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91. 发明授权

US07410591B2 Method and system for making a nano-plate for imprint lithography 失效
标题翻译：制造用于压印光刻的纳米板的方法和系统
公开(公告)号：US07410591B2
公开(公告)日：2008-08-12
申请号：US11012489
申请日：2004-12-16
申请人： Harry Sewell
发明人： Harry Sewell
IPC分类号： B29D11/00
CPC分类号： G03F7/0002 , B81C99/009 , B82Y10/00 , B82Y40/00 , G03F7/0017
摘要： Provided is a method and system for manufacturing a nano-plate. The method includes depositing two or more types of film around a central core to form a plurality of film layers, each film layer being of a different type than its adjacent layers. Next, the deposited film layers are sectioned to expose a patterned surface. Finally, the patterned surface is then planarized and selectively etched to form a relief pattern which can be used as an imprint stamp.
摘要翻译：提供了一种用于制造纳米板的方法和系统。该方法包括在中心芯周围沉积两种或更多种类型的膜以形成多个膜层，每个膜层的类型与其相邻层不同。接下来，沉积的膜层被分割以暴露图案化表面。最后，将图案化表面平面化并选择性地蚀刻以形成可用作压印印模的浮雕图案。

92. 发明申请

US20070148653A1 Fine metal structure, process for producing the same, fine metal mold and device 审中-公开
标题翻译：精细金属结构，制造方法，精细金属模具及装置
公开(公告)号：US20070148653A1
公开(公告)日：2007-06-28
申请号：US10584139
申请日：2004-12-21
申请人： Hiroshi Yoshida
发明人： Hiroshi Yoshida
IPC分类号： C12Q1/68 , B05D3/04 , B32B3/30 , G01N33/53 , C12M3/00 , B32B15/02
CPC分类号： B29C33/3842 , B29C33/424 , B81B2203/0361 , B81C1/00111 , B81C1/00206 , B81C99/0085 , B81C99/009 , B81C2201/034 , B82Y10/00 , B82Y40/00 , C23C18/1608 , C23C18/1651 , C23C18/1653 , C23C18/1657 , C23C18/1689 , C23C18/208 , C23C18/42 , G03F7/0002 , H01J1/304 , H01J9/025 , Y10T428/12389 , Y10T428/12993
摘要： A fine metal structure having its surface furnished with microprojections of high strength, high precision and large aspect ratio; and a process for producing the fine metal structure free of defects. There is provided a fine metal structure having its surface furnished with microprojections, characterized in that the microprojections have a minimum thickness or minimum diameter ranging from 10 nanometers to 10 micrometers and that the ratio between minimum thickness or minimum diameter (D) of microprojections and height of microprojections (H), H/D, is greater than 1. There is further provided a process for producing a fine metal structure, characterized by comprising providing a substrate having a fine rugged pattern on its surface, applying a molecular electroless plating catalyst to the surface, thereafter carrying out electroless plating to thereby form a metal layer having the rugged pattern filled, and detaching the metal layer from the substrate to thereby obtain a fine metal structure furnished with a surface having undergone reversal transfer of the above rugged pattern.
摘要翻译：精细的金属结构，其表面具有高强度，高精度和大纵横比的微喷射体; 以及没有缺陷的金属微细结构的制造方法。提供了具有微喷射体的表面的细金属结构，其特征在于，微喷射体具有10纳米至10微米的最小厚度或最小直径，并且微喷射体的最小厚度或最小直径（D）与高度的微喷射体（H）H / D大于1.还提供了一种制造精细金属结构的方法，其特征在于，在其表面上提供具有细凹凸图案的基板，将分子无电镀催化剂然后进行无电解电镀，从而形成具有凹凸图案的金属层，并将金属层与基板分离，从而获得配备有经过上述凹凸图案的反转传送的表面的精细金属结构。

