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91. 发明申请

US20090080489A1 VERTICAL CAVITY SURFACE EMITTING LASER AND IMAGE FORMING APPARATUS USING THE VERTICAL CAVITY SURFACE EMITTING LASER 有权
标题翻译：垂直孔表面发射激光和图像形成装置使用垂直孔表面发射激光
公开(公告)号：US20090080489A1
公开(公告)日：2009-03-26
申请号：US12209250
申请日：2008-09-12
申请人： Takeshi Uchida , Tetsuya Takeuchi
发明人： Takeshi Uchida , Tetsuya Takeuchi
IPC分类号： H01S5/183 , H01S3/08
CPC分类号： H01S5/18313 , B41J2/435 , H01S5/18333 , H01S2301/166
摘要： Provided is a laser having a multilayer reflector that suppresses the multimode operation. A vertical cavity surface emitting laser includes a first mirror, a cavity having an active layer, and a second mirror that are laminated. The second mirror is a multilayer reflector comprised of a first layer and a second layer that are alternately plurally laminated, the second layer having a refractive index higher than that of the first layer. At least one of the plural second layers has an oxidized confinement structure having an oxidized region and a non-oxidized region.
摘要翻译：提供了具有抑制多模操作的多层反射器的激光器。垂直腔表面发射激光器包括第一反射镜，具有有源层的空腔和层叠的第二反射镜。第二反射镜是由交替多层叠的第一层和第二层构成的多层反射体，第二层的折射率高于第一层的折射率。多个第二层中的至少一个具有氧化区域和非氧化区域的氧化限制结构。

92. 发明申请

US20080121840A1 MATERIALS FOR POLISHING LIQUID FOR METAL, POLISHING LIQUID FOR METAL, METHOD FOR PREPARATION THEREOF AND POLISHING METHOD USING THE SAME 有权
标题翻译：用于金属抛光液体的金属材料，用于金属的抛光液，其制备方法和使用其的抛光方法
公开(公告)号：US20080121840A1
公开(公告)日：2008-05-29
申请号：US12015533
申请日：2008-01-17
申请人： Takeshi Uchida , Tetsuya Hoshino , Hiroki Terazaki , Yasuo Kamigata , Naoyuki Koyama , Yoshio Honma , Seiichi Kondoh
发明人： Takeshi Uchida , Tetsuya Hoshino , Hiroki Terazaki , Yasuo Kamigata , Naoyuki Koyama , Yoshio Honma , Seiichi Kondoh
IPC分类号： C09K13/00
CPC分类号： C09G1/04 , C09G1/02 , C09K13/00 , C23F3/00 , C23F3/04 , C23F3/06 , H01L21/3212
摘要： Provided are a metal-polishing liquid that comprises an oxidizing agent, an oxidized-metal etchant, a protective film-forming agent, a dissolution promoter for the protective film-forming agent, and water; a method for producing it; and a polishing method of using it. Also provided are materials for the metal-polishing liquid, which include an oxidized-metal etchant, a protective film-forming agent, and a dissolution promoter for the protective film-forming agent.
摘要翻译：提供一种金属抛光液体，其包含氧化剂，氧化金属蚀刻剂，保护膜形成剂，保护膜形成剂的溶解促进剂和水; 一种生产它的方法; 和使用它的抛光方法。还提供了金属抛光液的材料，其包括氧化金属蚀刻剂，保护膜形成剂和用于保护膜形成剂的溶解促进剂。

93. 发明授权

US07319072B2 Polishing medium for chemical-mechanical polishing, and method of polishing substrate member 有权
标题翻译：用于化学机械抛光的抛光介质，以及抛光衬底构件的方法
公开(公告)号：US07319072B2
公开(公告)日：2008-01-15
申请号：US11352326
申请日：2006-02-13
申请人： Yasushi Kurata , Yasuo Kamigata , Takeshi Uchida , Hiroki Terasaki , Akiko Igarashi
发明人： Yasushi Kurata , Yasuo Kamigata , Takeshi Uchida , Hiroki Terasaki , Akiko Igarashi
IPC分类号： H01L21/461 , H01L21/302
CPC分类号： C03C15/00 , C09G1/02 , C09K3/1463 , C23F3/06 , H01L21/3212 , H01L21/7684
摘要： This invention provides a polishing medium for chemical-mechanical polishing, comprising an oxidizing agent for a conductor, a protective-film-forming agent for protecting a metal surface, an acid, and. water; (1) the polishing medium having a pH of 3 or less, and the oxidizing agent being in a concentration of from 0.01 to 3% by weight, or (2) the polishing medium containing abrasive grains having an average particle diameter of 50 nm or less, and the abrasive grains having standard deviation of particle size distribution in a value of more than 5 nm.
摘要翻译：本发明提供一种用于化学机械抛光的抛光介质，其包括用于导体的氧化剂，用于保护金属表面的保护膜形成剂，酸和。水; （1）抛光介质的pH为3以下，氧化剂浓度为0.01〜3重量％，或（2）研磨介质含有平均粒径为50nm的磨粒，或较少，磨粒具有大于5nm的粒度分布的标准偏差。

