专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

91. 发明授权

US06707537B2 Projection exposure system 失效
标题翻译：投影曝光系统
公开(公告)号：US06707537B2
公开(公告)日：2004-03-16
申请号：US10189279
申请日：2002-07-02
申请人： Nils Dieckmann , Jess Köhler , Johannes Wangler
发明人： Nils Dieckmann , Jess Köhler , Johannes Wangler
IPC分类号： G03B2754
CPC分类号： G03F7/70141 , G02B27/0037 , G02B27/4222 , G02B27/4294 , G03F7/70108
摘要： A projection exposure system, in particular for microlithography, serves to generate an image of an object disposed in an object plane in an image plane. For this purpose, use is made of a light source emitting projection light, illumination optics disposed in the beam path between the light source and the object plane and projection optics disposed in the beam path between the object plane and the image plane. Disposed in the vicinity of a field plane of the illumination optics is at least one optical element that changes the angular illumination distribution of the projection light passing through. The change, impressed by the optical element, in the angular illumination distribution is non-rotationally symmetrical with respect to the optical axis. The optical element can be disposed in various angular positions around an axis perpendicular to the field plane. Such an optical element makes it possible to modify the symmetry of the angular illumination distribution flexibly.
摘要翻译：特别是用于微光刻的投影曝光系统用于在图像平面中产生设置在物平面中的物体的图像。为此，使用发射投影光的光源，设置在光源和物平面之间的光束路径中的照明光学器件和布置在物平面和像平面之间的光束路径中的投影光学元件。设置在照明光学器件的场平面附近的至少一个光学元件，其改变通过的投影光的角度照度分布。角度照明分布中由光学元件照射的变化相对于光轴是非旋转对称的。光学元件可以围绕垂直于场平面的轴设置在各种角度位置。这样的光学元件使得可以灵活地改变角度照明分布的对称性。

92. 发明申请

US20130148092A1 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
公开(公告)号：US20130148092A1
公开(公告)日：2013-06-13
申请号：US13760268
申请日：2013-02-06
申请人： Johannes Wangler , Heiko Siekmann , Kenneth Weible , Ralf Scharnweber , Manfred Maul , Markus Deguenther , Michael Layh , Axel Scholz , Uwe Spengler , Reinhard Voelkel
发明人： Johannes Wangler , Heiko Siekmann , Kenneth Weible , Ralf Scharnweber , Manfred Maul , Markus Deguenther , Michael Layh , Axel Scholz , Uwe Spengler , Reinhard Voelkel
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G02B3/0056 , G02B27/0911 , G03F7/70058 , G03F7/70075 , G03F7/70083 , G03F7/70158
摘要： Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.

93. 发明授权

US08339577B2 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：用于在微光刻投影曝光装置的照明系统中监视多个反射镜阵列的方法和装置
公开(公告)号：US08339577B2
公开(公告)日：2012-12-25
申请号：US12506364
申请日：2009-07-21
申请人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
发明人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
IPC分类号： G01C11/26 , G01N21/00 , G03B27/32 , G03B27/54 , G03B27/74
CPC分类号： G03F7/70258 , G01B11/002 , G01B11/272 , G01M11/30 , G01N21/55 , G02B26/0833 , G03F7/70058 , G03F7/70116 , G03F7/70133 , G03F7/702 , G03F7/70291 , G03F7/70516 , G03F7/7085 , G05B13/048 , Y10S359/904
摘要： An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument.
摘要翻译：微光刻投影曝光装置的照明系统具有瞳孔表面和基本上平坦的布置，其具有期望地单独驱动的光束偏离元件，用于可变照明瞳孔表面。每个光束偏离元件允许作为施加到光束偏离元件的控制信号的函数来实现入射到其上的投影光束的偏移。测量照明仪器将独立于投影光束的测量光束引导到光束偏离元件上。检测仪器在光束偏离元件偏离后记录测量光束。评估单元确定投影光束与由检测器仪器提供的测量信号的偏差。

