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91. 发明申请

US20090239179A1 HYDROXYL-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS 有权
标题翻译：含羟基的单体，聚合物，耐腐蚀组合物和图案处理
公开(公告)号：US20090239179A1
公开(公告)日：2009-09-24
申请号：US12405670
申请日：2009-03-17
申请人： Takeshi Kinsho , Masaki Ohashi , Koji Hasegawa , Takeru Watanabe
发明人： Takeshi Kinsho , Masaki Ohashi , Koji Hasegawa , Takeru Watanabe
IPC分类号： G03F7/20 , C07C69/54 , C08F20/10
CPC分类号： G03F7/0392 , C07C69/54 , C07C2601/08 , C07C2602/42 , C07C2603/74 , C08F220/18 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： A hydroxyl-containing monomer of formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are monovalent C1-C15 hydrocarbon groups, or R2 and R3 may form an aliphatic ring. The monomers are useful for the synthesis of polymers which have high transparency to radiation of up to 500 nm and the effect of controlling acid diffusion so that the polymers may be used as a base resin to formulate radiation-sensitive resist compositions having a high resolution.
摘要翻译：提供式（1）的含羟基的单体，其中R 1是H，F，甲基或三氟甲基，R 2和R 3是一价C 1 -C 15烃基，或者R 2和R 3可以形成脂族环。单体可用于合成对高达500nm的辐射具有高透明度的聚合物，以及控制酸扩散的效果，使得聚合物可用作基础树脂以配制具有高分辨率的辐射敏感性抗蚀剂组合物。

92. 发明授权

US07192684B2 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process 有权
标题翻译：可聚合的含硅化合物，制造方法，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07192684B2
公开(公告)日：2007-03-20
申请号：US10671732
申请日：2003-09-29
申请人： Takeshi Kinsho , Takeru Watanabe , Koji Hasegawa
发明人： Takeshi Kinsho , Takeru Watanabe , Koji Hasegawa
IPC分类号： G03C1/73 , G03F7/039 , G03F7/36 , C08F30/08 , C07F7/08
CPC分类号： C08F30/08 , C07F7/081 , C07F7/0812 , G03F7/0045 , G03F7/0758 , G03F7/40 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： Polymerizable silicon-containing compounds of formula (1) wherein R1 is hydrogen, halogen or monovalent organic group are polymerized into polymers. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity and resolution at a wavelength of less than 300 nm, and high resistance to oxygen plasma etching, and thus lends itself to micropatterning for the fabrication of VLSIs
摘要翻译：其中R 1是氢，卤素或一价有机基团的式（1）的可聚合的含硅化合物聚合成聚合物。包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，在小于300nm的波长下具有优异的灵敏度和分辨率，并且具有高耐氧等离子体蚀刻性，因此适用于制造微波图案 VLSI

93. 发明授权

US07141352B2 Basic compound, resist composition and patterning process 有权
标题翻译：基本化合物，抗蚀剂组成和图案化工艺
公开(公告)号：US07141352B2
公开(公告)日：2006-11-28
申请号：US10849197
申请日：2004-05-20
申请人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa
发明人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： C07D235/06 , C07D235/18 , C07D405/06 , G03F7/0045 , G03F7/0382 , G03F7/0392 , Y10S430/106 , Y10S430/111
摘要： Resist compositions comprising basic compounds having a benzimidazole skeleton and a polar functional group have an excellent resolution and an excellent focus margin and are useful in microfabrication using electron beams or deep-UV light.
摘要翻译：包含具有苯并咪唑骨架和极性官能团的碱性化合物的抗蚀剂组合物具有优异的分辨率和优异的聚焦余量，并且可用于使用电子束或深紫外光的微细加工。

94. 发明授权

US07141351B2 Basic compound, resist composition and patterning process 有权
标题翻译：基本化合物，抗蚀剂组成和图案化工艺
公开(公告)号：US07141351B2
公开(公告)日：2006-11-28
申请号：US10849186
申请日：2004-05-20
申请人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa
发明人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa
IPC分类号： G03F7/004
CPC分类号： G03F7/0392 , C07D233/54 , C07D405/06 , G03F7/0045 , G03F7/0382 , Y10S430/106 , Y10S430/121
摘要： Resist compositions comprising basic compounds having an imidazole skeleton and a polar functional group have an excellent resolution and an excellent focus margin and are useful in microfabrication using electron beams or deep-UV light.
摘要翻译：包含具有咪唑骨架和极性官能团的碱性化合物的抗蚀剂组合物具有优异的分辨率和优异的聚焦余量，并且可用于使用电子束或深紫外光的微细加工。

