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    • 107. 发明公开
    • 조명장치
    • 照明设备
    • KR1020130008391A
    • 2013-01-22
    • KR1020110069107
    • 2011-07-12
    • 주성엔지니어링(주)
    • 윤영태권창구김정배김헌도이승준이준호황철주
    • H05B37/02F21W121/00
    • H05B37/0281F21V23/004F21W2121/00F21Y2105/00F21Y2115/15
    • PURPOSE: A lighting apparatus is provided to accommodate an independent lighting unit which is interlocking with the lighting apparatus and formed into a flower shape. CONSTITUTION: A first container unit forms a light emitting surface. The first container forms a first receiving space. A settling part is installed in the first container. A part to be seated is detachably placed inside the first receiving space. An optical source unit emits light toward the first container or the outside. An optical source driving unit operates the optical source unit. A control unit controls the optical source unit and the optical source driving unit. An independent lighting unit(1700) comprises a light source module(1701) and a power connector(1703). The light emitting surface of the light source module comprises a light emitting unit. The power connector comprises two terminals(1705).
    • 目的:提供照明装置以容纳与照明装置互锁并形成花形的独立照明单元。 构成:第一容器单元形成发光面。 第一容器形成第一容纳空间。 第一个容器中安装一个沉降部件。 待坐的部件可拆卸地放置在第一接收空间内。 光源单元朝向第一容器或外部发光。 光源驱动单元操作光源单元。 控制单元控制光源单元和光源驱动单元。 独立照明单元(1700)包括光源模块(1701)和电源连接器(1703)。 光源模块的发光面包括发光单元。 电源连接器包括两个端子(1705)。
    • 108. 发明公开
    • 박막 패턴의 제조 장치 및 제조 방법
    • 薄膜图案的制造和制造方法
    • KR1020120078835A
    • 2012-07-11
    • KR1020110000107
    • 2011-01-03
    • 주성엔지니어링(주)
    • 박상일민천규이준호신대철양지범윤영태이성희김승호
    • H01L21/027
    • H01L21/0274G03F7/16
    • PURPOSE: An apparatus and a method for manufacturing a thin film pattern are provided to simplify a manufacturing process of a thin film pattern by forming a thin film pattern on a substrate through two times of a vapor deposition process. CONSTITUTION: A loadlock chamber(LL) includes at least one of a substrate storage slot and a door for entering. A transfer chamber(TC) sends a kept substrate in the loadlock to each processing chamber(PC). The processing chamber supports the sent substrate from the transfer chamber. The processing chamber forms a thin film pattern on the substrate through a vapor deposition process with a mask. A plurality of mask changing units(MCU) alternately loads a first mask and a second mask to the processing chamber.
    • 目的:提供一种用于制造薄膜图案的装置和方法,以通过在基板上通过两次气相沉积工艺形成薄膜图案来简化薄膜图案的制造工艺。 构成:装载室(LL)包括基板存储槽和用于进入的门中的至少一个。 传送室(TC)将负载锁中的保持的基板发送到每个处理室(PC)。 处理室支持从传送室传送的衬底。 处理室通过具有掩模的气相沉积工艺在衬底上形成薄膜图案。 多个掩模改变单元(MCU)交替地将第一掩模和第二掩模加载到处理室。
    • 110. 发明公开
    • 기판 처리장치 및 기판 처리장치의 제어방법
    • 基板处理装置及其控制方法
    • KR1020120013704A
    • 2012-02-15
    • KR1020100075859
    • 2010-08-06
    • 주성엔지니어링(주)
    • 장우영이준호이승헌
    • H01L21/02
    • H01L21/67772H01L21/205H01L21/67739
    • PURPOSE: A substrate processing apparatus and a substrate processing apparatus control method are provided to secure a redundancy space inside of a housing by changing the built-in position of a lead opening apparatus, thereby reducing the whole size of the substrate processing apparatus. CONSTITUTION: A chamber(200) comprises a reaction space. A lead(300) selectively opens or closes the reaction space. A lift operation apparatus(500) supplies driving force for transferring the lead in up and down directions. A power transmission device(600) connects the lift operation apparatus and the lead. The power transmission device transfers the lead in up and down directions.
    • 目的:提供基板处理装置和基板处理装置控制方法,通过改变引线装置的内置位置来确保壳体内部的冗余空间,从而减小基板处理装置的整体尺寸。 构成:室(200)包括反应空间。 引线(300)选择性地打开或关闭反应空间。 提升操作装置(500)提供用于在上下方向上传送引线的驱动力。 动力传递装置(600)连接提升操作装置和引导件。 电力传输装置在上下方向上传送引线。