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    • 103. 发明公开
    • 반도체 장치 및 그 제조 방법
    • 半导体器件及其制造方法
    • KR1020080082914A
    • 2008-09-12
    • KR1020080020891
    • 2008-03-06
    • 후지쯔 세미컨덕터 가부시키가이샤
    • 왕웬셍
    • H01L27/105
    • H01L27/11507H01L27/11502H01L28/55H01L28/65H01L28/75
    • A semiconductor device and a method for manufacturing the same are provided to improve retention characteristics by forming an upper electrode of which a crystal state is controlled. A capacitor structure is formed over a semiconductor substrate(1). The capacitor structure is configured by inserting a capacitor layer between an upper electrode(11) and a lower electrode(9). An upper electrode is comprised of a first layer, a second layer, and a third layer. The first layer is made of an oxide that is represented by a chemical formula of M1Ox1 using a composition parameter(x1), and represented by a chemical formula M1Ox2 using a composition parameter(x2). The second layer is formed on the first layer and made of an oxide that is represented by a chemical formula of M2Oy1 using a composition parameter(y1), and represented by a chemical formula of M2oY2 using a composition parameter(y2). The third layer is formed on the second layer and made of an oxide that is represented by a chemical formula of M3Oz1 using a composition parameter(z1), and represented by a chemical formula of M3Oz2 using a composition parameter(z2). The second layer has an oxidation ratio greater than those of the first and third layers, and y2/y1>x2/x1, y2/y1>z2/z1, and z2/z1 x2/x1 are satisfied.
    • 提供半导体器件及其制造方法,以通过形成控制晶体状态的上电极来改善保持特性。 在半导体衬底(1)上形成电容器结构。 电容器结构通过在上电极(11)和下电极(9)之间插入电容器层来构成。 上电极由第一层,第二层和第三层组成。 第一层由使用组成参数(x1)由化学式M1Ox1表示并由组成参数(x2)由化学式M1Ox2表示的氧化物制成。 第二层由第一层形成,由使用组成参数(y1)由化学式M2Oy1表示的氧化物形成,并使用组成参数(y2)由化学式M2oY2表示。 第三层由第二层形成,由使用组成参数(z1)由化学式M3Oz1表示的氧化物形成,并使用组成参数(z2)由化学式M3Oz2表示。 第二层的氧化比大于第一层和第三层的氧化比,并且满足y2 / y1> x2 / x1,y2 / y1> z2 / z1和z2 / z1×2 / x1。
    • 104. 发明公开
    • 반도체 장치 및 그 제조 방법
    • 半导体器件及其制造方法
    • KR1020080080953A
    • 2008-09-05
    • KR1020080019380
    • 2008-02-29
    • 후지쯔 세미컨덕터 가부시키가이샤
    • 사꾸마다까시
    • H01L21/265
    • H01L21/823412H01L21/3145
    • A semiconductor device is provided to stably form a pocket region by avoiding a shadowing phenomenon caused by a photoresist layer. On a semiconductor substrate(10) having a first region and a second region adjacent to the first region, an isolation layer(12) is formed in the boundary between the first and second regions wherein the isolation layer delimits a first active region in the first region and a second active region in the second region. A gate electrode(20) is formed on the first active region by interposing a gate insulation layer(18). A first photoresist layer is formed on the substrate having the gate electrode, having an opening that covers the second region and exposes the first active region wherein the edge portion of the opening in the boundary is positioned in the second active region rather than in the center of the isolation layer. By using the first photoresist layer and the gate electrode as a mask, an ion implantation process is slantingly performed with respect to the normal direction of the substrate to form a pair of pocket regions(24) in the semiconductor substrate at both sides of the gate electrode.
    • 提供半导体器件以通过避免由光致抗蚀剂层引起的阴影现象来稳定地形成袋区域。 在具有与第一区域相邻的第一区域和第二区域的半导体衬底(10)上,在第一和第二区域之间的边界中形成隔离层(12),其中隔离层限定第一区域中的第一有源区域 区域和第二区域中的第二活性区域。 通过插入栅绝缘层(18)在第一有源区上形成栅电极(20)。 在具有栅电极的基板上形成第一光致抗蚀剂层,具有覆盖第二区域的开口,并露出第一有源区域,其中边界中的开口的边缘部分位于第二有源区域而不是中心 的隔离层。 通过使用第一光致抗蚀剂层和栅电极作为掩模,相对于衬底的法线方向倾斜地执行离子注入工艺,以在栅极两侧的半导体衬底中形成一对凹穴区域(24) 电极。
    • 107. 发明公开
    • I/O 회로
    • I / O电路
    • KR1020080077557A
    • 2008-08-25
    • KR1020080013458
    • 2008-02-14
    • 후지쯔 세미컨덕터 가부시키가이샤
    • 스즈키데루오
    • H01L27/04H01L27/088H01L21/822H03K19/003
    • An I/O circuit is provided to reduce the size of a NMOS driver at a ground among NMOS drivers serially connected, and to shorten activation transition time of the NMOS driver at a ground. An I/O circuit comprises a first NMOS driver(10), a second NMOS driver(11), and a level converter, and a first NMOS transistor(26). A drain contacts a pad in the first NMOS driver contacts. The second NMOS driver is installed in a region different from the first NMOS driver. On the second NMOS driver, a drain contacts a source of the first NMOS driver, and a source contacts a ground potential. The level converter is configured to convert inner power potential level into power potential level. The first NMOS transistor includes a drain, a source, and a gate. The drain of the first NMOS transistor contacts one output terminal of the level converter. The source of the first NMOS transistor contacts a ground potential. The gate of the first NMOS transistor contacts the other output terminal of the level converter.
