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    • 101. 发明申请
    • VIDEO PROJECTOR
    • 视频投影机
    • US20120075587A1
    • 2012-03-29
    • US13243140
    • 2011-09-23
    • Yusuke YAMAMOTOToshihiro SaruwatariChao Wang
    • Yusuke YAMAMOTOToshihiro SaruwatariChao Wang
    • G03B21/16
    • G03B21/16
    • A projector is provided with a lamp including an arc tube, which generates light, and a reflector. The reflector includes an inner surface that reflects light from the arc tube and an opposite outer surface. The arc tube and the inner surface define an inner portion of the lamp. At least the outer surface defines an outer portion of the lamp. A housing accommodates the lamp and includes an air inlet through which air is drawn in from outside the housing. An air mixing structure mixes a cooling current that has cooled the inner portion of the lamp with the air drawn into the housing through the air inlet. A cooling current guide structure guides the cooling current mixed with the air mixing structure to the outer portion of the lamp.
    • 投影仪设置有灯,其包括产生光的电弧管和反射器。 反射器包括反射来自电弧管的光的内表面和相对的外表面。 电弧管和内表面限定了灯的内部部分。 至少外表面限定了灯的外部部分。 壳体容纳灯,并且包括空气入口,空气从壳体外部吸入空气。 空气混合结构将冷却灯的内部的冷却电流与通过空气入口吸入外壳的空气混合。 冷却电流导向结构将与空气混合结构混合的冷却电流引导到灯的外部。
    • 102. 发明申请
    • SYSTEMS AND METHODS FOR CONCURRENCY ANALYSIS
    • 系数和方差分析
    • US20120011492A1
    • 2012-01-12
    • US13109998
    • 2011-05-18
    • Nishant SinhaChao Wang
    • Nishant SinhaChao Wang
    • G06F9/44
    • G06F11/3608
    • Systems and methods are disclosed to check properties of bounded concurrent programs by encoding concurrent control flow graph (CFG) and property for programming threads as a first-order formula F1; initializing an interference abstraction (IA); encoding the IA as a first-order formula F2; checking a conjunction of F1 and F2 (F1̂F2); if the conjunction is satisfiable, checking if an interference relation (IR) is spurious, and iteratively refining the IA; and if the conjunction is unsatisfiable, checking if an interference relation (IR) is spurious, and iteratively refining the IA.
    • 公开了系统和方法,通过将并行控制流程图(CFG)和编程线程的属性编码为一阶公式F1来检查有界并发程序的属性; 初始化干扰抽象(IA); 将IA编码为一阶公式F2; 检查F1和F2(F1F2)的连接; 如果连接是可满足的,则检查干扰关系(IR)是否是假的,并且迭代地改进IA; 并且如果连接不能令人满意,则检查干扰关系(IR)是否是伪造的,并且迭代地改进IA。
    • 108. 发明申请
    • Techniques for removal of photolithographic films
    • 去除光刻胶膜的技术
    • US20070072390A1
    • 2007-03-29
    • US11243883
    • 2005-10-04
    • Runshun WangChao WangLien Cheng
    • Runshun WangChao WangLien Cheng
    • H01L21/76H01L21/8242
    • H01L21/31138H01L21/31111
    • Techniques for removal of photolithographic films used in the manufacture of semiconductor devices are provided. A substrate support member of a first processing chamber includes at least three retractable pins capable of elevating a wafer from a surface of the substrate support member. In addition, the first processing chamber is configured to automatically maintain the substrate support member at a first temperature. The wafer is elevated from the surface of the substrate support member using the at least three retractable pins. Thermal heating of the substrate from the substrate support member is reduced. A photoresist layer of the substrate is etched away while the substrate is in an elevated position. An anti-reflective layer of the substrate can be etched to remove substantially all of the anti-reflective layer. In a specific embodiment, the anti-reflective layer includes a DUO™ Bottom Anti-Reflective Coating by Honeywell International Inc.
    • 提供了用于去除用于制造半导体器件的光刻胶片的技术。 第一处理室的衬底支撑构件包括至少三个能够从衬底支撑构件的表面升高晶片的伸缩销。 另外,第一处理室被配置为自动地将基板支撑构件保持在第一温度。 使用至少三个可缩回的销,从衬底支撑构件的表面升高晶片。 衬底从衬底支撑构件的热加热减少了。 当衬底处于升高位置时,蚀刻掉衬底的光致抗蚀剂层。 可以蚀刻衬底的抗反射层以基本上去除所有抗反射层。 在具体实施方案中,抗反射层包括Honeywell International Inc.的DUO TM底部防反射涂层