专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

101. 发明授权

US07715459B2 Laser system 失效
标题翻译：激光系统
公开(公告)号：US07715459B2
公开(公告)日：2010-05-11
申请号：US11982152
申请日：2007-10-31
申请人： Daniel J. W. Brown , William N. Partlo , Richard L. Sandstrom
发明人： Daniel J. W. Brown , William N. Partlo , Richard L. Sandstrom
IPC分类号： H01S3/22
CPC分类号： H01S3/2308 , G03F7/70025 , G03F7/70041 , G03F7/7055 , G03F7/70575 , G03F7/70583 , H01S3/005 , H01S3/0057 , H01S3/08036 , H01S3/225 , H01S3/2325 , H01S3/2383
摘要： An apparatus/method which may comprise: a very high power line narrowed lithography laser light source which may comprise: a solid state seed laser system which may comprise: a pre-seed laser providing a pre-seed laser output; a fiber amplifier receiving the pre-seed laser output and providing an amplified seed laser pulse which may comprise: a pulse having a nominal wavelength outside of the DUV range; a frequency converter converting to essentially the wavelength of the amplifier gain medium; a first and a second gas discharge laser amplifier gain medium operating at different repetition rates from that of the seed laser output; a beam divider providing the amplifier gain mediums with output pulses from the seed laser; a beam combiner combining the outputs of each respective amplifier gain medium to provide a laser output light pulse beam having the pulse repetition rate of the solid state seed laser system.
摘要翻译：可以包括：非常高的电力线狭窄的光刻激光光源，其可以包括：固态种子激光系统，其可以包括：提供种子间激光输出的种子间激光; 接收所述种子间激光输出并提供放大的种子激光脉冲的光纤放大器，其可以包括：具有在所述DUV范围之外的标称波长的脉冲; 变换器基本上转换为放大器增益介质的波长; 第一和第二气体放电激光放大器增益介质，与种子激光输出的重复频率不同; 一个分束器，为放大器增益介质提供来自种子激光器的输出脉冲; 组合各个放大器增益介质的输出的光束组合器，以提供具有固态种子激光器系统的脉冲重复率的激光输出光脉冲光束。

102. 发明授权

US07643529B2 Laser system 有权
标题翻译：激光系统
公开(公告)号：US07643529B2
公开(公告)日：2010-01-05
申请号：US11982103
申请日：2007-10-31
申请人： Daniel J. W. Brown , William N. Partlo , Richard L. Sandstrom
发明人： Daniel J. W. Brown , William N. Partlo , Richard L. Sandstrom
IPC分类号： H01S3/22
CPC分类号： G03F7/70341 , G03F7/70025 , G03F7/70041 , G03F7/7055 , H01S3/005 , H01S3/0057 , H01S3/08004 , H01S3/08009 , H01S3/083 , H01S3/10092 , H01S3/225 , H01S3/2251 , H01S3/2258 , H01S3/2333 , H01S3/2383 , H01S2301/02
摘要： An apparatus/method may comprise a line narrowed pulsed lithography laser light source which may comprise: a seed pulse providing laser system which may comprise: a first pulsed seed laser producing seed pulses at a rate of X kHz; a second pulsed seed laser producing seed pulses at a rate of X kHz; an amplification system which may comprise: a first amplifier gain system which may comprise a first and a second pulsed gas discharge amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½ X kHz on output pulses from the first seed laser; a second amplifier gain system which may comprise a first and a second pulsed amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½ X kHz on output pulses from the second seed laser.
摘要翻译：一种装置/方法可以包括线窄的脉冲光刻激光光源，其可以包括：提供激光系统的种子脉冲，其可以包括：以X kHz的速率产生种子脉冲的第一脉冲种子激光器; 第二脉冲种子激光器以XkHz的速率产生种子脉冲; 放大系统，其可以包括：第一放大器增益系统，其可以包括第一和第二脉冲气体放电放大器增益介质，每个具有在UV范围内的标称中心波长，并且每个在来自第一种子激光; 第二放大器增益系统，其可以包括第一和第二脉冲放大器增益介质，每个具有在UV范围内的标称中心波长，并且每个在来自第二种子激光器的输出脉冲上以1/2 X kHz工作。