94. 发明申请

US20070277184A1 Data Processing Program And Data Processing Device 审中-公开
标题翻译：数据处理程序和数据处理设备
公开(公告)号：US20070277184A1
公开(公告)日：2007-11-29
申请号：US11568073
申请日：2005-03-16
申请人： Takehiko Yasuda , Yoshiteru Adachi , Takeshi Uchida
发明人： Takehiko Yasuda , Yoshiteru Adachi , Takeshi Uchida
IPC分类号： G06F9/46
CPC分类号： G11B20/10527 , G06F9/4881 , G11B2020/00014 , G11B2020/1099
摘要： A processor functions as changing means for changing a processing priority level of one of an encode function thread T2 for encoding data and other processes in accordance with the processing rate of the encode function thread T2. It is preferable that the changing means is operable to change the processing priority level at predetermined timings.
摘要翻译：处理器用作根据编码功能线程T 2的处理速率来改变用于编码数据的编码功能线程T 2和其他处理之一的处理优先级的改变装置。优选地，改变装置可操作以在预定时间改变处理优先级。

95. 发明授权

US07023291B2 Oven controlled crystal oscillator for high stability 失效
标题翻译：烤箱控制晶体振荡器具有高稳定性
公开(公告)号：US07023291B2
公开(公告)日：2006-04-04
申请号：US10946890
申请日：2004-09-22
申请人： Hiroshi Kato , Manabu Ito , Takeshi Uchida
发明人： Hiroshi Kato , Manabu Ito , Takeshi Uchida
IPC分类号： H03B5/32
CPC分类号： H05K1/0201 , G05D23/19 , H03B5/04 , H03B5/36 , H05K1/181 , H05K3/301 , H05K2201/10022 , H05K2201/10068 , H05K2201/10151 , H05K2201/10515 , H05K2201/10606
摘要： To provide a highly stable crystal oscillator having increased thermal efficiency. The highly stable crystal oscillator comprises; a thermostat mainframe which maintains the temperature of a crystal resonator including a resonator container for sealing a crystal piece constant, an oscillating element which constitutes an oscillation circuit together with said crystal resonator, a temperature control element which controls the temperature inside of said thermostat mainframe, and a circuit board mounted with said thermostat mainframe, said oscillating element, and said temperature control element. The construction is such that a heat generating chip resistor and a highly heat sensitive element having a higher temperature dependency, among said oscillating element and said temperature control element, are arranged on one principal plane of said circuit board, and said heat generating chip resistor, said highly heat sensitive element, and said thermostat mainframe are directly heat bonded by a thermo-conductive material.
摘要翻译：提供具有增加的热效率的高度稳定的晶体振荡器。高度稳定的晶体振荡器包括：恒温器主机，其保持包括用于密封晶体片的谐振器容器的晶体谐振器的温度，与所述晶体谐振器一起构成振荡电路的振荡元件，控制所述恒温器主机内部的温度的温度控制元件，以及安装有所述恒温器主机，所述振荡元件和所述温度控制元件的电路板。该结构使得在所述振荡元件和所述温度控制元件之中具有较高温度依赖性的发热芯片电阻器和高热敏元件被布置在所述电路板的一个主平面上，并且所述发热芯片电阻器，所述高热敏元件，并且所述恒温器主机通过热导材料直接热粘合。

96. 发明授权

US06899821B2 Abrasive liquid for metal and method for polishing 有权
标题翻译：金属研磨液和抛光方法
公开(公告)号：US06899821B2
公开(公告)日：2005-05-31
申请号：US09976001
申请日：2001-10-15
申请人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
发明人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
IPC分类号： C09G1/02 , C23F3/00 , C23F3/06 , H01L21/321 , C09K13/00 , C09K13/06 , H01L21/302
CPC分类号： C09G1/02 , C23F3/00 , C23F3/06 , H01L21/3212
摘要： An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent informing a protecting film and (5) water; and a method for polishing.
摘要翻译：一种用于金属的研磨液，包括（1）金属氧化剂，（2）氧化金属的溶解剂，（3）第一保护膜形成剂，例如氨基酸或唑，物理上吸附金属的表面和/或形成化学键，从而形成保护膜，（4）辅助第一保护膜形成剂的第二保护膜形成剂如聚丙烯酸，聚酰胺或其盐通知保护膜和（5）水; 和抛光方法。