94. 发明申请

US20120206704A1 ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY 有权
标题翻译：投影光刻照明光学单元
公开(公告)号：US20120206704A1
公开(公告)日：2012-08-16
申请号：US13368430
申请日：2012-02-08
申请人： Johannes Wangler , Markus Deguenther , Stig Bieling
发明人： Johannes Wangler , Markus Deguenther , Stig Bieling
IPC分类号： G03B27/54
CPC分类号： G03F7/70058
摘要： An illumination optical unit for projection lithography for illuminating an object field, in which an object to be imaged can be arranged, with illumination light has a field facet mirror having a plurality of field facets. A pupil facet mirror of the illumination optical unit has a plurality of pupil facets. The pupil facets serve for imaging the field facets respectively assigned individually to the pupil facets into the object field. An individual mirror array of the illumination optical unit has individual mirrors that can be tilted in driven fashion individually. The individual mirror array is arranged in an illumination light beam path upstream of the field facet mirror. This can result in flexibly configurable illumination by the illumination optical unit, this illumination being readily adaptable to predetermined values.
摘要翻译：用于照射物场的投影光刻用的照明光学单元，其中可以利用照明光布置要成像的物体，具有具有多个场面的场面反射镜。照明光学单元的瞳孔面镜具有多个光瞳面。瞳孔面用于将分别分配给瞳孔面的场面刻面成像为物场。照明光学单元的单个反射镜阵列具有可以分别以驱动方式倾斜的各个反射镜。单个反射镜阵列布置在场分面反射镜上游的照明光束路径中。这可以导致由照明光学单元灵活配置的照明，该照明容易适应于预定值。

95. 发明申请

US20110083542A1 OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微电子投影曝光装置照明系统的光学积分器
公开(公告)号：US20110083542A1
公开(公告)日：2011-04-14
申请号：US12973234
申请日：2010-12-20
申请人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
发明人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
IPC分类号： B26D3/06 , B26D7/27
CPC分类号： G03F7/70958 , G03F7/70075 , Y10T83/0304 , Y10T83/04
摘要： The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.
摘要翻译：本发明涉及一种被配置为在微光刻投影曝光设备的照明系统中产生多个次级光源的光学积分器。本公开还涉及制造用于这种照明系统的细长微透镜阵列的方法。细长微透镜的数组经常被包含在这种照明系统的光学积分器或散射板中。

96. 发明申请

US20090040496A1 MICROLITHOGRAPHIC EXPOSURE METHOD AS WELL AS A PROJECTION EXPOSURE SYSTEM FOR CARRYING OUT THE METHOD 有权
标题翻译：作为实施方法的投影曝光系统的微观曝光方法
公开(公告)号：US20090040496A1
公开(公告)日：2009-02-12
申请号：US12177715
申请日：2008-07-22
申请人： Toralf GRUNER , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf GRUNER , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

97. 发明授权

US07408616B2 Microlithographic exposure method as well as a projection exposure system for carrying out the method 有权
标题翻译：微光刻曝光方法以及用于实施该方法的投影曝光系统
公开(公告)号：US07408616B2
公开(公告)日：2008-08-05
申请号：US10949396
申请日：2004-09-27
申请人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/42
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

