A1 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US20080239268A1
公开(公告)日：2008-10-02
申请号：US11729960
申请日：2007-03-30
申请人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Paul Van Der Veen
发明人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Paul Van Der Veen
IPC分类号： G03B27/52
CPC分类号： G03F7/70291 , G03F7/70116 , G03F7/702 , G03F7/70516
摘要： A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
摘要翻译：装置制造方法包括使用照明系统来调节辐射束。调节包括控制照明系统的独立可控元件阵列和相关联的光学部件，以将辐射束转换成期望的照明模式，该控制包括根据分配方案将不同的单独可控元件分配到照明模式的不同部分，所述分配方案被选择以提供照明模式，辐射束或两者的一个或多个属性的期望修改。该方法还包括以其横截面中的图案图案化辐射束以形成图案化的辐射束，并将图案化的辐射束投影到基板的目标部分上。

102. 发明授权

US07403265B2 Lithographic apparatus and device manufacturing method utilizing data filtering 有权
标题翻译：利用数据滤波的平版印刷设备和器件制造方法
公开(公告)号：US07403265B2
公开(公告)日：2008-07-22
申请号：US11093259
申请日：2005-03-30
申请人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans
发明人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans
IPC分类号： G03B27/54 , G03B27/42 , G03B27/32
CPC分类号： G03F7/70191 , G03F7/70291 , G03F7/70433 , G03F7/70508
摘要： An apparatus and method are used to form patterns on a substrate. The comprise a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams of radiation. The patterning device modulates the sub-beams of radiation to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters for pattern sharpening, image log slope control, and/or CD biasing can also be used.
摘要翻译：使用装置和方法在基板上形成图案。包括投影系统，图案形成装置，低通滤波器和数据操作装置。投影系统将辐射束投射到基板上作为辐射子束阵列。图案形成装置调制辐射的子光束以在衬底上基本上产生所要求的剂量图案。低通滤波器对从所请求的剂量图案导出的图形数据进行操作，以便形成仅包含低于选定阈值频率的空间频率分量的限幅目标剂量模式。数据处理装置基于斑点曝光强度与限幅目标剂量图案的直接代数最小二乘拟合，产生包括由图案形成装置产生的点曝光强度的控制信号。在各种示例中，还可以使用用于图案锐化，图像对数斜率控制和/或CD偏置的滤波器。

103. 发明申请

US20070279611A1 Reflective loop system producing incoherent radiation 有权
标题翻译：产生不相干辐射的反射环系统
公开(公告)号：US20070279611A1
公开(公告)日：2007-12-06
申请号：US11447289
申请日：2006-06-06
申请人： Johannes Jacobus Matheus Baselmans , Kenji Ueyama
发明人： Johannes Jacobus Matheus Baselmans , Kenji Ueyama
IPC分类号： G03B27/54
CPC分类号： G03F7/70583 , G02B27/48
摘要： A system and method are used to form incoherent beams from a coherent beam. A system comprises a source of radiation and a reflective loop system. The source of radiation produces a coherent or partially coherent beam. The reflective loop system received the partially coherent beam and reflects the partially coherent beam through a loop, or alternatively through non-overlapping loops, to form an incoherent beam.
摘要翻译：系统和方法用于从相干光束形成非相干光束。系统包括辐射源和反射回路系统。辐射源产生相干或部分相干的光束。反射环系统接收部分相干光束并且通过环路反射部分相干光束，或者通过非重叠环路反射以形成非相干光束。

104. 发明授权

US07239373B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US07239373B2
公开(公告)日：2007-07-03
申请号：US11546394
申请日：2006-10-12
申请人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans , Laurentius Catrinus Jorritsma
发明人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans , Laurentius Catrinus Jorritsma
IPC分类号： G03B27/54 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70558 , G03F7/70275 , G03F7/70291 , G03F7/70466 , G03F7/70475
摘要： A lithography apparatus including a projection system configured to project a beam of radiation onto a substrate as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation. The apparatus also includes a data-path including at least one data manipulation device arranged to at least partly convert data defining a requested pattern to a control signal suitable for controlling the array of individually controllable elements to form substantially the requested pattern on the substrate. The data manipulation device is arranged to carry out the conversion by applying a pseudo-inverted form of a point-spread function matrix to a column vector representing the requested pattern. The point-spread function matrix includes information about the shape and relative position of the point-spread function of each spot to be exposed on the substrate by one of the sub-beams of radiation at a given time.

