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    • 91. 发明授权
    • Rear projection screen with uniformity of luminance
    • 背投屏幕亮度均匀
    • US06292294B1
    • 2001-09-18
    • US09253533
    • 1999-02-22
    • Yoshiki TakahashiMasahiro GotoHitomu WatanabeMakoto HondaKumpei OdaKatsunori Takahashi
    • Yoshiki TakahashiMasahiro GotoHitomu WatanabeMakoto HondaKumpei OdaKatsunori Takahashi
    • G03B2160
    • G03B21/625
    • A rear projection screen including a Fresnel lens sheet arranged on the projection side, and a lenticular lens sheet arranged on the observation side. The Fresnel lens sheet has a lenticular lens for vertical diffusion on its light-entering side. The lenticular lens for vertical diffusion containing a plurality of convex lenses that extend horizontally, and these plural convex lenses are arranged with a constant pitch. Further, the diffusion angle of the lenticular lens for vertical diffusion continuously increases, and, at the same time, the direction of diffusion is gradually inclined to the central part as the distance from the central part toward each of the edges on the screen surface increases. The diffusion properties (the angle and direction of diffusion) of the lenticular lens thus continuously vary between the central part and the edges of the screen surface.
    • 背投影屏幕,其包括布置在投影侧的菲涅耳透镜片和布置在观察侧的双凸透镜片。 菲涅耳透镜片具有用于在其光入侧的垂直扩散的双凸透镜。 用于垂直扩散的双凸透镜,其包含水平延伸的多个凸透镜,并且这些多个凸透镜以恒定的间距排列。 此外,双凸透镜对垂直扩散的扩散角度连续增加,同时,随着屏幕表面上的中心部分朝向每个边缘的距离,扩散方向逐渐向中心部分倾斜 。 因此,双凸透镜的扩散特性(扩散的角度和方向)在屏幕表面的中心部分和边缘之间连续变化。
    • 95. 发明授权
    • Method of controlling slag coating of a steel converter
    • 钢转炉炉渣涂层控制方法
    • US5567222A
    • 1996-10-22
    • US408066
    • 1995-03-21
    • Katsunori TakahashiEizo MaedaHajime SuzukiSumio YamadaTaichi NakazawaYasuo Imaiida
    • Katsunori TakahashiEizo MaedaHajime SuzukiSumio YamadaTaichi NakazawaYasuo Imaiida
    • C21C5/36C21C5/44F27D1/16C21C5/54
    • F27D1/1678C21C5/36C21C5/44
    • A method of controlling slag coating in a steel converter in which slag is left in the converter after tapping, and a slag solidifying agent is added to the slag to form a coated slag which is used to coat the bottom and/or side wall surface of the converter. The method is performed bya) examining the composition of the slag at the tapping time;b) determining, based on the examined slag and through an equilibrium calculation using thermodynamic data, the amount of solidifying agent per unit weight of the slag necessary for maintaining the liquid volume fraction of the coated slag to a value not greater than about 40% at the planned tapping temperature of the next charge of steel;c) determining the amount of charge of the solidifying agent based on the calculated required amount of the solidifying agent and the amount of the slag remaining in the converter; andd) adding the calculated charge of the solidifying agent to the slag after tapping, to form a coated slag.
    • 一种钢铁转炉中的炉渣涂层的控制方法,其中炉渣在出钢后留在转炉中,渣渣固化剂加入炉渣中以形成涂层炉渣,该炉渣用于涂覆底部和/或侧壁表面 转换器。 该方法通过以下步骤进行:a)在出料时检查炉渣的组成; b)基于所检查的炉渣和通过使用热力学数据的平衡计算确定每单位重量的炉渣所需的固化剂的量,以将涂覆炉渣的液体体积分数维持在不大于约40%的值 下一批钢铁的规划出钢温度; c)基于所计算的固化剂所需量和转化器中剩余的渣量来确定固化剂的装料量; 和d)在出料后将计算出的固化剂的量加到炉渣中,形成涂层的炉渣。
    • 97. 发明授权
    • Exposure device
    • 曝光装置
    • US4982226A
    • 1991-01-01
    • US246733
    • 1988-09-20
    • Katsunori Takahashi
    • Katsunori Takahashi
    • G03F7/20G21K5/00H01L21/30
    • G03F7/70558G03F7/20
    • An exposure device includes a light source, means for transmitting radiation from the light source to the surface of a photosensitive film, and photosensitive information outputting means for measuring and outputting information which represents the state of exposure of the surface of the photosensitive film. A suitable exposure can be determined by detecting changes in the properties of the resist. In consequence, exposure can be adjusted to fit the exposed state of the photosensitive film which would be impossible in the prior art. Further, variations that occur in exposure can be decreased, and yield can be improved.
    • 曝光装置包括光源,用于将来自光源的辐射传输到感光膜的表面的装置,以及用于测量和输出表示感光膜的表面的曝光状态的信息的光敏信息输出装置。 可以通过检测抗蚀剂的性质的变化来确定合适的曝光。 因此,可以调整曝光以适应现有技术中不可能的感光膜的曝光状态。 此外,可以降低在曝光中发生的变化,并且可以提高产率。