98. 发明申请

US20060126049A1 Illumination system for a microlithography projection exposure apparatus 审中-公开
标题翻译：用于微光刻投影曝光装置的照明系统
公开(公告)号：US20060126049A1
公开(公告)日：2006-06-15
申请号：US11271844
申请日：2005-11-14
申请人： Markus Deguenther , Johannes Wangler , Markus Brotsack , Ella Mizkewitsch
发明人： Markus Deguenther , Johannes Wangler , Markus Brotsack , Ella Mizkewitsch
IPC分类号： G03B27/72
CPC分类号： G03F7/70075 , G03F7/70091
摘要： An illumination system for a microlithography projection exposure apparatus is designed for illuminating an illumination field with an illumination radiation with a predeterminable degree of coherence σ, it being possible to adjust the degree of coherence within a degree of coherence range extending into the range of very small degrees of coherence of significantly less than σ=0.2. The illumination system may have a first optical system for generating a predeterminable light distribution in an entrance plane of a light mixing device, and also a light mixing device for homogenizing the impinging radiation. The first optical system and the light mixing device can in each case be changed over between a plurality of configurations corresponding to different degree of coherence ranges. The degree of coherence ranges overlap and are dimensioned such that the resulting total degree of coherence range is larger than the individual degree of coherence ranges.
摘要翻译：用于微光刻投影曝光装置的照明系统设计成用具有可预定程度的一致性sigma的照明辐射照射照明场，可以在相干范围内的相干程度范围内调整相干度相干度显着小于σ= 0.2。照明系统可以具有用于在光混合装置的入射面中产生可预定的光分布的第一光学系统，以及用于均匀化入射辐射的光混合装置。在每种情况下，可以在对应于不同程度的相干范围的多个配置之间改变第一光学系统和光混合装置。相干度的重叠程度重叠，其尺寸使得所产生的总相干度范围大于相干范围的个体程度。

99. 发明授权

US5646715A Illuminating arrangement for an optical system having a reticle masking unit 失效
标题翻译：具有掩模掩模单元的光学系统的照明装置
公开(公告)号：US5646715A
公开(公告)日：1997-07-08
申请号：US355157
申请日：1994-12-08
申请人： Johannes Wangler
发明人： Johannes Wangler
IPC分类号： G02B19/00 , G02B27/00 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70066 , G03F7/70075 , G03F7/70108 , G03F7/70141 , G03F7/702 , G03F7/70583
摘要： The invention is directed to an illuminating arrangement for an optical system such as a microlithographic projection exposure apparatus and includes a glass rod 5 for light integration. The reticle masking unit (REMA) 51 is mounted at the exit face of the glass rod 5.
摘要翻译：本发明涉及一种用于诸如微光刻投影曝光装置的光学系统的照明装置，并且包括用于光集成的玻璃棒5。掩模版掩模单元（REMA）51安装在玻璃棒5的出射面。

100. 发明授权

US5343489A Arrangement for shaping a laser beam and for reducing the coherence thereof 失效
标题翻译：用于成形激光束并减小其相干性的布置
公开(公告)号：US5343489A
公开(公告)日：1994-08-30
申请号：US912277
申请日：1992-07-13
申请人： Johannes Wangler
发明人： Johannes Wangler
IPC分类号： G02B5/00 , G02B17/00 , G02B27/09 , G02B27/14 , G02B27/48 , G03F7/20 , H01S3/00 , H01S3/08
CPC分类号： G02B27/0977 , G02B27/09 , G02B27/0911 , G02B27/106 , G02B27/144 , G02B27/145 , G02B27/48 , G03F7/70208 , G03F7/70583 , H01S3/005 , Y10S372/70
摘要： The invention is directed to an arrangement for shaping a laser beam and for reducing the coherence thereof. The arrangement has at least two approximately parallel mirrors arranged approximately perpendicular to the laser beam. One of the mirrors is fully reflective whereas the other mirror is partially reflective so that the exiting light beam comprises several mutually adjacent or partially overlapping component beams which are reflected a different number of times. The spacing of the mirrors is greater than half the coherence length of the laser. An advantageous embodiment provides the arrangement on a plane-parallel glass plate with the degree of reflection of the partially-reflective mirror being reduced in a stepwise manner and with a partial overlapping of the exiting component beams.
摘要翻译：本发明涉及一种用于成形激光束并减少其相干性的装置。该装置具有大致垂直于激光束布置的至少两个近似平行的反射镜。其中一个反射镜是完全反射的，而另一个反射镜是部分反射的，使得出射的光束包括被反射不同次数的若干相互相邻或部分重叠的分量光束。反射镜的间距大于激光器相干长度的一半。有利的实施例提供了平面平行玻璃板上的布置，其中部分反射镜的反射程度以逐步的方式减小并且与出射的分量光束的部分重叠。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式