105. 发明授权

US07183566B2 Lithographic apparatus for manufacturing a device 有权
标题翻译：用于制造装置的平版印刷装置
公开(公告)号：US07183566B2
公开(公告)日：2007-02-27
申请号：US10848583
申请日：2004-05-19
申请人： Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker
发明人： Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker
IPC分类号： G01N21/86 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70516 , G03F7/70291 , G03F7/70591
摘要： To calibrate a lithographic apparatus having a programmable patterning means, a sensor, such as a CCD, CMOS sensor or photo-diode array, having detector elements larger than the size of a spot corresponding to a single pixel of the programmable patterning means is used. Pixels are selectively activated singly or in groups.
摘要翻译：为了校准具有可编程图案形成装置的光刻设备，使用具有比对应于可编程图案形成装置的单个像素的点的尺寸大的检测器元件的诸如CCD，CMOS传感器或光电二极管阵列的传感器。像素被单独或分组选择性地激活。

106. 发明授权

US07068349B2 Method of and preventing focal plane anomalies in the focal plane of a projection system 有权
标题翻译：投影系统焦平面焦平面异常的方法和防止
公开(公告)号：US07068349B2
公开(公告)日：2006-06-27
申请号：US10830406
申请日：2004-04-23
申请人： Ingrid Minnaert-Janssen , Johannes Jacobus Matheus Baselmans , Frits Jurgen Van Hout , Peter Van Oorschot , Christian Wagner , Adriaan Roelof Van Zwol , Roderik Willem Van Es , Petrus Augustinus Marie Van Der Wielen , Hubrecht Lodewijk Van Ginneken
发明人： Ingrid Minnaert-Janssen , Johannes Jacobus Matheus Baselmans , Frits Jurgen Van Hout , Peter Van Oorschot , Christian Wagner , Adriaan Roelof Van Zwol , Roderik Willem Van Es , Petrus Augustinus Marie Van Der Wielen , Hubrecht Lodewijk Van Ginneken
IPC分类号： G03B27/68 , G03B27/52
CPC分类号： G03B27/68 , G03F7/706
摘要： To reduce and prevent local field anomalies created localized thinning of the coating of optical elements in the apparatus. The projection system is flood exposed to an intense beam of radiation for a substantial period of time. As the rate of thinning of the coating decreases with time, a uniform coating results.
摘要翻译：为了减少和防止局部场异常造成设备中光学元件涂层的局部变薄。投影系统在相当长的一段时间内暴露于强烈的辐射束。随着涂层变薄的速度随时间的推移而降低，可以得到均匀的涂层。

107. 发明授权

US09423701B2 Lithographic method and assembly 有权
标题翻译：平版印刷方法和装配
公开(公告)号：US09423701B2
公开(公告)日：2016-08-23
申请号：US13438526
申请日：2012-04-03
申请人： Shaoxian Zhang , Johannes Jacobus Matheus Baselmans , Johannes Christiaan Maria Jasper
发明人： Shaoxian Zhang , Johannes Jacobus Matheus Baselmans , Johannes Christiaan Maria Jasper
IPC分类号： G03B27/68 , G03F7/20
CPC分类号： G03F7/706 , G03F7/70616 , G03F7/70625
摘要： A lithographic method of determining a sensitivity of a property of a pattern feature to change in optical aberrations of a lithographic apparatus used to provide that pattern feature. The method includes controlling a configuration of the lithographic apparatus to establish a first aberration state, forming a first image of the pattern feature with that lithographic apparatus when the lithographic apparatus is in that first aberration state, measuring a property of the image, controlling a configuration of the lithographic apparatus to establish a second, different, aberration state, forming an image of the same pattern feature with that lithographic apparatus when the lithographic apparatus is in that second aberration state, measuring a same property of the image, and using the measurements to determine the sensitivity of the property of the pattern feature to changes in the aberration state.
摘要翻译：确定图案特征的属性的灵敏度以改变用于提供该图案特征的光刻设备的光学像差的光刻方法。该方法包括控制光刻设备的配置以建立第一像差状态，当光刻设备处于第一像差状态时，利用该光刻设备形成图案特征的第一图像，测量图像的属性，控制配置的光刻设备，以建立第二，不同的像差状态，当光刻设备处于第二像差状态时，与该光刻设备形成相同图案特征的图像，测量图像的相同特性，并使用测量值确定图案特征的属性对像差状态变化的敏感度。

