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91. 发明授权

US09529283B2 Radiation source, lithographic apparatus, and device manufacturing method 有权
标题翻译：辐射源，光刻设备和器件制造方法
公开(公告)号：US09529283B2
公开(公告)日：2016-12-27
申请号：US13058783
申请日：2009-07-29
申请人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Leonid Aizikovitch Sjmaenok
发明人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Leonid Aizikovitch Sjmaenok
IPC分类号： G21K5/04 , G03F7/20 , B82Y10/00 , G02B5/20 , G21K1/06 , G21K1/10
CPC分类号： G03F7/70958 , B82Y10/00 , G02B5/208 , G03F7/70033 , G03F7/70191 , G03F7/70575 , G03F7/70941 , G21K1/062 , G21K1/10
摘要： A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of material highly reflective of non-EUV secondary radiation located on a radiation incident side of the body. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of high emissivity material on an end of the body.
摘要翻译：光谱纯度滤光器被配置为透射极紫外（EUV）辐射并偏转或吸收非EUV次级辐射。在一个实施例中，光谱纯度滤光器包括高度透射EUV辐射的材料体和高度反射位于身体辐射入射侧的非EUV次级辐射的材料层。在一个实施例中，光谱纯度滤光器包括在EUV辐射高度透射的材料体和在身体端部上的高发射率材料层。

92. 发明授权

US09207548B2 Radiation source with a debris mitigation system, lithographic apparatus with a debris mitigation system, method for preventing debris from depositing on collector mirror, and device manufacturing method 有权
标题翻译：具有碎片缓解系统的辐射源，具有碎片缓解系统的光刻设备，用于防止碎屑沉积在集光镜上的方法和装置制造方法
公开(公告)号：US09207548B2
公开(公告)日：2015-12-08
申请号：US13058776
申请日：2009-07-30
申请人： Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors
发明人： Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors
IPC分类号： G03F7/20 , H05G2/00
CPC分类号： G03F7/70916 , G03F7/70033 , G03F7/70175 , G03F7/70883 , G03F7/70908 , G03F7/70983 , H05G2/003
摘要： A lithographic apparatus includes a radiation source configured to produce extreme ultraviolet radiation, the radiation source including a chamber in which a plasma is generated; a collector mirror configured to reflect radiation emitted by the plasma; and a debris mitigation system including a gas supply system configured to supply a first gas flow toward the plasma, the first gas flow being selected to thermalize debris generated by the plasma, and a plurality of gas manifolds arranged at a location proximate the collector mirror, the gas manifolds configured to supply a second gas flow in the chamber, the second gas flow being directed toward the plasma to prevent thermalized debris from depositing on the collector mirror.
摘要翻译：光刻设备包括被配置为产生极紫外辐射的辐射源，所述辐射源包括其中产生等离子体的室; 收集器反射镜，被配置为反射等离子体发射的辐射; 以及包括气体供应系统的碎片减缓系统，所述气体供应系统被配置为朝向所述等离子体供应第一气流，所述第一气流被选择为热等离子体产生的碎屑，以及布置在靠近所述收集器反射镜的位置处的多个气体歧管，所述气体歧管被构造成在所述室中提供第二气流，所述第二气流指向所述等离子体以防止热碎屑沉积在所述收集器反射镜上。

93. 发明授权

US08901521B2 Module and method for producing extreme ultraviolet radiation 有权
标题翻译：用于产生极紫外线辐射的模块和方法
公开(公告)号：US08901521B2
公开(公告)日：2014-12-02
申请号：US12197693
申请日：2008-08-25
申请人： Tjarko Adriaan Rudolf Van Empel , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski
发明人： Tjarko Adriaan Rudolf Van Empel , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski
IPC分类号： G01J3/10 , G03F7/20 , H05G2/00
CPC分类号： H05G2/008 , G03F7/70175 , G03F7/70891 , G03F7/70916 , G03F7/70983 , H05G2/003 , H05G2/006 , H05K7/2039
摘要： A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.
摘要翻译：用于产生极紫外线辐射的模块包括被配置为将点火材料的液滴供应到预定的目标点火位置的电源和布置成聚焦在预定的目标点火位置上的激光器，并且通过击打位于在预定的目标点火位置，以便将液滴变成极紫外线产生等离子体。此外，模块包括收集器反射镜，其具有构造和布置成反射辐射的镜面，以便将辐射聚焦在焦点上。流体供应器被构造和布置成在相对于镜面横向的方向上形成从镜面流出的气流，以便减轻由等离子体产生的颗粒碎片。

