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91. 发明授权

US07253179B2 Fused heterocyclic compounds 失效
标题翻译：稠合杂环化合物
公开(公告)号：US07253179B2
公开(公告)日：2007-08-07
申请号：US10705173
申请日：2003-11-06
申请人： Xi Chen , Xiaoqi Chen , Pingchen Fan , Juan Jaen , Leping Li , Jeffrey Thomas Mihalic
发明人： Xi Chen , Xiaoqi Chen , Pingchen Fan , Juan Jaen , Leping Li , Jeffrey Thomas Mihalic
IPC分类号： A61K31/4745 , C07D471/02
CPC分类号： C07D471/04
摘要： Compounds, compositions and methods are provided that are useful in the treatment and/or prevention of a condition or disorder mediated by a G-protein coupled receptor. In particular, the compounds of the invention are useful in the treatment and/or prevention of eating disorders, obesity, anxiety disorders and mood disorders.
摘要翻译：提供了可用于治疗和/或预防由G蛋白偶联受体介导的病症或病症的化合物，组合物和方法。特别地，本发明的化合物可用于治疗和/或预防进食障碍，肥胖症，焦虑障碍和情绪障碍。

92. 发明授权

US07125885B2 Fused heterocyclic compounds 失效
标题翻译：稠合杂环化合物
公开(公告)号：US07125885B2
公开(公告)日：2006-10-24
申请号：US10928029
申请日：2004-08-26
申请人： Xiaoqi Chen , Pingchen Fan , Juan Jaen , Leping Li , Mike Lizarzaburu , Jeffrey Thomas Mihalic , Stephen Joseph Shuttleworth
发明人： Xiaoqi Chen , Pingchen Fan , Juan Jaen , Leping Li , Mike Lizarzaburu , Jeffrey Thomas Mihalic , Stephen Joseph Shuttleworth
IPC分类号： C07D471/04 , A61K31/437
CPC分类号： C07D471/04
摘要： The present invention provides compounds having the formula: wherein R1, R2, R, R′ and the subscript p are described herein. The compounds are useful in the treatment and/or prevention of a condition or disorder mediated by a G-protein coupled receptor. Pharmaceutical compositions and methods of using these compounds for the treatment and/or prevention of a condition or disorder mediated by a G-protein coupled receptor, such as eating disorder, obesity, anxiety disorders and mood disorders are also provided.
摘要翻译：本发明提供具有下式的化合物：其中R 1，R 2，R 2，R 3'和下标p在本文中描述。该化合物可用于治疗和/或预防由G蛋白偶联受体介导的病症或病症。还提供了使用这些化合物治疗和/或预防由G蛋白偶联受体介导的病症或病症（如进食障碍，肥胖症，焦虑症和情绪障碍）的药物组合物和方法。

93. 发明授权

US06906069B1 LXR modulators 失效
标题翻译： LXR调制剂
公开(公告)号：US06906069B1
公开(公告)日：2005-06-14
申请号：US09479315
申请日：2000-01-06
申请人： Leping Li , Julio C. Medina , Bei Shan
发明人： Leping Li , Julio C. Medina , Bei Shan
IPC分类号： A01N43/58 , A61K31/167 , A61K31/34 , A61K31/443
CPC分类号： A61K31/167 , A61K31/34 , A61K31/443 , Y02A50/411
摘要： The invention provides compounds, compositions and methods for modulating the effects of LXRα in a cell. The compounds and compositions are useful both as diagnostic indicators of LXRα function and as pharmacologically active agents. The compounds and compositions find particular use in the treatment of disease states associated with cholesterol metabolism, particularly atherosclerosis and hypercholesterolemia.
摘要翻译：本发明提供用于调节细胞中LXRα的作用的化合物，组合物和方法。化合物和组合物既可用作LXRα功能的诊断指标，也可用作药理活性剂。化合物和组合物特别用于治疗与胆固醇代谢相关的疾病状态，特别是动脉粥样硬化和高胆固醇血症。

94. 发明授权

US06673923B2 Pyrazole antimicrobial agents 失效
标题翻译：吡唑抗菌剂
公开(公告)号：US06673923B2
公开(公告)日：2004-01-06
申请号：US09847962
申请日：2001-05-02
申请人： Leping Li , Xiaoqi Chen , Serena T. Cutler
发明人： Leping Li , Xiaoqi Chen , Serena T. Cutler
IPC分类号： C07D23112
CPC分类号： C07D231/12 , A61K31/415 , C07D231/20 , C07D403/10 , C07D409/04 , A61K31/00 , A61K2300/00
摘要： The present invention provides pyrazole and pyrazolone derivatives. Preferred compounds of the invention are useful as RNA polymerase inhibitors. Further preferred compounds of the invention are useful as antimicrobial agents.
摘要翻译：本发明提供吡唑和吡唑啉酮衍生物。本发明优选的化合物可用作RNA聚合酶抑制剂。本发明的其它优选化合物可用作抗微生物剂。

