专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

91. 发明授权

US07692771B2 Imprint lithography 有权
公开(公告)号：US07692771B2
公开(公告)日：2010-04-06
申请号：US11138899
申请日：2005-05-27
申请人： Aleksey Yurievich Kolesnychenko , Helmar Van Santen , Yvonne Wendela Kruijt-Stegeman
发明人： Aleksey Yurievich Kolesnychenko , Helmar Van Santen , Yvonne Wendela Kruijt-Stegeman
IPC分类号： G03B27/02 , G03B27/20
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A lithographic apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table arranged to receive a substrate, a radiation output arranged to illuminate a part of the imprint template, and a detector configured to detect radiation scattered from an interface between the imprint template and imprintable material provided on the substrate.

92. 发明授权

US07686970B2 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US07686970B2
公开(公告)日：2010-03-30
申请号：US11025835
申请日：2004-12-30
申请人： Aleksey Yurievich Kolesnychenko , Helmar Van Santen , Yvonne Kruijt-Stegeman
发明人： Aleksey Yurievich Kolesnychenko , Helmar Van Santen , Yvonne Kruijt-Stegeman
IPC分类号： B44C1/22
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method for manufacturing a working template for use in imprint lithography is disclosed, which in an embodiment, involves contacting a first target region of an imprintable medium on a working template substrate with a master template to form a first imprint in the medium, the imprint defining a part of a working template pattern, separating the master template from the imprinted medium, contacting a second target region of the medium with the master template to form a second imprint in the medium, the second imprint defining a further part of the working template pattern, and separating the master template from the imprinted medium.
摘要翻译：公开了一种用于制造用于压印光刻的工作模板的方法，其在一个实施例中包括将工作模板基板上的可压印介质的第一目标区域与主模板接触以在介质中形成第一印记，印记定义工作模板模式的一部分，将主模板与压印介质分离，将介质的第二目标区域与主模板接触以在介质中形成第二压印，第二压印定义工作模板的另一部分模式，并将主模板与压印介质分离。

93. 发明授权

US07642297B2 Non-leaching adhesive system and its use in a liquid immersion objective 有权
标题翻译：非浸出粘合剂系统及其在液体浸入物中的应用
公开(公告)号：US07642297B2
公开(公告)日：2010-01-05
申请号：US10568837
申请日：2004-08-05
申请人： Emile Johannes Karel Verstegen , Johan George Kloosterboer , Hendrik Roelof Stapert , Jacobus Hermanus Maria Neijzen , Helmar Van Santen
发明人： Emile Johannes Karel Verstegen , Johan George Kloosterboer , Hendrik Roelof Stapert , Jacobus Hermanus Maria Neijzen , Helmar Van Santen
IPC分类号： C08F2/46 , C09J4/02
CPC分类号： C09J135/02
摘要： A non-leaching adhesive system and its use in a liquid immersion objective for immersion-writing of masters for optical discs are disclosed. The adhesive system comprises at least one monomer, selected from among the group of acrylate and methacrylate monomers, allylic monomers, norbornene monomers, hybrid monomers thereof, containing chemically different polymeriazble groups, and multifunctional thiol monomers, provided that said thiol is used in combination with at least one of said non-thiol monomers; and a polymerization initiator. At least one of said monomers, not being a thiol, is provided with at least two functional polymerizable groups to obtain a crosslinked polymer network. The polymerization initiator is preferably an initiator that can be activated both thermally and with UV radiation. The adhesive system may further contain a reactive diluent. Further the use of the present adhesive system in mounting a liquid immersion objective is disclosed.
摘要翻译：公开了一种非浸出粘合剂系统及其在用于浸入式写入光盘的液浸物镜中的用途。粘合剂体系包含至少一种选自丙烯酸酯和甲基丙烯酸酯单体的单体，烯丙基单体，降冰片烯单体，含有化学上不同的聚合物基团的杂化单体和多官能硫醇单体，条件是所述硫醇与所述非硫醇单体中的至少一种; 和聚合引发剂。至少一种所述单体（不是硫醇）具有至少两个官能的可聚合基团以获得交联的聚合物网络。聚合引发剂优选是能够以热辐射和UV辐射活化的引发剂。粘合剂体系还可以含有反应性稀释剂。此外，公开了本发明的粘合剂系统在安装液浸物镜中的用途。