108. 发明授权

US08817235B2 Lithographic apparatus and method involving a pockels cell 有权
标题翻译：涉及斑纹细胞的平版印刷设备和方法
公开(公告)号：US08817235B2
公开(公告)日：2014-08-26
申请号：US12436604
申请日：2009-05-06
申请人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans
发明人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans
IPC分类号： G03B27/72 , G03B27/54 , G03B27/32
CPC分类号： G03F7/70141 , G03F7/70108 , G03F7/70116 , G03F7/70566
摘要： A lithographic apparatus is disclosed that includes an illumination system configured to condition a beam of radiation, the illumination system having a Pockels cell arranged to control the polarization of the radiation beam, and an array of individually controllable reflective elements arranged to control the pupil plane distribution of the radiation beam.
摘要翻译：公开了一种光刻设备，其包括被配置为调节辐射束的照明系统，所述照明系统具有设置成控制辐射束的偏振的Pockels单元，以及布置成控制瞳孔平面分布的单独可控反射元件的阵列的辐射束。

109. 发明授权

US08610878B2 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US08610878B2
公开(公告)日：2013-12-17
申请号：US12966448
申请日：2010-12-13
申请人： Johannes Jacobus Matheus Baselmans , Francis Fahrni , Gerardus Johannes Joseph Keijsers , Heine Melle Mulder , Willem Richard Pongers , Joost Cyrillus Lambert Hageman , Mattheus Johannes Van Bruggen , Johannes Franciscus Roosekrans , David James Butler , Patrick Marcel Maria Thomassen , Gabriela Vesselinova Paeva
发明人： Johannes Jacobus Matheus Baselmans , Francis Fahrni , Gerardus Johannes Joseph Keijsers , Heine Melle Mulder , Willem Richard Pongers , Joost Cyrillus Lambert Hageman , Mattheus Johannes Van Bruggen , Johannes Franciscus Roosekrans , David James Butler , Patrick Marcel Maria Thomassen , Gabriela Vesselinova Paeva
IPC分类号： G03B27/32 , G03B27/42 , G03B27/54 , G03B27/58
CPC分类号： G03B27/54 , G03F7/70066 , G03F7/70208
摘要： A lithographic apparatus includes an illumination system configured to provide a first beam of radiation, which forms a first mask illumination region, and configured to substantially simultaneously provide a second beam of radiation, which forms a second mask illumination region. The first and second illumination regions being configured to substantially simultaneously illuminate a same mask. The lithographic apparatus also includes a projection system configured to project the first radiation beam such that it forms a first substrate illumination region and configured to simultaneously project the second radiation beam such that it forms a second substrate illumination region.
摘要翻译：光刻设备包括被配置为提供第一辐射束的照明系统，其形成第一掩模照射区域，并且被配置为基本上同时提供第二辐射束，其形成第二掩模照射区域。第一和第二照明区域被配置为基本上同时照射相同的掩模。光刻设备还包括投影系统，该投影系统配置成投射第一辐射束，使得其形成第一基板照明区域并且被配置为同时投射第二辐射束，使得其形成第二基板照明区域。

110. 发明授权

US08264667B2 Lithographic apparatus and device manufacturing method using interferometric and other exposure 有权
标题翻译：平版印刷设备和器件制造方法采用干涉式曝光等
公开(公告)号：US08264667B2
公开(公告)日：2012-09-11
申请号：US11417210
申请日：2006-05-04
申请人： Kars Zeger Troost , Johannes Jacobus Matheus Baselmans , James Sherwood Greeneich
发明人： Kars Zeger Troost , Johannes Jacobus Matheus Baselmans , James Sherwood Greeneich
IPC分类号： G03B27/54 , G03B27/42 , G02B27/00
CPC分类号： G03F7/70408
摘要： A lithographic apparatus including an exposure unit that exposes parallel lines on a target area of a substrate by projecting two beams of radiation onto the substrate. The two beams of radiation are projected such that they interfere with each other to form the parallel lines. An actuator continuously moves the substrate relative to the exposure unit, while the exposure unit exposes the parallel lines on the target areas on the substrate.
摘要翻译：一种光刻设备，包括曝光单元，该曝光单元通过将两束辐射投射到基板上而使基板的目标区域上的平行线曝光。两束辐射被投影使得它们彼此干涉以形成平行线。执行器相对于曝光单元连续移动基板，同时曝光单元将平行线暴露在基板上的目标区域上。

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