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91. 发明授权

US06852467B2 Positive resist composition 有权
标题翻译：正抗蚀剂组成
公开(公告)号：US06852467B2
公开(公告)日：2005-02-08
申请号：US09961281
申请日：2001-09-25
申请人： Toshiaki Aoai , Shoichiro Yasunami , Kazuyoshi Mizutani , Shinichi Kanna
发明人： Toshiaki Aoai , Shoichiro Yasunami , Kazuyoshi Mizutani , Shinichi Kanna
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0046 , G03F7/0392 , G03F7/0395 , Y10S430/108
摘要： A positive resist composition comprising: (A) a fluorine group-containing resin having: a structure wherein at least one of the main chain and the side chain of the polymer skeleton has at least one fluorine atom; and having a group capable of decomposing under the action of an acid to increase the solubility in an alkali developer; (B) a compound capable of generating an acid upon irradiation with one of actinic ray and radiation, and (C) a surfactant containing at least one of a silicon atom and a fluorine atom.
摘要翻译：一种正型抗蚀剂组合物，其包含：（A）含氟基树脂，其具有以下结构：其中所述聚合物骨架的主链和侧链中的至少一个具有至少一个氟原子; 并且具有能够在酸的作用下能够分解以增加在碱性显影剂中的溶解度的基团;（B）在用光化学射线和辐射之一照射时能够产生酸的化合物，和（C）含有硅原子和氟原子中的至少一个。

92. 发明授权

US06830871B2 Chemical amplification type resist composition 失效
标题翻译：化学放大型抗蚀剂组合物
公开(公告)号：US06830871B2
公开(公告)日：2004-12-14
申请号：US10642182
申请日：2003-08-18
申请人： Shinichi Kanna , Kazuyoshi Mizutani , Tomoya Sasaki
发明人： Shinichi Kanna , Kazuyoshi Mizutani , Tomoya Sasaki
IPC分类号： G03F720
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/12
摘要： A chemical amplification type resist composition comprising: (a) a resin comprising repeating units having a side chain containing the specific partial structure and which increases the solubility in an alkaline developing solution by the action of an acid, (b) a compound capable of generating an acid upon irradiation with actinic rays or a radiation, (c) a low-molecular compound having a molecular weight of 3,000 or lower, wherein the value determined with the specific calculation formula is from 0.1 to 0.5, and (d) a solvent.
摘要翻译：一种化学放大型抗蚀剂组合物，其包含：（a）包含具有侧链的重复单元的树脂，所述侧链含有特定部分结构，并且通过酸的作用增加在碱性显影液中的溶解度，（b）能够产生（3）分子量为3000以下的低分子化合物，其特征在于，计算式为0.1〜0.5，（d）为溶剂。

93. 发明授权

US06811947B2 Positive resist composition 有权
标题翻译：正抗蚀剂组成
公开(公告)号：US06811947B2
公开(公告)日：2004-11-02
申请号：US10372240
申请日：2003-02-25
申请人： Kazuyoshi Mizutani , Tomoya Sasaki , Shinichi Kanna
发明人： Kazuyoshi Mizutani , Tomoya Sasaki , Shinichi Kanna
IPC分类号： G03F7039
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/108 , Y10S430/115
摘要： A positive resist composition comprising (A) a resin, which is decomposed by the action of an acid to increase solubility in an alkali developing solution, having a repeating unit represented by formula (Y) defined in the specification, (B) a compound capable of generating an acid upon irradiation of an actinic ray or radiation, and (C) a solvent.
摘要翻译：一种正型抗蚀剂组合物，其包含（A）通过酸的作用分解以提高在碱性显影液中的溶解度的树脂，其具有由说明书中定义的式（Y）表示的重复单元，（B）具有化合物在光化射线或辐射照射时产生酸，和（C）溶剂。

