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    • 98. 发明申请
    • COMPOUND FOR ORGANIC THIN FILM TRANSISTOR AND ORGANIC THIN FILM TRANSISTOR USING THE SAME
    • 有机薄膜晶体管及其有机薄膜晶体管的化合物
    • US20110220883A1
    • 2011-09-15
    • US13057820
    • 2009-08-05
    • Yuki NakanoMasatoshi SaitoHiroaki Nakamura
    • Yuki NakanoMasatoshi SaitoHiroaki Nakamura
    • H01L51/52H01L51/10C07C13/62C07C43/20C07C321/26C07C317/14C07C211/50C07D207/04C07C25/13C07C22/04C07C255/52
    • C07C15/20C07C43/2055C07C2603/52H01L51/0055H01L51/0541H01L51/0545H01L51/0558
    • A compound for an organic thin film transistor having a structure of the following formula (1): wherein R1 to R6 are independently a hydrogen atom, a halogen atom, an alkyl group having 1 to 30 carbon atoms, a haloalkyl group having 1 to 30 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a haloalkoxy group having 1 to 30 carbon atoms, an alkylthio group having 1 to 30 carbon atoms, a haloalkylthio group having 1 to 30 carbon atoms, an alkylamino group having 1 to 30 carbon atoms, a dialkylamino group having 2 to 60 carbon atoms (the alkyl groups may be combined with each other to form a ring structure containing the nitrogen atom), an alkylsulfonyl group having 1 to 30 carbon atoms, a haloalkylsulfonyl group having 1 to 30 carbon atoms, an aromatic hydrocarbon group having 6 to 60 carbon atoms, an aromatic heterocyclic group having 3 to 60 carbon atoms, an alkylsilyl group having 3 to 20 carbon atoms, an alkylsilylacetylene group having 5 to 60 carbon atoms or a cyano group, which each may have a substituent, provided that the compound in which all of R1 to R6 are a hydrogen atom is excluded.
    • 一种具有下式(1)结构的有机薄膜晶体管的化合物:其中R 1至R 6独立地为氢原子,卤素原子,具有1至30个碳原子的烷基,具有1至30个碳原子的卤代烷基 碳原子,碳原子数1〜30的烷氧基,碳原子数1〜30的卤代烷氧基,碳原子数1〜30的烷硫基,碳原子数1〜30的卤代烷硫基,碳原子数为1〜30的烷基氨基 碳原子,碳原子数2〜60的二烷基氨基(烷基可以相互结合形成含有氮原子的环结构),碳原子数1〜30的烷基磺酰基,碳原子数1〜30的卤代烷基磺酰基 碳原子数为6〜60的芳香族烃基,碳原子数3〜60的芳香族杂环基,碳原子数3〜20的烷基甲硅烷基,碳原子数5〜60的烷基甲硅烷基乙炔基或氰基, 其各自可以具有取代基,条件是其中R1至R6全部为氢原子的化合物被排除。
    • 99. 发明申请
    • SEMICONDUCTOR DEVICE
    • 半导体器件
    • US20110068353A1
    • 2011-03-24
    • US12993209
    • 2009-05-20
    • Yuki Nakano
    • Yuki Nakano
    • H01L29/78H01L29/24
    • H01L29/7813H01L29/0634H01L29/1095H01L29/1608H01L29/42368H01L29/45H01L29/66068H01L29/7397
    • A semiconductor device (A1) includes a first n-type semiconductor layer (11), a second n-type semiconductor layer (12), a p-type semiconductor layer (13), a trench (3), an insulating layer (5), a gate electrode (41), and an n-type semiconductor region (14). The p-type semiconductor layer (13) includes a channel region that is along the trench (3) and in contact with the second n-type semiconductor layer (12) and the n-type semiconductor region (14). The size of the channel region in the depth direction x is 0.1 to 0.5 μm. The channel region includes a high-concentration region where the peak impurity concentration is approximately 1×1018 cm−3. The semiconductor device A1 thus configured allows achieving desirable values of on-resistance, dielectric withstand voltage and threshold voltage.
    • 半导体器件(A1)包括第一n型半导体层(11),第二n型半导体层(12),p型半导体层(13),沟槽(3),绝缘层(5) ),栅电极(41)和n型半导体区域(14)。 p型半导体层(13)包括沿着沟槽(3)并与第二n型半导体层(12)和n型半导体区域(14)接触的沟道区域。 沟道区域的深度方向x的大小为0.1〜0.5μm。 沟道区域包括峰值杂质浓度约为1×1018cm-3的高浓度区域。 如此构造的半导体器件A1允许实现导通电阻,介电耐受电压和阈值电压的期望值。