103. 发明授权

US08102889B2 Multi-chamber gas discharge laser bandwidth control through discharge timing 有权
标题翻译：多室气体放电激光带宽控制通过放电时序
公开(公告)号：US08102889B2
公开(公告)日：2012-01-24
申请号：US12806308
申请日：2010-08-10
申请人： Robert N. Jacques , William N. Partlo , Daniel J. W. Brown
发明人： Robert N. Jacques , William N. Partlo , Daniel J. W. Brown
IPC分类号： H01S3/00
CPC分类号： H01S3/225 , H01S3/08022 , H01S3/09702 , H01S3/1301 , H01S3/134 , H01S3/2308 , H01S3/2366
摘要： A method and apparatus are disclosed for controlling bandwidth in a multi-portion laser system comprising a first line narrowed oscillator laser system portion providing a line narrowed seed pulse to an amplifier laser system portion, may comprise utilizing a timing difference curve defining a relationship between a first laser system operating parameter other than bandwidth and the timing difference and also a desired point on the curve defining a desired timing difference, wherein each unique operating point on the curve corresponds to a respective bandwidth value; determining an actual offset from the timing difference at the desired point on the curve to an actual operating point on the curve; determining an error between the actual offset and a desired offset corresponding to a desired bandwidth; modifying the firing differential timing to remove the error between the actual offset and the desired offset.
摘要翻译：公开了一种用于控制多部分激光系统中的带宽的方法和装置，其包括向放大器激光系统部分提供线窄化种子脉冲的第一线窄化振荡器激光器系统部分，可以包括利用定时差分曲线来定义第一激光系统操作参数而不是带宽和定时差，并且还在曲线上的期望点定义期望的时序差，其中曲线上的每个唯一操作点对应于相应的带宽值; 确定曲线上期望点处的定时差与曲线上的实际工作点的实际偏移; 确定实际偏移与对应于期望带宽的期望偏移之间的误差; 修改击发差分定时以消除实际偏移和所需偏移之间的误差。

104. 发明授权

US07830934B2 Multi-chamber gas discharge laser bandwidth control through discharge timing 有权
标题翻译：多室气体放电激光带宽控制通过放电时序
公开(公告)号：US07830934B2
公开(公告)日：2010-11-09
申请号：US11323604
申请日：2005-12-29
申请人： Robert N. Jacques , William N. Partlo , Daniel J. W. Brown
发明人： Robert N. Jacques , William N. Partlo , Daniel J. W. Brown
IPC分类号： H01S3/00
CPC分类号： H01S3/225 , H01S3/08022 , H01S3/09702 , H01S3/1301 , H01S3/134 , H01S3/2308 , H01S3/2366
摘要： A method and apparatus are disclosed for controlling bandwidth in a multi-portion laser system comprising a first line narrowed oscillator laser system portion providing a line narrowed seed pulse to an amplifier laser system portion, may comprise utilizing a timing difference curve defining a relationship between a first laser system operating parameter other than bandwidth and the timing difference and also a desired point on the curve defining a desired timing difference, wherein each unique operating point on the curve corresponds to a respective bandwidth value; determining an actual offset from the timing difference at the desired point on the curve to an actual operating point on the curve; determining an error between the actual offset and a desired offset corresponding to a desired bandwidth; modifying the firing differential timing to remove the error between the actual offset and the desired offset.
摘要翻译：公开了一种用于控制多部分激光系统中的带宽的方法和装置，其包括向放大器激光系统部分提供线窄化种子脉冲的第一线窄化振荡器激光器系统部分，可以包括利用定时差分曲线来定义第一激光系统操作参数而不是带宽和定时差，并且还在曲线上的期望点定义期望的时序差，其中曲线上的每个唯一操作点对应于相应的带宽值; 确定曲线上期望点处的定时差与曲线上的实际工作点的实际偏移; 确定实际偏移与对应于期望带宽的期望偏移之间的误差; 修改击发差分定时以消除实际偏移和所需偏移之间的误差。