94. 发明授权

US06506535B1 Positive working photoresist composition 失效
标题翻译：正工作光致抗蚀剂组成
公开(公告)号：US06506535B1
公开(公告)日：2003-01-14
申请号：US09698221
申请日：2000-10-30
申请人： Kazuyoshi Mizutani , Kenichiro Sato , Kunihiko Kodama
发明人： Kazuyoshi Mizutani , Kenichiro Sato , Kunihiko Kodama
IPC分类号： G03C172
CPC分类号： G03F7/0758 , G03F7/0045 , G03F7/0395 , G03F7/0397 , Y10S430/106
摘要： Disclosed is a positive working photoresist composition comprising an acid-decomposable polymer containing at least a repeating unit represented by the following formula (I) and at least either one repeating unit represented by the following formula (IIa) or (IIb), and also disclosed is a positive working photoresist composition comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation, (B) an acid-decomposable polymer containing at least a repeating unit represented by the following formula (I) and at least either one repeating unit represented by the following formula (IIa) or (IIb), (C) at least one solvent capable of dissolving the components (A) and (B), (D) an organic basic compound and (E) at least one surfactant selected from fluorine-containing surfactants, silicon-containing surfactants and nonionic surfactants:
摘要翻译：公开了一种正性光致抗蚀剂组合物，其包含至少含有由下式（I）表示的重复单元和至少一种由下式（IIa）或（IIb）表示的重复单元的酸可分解聚合物，并且还公开是一种正性光致抗蚀剂组合物，其包含（A）在用光化射线或辐射照射时能够产生酸的化合物，（B）至少含有由下式（I）表示的重复单元的酸可分解聚合物和至少由下式（IIa）或（IIb）表示的一个重复单元，（C）至少一种能够溶解组分（A）和（B）的溶剂，（D）有机碱性化合物和（E）一种选自含氟表面活性剂，含硅表面活性剂和非离子表面活性剂的表面活性剂：

95. 发明授权

US06399269B2 Bottom anti-reflective coating material composition for photoresist and method of forming resist pattern using the same 有权
标题翻译：用于光致抗蚀剂的底部防反射涂料组合物和使用其形成抗蚀剂图案的方法
公开(公告)号：US06399269B2
公开(公告)日：2002-06-04
申请号：US09397117
申请日：1999-09-16
申请人： Kazuyoshi Mizutani , Makoto Momota
发明人： Kazuyoshi Mizutani , Makoto Momota
IPC分类号： G03F709
CPC分类号： G03F7/091
摘要： A bottom anti-reflective coating material composition for a photoresist comprising the following components (a) to (d): (a) a polymer containing a dye structure having a molar extinction coefficient of 1.0×104 or more to light including a wavelength used for exposure of the photoresist; (b) a thermal crosslinking agent which is activated by an acid to react with component (a) described above, thereby forming a crosslinked structure; (c) a sulfonic acid ester compound or diaryl iodonium salt, which is decomposed to generate an acid with heating at temperature between 150 to 200° C.; and (d) an organic solvent capable of dissolving components (a) to (c) described above. The bottom anti-reflective coating material composition for a photoresist provides a bottom anti-reflective coating having a large absorbance to light including a wavelength used for exposure, and an adverse effect due to a standing wave generated by reflection from a substrate can be reduced, a limiting resolution of the photoresist is increased, and a good resist profile is obtained. A method of forming a resist pattern using the composition is also disclosed.
摘要翻译：一种用于光致抗蚀剂的底部抗反射涂料组合物，其包含以下组分（a）至（d）：（a）含有具有摩尔吸光系数为1.0×10 4或更高的染料结构的聚合物，其包含用于曝光的波长的光致抗蚀剂;（b）由酸活化以与上述组分（a）反应的热交联剂，由此形成交联结构;（c）磺酸酯化合物或二芳基碘鎓盐，其分解成在150〜200℃的温度下加热生成酸。和（d）能够溶解上述组分（a）至（c）的有机溶剂。用于光致抗蚀剂的底部抗反射涂料组合物提供具有大的吸光度的底部抗反射涂层，其包括用于曝光以及由于从基板反射产生的驻波产生的不利影响，可以降低光致抗蚀剂的极限分辨率，获得良好的抗蚀剂图。还公开了使用该组合物形成抗蚀剂图案的方法。