94. 发明授权

US07618250B2 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US07618250B2
公开(公告)日：2009-11-17
申请号：US11440439
申请日：2006-05-25
申请人： Helmar Van Santen , Aleksey Yurievich Kolesnychenko , Yvonne Wendela Kruijt-Stegeman
发明人： Helmar Van Santen , Aleksey Yurievich Kolesnychenko , Yvonne Wendela Kruijt-Stegeman
IPC分类号： B29C59/00
CPC分类号： B29C43/021 , B29C35/0888 , B29C43/003 , B29C43/52 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table, and an optical encoder, the optical encoder having a radiation output, a first diffraction grating, and a detector, the radiation output arranged to illuminate a second diffraction grating and the detector positioned to detect radiation diffracted by the first and second diffraction gratings to provide an alignment signal.
摘要翻译：公开了一种压印光刻设备，其具有被配置为保持压印模板，衬底台和光学编码器的模板保持器，所述光学编码器具有辐射输出，第一衍射光栅和检测器，所述辐射输出被布置成照亮第二衍射光栅和检测器，定位成检测由第一和第二衍射光栅衍射的辐射以提供对准信号。

95. 发明申请

US20080198473A1 Variable Focus Lens 审中-公开
标题翻译：可变焦距镜头
公开(公告)号：US20080198473A1
公开(公告)日：2008-08-21
申请号：US11917171
申请日：2006-06-12
申请人： Jaap Ruigrok , Helmar Van Santen , Michael Adrianus Henricus Van Der Aa
发明人： Jaap Ruigrok , Helmar Van Santen , Michael Adrianus Henricus Van Der Aa
IPC分类号： G02B3/14
CPC分类号： G02B3/14
摘要： The invention relates to variable focus lenses based on magneto wetting and related devices, wherein two fluids, one of which is magnetically susceptible, are in contact over a meniscus. The shape of the meniscus is controlled by means of an applied magnetic field gradient. The contact angle between the chamber wall and the meniscus is a conserved. Implementation of special shaping to the internal or external walls of the chamber, while conserving the contact angle, results in better lens shape in the variable focus lens and lower levels of lens distortion.
摘要翻译：本发明涉及基于磁润湿和相关装置的可变焦距透镜，其中两个流体（其中之一是磁敏感的）在弯液面上接触。弯液面的形状通过施加的磁场梯度来控制。室壁和弯液面之间的接触角是保守的。在腔室的内壁或外壁实现特殊成形，同时节省接触角，导致可变焦距透镜更好的透镜形状和更低的透镜变形水平。

96. 发明授权

US07394521B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US07394521B2
公开(公告)日：2008-07-01
申请号：US10743271
申请日：2003-12-23
申请人： Helmar Van Santen , Aleksey Kolesnychenko
发明人： Helmar Van Santen , Aleksey Kolesnychenko
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/7085
摘要： A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.
摘要翻译：公开了一种用于浸没式光刻投影装置的液体供应系统，其中在投影系统，阻挡构件和基板之间限定空间。阻挡构件不被密封，使得在使用期间，允许浸没液体流出空间以及阻挡构件和基底之间。

97. 发明授权

US07377764B2 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US07377764B2
公开(公告)日：2008-05-27
申请号：US11150465
申请日：2005-06-13
申请人： Yvonne Wendela Kruijt-Stegeman , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Johan Frederik Dijksman , Helmar Van Santen , Sander Frederik Wuister
发明人： Yvonne Wendela Kruijt-Stegeman , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Johan Frederik Dijksman , Helmar Van Santen , Sander Frederik Wuister
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A lithographic apparatus is disclosed that has an imprint template or a template holder configured to hold an imprint template, and a substrate table arranged to receive a substrate, the apparatus further comprising walls which together with the substrate table and the imprint template or the template holder, are configured to form an enclosed space which is substantially sealed from a surrounding area.
摘要翻译：公开了一种光刻设备，其具有构造成保持压印模板的压印模板或模板保持器，以及布置成接收衬底的衬底台，该设备还包括与衬底台和压印模板或模板保持器一起的壁被构造成形成从周围区域基本密封的封闭空间。