93. 发明授权

US07192529B2 Stamper, lithographic method of using the stamper and method of forming a structure by a lithographic pattern 有权
标题翻译：压模，使用压模的光刻方法和通过光刻图案形成结构的方法
公开(公告)号：US07192529B2
公开(公告)日：2007-03-20
申请号：US10628275
申请日：2003-07-29
申请人： Mitsuru Hasegawa , Akihiro Miyauchi
发明人： Mitsuru Hasegawa , Akihiro Miyauchi
IPC分类号： B44C1/22 , C25F3/00 , C03C15/00 , C03C25/68 , C23F1/00
CPC分类号： B82Y10/00 , B29C33/424 , B29C43/36 , B81C99/009 , B81C2201/036 , B82Y40/00 , G03F7/0002 , G03F7/0017 , H01L21/76817
摘要： A stamper includes a substrate and a plurality of protrusions of different heights formed on one of the surfaces of the substrate, the protrusions of larger height having a stack structure formed of at least two layers of at least two types of materials, thereby transferring a plurality of patterns at the same time.
摘要翻译：压模包括基板和形成在基板的一个表面上的不同高度的多个突起，较大高度的突起具有由至少两层至少两种类型的材料形成的堆叠结构，从而传输多个的模式在同一时间。

94. 发明申请

US20050158669A1 Silicon micro-mold 有权
标题翻译：硅微模具
公开(公告)号：US20050158669A1
公开(公告)日：2005-07-21
申请号：US11015084
申请日：2004-12-15
申请人： Alfredo Morales
发明人： Alfredo Morales
IPC分类号： B29C33/38 , B81C1/00 , G03F7/00
CPC分类号： B81C99/009 , B29C33/3842 , G03F7/0017
摘要： The present invention describes a method for fabricating an x-ray mask tool which can achieve pattern features having lateral dimension of less than 1 micron. The process begins by depositing a conductive metal layer onto one surface of a silicon wafer. A thin photoresist and a standard lithographic mask are then used to transfer an trace image pattern onto the opposite surface of the wafer by exposing and developing the resist. The exposed portion of the silicon substrate is anisotropically etched through the wafer thickness down to conductive metal layer to provide an etched pattern consisting of a series of rectilinear channels and recesses in the silicon which serve as the silicon micro-mold. Microcomponents are prepared with this mold by first filling the mold channels and recesses with a metal deposit, typically by electroplating, and then removing the silicon micro-mold by chemical etching.
摘要翻译：本发明描述了一种可以实现具有小于1微米的横向尺寸的图案特征的X射线掩模工具的制造方法。该工艺开始于在硅晶片的一个表面上沉积导电金属层。然后使用薄的光致抗蚀剂和标准光刻掩模通过曝光和显影抗蚀剂将痕迹图案转印到晶片的相对表面上。将硅衬底的暴露部分通过晶片厚度各向异性地蚀刻到导电金属层，以提供由用作硅微型模的硅中的一系列直线通道和凹槽组成的蚀刻图案。通过首先用金属沉积物（通常通过电镀）填充模具通道和凹槽，然后通过化学蚀刻去除硅微型模具，用该模具制备微组件。