105. 发明申请

US20100142582A1 GAS DISCHARGE LASER CHAMBER 有权
标题翻译：气体放电激光室
公开(公告)号：US20100142582A1
公开(公告)日：2010-06-10
申请号：US12603486
申请日：2009-10-21
申请人： Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Bryan G. Moosman , Tae H. Chung , Thomas P. Duffey , James J. Ferrell , Terance Hilsabeck
发明人： Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Bryan G. Moosman , Tae H. Chung , Thomas P. Duffey , James J. Ferrell , Terance Hilsabeck
IPC分类号： H01S3/038 , H01S3/03
CPC分类号： H01S3/036
摘要： One aspect of the disclosed subject matter describes a gas discharge laser chamber. The gas discharge laser chamber includes a discharge region formed between a first electrode and a second electrode, a tangential fan for circulating gas through the discharge region, wherein the fan is proximate to an input side of the discharge region, an input side acoustic baffle proximate to the input side of the discharge region. The input side acoustic baffle includes a vanishing point leading edge, a vanishing point trailing edge, a gas flow smoothing offset surface aligning a gas flow from a surface of the input side acoustic baffle to an input side of a cathode support in the discharge region, a plurality of ridges separated by a plurality of trenches, wherein the plurality of ridges and the plurality of trenches are aligned with a direction of gas flow through the discharge region and wherein the plurality of ridges have a random pitch between about 0.3 and about 0.7 inch.
摘要翻译：所公开的主题的一个方面描述了气体放电激光室。气体放电激光室包括形成在第一电极和第二电极之间的放电区域，用于使气体循环通过放电区域的切向风扇，其中风扇靠近放电区域的输入侧，输入侧隔音板接近到放电区域的输入侧。输入侧声挡板包括消失点前缘，消失点后缘，气流平滑偏移表面，使来自输入侧声挡板的表面的气流与放电区域中的阴极支撑体的输入侧对准，由多个沟槽分开的多个脊，其中所述多个脊和所述多个沟槽与通过所述放电区域的气体流动方向对齐，并且其中所述多个脊具有约0.3和约0.7英寸之间的随机间距。

106. 发明授权

US09029813B2 Filter for material supply apparatus of an extreme ultraviolet light source 有权
标题翻译：过滤器用于极紫外光源的材料供应装置
公开(公告)号：US09029813B2
公开(公告)日：2015-05-12
申请号：US13112784
申请日：2011-05-20
申请人： Igor V. Fomenkov , William N. Partlo , Georgiy O. Vaschenko , William Oldham
发明人： Igor V. Fomenkov , William N. Partlo , Georgiy O. Vaschenko , William Oldham
IPC分类号： G01J3/10 , B22F3/105 , B01D29/56
CPC分类号： B01D29/56 , B22F3/105 , H05G2/006 , H05G2/008 , H05H1/46
摘要： A filter is used in a target material supply apparatus and includes a sheet having a first flat surface and a second opposing flat surface, and a plurality of through holes. The first flat surface is in fluid communication with a reservoir that holds a target mixture that includes a target material and non-target particles. The through holes extend from the second flat surface and are fluidly coupled at the second flat surface to an orifice of a nozzle. The sheet has a surface area that is exposed to the target mixture, the exposed surface area being at least a factor of one hundred less than an exposed surface area of a sintered filter having an equivalent transverse extent to that of the sheet.
摘要翻译：在目标材料供给装置中使用过滤器，并且包括具有第一平面和第二相对平坦面的片，以及多个通孔。第一平坦表面与储存包含目标材料和非目标颗粒的目标混合物的储存器流体连通。通孔从第二平坦表面延伸并且在第二平坦表面处流体耦合到喷嘴的孔口。片材具有暴露于目标混合物的表面积，暴露的表面积比具有与片材相当的横向程度的烧结过滤器的暴露表面积至少要低一百倍。

107. 发明授权

US08379687B2 Gas discharge laser line narrowing module 有权
标题翻译：气体放电激光线变窄模块
公开(公告)号：US08379687B2
公开(公告)日：2013-02-19
申请号：US11173955
申请日：2005-06-30
申请人： Raymond F. Cybulski , Robert A. Bergstedt , William N. Partlo , Richard L. Sandstrom , Gon Wang
发明人： Raymond F. Cybulski , Robert A. Bergstedt , William N. Partlo , Richard L. Sandstrom , Gon Wang
IPC分类号： H01S3/08
CPC分类号： H01S3/03 , H01S3/034 , H01S3/036 , H01S3/1055 , H01S3/225
摘要： A line narrowed gas discharge laser system and method of operating same is disclosed which may comprise a dispersive center wavelength selective element; a beam expander comprising a plurality of refractive elements; a refractive element positioning mechanism positioning at least one of the refractive elements to modify an angle of incidence of a laser light beam on the dispersive center wavelength selection element; each of the dispersive center wavelength selection element and the beam expander being aligned with each other and with a housing containing at least the dispersive center wavelength selection element; a housing positioning mechanism positioning the housing with respect to an optical axis of the gas discharge laser system. The dispersive element may comprise a grating and the beam expander may comprise a plurality of prisms. The housing may contain the dispersive center wavelength selective element and the beam expander. The housing positioning element may comprise a position locking mechanism.
摘要翻译：公开了一种窄气体放电激光系统及其操作方法，其可以包括分散中心波长选择元件; 包括多个折射元件的光束扩展器; 折射元件定位机构，其定位折射元件中的至少一个，以改变激光束在分散中心波长选择元件上的入射角; 分散中心波长选择元件和扩束器中的每一个彼此对准并且至少包含分散中心波长选择元件的壳体; 壳体定位机构相对于气体放电激光系统的光轴定位壳体。色散元件可以包括光栅，并且光束扩展器可以包括多个棱镜。壳体可以包含分散中心波长选择元件和扩束器。壳体定位元件可以包括位置锁定机构。

