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    • 96. 发明授权
    • MIS Field effect transistor for high source-drain voltages
    • MIS场效应晶体管用于高源极 - 漏极电压
    • US4247860A
    • 1981-01-27
    • US873234
    • 1978-01-30
    • Jenoe Tihanyi
    • Jenoe Tihanyi
    • H01L29/10H01L29/423H01L29/78H01L29/786
    • H01L29/78624H01L29/105H01L29/1083H01L29/42368H01L29/42384H01L29/78
    • A MIS field effect transistor of the depletion type having source, drain and channel regions of a first conductivity type formed in a substrate of the second conductivity type. A gate electrode is formed on an insulating layer above the channel. The spacing between the channel and the gate electrode increases between the source and the drain. This increase in spacing may be a continuous increase in the direction of the drain or may be a series of steps. A circuit arrangement is described where a plurality of these depletion MIS field effect transistors of the above type are serially connected with the source of the first of these depletion type transistors, connected to the drain of a preceding enhancement type MIS field effect transistor.
    • 一种耗尽型MIS场效应晶体管,其具有形成在第二导电类型的衬底中的第一导电类型的源极,漏极和沟道区。 栅极电极形成在通道上方的绝缘层上。 沟道和栅电极之间的间距在源极和漏极之间增加。 间隔的这种增加可以是排水方向上的连续增加,或者可以是一系列步骤。 描述了一种电路装置,其中上述类型的多个这些耗尽MIS场效应晶体管与连接到先前增强型MIS场效应晶体管的漏极的这些耗尽型晶体管中的第一个的源极串联连接。