95. 发明申请

US20050150404A1 Hardened nano-imprinting stamp 审中-公开
标题翻译：硬化纳米印记邮票
公开(公告)号：US20050150404A1
公开(公告)日：2005-07-14
申请号：US11065171
申请日：2005-02-23
申请人： Heon Lee , Gun-Young Jung
发明人： Heon Lee , Gun-Young Jung
IPC分类号： B82B3/00 , B81C1/00 , G03F7/00 , H01L21/027 , B41K1/42
CPC分类号： B82Y10/00 , B81C99/009 , B82Y40/00 , G03F7/0002 , G03F7/0017 , Y10T428/24355
摘要： A hardened nano-imprinting stamp and a method of forming a hardened nano-imprinting stamp are disclosed. The hardened nano-imprinting stamp includes a plurality of silicon-based nano-sized features that have an hardened shell of silicon carbide, silicon nitride, or silicon carbide nitride. The hardened shell is made harder than the underlying silicon by a plasma carburization and/or a plasma nitridation process. During the plasma process atoms of carbon and/or nitrogen bombard and penetrate a plurality of exposed surfaces of the nano-sized features and chemically react with the silicon to form the hardened shell of silicon carbide, silicon nitride, or silicon carbide nitride. The lifetime, durability, economy, and accuracy of the resulting hardened nano-imprinting stamp are improved.
摘要翻译：公开了一种硬化的纳米压印印模和形成硬化的纳米压印印模的方法。硬化的纳米压印印模包括多个硅基纳米尺寸特征，其具有碳化硅，氮化硅或碳化硅氮化物的硬化壳。通过等离子体渗碳和/或等离子体氮化处理使硬化的壳比下面的硅更硬。在等离子体工艺期间，碳和/或氮原子轰击并穿透纳米尺寸特征的多个暴露表面并与硅发生化学反应以形成碳化硅，氮化硅或碳化硅氮化物的硬化壳。提高了所得到的硬化纳米压印印模的寿命，耐久性，经济性和精度。

96. 发明申请

US20050064720A1 Process for making angled features for nanolithography and nanoimprinting 失效
标题翻译：用于制造纳米光刻和纳米压印的成角度特征的方法
公开(公告)号：US20050064720A1
公开(公告)日：2005-03-24
申请号：US10668148
申请日：2003-09-22
申请人： Manish Sharma
发明人： Manish Sharma
IPC分类号： G02F1/1337 , H01L21/302
CPC分类号： G02F1/13378 , B81B2203/0361 , B81C1/00626 , B81C99/009
摘要： This invention provides a directional ion etching process for making nano-scaled angled features such as may be used, for example, in liquid crystal displays and or nanoimprinting templates. In a particular embodiment a semiconductor wafer substrate is prepared with at least one layer of material. A photoresist is applied, masked, exposed and developed. Anisotropic ion etching at a high angle relative to the wafer is performed to remove portions of the non protected material layer. The remaining photoresist caps shadow at least a portion of the material layer, and as the ion etching is performed at an angle, the protected portions of the material layer also appear at an angle.
摘要翻译：本发明提供了一种定向离子蚀刻工艺，用于制造例如可用于液晶显示器和/或纳米压印模板中的纳米级角度特征。在特定实施例中，半导体晶片衬底被制备成具有至少一层材料。应用光刻胶，掩蔽，曝光和显影。执行相对于晶片高角度的各向异性离子蚀刻以去除部分未被保护的材料层。剩余的光致抗蚀剂帽遮盖材料层的至少一部分，并且当以一定角度执行离子蚀刻时，材料层的受保护部分也出现一定角度。