95. 发明授权

US06213846B1 Real-time control of chemical-mechanical polishing processes using a shaft distortion measurement 失效
标题翻译：使用轴失真测量实时控制化学机械抛光工艺
公开(公告)号：US06213846B1
公开(公告)日：2001-04-10
申请号：US09351436
申请日：1999-07-12
申请人： Leping Li , Xinhui Wang
发明人： Leping Li , Xinhui Wang
IPC分类号： B24B4900
CPC分类号： B24B37/013 , B24B49/16
摘要： A method is provided for detecting the endpoint of a film removal process such as chemical-mechanical polishing (CMP). The process uses a device having a shaft, and friction in the film removal causes torque on the shaft. Two axially displaced reflecting portions are provided on the shaft. Light reflected from these portions generates first and second reflected signals, respectively. A phase difference between the reflected signals is detected, and an output signal is generated in accordance therewith. A change in the output signal indicates a change in deformation of the shaft resulting from change in the torque, thereby indicating the endpoint of the film removal process.
摘要翻译：提供了用于检测诸如化学机械抛光（CMP）的膜去除过程的终点的方法。该方法使用具有轴的装置，并且膜去除中的摩擦导致轴上的扭矩。两个轴向位移的反射部分设置在轴上。从这些部分反射的光分别产生第一和第二反射信号。检测反射信号之间的相位差，并根据其产生输出信号。输出信号的变化表示由转矩变化引起的轴的变形的变化，由此表示膜去除过程的终点。

96. 发明授权

US6046171A 6,11-bridged erythromycin derivatives 有权
标题翻译： 6,11桥梁红霉素衍生物
公开(公告)号：US6046171A
公开(公告)日：2000-04-04
申请号：US158459
申请日：1998-09-22
申请人： Yat Sun Or , George Griesgraber , Leping Li , Daniel T. Chu
发明人： Yat Sun Or , George Griesgraber , Leping Li , Daniel T. Chu
IPC分类号： C07H17/08 , A61K31/70 , C07H1/00
CPC分类号： C07H17/08
摘要： Novel 6,11-bridged erythromycin compounds and pharmaceutically acceptable salts and esters thereof having antibacterial activity having a formula ##STR1## compositions comprising a therapeutically effective amount of a compound of the invention in combination with a pharmaceutically acceptable carrier, a method for treating bacterial infections by administering to a mammal a pharmaceutical composition containing a therapeutically-effective amount of a compound of the invention, and processes for their preparation.
摘要翻译：具有抗细菌活性的新型6,11-桥接的红霉素化合物及其药学上可接受的盐和酯，其组成包括治疗有效量的本发明化合物与药学上可接受的载体的组合，通过给予哺乳动物含有治疗有效量的本发明化合物的药物组合物及其制备方法。

97. 发明授权

US5770948A Rotary signal coupling for chemical mechanical polishing endpoint detection with a strasbaugh tool 失效
标题翻译：旋转信号耦合用于化学机械抛光终点检测与strasbaugh工具
公开(公告)号：US5770948A
公开(公告)日：1998-06-23
申请号：US620723
申请日：1996-03-19
申请人： Leping Li , Steven George Barbee , Arnold Halperin , Richard Mars Ruggiero , William Joseph Surovie
发明人： Leping Li , Steven George Barbee , Arnold Halperin , Richard Mars Ruggiero , William Joseph Surovie
IPC分类号： B24B37/013 , B24B37/24 , B24B37/26 , G01B7/06 , H01L21/302
CPC分类号： B24B37/013 , B24B37/245 , B24B37/26 , B24B49/12 , G01B7/06
摘要： An apparatus for rotary signal coupling in in-situ monitoring of a chemical-mechanical polishing process by a polisher is provided with a sensor fixed to a rotatable wafer carrier for creating a signal responsive to the chemical mechanical polishing process, a conductor coupled to the sensor for receiving the signal, the conductor fixed to the rotatable wafer carrier, a contact coupled to the conductor, the contact fixed to a stationary drive arm, and signal transfer means coupled to the contact for transferring the signal to a monitoring means.
摘要翻译：用于通过抛光机原位监测化学机械抛光工艺的旋转信号耦合装置设置有固定到可旋转晶片载体的传感器，用于产生响应于化学机械抛光工艺的信号，耦合到传感器的导体为了接收信号，固定到可旋转晶片载体的导体，耦合到导体的触点，固定到固定驱动臂的触点和耦合到触点的信号传送装置，用于将信号传送到监视装置。

