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    • 95. 发明授权
    • Printing apparatus capable of effectively heating and cooling ink
    • 能够有效地加热和冷却墨水的印刷装置
    • US08256860B2
    • 2012-09-04
    • US12385344
    • 2009-04-06
    • Hiroyuki Nakamura
    • Hiroyuki Nakamura
    • B41J29/38
    • B41J2/175B41J2/17596B41J2/195B41J29/377
    • A printing apparatus is provided with a heater for heating ink and a cooler for cooling ink, and comprises: an ink circulation route including a heater side route and a cooler side route which are separately provided through the heater and the cooler respectively; a switch mechanism operable to switch the ink circulation route between the heater side route and the cooler side route; and a control unit operable to control the switch mechanism. The control unit controls the switch mechanism to switch the ink circulation route to the heater side route when the ink temperature is lower than a first reference temperature, and switch the ink circulation route to the cooler side route when the ink temperature is no lower than the first reference temperature. By this configuration, the ink heating efficiency can be improved.
    • 印刷装置设置有用于加热油墨的加热器和用于冷却油墨的冷却器,并且包括:分别通过加热器和冷却器分别设置的包括加热器侧路径和冷却器侧路径的油墨循环路线; 开关机构,其可操作以切换加热器侧路径和冷却器侧路径之间的油墨循环路径; 以及控制单元,用于控制开关机构。 当油墨温度低于第一基准温度时,控制单元控制开关机构将油墨循环路径切换到加热器侧路径,并且当油墨温度不低于第一参考温度时,将油墨循环路径切换到较冷侧路线 第一参考温度。 通过这种构造,可以提高油墨加热效率。
    • 96. 发明申请
    • PROTECTION CIRCUIT FOR SEMICONDUCTOR INTEGRATED CIRCUIT AND DRIVING METHOD THEREFOR
    • 半导体集成电路的保护电路及其驱动方法
    • US20120162837A1
    • 2012-06-28
    • US13408533
    • 2012-02-29
    • Hiroyuki Nakamura
    • Hiroyuki Nakamura
    • H02H9/04
    • H03K17/00
    • A surge protection circuit comprises a surge detection circuit 14 for detecting a surge applied to a semiconductor integrated circuit, and a protection element 15 for absorbing the surge. The protection element is connected between a signal terminal for supplying a signal to the semiconductor integrated circuit and a power source terminal for supplying a power source voltage. When the power source voltage is not larger than a voltage enough to normally operate the semiconductor integrated circuit and the surge detection circuit does not detect the surge, the protection element is set in a current limiting state. When the power source voltage is not larger than a voltage enough to normally operate the semiconductor integrated circuit and the surge detection circuit detects the surge, the protection element is set in a current non-limiting state.
    • 浪涌保护电路包括用于检测施加到半导体集成电路的浪涌的浪涌检测电路14和用于吸收浪涌的保护元件15。 保护元件连接在用于向半导体集成电路提供信号的信号端子和用于提供电源电压的电源端子之间。 当电源电压不大于足以正常操作半导体集成电路的电压并且浪涌检测电路没有检测到浪涌时,保护元件被设置在限流状态。 当电源电压不大于足以正常操作半导体集成电路的电压并且浪涌检测电路检测到浪涌时,保护元件被设置在当前的非限制状态。
    • 98. 发明授权
    • Method of manufacturing a perpendicular magnetic recording medium, a method of manufacturing a substrate for a perpendicular magnetic recording medium, and a medium and a substrate manufactured by the methods
    • 垂直磁记录介质的制造方法,垂直磁记录介质用基板的制造方法以及由该方法制造的介质和基板
    • US08167685B2
    • 2012-05-01
    • US11925333
    • 2007-10-26
    • Shoji SakaguchiHiroyuki NakamuraHideki Matsuo
    • Shoji SakaguchiHiroyuki NakamuraHideki Matsuo
    • B24B1/00G11B5/62G11B7/24
    • G11B5/8404B24B19/028B24B21/004
    • A method of manufacturing a perpendicular magnetic recording medium and a substrate for the medium are disclosed, in which abnormal protrusions on an underlayer made of a Ni—P alloy are automatically eliminated while maintaining a flat surface with high accuracy on the underlayer, and appropriate texture traces remain to promote magnetization alignment in the vertical direction in a perpendicular magnetic recording medium without adversely affecting the magnetization alignment. In the method, texture processing is carried out on an underlayer made of a Ni—P alloy on a nonmagnetic base plate using a polishing tape while supplying mixed slurry of a surfactant and abrasive grains of polycrystalline diamond, and then, texture polishing is carried out on the underlayer processed by the texture processing, using a polishing tape while supplying slurry containing an abrasive material and an organic acid until the surface of the underlayer is polished to an arithmetic mean roughness Ra of at most 0.5 nm, preferably in the range of 0.05 nm to 0.2 nm.
    • 公开了制造用于介质的垂直磁记录介质和基板的方法,其中在Ni-P合金制成的底层上的异常突起被自动消除,同时在底层上保持高精度的平坦表面,并且具有适当的质地 留下痕迹以促进垂直磁记录介质中的垂直方向的磁化取向,而不会不利地影响磁化取向。 在该方法中,使用研磨带在非磁性基板上由Ni-P合金制成的底层进行纹理加工,同时供给表面活性剂和多晶金刚石的磨粒的混合浆料,然后进行织构研磨 在通过纹理处理处理的底层上,使用抛光带,同时供给含有研磨材料和有机酸的浆料,直到底层的表面被抛光至至多0.5nm的算术平均粗糙度Ra,优选在0.05的范围内 nm至0.2nm。