108. 发明授权

US08126027B2 Line narrowing module 有权
标题翻译：线窄模块
公开(公告)号：US08126027B2
公开(公告)日：2012-02-28
申请号：US13086858
申请日：2011-04-14
申请人： J. Martin Algots , Robert A. Bergstedt , William N. Partlo , German E. Rylov , Richard L. Sandstrom
发明人： J. Martin Algots , Robert A. Bergstedt , William N. Partlo , German E. Rylov , Richard L. Sandstrom
IPC分类号： H01S3/22
CPC分类号： H01S3/1055 , G03F7/70025 , G03F7/70041 , H01S3/005 , H01S3/036 , H01S3/08 , H01S3/08004 , H01S3/08059 , H01S3/097 , H01S3/106 , H01S3/2251
摘要： An apparatus is disclosed which may comprise a grating receiving light, a first prism moveable to coarsely select an angle of incidence of the light on the grating, and a second prism moveable to finely select an angle of incidence of the light on the grating. In one application, the apparatus may be used as a line narrowing module for a laser light source.
摘要翻译：公开了一种可以包括接收光的光栅的装置，可以粗略地选择光栅入射角的第一棱镜和可精细选择光栅入射角的第二棱镜。在一个应用中，该装置可以用作激光源的线窄化模块。

109. 发明申请

US20110141865A1 Metrology for Extreme Ultraviolet Light Source 有权
标题翻译：极紫外光源计量
公开(公告)号：US20110141865A1
公开(公告)日：2011-06-16
申请号：US12637961
申请日：2009-12-15
申请人： Vahan Senekerimyan , Nam-Hyong Kim , Robert A. Bergstedt , Igor V. Fomenkov , William N. Partlo
发明人： Vahan Senekerimyan , Nam-Hyong Kim , Robert A. Bergstedt , Igor V. Fomenkov , William N. Partlo
IPC分类号： G11B20/00 , G11B7/00
CPC分类号： G01J1/429 , H05G2/008
摘要： An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; a beam delivery system configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location; and a metrology system. The beam delivery system includes converging lens configured and arranged to focus the amplified light beam at the target location. The metrology system includes a light collection system configured to collect a portion of the amplified light beam reflected from the converging lens and a portion of a guide laser beam reflected from the converging lens. The light collection system includes a dichroic optical device configured to optically separate the portions.
摘要翻译：极紫外光系统包括产生放大光束的驱动激光系统; 配置成在目标位置产生目标材料的目标材料输送系统; 射束传送系统，被配置为接收从驱动激光系统发射的放大光束并将放大的光束引向目标位置; 和计量系统。光束传送系统包括被配置和布置成将被放大的光束聚焦在目标位置处的会聚透镜。测量系统包括：光收集系统，被配置为收集从会聚透镜反射的放大光束的一部分和从会聚透镜反射的一部分引导激光束。光采集系统包括配置为光学地分离这些部分的二向色光学装置。

110. 发明申请

US20100258749A1 SYSTEM, METHOD AND APPARATUS FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET CHAMBER WITH HOT WALLS AND COLD COLLECTOR MIRROR 有权
标题翻译：用于激光生产的等离子体超紫外线室的系统，方法和装置，具有热水和冷收集器
公开(公告)号：US20100258749A1
公开(公告)日：2010-10-14
申请号：US12725167
申请日：2010-03-16
申请人： William N. Partlo , Igor V. Fomenkov
发明人： William N. Partlo , Igor V. Fomenkov
IPC分类号： H05G2/00
CPC分类号： H05G2/005 , G03F7/70033 , G21K5/00 , H05G2/003 , H05G2/006
摘要： A system and method for an extreme ultraviolet light chamber comprising a collector mirror, a cooling system coupled to a backside of the collector mirror operative to cool a reflective surface of the collector mirror and a buffer gas source coupled to the extreme ultraviolet light chamber.
摘要翻译：一种用于极紫外光室的系统和方法，包括收集器反射镜，耦合到收集器反射镜的后侧的冷却系统，其用于冷却收集反射镜的反射表面和耦合到极紫外光室的缓冲气体源。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式