95. 发明授权

US07029822B2 Tertiary alcohol compounds having alicyclic structure 失效
标题翻译：具有脂环结构的叔醇化合物
公开(公告)号：US07029822B2
公开(公告)日：2006-04-18
申请号：US10891229
申请日：2004-07-15
申请人： Koji Hasegawa , Takeru Watanabe , Takeshi Kinsho
发明人： Koji Hasegawa , Takeru Watanabe , Takeshi Kinsho
IPC分类号： G03F7/004
CPC分类号： C07C69/753 , C07C69/608 , C07C2602/42 , C07C2603/86
摘要： Tertiary alcohol compounds of formula (1) are novel wherein R1 and R2 are C1–10 alkyl groups which may have halogen substituents, or R1 and R2 may form an aliphatic hydrocarbon ring, Y and Z are a single bond or a divalent C1–10 organic group, and k=0 or 1. Using the tertiary alcohol compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, etching resistance and substrate adhesion
摘要翻译：式（1）的叔醇化合物是新的，其中R 1和R 2是可以具有卤素取代基的C 1-10烷基，或R 1， SUP>和R 2可以形成脂族烃环，Y和Z是单键或二价C 1-10有机基团，k = 0或1.使用叔醇化合物作为单体，得到聚合物。包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率，耐蚀刻性和基材粘合性

96. 发明申请

US20050008968A1 Basic compound, resist composition and patterning process 有权
标题翻译：基本化合物，抗蚀剂组成和图案化工艺
公开(公告)号：US20050008968A1
公开(公告)日：2005-01-13
申请号：US10849197
申请日：2004-05-20
申请人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa
发明人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa
IPC分类号： C07D235/06 , C07D235/12 , C07D235/16 , C07D235/18 , C07D405/06 , C09K3/00 , G03F7/004 , G03F7/038 , G03F7/039 , H01L21/027
CPC分类号： C07D235/06 , C07D235/18 , C07D405/06 , G03F7/0045 , G03F7/0382 , G03F7/0392 , Y10S430/106 , Y10S430/111
摘要： Resist compositions comprising basic compounds having a benzimidazole skeleton and a polar functional group have an excellent resolution and an excellent focus margin and are useful in microfabrication using electron beams or deep-UV light.
摘要翻译：包含具有苯并咪唑骨架和极性官能团的碱性化合物的抗蚀剂组合物具有优异的分辨率和优异的聚焦余量，并且可用于使用电子束或深紫外光的微细加工。

97. 发明授权

US08114570B2 Photoacid generator, resist composition, and patterning process 有权
标题翻译：光酸发生剂，抗蚀剂组合物和图案化工艺
公开(公告)号：US08114570B2
公开(公告)日：2012-02-14
申请号：US12410357
申请日：2009-03-24
申请人： Youichi Ohsawa , Takeshi Kinsho , Takeru Watanabe , Koji Hasegawa , Masaki Ohashi
发明人： Youichi Ohsawa , Takeshi Kinsho , Takeru Watanabe , Koji Hasegawa , Masaki Ohashi
IPC分类号： G03F7/004 , G03F7/30 , C07D307/00 , C07C309/03 , C07C309/19
CPC分类号： G03F7/0045 , C07C25/18 , C07C309/12 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07D333/46 , C07D493/08 , C07D493/18 , C08K5/42 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/2041 , Y10S430/111
摘要： Photoacid generators generate sulfonic acids of formula (1a) upon exposure to high-energy radiation. ROC(═O)R1—COOCH2CF2SO3−H+ (1a) RO is OH or C1-C20 organoxy, R1 is a divalent C1-C20 aliphatic group or forms a cyclic structure with RO. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.
摘要翻译：光生酸发生剂在暴露于高能量辐射时产生式（1a）的磺酸。 ROC（= O）R1-COOCH2CF2SO3-H +（1a）RO是OH或C1-C20有机氧基，R1是二价C1-C20脂族基团或与RO形成环状结构。光致酸产生剂与树脂相容并且可以控制酸扩散，因此适用于化学增幅抗蚀剂组合物。