96. 发明授权

US06248500B1 Composition for anti-reflective coating material 失效
标题翻译：防反射涂料的成分
公开(公告)号：US06248500B1
公开(公告)日：2001-06-19
申请号：US09499703
申请日：2000-02-07
申请人： Kazuyoshi Mizutani , Hiroshi Yoshimoto
发明人： Kazuyoshi Mizutani , Hiroshi Yoshimoto
IPC分类号： G03F711
CPC分类号： G03F7/091
摘要： A composition for anti-reflective coating material is disclosed, comprising a polymer compound having repeating units having specific structure, and optionally a melamine, guanamine, urea, phenol, naphthol or hydroxyanthracene compound substituted by at least one group selected from the group consisting of a methylol group and an alkoxymethyl group at two or more positions. The composition for anti-reflective coating material of the present invention is effective for the reduction of adverse effects of reflection by the substrate in a lithographic process using various radiations. A resist pattern formation process which comprises the use of the composition for anti-reflective coating material is also disclosed.
摘要翻译：公开了一种抗反射涂层材料的组合物，其包含具有特定结构的重复单元的高分子化合物，以及任选的三聚氰胺，胍胺，脲，苯酚，萘酚或羟基蒽化合物，被至少一种选自以下的基团所取代：羟甲基和烷氧基甲基。本发明的抗反射涂层材料的组合物对于在使用各种辐射的光刻工艺中减少基板反射的不利影响是有效的。还公开了包括使用抗反射涂层材料用组合物的抗蚀图案形成方法。

97. 发明授权

US6165684A Bottom anti-reflective coating material composition and method for forming resist pattern using the same 失效
标题翻译：底部防反射涂料组合物和使用其形成抗蚀剂图案的方法
公开(公告)号：US6165684A
公开(公告)日：2000-12-26
申请号：US997393
申请日：1997-12-23
申请人： Kazuyoshi Mizutani , Makoto Momota
发明人： Kazuyoshi Mizutani , Makoto Momota
IPC分类号： G03F7/09 , G03F7/11
CPC分类号： G03F7/091
摘要： A composition for a bottom anti-reflective coating material and a method for forming a resist pattern using the composition, which are high in the dry etching rate, high in the resolution, excellent in the resist film thickness dependency and high in the effect of preventing reflective light against exposure light, and provide no intermixing with the photoresist layer, are disclosed, wherein the composition for a bottom anti-reflective coating material comprises a naphthalene group-containing polymer compound having a specific structure.
摘要翻译：用于底部抗反射涂层材料的组合物和使用该组合物形成抗蚀剂图案的方法，其干蚀刻速率高，分辨率高，抗蚀剂膜厚度依赖性优异，防止效果高公开了防曝光的反射光，并且不提供与光致抗蚀剂层的混合，其中用于底部抗反射涂层材料的组合物包含具有特定结构的含萘基的聚合物化合物。

98. 发明授权

US5216105A Silicone polymers and positive working light-sensitive compositions comprising the same 失效
标题翻译：硅胶聚合物和正极工作的含有它的光敏组合物
公开(公告)号：US5216105A
公开(公告)日：1993-06-01
申请号：US550446
申请日：1992-07-10
申请人： Toshiaki Aoai , Kazuyoshi Mizutani
发明人： Toshiaki Aoai , Kazuyoshi Mizutani
IPC分类号： C08G77/22 , C08G77/382 , G03F7/075
CPC分类号： C08G77/22 , C08G77/382 , G03F7/0757 , Y10S430/122 , Y10S430/126
摘要： A novel siloxane polymer having at least 1 mol % of a structural unit derived from a cyclic heat addition product between a diene compound of formula (I) or (II) and an olefin or acetylene compound of formula (III), (IV) or (V): ##STR1## and a positive working light-sensitive composition comprising the siloxane polymer.

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