98. 发明授权

US07372541B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07372541B2
公开(公告)日：2008-05-13
申请号：US11239480
申请日：2005-09-30
申请人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen , Sjoerd Nicolaas Lambertus Donders
发明人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen , Sjoerd Nicolaas Lambertus Donders
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.
摘要翻译：在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。在结构和衬底的表面之间使用气体以在空间中容纳液体。

99. 发明授权

US07358507B2 Liquid removal in a method and device for irradiating spots on a layer 有权
标题翻译：用于在层上照射斑点的方法和装置中的液体去除
公开(公告)号：US07358507B2
公开(公告)日：2008-04-15
申请号：US10538115
申请日：2003-11-14
申请人： Helmar Van Santen
发明人： Helmar Van Santen
IPC分类号： G21G5/00
CPC分类号： G11B7/1374 , G03F7/70341 , G11B7/122 , G11B7/261
摘要： For irradiating a layer (3) a radiation beam (7) is directed and focused to a spot (11) on the layer (3), relative movement of the layer (3) relative to the optical element (59) is caused so that, successively, different portions of the layer (3) are irradiated and an interspace (53) between a surface of the optical element (59) nearest to the layer (3) is maintained. Furthermore, at least a portion of the interspace (53) through which the radiation irradiates the spot (11) on the layer (3) is maintained filled with a liquid (91). By directing a gas flow (71-73) to a surface zone (74) of the layer (3), liquid (91) is reliably prevented from passing that surface zone (74), without causing damage to the layer (3). The liquid (91) is drawn away from the layer (3) in the vicinity of the surface zone (74).
摘要翻译：为了照射层（3），辐射束（7）被引导并聚焦到层（3）上的斑点（11），引起层（3）相对于光学元件（59）的相对运动，使得照射层（3）的不同部分，并且维持最靠近层（3）的光学元件（59）的表面之间的间隙（53）。此外，辐射照射层（3）上的斑点（11）的间隙（53）的至少一部分保持充满液体（91）。通过将气流（71-73）引导到层（3）的表面区域（74），可靠地防止液体（91）通过该表面区域（74），而不会损坏层（3）。液体（91）在表面区域（74）附近从层（3）被拉出。

100. 发明申请

US20060209414A1 Method and device for irradiating spots on a layer 有权
标题翻译：用于在层上照射斑点的方法和装置
公开(公告)号：US20060209414A1
公开(公告)日：2006-09-21
申请号：US10539351
申请日：2003-11-20
申请人： Helmar Van Santen , Jacobus Neijzen
发明人： Helmar Van Santen , Jacobus Neijzen
IPC分类号： G02B1/10
CPC分类号： G03F7/70341 , G11B7/122 , G11B7/1374 , G11B7/261
摘要： For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the optical element is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the optical element nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit and flowing out of an outflow opening through a total projected cross-sectional passage area in a plane parallel to the layer. The outflow opening or a plurality of the outflow openings are positioned such that, seen in a direction perpendicular to the layer, the total cross-sectional area has a centre in the portion of the interspace through which the radiation irradiates the spot.
摘要翻译：为了照射层，辐射束被引导并聚焦到层上的斑点，引起层相对于光学元件的相对运动，使得相继地照射该层的不同部分，并且在该层的表面之间的间隙保持最靠近层的光学元件。此外，辐射照射到层上的斑点的间隙的至少一部分保持充满液体，液体经由供应管道供给，并通过总投影横截面通过面积流出流出开口在与平面平行的平面上。流出开口或多个流出开口定位成使得从垂直于该层的方向看，总横截面积在该空间部分中的中心，辐射辐射穿过该点。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式