98. 发明授权

US07276324B2 Nitrogen-containing organic compound, resist composition and patterning process 有权
标题翻译：含氮有机化合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07276324B2
公开(公告)日：2007-10-02
申请号：US10984933
申请日：2004-11-10
申请人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Katsuya Takemura , Kazumi Noda , Katsuhiro Kobayashi
发明人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Katsuya Takemura , Kazumi Noda , Katsuhiro Kobayashi
IPC分类号： G03C1/73 , G03F7/038 , G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0382
摘要： Chemically amplified resist compositions comprising nitrogen-containing organic compounds having an aromatic carboxylic acid ester structure have an excellent resolution and provide a precise pattern profile and are useful in microfabrication using electron beams or deep-UV light.
摘要翻译：包含具有芳族羧酸酯结构的含氮有机化合物的化学扩增抗蚀剂组合物具有优异的分辨率并提供精确的图案轮廓，并且可用于使用电子束或深紫外光的微细加工。

99. 发明授权

US06509481B2 Tetrahydrofuran compounds having alicyclic structure 有权
标题翻译：具有脂环结构的四氢呋喃化合物
公开(公告)号：US06509481B2
公开(公告)日：2003-01-21
申请号：US10117218
申请日：2002-04-08
申请人： Takeshi Kinsho , Koji Hasegawa , Takeru Watanabe
发明人： Takeshi Kinsho , Koji Hasegawa , Takeru Watanabe
IPC分类号： C07D31500
CPC分类号： C07D307/12 , C07D307/06
摘要： Tetrahydrofuran compounds of formula (1) wherein the broken line represents a single bond, a divalent organic group, or a structure in which the alicyclic structure in the form of norbornene or tetracyclo[4.4.0.12,5.17,10]dodecene and the tetrahydrofuran cyclic structure share one or two constituent carbon atoms, and k is 0 or 1 are novel and useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography
摘要翻译：式（1）的四氢呋喃化合物，其中虚线表示单键，二价有机基团或其中降冰片烯或四环[4.4.0.12,5.17,10]十二碳烯形式的脂环结构和四氢呋喃环状结构共享一个或两个组成碳原子，并且k为0或1是新颖的并且可用作形成用于化学增强抗蚀剂组合物中的基础树脂的单体，其适用于微图案光刻

100. 发明授权

US06469220B2 Tertiary alcohol compounds having an alicyclic structure 有权
标题翻译：具有脂环结构的叔醇化合物
公开(公告)号：US06469220B2
公开(公告)日：2002-10-22
申请号：US10025064
申请日：2001-12-19
申请人： Koji Hasegawa , Takeshi Kinsho , Takeru Watanabe
发明人： Koji Hasegawa , Takeshi Kinsho , Takeru Watanabe
IPC分类号： C07C3522
CPC分类号： C07C33/14 , C07C35/21 , C07C2601/08 , C07C2601/14 , C07C2603/90 , G03F7/0395 , G03F7/0397
摘要： The present invention provides novel tertiary alcohol compounds which are useful as monomers for the preparation of photoresist materials having high transparency and a great affinity for the substrate and hence suitable for use in photolithography using a light source comprising preferably light having a wavelength of 300 nm or less and more preferably light emitted from an ArF excimer laser. Specifically, the present invention provides tertiary alcohols compounds represented by the following general formula (1): wherein R1 and R2 each independently represent a straigh-chain, branched or cyclic alkyl group having 1 to 10 carbon atoms, in which some or all of the hydrogen atoms on the constituent carbon atoms may be replaced by a halogen atom or halogen atoms, or R1 and R2 may be joined together to form an aliphatic hydrocarbon ring; Z represents a straight-chain, branched or cyclic divalent organic group having 2 to 10 carbon atoms; and k is 0 or 1.
摘要翻译：本发明提供新颖的叔醇化合物，其可用作制备具有高透明度和对基材的极好亲和力的光致抗蚀剂材料的单体，因此适用于使用光源的光刻法，该光源优选包含波长为300nm的光或更优选由ArF准分子激光器发出的光。特别地，本发明提供由以下通式（1）表示的叔醇化合物：其中R 1和R 2各自独立地表示具有1个 10个碳原子，其中构成碳原子上的一些或全部氢原子可以被卤素原子或卤素原子取代，或者R1和R2可以连接在一起形成脂族烃环; Z表示具有2〜10个碳原子的直链，支链或环状二价有机基团; k为0或1。

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