97. 发明申请

US20050095860A1 Abrasive liquid for metal and method for polishing 有权
公开(公告)号：US20050095860A1
公开(公告)日：2005-05-05
申请号：US10995494
申请日：2004-11-24
申请人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
发明人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
IPC分类号： C09G1/02 , C23F3/00 , C23F3/06 , H01L21/321 , H01L21/4763 , H01L21/302 , H01L21/461
CPC分类号： C09G1/02 , C23F3/00 , C23F3/06 , H01L21/3212
摘要： An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent in forming a protecting film and (5) water; and a method for polishing.

98. 发明授权

US06241925B1 Method of lining channels 失效
标题翻译：衬里通道的方法
公开(公告)号：US06241925B1
公开(公告)日：2001-06-05
申请号：US09319110
申请日：1999-05-27
申请人： Mitsutoshi Hayashi , Mitsunori Komori , Masato Koseki , Yuichi Banrai , Tomoyuki Minami , Seiji Mizukami , Yasuo Miyazaki , Akira Kamide , Hirohisa Tanimuro , Takeshi Uchida
发明人： Mitsutoshi Hayashi , Mitsunori Komori , Masato Koseki , Yuichi Banrai , Tomoyuki Minami , Seiji Mizukami , Yasuo Miyazaki , Akira Kamide , Hirohisa Tanimuro , Takeshi Uchida
IPC分类号： B29C6334
CPC分类号： F16L55/1654 , B29C53/08 , B29C53/086 , B29C63/343
摘要： A method of lining a channel can be provided which includes the steps of: installing at a work site a roll having wound thereon a rigid or semirigid plastic pipe shaped initially in the form of an approximately round tube and deformed from the initial form to a flat tubular form, paying off the pipe as softened by heating from the roll installed at the work site toward an inlet of the channel to be lined, and folding the paid-off flat pipe in two to a U shape at a position between the roll and the channel inlet. The U-shaped pipe is hardened by forced cooling from outside immediately after the folding step while being restricted in shape, then inserted into the channel while being thus hardened and thereafter restored to the initial form by being inflated with heat and pressure applied from inside, whereby a lining of improved quality can be formed with an improved work efficiency.
摘要翻译：可以提供一种衬里通道的方法，其包括以下步骤：在工作现场安装卷绕有刚性或半刚性塑料管的辊，该刚性或半刚性塑料管最初形成为大致圆形管的形式并且从初始形状变形为平坦通过加热从安装在工作现场的辊朝向要衬里的通道的入口而软化的管，并且将放出的扁平管折叠成U形，在辊和通道入口。 U形管通过在折叠步骤之后立即从外部强制冷却而被硬化，同时被限制形状，然后在被硬化的同时插入通道中，然后通过从内部施加的热量和压力充气而恢复初始形状，从而能够以提高的工作效率形成质量提高的衬里。

99. 发明授权

US5691339A Circulatory disorder improving agent 失效
标题翻译：循环障碍改善剂
公开(公告)号：US5691339A
公开(公告)日：1997-11-25
申请号：US424282
申请日：1995-04-21
申请人： Hiroshi Shinyama , Toru Kawamura , Minori Okita , Takeshi Uchida , Masahiro Watanabe
发明人： Hiroshi Shinyama , Toru Kawamura , Minori Okita , Takeshi Uchida , Masahiro Watanabe
IPC分类号： A61K31/44 , A61K31/4422 , A61K31/495 , A61K31/496 , C07D401/00
CPC分类号： A61K31/495 , A61K31/44 , A61K31/4422 , A61K31/496
摘要： A circulatory disorder improving agent comprising, as an active ingredient, a dihydropyridine derivative of the formula (I) ##STR1## or an acid addition salt thereof. Said circulatory disorder improving agent is particularly useful as an organ circulation disorder improving agent or peripheral circulation improving agent.
摘要翻译： PCT No.PCT / JP94 / 01412 Sec。 371日期1995年04月21日 102（e）日期1995年4月21日PCT 1994年8月25日PCT公布。第WO95 / 05825号公报日期：1995年3月2日循环障碍改善剂，其包含式（I）的二氢吡啶衍生物或其酸加成盐作为活性成分。所述循环障碍改善剂特别可用作器官循环障碍改善剂或外周循环改善剂。

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