98. 发明授权

US5660672A In-situ monitoring of conductive films on semiconductor wafers 失效
标题翻译：半导体晶片导电膜的原位监测
公开(公告)号：US5660672A
公开(公告)日：1997-08-26
申请号：US419208
申请日：1995-04-10
申请人： Leping Li , Steven George Barbee , Arnold Halperin , Tony Frederick Heinz
发明人： Leping Li , Steven George Barbee , Arnold Halperin , Tony Frederick Heinz
IPC分类号： G01B7/00 , G01B7/06 , G01R31/26 , H01L21/302 , H01L21/3205 , H01L21/66
CPC分类号： G01B7/105
摘要： The change in thickness of a film on an underlying body such as a semiconductor substrate is monitored in situ by inducing a current in the film, and as the thickness of the film changes (either increase or decrease), the changes in the current are detected. With a conductive film, eddy currents are induced in the film by a generating an alternating electromagnetic field with a sensor which includes a capacitor and an inductor.
摘要翻译：通过在膜中感应电流来原位监测半导体衬底等底层上的膜的厚度变化，随着膜的厚度变化（增加或减小），检测电流的变化。利用导电膜，通过与包括电容器和电感器的传感器产生交变电磁场，在膜中引起涡流。

99. 发明授权

US5582746A Real time measurement of etch rate during a chemical etching process 失效
公开(公告)号：US5582746A
公开(公告)日：1996-12-10
申请号：US269862
申请日：1994-06-30
申请人： Steven G. Barbee , Tony F. Heinz , Yiping Hsiao , Leping Li , Eugene H. Ratzlaff , Justin W. Wong
发明人： Steven G. Barbee , Tony F. Heinz , Yiping Hsiao , Leping Li , Eugene H. Ratzlaff , Justin W. Wong
IPC分类号： C23F1/00 , G01N17/00 , G01N27/02 , G01N29/34 , G01N29/42 , G03F7/30 , H01L21/306 , H01L21/66
CPC分类号： B24B37/013 , G01N29/348 , G01N29/42 , G03F7/3028 , H01L22/26 , G01N2291/0231 , G01N2291/2694 , H01L2924/0002
摘要： A contactless method and apparatus for real-time in-situ monitoring of a chemical etching process during etching of at least one wafer in a wet chemical etchant bath are disclosed. The method comprises the steps of providing two conductive electrodes in the wet chemical bath, wherein the two electrodes are proximate to but not in contact with a wafer; monitoring an electrical characteristic between the two electrodes as a function of time in the etchant bath of the at least one wafer, wherein a prescribed change in the electrical characteristic is indicative of a prescribed condition of the etching process; and recording a plurality of values of the electrical characteristic as a function of time during etching. From the plurality of recorded values and corresponding times, instantaneous etch rates, average etch rates, and etching end points may be determined. Such a method and the apparatus therefor are particularly useful in a wet chemical etch station.

100. 发明授权

US5573624A Chemical etch monitor for measuring film etching uniformity during a chemical etching process 失效
标题翻译：用于在化学蚀刻过程中测量膜蚀刻均匀性的化学蚀刻监测器
公开(公告)号：US5573624A
公开(公告)日：1996-11-12
申请号：US269861
申请日：1994-06-30
申请人： Steven G. Barbee , Tony F. Heinz , Yiping Hsiao , Leping Li , Eugene H. Ratzlaff , Justin W. Wong
发明人： Steven G. Barbee , Tony F. Heinz , Yiping Hsiao , Leping Li , Eugene H. Ratzlaff , Justin W. Wong
IPC分类号： G01N17/00 , G01N27/02 , G01N29/34 , G01N29/42 , G03F7/30 , H01L21/66 , C23F1/02
CPC分类号： B24B37/013 , G01N29/348 , G01N29/42 , G03F7/3028 , H01L22/26 , G01N2291/0231 , G01N2291/2694 , H01L2924/0002
摘要： A contactless method and apparatus for real-time in-situ monitoring of a chemical etching process during etching of at least one wafer in a wet chemical etchant bath are disclosed. The method comprises the steps of providing two conductive electrodes in the wet chemical bath, wherein the two electrodes are proximate to but not in contact with a wafer; monitoring an electrical characteristic between the two electrodes as a function of time in the etchant bath of the at least one wafer, wherein a prescribed change in the electrical characteristic is indicative of a prescribed condition of the etching process; detecting a minimum and maximum value of the electrical characteristic during etching; determining the times of the minimum and maximum values; and comparing the times of the minimum and maximum values to determine a film etching uniformity value. Such a method and the apparatus therefor are particularly useful in a wet chemical etch station, and are useful for film deposition process quality control.
摘要翻译：公开了一种用于在湿式化学蚀刻剂浴中蚀刻至少一个晶片期间对化学蚀刻工艺进行实时原位监测的非接触式方法和装置。该方法包括以下步骤：在湿化学浴中提供两个导电电极，其中两个电极接近但不与晶片接触; 在所述至少一个晶片的蚀刻液浴中监测所述两个电极之间的电特性作为时间的函数，其中所述电特性的规定变化表示所述蚀刻工艺的规定条件; 检测蚀刻期间的电特性的最小值和最大值; 确定最小和最大值的时间; 并比较最小和最大值的时间以确定膜蚀刻均匀度值。这种方法及其装置在湿化学蚀刻站中特别有用，并且可用于膜沉积工艺质量控制。

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