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    • 91. 发明申请
    • Method and arrangement for detecting a random access channel preamble using multiple antenna reception in a communication system
    • 用于在通信系统中使用多个天线接收来检测随机接入信道前同步码的方法和装置
    • US20050047530A1
    • 2005-03-03
    • US10651200
    • 2003-08-29
    • Jung LeeAnil Rao
    • Jung LeeAnil Rao
    • H04B7/005H04B7/08H04L1/06H04L1/02
    • H04B7/086H04L1/0618H04W52/50
    • In a method and arrangement for detecting a random access channel preamble in a received uplink signal, the uplink signal is received at one or more receive antennas and contains data related to a random access channel preamble. The received uplink signal is subjected to spatial processing and temporal processing in order to detect the random access channel preamble. A best cell portion for communicating with a user may also be determined based on the detected preamble. The best cell portion represents a portion of a cell where a received uplink signal from a user has a highest signal to interference ratio. The detected random access channel preamble is indicative of the best cell portion for communicating with the user.
    • 在用于检测接收到的上行链路信号中的随机接入信道前同步码的方法和装置中,在一个或多个接收天线处接收上行链路信号,并且包含与随机接入信道前导码有关的数据。 接收到的上行链路信号经受空间处理和时间处理,以便检测随机接入信道前同步码。 还可以基于检测到的前导码来确定用于与用户通信的最佳小区部分。 最好的小区部分表示从用户接收的上行链路信号具有最高的信号与干扰比的小区的一部分。 检测到的随机接入信道前导码指示用于与用户通信的最佳小区部分。
    • 99. 发明申请
    • System and method for reducing power used to execute application program
    • 用于降低用于执行应用程序的功率的系统和方法
    • US20070136615A1
    • 2007-06-14
    • US11635203
    • 2006-12-07
    • Donghwan SonJung LeeHyung Lee
    • Donghwan SonJung LeeHyung Lee
    • G06F1/00
    • G06F1/3203G06F1/324G06F1/3243G06F1/3296Y02D10/126Y02D10/152Y02D10/172
    • Provided is a system and method of controlling power, the system and method capable of predicting optimal speeds of operation clocks of a central processing unit (CPU) and a memory used to execute an application program, thereby reducing power used to execute the application program. The system for controlling power includes a requirement prediction module predicting a requirement of central processing unit (CPU) performance and a requirement of memory usage for executing the application program; an operation clock determining unit determining optimal speeds of operation clocks of the CPU and the memory for executing the application program based on the requirements; and a clock speed/driving voltage generating unit generating optimal speeds of the operation clocks and optimal driving voltages of the CPU and the memory for executing the application program based on the determined optimal speeds of the operation clocks.
    • 提供了一种控制功率的系统和方法,能够预测中央处理单元(CPU)的操作时钟的最佳速度和用于执行应用程序的存储器的系统和方法,从而减少用于执行应用程序的功率。 用于控制功率的系统包括:预测中央处理单元(CPU)性能要求的预测模块和执行应用程序的存储器使用需求; 操作时钟确定单元,用于根据需要确定CPU和用于执行应用程序的存储器的操作时钟的最佳速度; 以及时钟速度/驱动电压产生单元,其基于所确定的操作时钟的最佳速度,生成CPU和用于执行应用程序的存储器的操作时钟的最佳速度和最佳驱动电压。
    • 100. 发明申请
    • Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry comprising the same
    • 用于控制抛光选择性的辅助剂和包含其的化学机械抛光浆料
    • US20070132058A1
    • 2007-06-14
    • US11634238
    • 2006-12-06
    • Gi YiJong KimJung LeeKwang MoonChang KoSoon JangSeung ChoYoung Hong
    • Gi YiJong KimJung LeeKwang MoonChang KoSoon JangSeung ChoYoung Hong
    • H01L29/00
    • C09K3/1463C09G1/02H01L21/31053
    • Disclosed is an adjuvant for use in simultaneous polishing of a cationically charged material and an anionically charged material, which forms an adsorption layer on the cationically charged material in order to increase polishing selectivity of the anionically charged material, wherein the adjuvant comprises a polyelectrolyte salt containing: (a) a mixture of a linear polyelectrolyte having a weight average molecular weight of 2,000˜50,000 with a graft type polyelectrolyte that has a weight average molecular weight of 1,000˜20,000 and comprises a backbone and a side chain; and (b) a basic material. CMP (chemical mechanical polishing) slurry comprising the above adjuvant and abrasive particles is also disclosed. The adjuvant comprising a mixture of a linear polyelectrolyte with a graft type polyelectrolyte makes it possible to increase polishing selectivity as compared to CMP slurry using the linear polyelectrolyte alone, and to obtain a desired range of polishing selectivity by controlling the ratio of the linear polyelectrolyte to the graft type polyelectrolyte.
    • 公开了一种用于同时抛光阳离子电荷材料和阴离子充电材料的佐剂,其在阳离子电荷材料上形成吸附层,以增加阴离子带电材料的抛光选择性,其中助剂包含含有 (a)重均分子量为2000〜50,000的线性聚电解质与重均分子量为1,000〜20,000的接枝型聚电解质的混合物,其包含骨架和侧链; 和(b)基本材料。 还公开了包含上述助剂和磨料颗粒的CMP(化学机械抛光)浆料。 包含线性聚电解质与接枝型聚电解质的混合物的佐剂使得可以使用单独的线性聚电解质与CMP浆料相比提高抛光选择性,并且通过控制线性聚电解质与 接枝型聚电解质。