97. 发明申请

US20050046758A1 Method of transcribing biomolecular patterns, method of manufacturing chip boards, and method of manufacturing biochips 失效
标题翻译：转录生物分子模式的方法，制造芯片板的方法以及制造生物芯片的方法
公开(公告)号：US20050046758A1
公开(公告)日：2005-03-03
申请号：US10902495
申请日：2004-07-29
申请人： Tomohiko Matsushita , Shigeru Aoyama , Takeo Nishikawa , Yuko Tsuda , Shigemi Norioka , Tetsuichi Wazawa
发明人： Tomohiko Matsushita , Shigeru Aoyama , Takeo Nishikawa , Yuko Tsuda , Shigemi Norioka , Tetsuichi Wazawa
IPC分类号： G01N33/53 , B81C1/00 , B81C99/00 , G01N33/48 , G01N33/50 , G01N35/00 , G01N37/00 , G02F1/017 , G02F1/13 , H01S5/34
CPC分类号： B82Y20/00 , B01J2219/00382 , B01J2219/00385 , B01J2219/00436 , B01J2219/00527 , B01J2219/00576 , B01J2219/00596 , B01J2219/00605 , B01J2219/00612 , B01J2219/00617 , B01J2219/00619 , B01J2219/00621 , B81B2201/0214 , B81B2201/06 , B81C1/00206 , B81C99/009 , B82Y5/00 , B82Y10/00 , G02F2001/01791 , G02F2202/32 , H01S5/3412
摘要： A method of mass-producing minute structures such as biochips, protein chips, quantum dots, and quantum chips involves arranging an antigen two-dimensionally on a board and arranging probes two-dimensionally facing the same direction so that the binding sites of the probes may bind to the antigen. An inorganic substance such as Ni is deposited on the board from the upper side of the probes by sputtering or evaporation to form a thin film layer and on the top surface of the flatly formed thin film layer, a supporting layer is formed by separating out the same inorganic substance using electrotyping. Then, by peeling the thin film layer and the supporting layer off of the board together, the mother stamper having cavities for the patterns of biomolecules is obtained.
摘要翻译：大规模生产生物芯片，蛋白质芯片，量子点和量子芯片的微小结构的方法包括将二维布置在板上，并将探针二维排列成相同的方向，使得探针的结合位点结合抗原。无机物质如Ni通过溅射或蒸发从探针的上侧沉积在板上以形成薄膜层，并且在平坦形成的薄膜层的顶表面上，通过分离出使用电化学的相同无机物质。然后，通过将薄膜层和支撑层从板上剥离在一起，获得具有用于生物分子图案的空腔的母模。

98. 发明申请

US20040238491A1 FINE-DIMENSION MASKS AND RELATED PROCESSES 失效
标题翻译：微尺寸面膜及相关工艺
公开(公告)号：US20040238491A1
公开(公告)日：2004-12-02
申请号：US10250044
申请日：2003-05-30
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人： Peter H. Berasi , Michael F. Jerome , Doris P. Pulaski , Robert P. Rippstein
IPC分类号： C23F001/00
CPC分类号： H01L24/11 , B81C99/009 , C23C14/042 , C23F1/02 , C23F1/38 , G03F7/0015 , G03F7/12 , H01L2224/1147 , H01L2224/11472 , H01L2224/13099 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01011 , H01L2924/01019 , H01L2924/01033 , H01L2924/01041 , H01L2924/01042 , H01L2924/01074 , H01L2924/01076 , H01L2924/01077 , H01L2924/01082 , H01L2924/014 , H01L2924/12042 , H01L2924/14 , H01L2924/3025 , Y10T428/24322 , H01L2924/00 , H01L2224/0401
摘要： A method of making, and the resultant mask, comprises developing resist layers over surfaces of a masking layer to transfer significantly reduced sized openings within glass masters attached to the surfaces of the masking layer into the resist layers. These significantly reduced sized openings within the resist layers are then transferred into the masking layer within a first etch bath by simultaneously monitoring and controlling both etchant activity and concentration of a byproduct within the etch bath formed between the masking material and the etchant. The openings may be etched to completion within the first etch bath, or alternatively, the openings may be etched to a pre-finished image size. Wherein the openings are etched to a pre-finished image size, the masking layer is immersed into a second etch bath for further micro-etching of these openings to a final desired image size.
摘要翻译：一种制造方法，并且所得到的掩模包括在掩模层的表面上显影抗蚀剂层，以将附着于掩模层的表面的玻璃主体中的大大减小尺寸的开口转移到抗蚀剂层中。然后通过同时监测和控制在掩蔽材料和蚀刻剂之间形成的蚀刻槽内的副产物的蚀刻剂活性和浓度两者，将抗蚀剂层内的这些明显减小的尺寸的开口转移到第一蚀刻槽内的掩模层中。可以在第一蚀刻槽内蚀刻开口以完成，或者可以将开口蚀刻到预先完成的图像尺寸。其中将开口蚀刻成预成像图像尺寸，将掩模层浸入第二蚀刻槽中，以进一步对这些开口进行微蚀刻以达到最终期望的图像尺寸。