    • 提供了一个I / O电路,以减小串联连接的NMOS驱动器之间的接地NMOS驱动器的尺寸,并缩短NMOS驱动器在地的激活转换时间。 I / O电路包括第一NMOS驱动器(10),第二NMOS驱动器(11)和电平转换器以及第一NMOS晶体管(26)。 漏极接触第一个NMOS驱动器触点中的焊盘。 第二NMOS驱动器安装在与第一NMOS驱动器不同的区域中。 在第二NMOS驱动器上,漏极接触第一NMOS驱动器的源极,并且源极接地电位。 电平转换器被配置为将内部功率电平电平转换为功率电平电平。 第一NMOS晶体管包括漏极,源极和栅极。 第一NMOS晶体管的漏极接触电平转换器的一个输出端。 第一NMOS晶体管的源极接地电位。 第一NMOS晶体管的栅极接触电平转换器的另一个输出端。
    • 109. 发明公开
    • 직류-직류 변환 회로, 직류-직류 변환 제어 회로,직류-직류 변환 제어 방법
    • DC-DC转换器,DC-DC转换器控制电路,DC-DC转换器控制方法
    • KR1020080076725A
    • 2008-08-20
    • KR1020080006649
    • 2008-01-22
    • 후지쯔 세미컨덕터 가부시키가이샤
    • 하세가와모리히토오자와히데키요
    • H02M3/155
    • H02M1/36H02M1/32H02M3/156Y10S323/901
    • A DC-DC conversion circuit, a DC-DC conversion control circuit, and a DC-DC conversion control method are provided to prevent inrush current by reducing time for converting a control signal related to output control in starting of the DC-DC conversion circuit and removing an uncontrolled state of the DC-DC conversion circuit. In a DC-DC conversion circuit(CNV1), a plurality of control signal generating circuits are installed to correspond to a plurality of control signals. Each of the control signal generating circuits generates the corresponding control signal among the plurality of control signals based on a corresponding output value among a plurality of output values. A plurality of soft start control circuits(CS1,CS2) are installed to correspond to the plurality of control signals. Each of the soft start control circuits controls a variation of the corresponding control signal in starting of the DC-DC conversion circuit. A start control circuit commands the corresponding soft start control circuit to start operation according to a change of the control signal related to output control in the starting of the DC-DC conversion circuit.
    • 提供DC-DC转换电路,DC-DC转换控制电路和DC-DC转换控制方法,以防止在直流 - 直流转换电路启动时转换与输出控制相关的控制信号的时间的浪涌电流 以及去除DC-DC转换电路的不受控状态。 在DC-DC转换电路(CNV1)中,安装多个控制信号生成电路以对应于多个控制信号。 控制信号生成电路中的每一个基于多个输出值中的对应的输出值,生成多个控制信号中的对应的控制信号。 安装多个软启动控制电路(CS1,CS2)以对应于多个控制信号。 每个软启动控制电路控制DC-DC转换电路启动时相应控制信号的变化。 启动控制电路根据在DC-DC转换电路起动时与输出控制相关的控制信号的变化,命令对应的软启动控制电路开始工作。
    • 110. 发明公开
    • 고체 촬상 소자 및 암전류 성분 제거 방법
    • 固态图像拾取器件和暗电流分量去除方法
    • KR1020080072089A
    • 2008-08-05
    • KR1020087015797
    • 2005-12-27
    • 후지쯔 세미컨덕터 가부시키가이샤
    • 히구치츠요시
    • H04N5/357H04N5/361
    • H04N5/37455H03M1/0604H03M1/123H03M1/56H04N5/361
    • To remove, from pixel signals, dark current components, which varies with temperature, without degrading the resolution during A/D conversion. A D/A converter (11) generates a reference signal that increases from a predetermined initial signal level at a constant gradient. A comparator (12) compares a pixel signal with the reference signal. A counter (13) performs a counting in synchronization with the increase of the reference signal. A latch circuit (14) holds as a quantized value of the pixel signal. An average value calculating part (15) calculates an average value of the quantized values of the pixel signals read from a plurality of light-shielded pixels. A reference signal adjusting part (16) establishes, based on the average value, the initial signal level of the reference signal to be compared with the pixel signals read from light-receiving pixels.
    • 从像素信号中去除随温度变化的暗电流分量,而不会降低A / D转换期间的分辨率。 D / A转换器(11)产生以恒定梯度从预定的初始信号电平增加的参考信号。 比较器(12)将像素信号与参考信号进行比较。 计数器(13)与参考信号的增加同步地进行计数。 锁存电路(14)保持像素信号的量化值。 平均值计算部(15)计算从多个遮光像素读取的像素信号的量化值的平均值。 参考信号调整部(16)基于平均值建立与从受光像素读取的像素信号进行比较的参考信号的初始信号电平。