99. 发明授权

US06808646B1 Method of replicating a high resolution three-dimensional imprint pattern on a compliant media of arbitrary size 有权
标题翻译：在任意尺寸的兼容介质上复制高分辨率三维印记图案的方法
公开(公告)号：US06808646B1
公开(公告)日：2004-10-26
申请号：US10425891
申请日：2003-04-29
申请人： Albert H. Jeans
发明人： Albert H. Jeans
IPC分类号： C03C2568
CPC分类号： G03F7/20 , B81C99/009 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0015
摘要： A method for replicating a high resolution three-dimensional imprint pattern on a compliant media is disclosed. The compliant media carries an imprint stamp that includes three-dimensional features that can be used as an imprint stamp in a roll-to-roll transfer printing process. The compliant media can be made to any size and can be connected with a belt or a cylinder. The compliant media can be optically transparent and the belt or cylinder can be optically transparent so that a light source positioned inside or outside the belt or the cylinder can irradiate another media that is urged into contact with the compliant media.
摘要翻译：公开了一种在兼容介质上复制高分辨率三维印记图案的方法。兼容介质带有压印标记，其包括可在卷对卷转印打印过程中用作压印印模的三维特征。柔性介质可以制成任何尺寸，并且可以与皮带或汽缸连接。柔性介质可以是光学透明的，并且带或圆筒可以是光学透明的，使得位于带或圆筒内侧或外侧的光源可以照射被推动与柔性介质接触的另一介质。

100. 发明申请

US20040200818A1 Method and apparatus for processing three-dimensional structure, method for producing three-dimensional shape product and three-dimensional structure 有权
标题翻译：三维结构处理方法及装置，三维形状产品制作方法及三维结构
公开(公告)号：US20040200818A1
公开(公告)日：2004-10-14
申请号：US10832375
申请日：2004-04-27
发明人： Yasufumi Yamada , Katsumi Midorikawa , Hiroshi Kumagai
IPC分类号： G03H001/16 , B23K026/00
CPC分类号： G11B7/125 , B23K26/009 , B23K26/066 , B23K26/18 , B29C33/3857 , B29C64/129 , B81B2203/033 , B81B2203/0392 , B81C1/00103 , B81C99/009 , B81C2201/0143 , G02B5/1857 , G03H2001/0478 , G11B7/261 , Y10S428/913 , Y10T428/12389 , Y10T428/12396 , Y10T428/24917 , Y10T428/24926 , Y10T428/24942 , Y10T428/31623
摘要： A method for processing a three-dimensional structure having a fine three-dimensional shape and a smooth surface is disclosed in which the three-dimensional structure is usable for an optical device. The process method includes depositing a thin layer for absorption of laser light on a flat substrate; depositing a transparent layer on the thin layer for absorption of laser light; and irradiating a process laser light, passing through the transparent layer; in which pulse injection energy of the process laser light is set to be the same as or smaller than the maximum pulse injection energy capable of exposing a surface of the thin layer in front in the incident direction of the process laser light, and to be set the same as or greater than the minimum pulse injection energy capable of removing the transparent layer in rear in the incident direction of the process laser light.
摘要翻译：公开了一种用于处理具有微细三维形状和光滑表面的三维结构的方法，其中三维结构可用于光学装置。该方法包括在平坦基底上沉积用于吸收激光的薄层; 在薄层上沉积透明层以吸收激光; 并照射通过透明层的工艺激光; 其中将工艺激光的脉冲注入能量设定为与能够在工艺激光的入射方向上的前面暴露薄层的表面的最大脉冲注入能量相同或更小，并设定与能够沿着工艺激光的入射方向去除后方的透明层的最小脉冲注入能量相同或者更大。

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