94. 发明授权

US08345223B2 Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby 有权
标题翻译：光学元件，包括这种光学元件的光刻设备，器件制造方法以及由此制造的器件
公开(公告)号：US08345223B2
公开(公告)日：2013-01-01
申请号：US12919741
申请日：2009-02-24
申请人： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Maarten Marinus Johannes Wilhelmus Van Herpen , Andrei Mikhailovich Yakunin
发明人： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Maarten Marinus Johannes Wilhelmus Van Herpen , Andrei Mikhailovich Yakunin
IPC分类号： G03B27/54 , G03B27/42 , G02B27/14
CPC分类号： G02B5/208 , B82Y10/00 , G02B5/0891 , G02B5/22 , G02B5/26 , G03F7/70191 , G03F7/702 , G03F7/70575 , G03F7/70958 , G21K1/067 , G21K2201/061 , G21K2201/064 , G21K2201/065 , G21K2201/067
摘要： An optical element includes a first layer that includes a first material, and is configured to be substantially reflective for radiation of a first wavelength and substantially transparent for radiation of a second wavelength. The optical element includes a second layer that includes a second material, and is configured to be substantially absorptive or transparent for the radiation of the second wavelength. The optical element includes a third layer that includes a third material between the first layer and the second layer, and is substantially transparent for the radiation of the second wavelength and configured to reduce reflection of the radiation of the second wavelength from a top surface of the second layer facing the first layer. The first layer is located upstream in the optical path of incoming radiation with respect to the second layer in order to improve spectral purity of the radiation of the first wavelength.
摘要翻译：光学元件包括第一层，其包括第一材料，并且被配置为对于第一波长的辐射基本上是反射的，并且对于第二波长的辐射基本上是透明的。光学元件包括第二层，其包括第二材料，并且被配置为对于第二波长的辐射是基本吸收或透明的。光学元件包括第三层，其包括在第一层和第二层之间的第三材料，并且对于第二波长的辐射基本上是透明的，并且被配置为减少第二波长的辐射的反射从第二层的顶表面第二层面向第一层。为了提高第一波长的辐射的光谱纯度，第一层相对于第二层位于入射辐射的光路中的上游。

95. 发明授权

US08269179B2 Illumination system and filter system 失效
标题翻译：照明系统和过滤系统
公开(公告)号：US08269179B2
公开(公告)日：2012-09-18
申请号：US12318291
申请日：2008-12-24
申请人： Arnoud Cornelis Wassink , Levinus Pieter Bakker , Johannes Hubertus Josephina Moors , Frank Jeroen Pieter Schuurmans
发明人： Arnoud Cornelis Wassink , Levinus Pieter Bakker , Johannes Hubertus Josephina Moors , Frank Jeroen Pieter Schuurmans
IPC分类号： G03B27/52 , G03B27/72 , G01J3/10
CPC分类号： G03F7/70916
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统，配置成将辐射束投影到衬底上的投影系统，以及用于将碎屑颗粒从辐射束中过滤的过滤系统。过滤器系统包括用于捕集碎片颗粒的多个箔，用于保持多个箔的支撑件，以及具有布置成要冷却的表面的冷却系统。冷却系统和支撑件相对于彼此定位，使得在冷却系统的表面和支撑件之间形成间隙。冷却系统还被布置成将气体注入到间隙中。

96. 发明授权

US08094288B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08094288B2
公开(公告)日：2012-01-10
申请号：US10842637
申请日：2004-05-11
申请人： Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors
发明人： Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors
IPC分类号： G03B27/52 , G03B27/54
CPC分类号： G03F7/70191 , G03F7/70575
摘要： A lithographic apparatus includes an illumination system configured to transmit a beam of radiation, the beam of radiation comprising desired radiation having a predetermined wavelength or a predetermined wavelength range, and undesired radiation having another wavelength or another wavelength range; a support structure configured to support a patterning structure, the patterning structure being configured to impart the beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate; wherein at least part of the lithographic apparatus, in use, includes a gas substantially transmissive for at least part of the desired radiation and substantially less transmissive for at least part of the undesired radiation.
摘要翻译：光刻设备包括被配置为透射辐射束的照明系统，所述辐射束包括具有预定波长或预定波长范围的期望辐射，以及具有另一波长或另一波长范围的不需要的辐射; 支撑结构，其构造成支撑图案形成结构，所述图案化结构被配置为在其横截面中赋予所述辐射束的图案; 被配置为保持基板的基板台; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 其中在使用中至少部分光刻设备包括至少部分所需辐射基本上透射的气体，对于至少部分不需要的辐射基本上较少透射。

97. 发明申请

US20110126406A1 Lithographic Apparatus and Method of Manufacturing an Electrostatic Clamp for a Lithographic Apparatus 有权
标题翻译：平版印刷设备和制造用于平版印刷设备的静电夹具的方法
公开(公告)号：US20110126406A1
公开(公告)日：2011-06-02
申请号：US13020399
申请日：2011-02-03
申请人： Hubert Adriaan VAN MIERLO , Erik Leonardus Ham , Hendricus Johannes Maria Meijer , Hendrik Antony Johannes Neerhof , Joost Jeroen Ottens , Johannes Adrianus Petrus Leijtens , Marco Le Kluse , Jan Hopman , Johannes Hubertus Josephina Moors
发明人： Hubert Adriaan VAN MIERLO , Erik Leonardus Ham , Hendricus Johannes Maria Meijer , Hendrik Antony Johannes Neerhof , Joost Jeroen Ottens , Johannes Adrianus Petrus Leijtens , Marco Le Kluse , Jan Hopman , Johannes Hubertus Josephina Moors
IPC分类号： H01B13/00
CPC分类号： H01L21/6831 , G03F7/70708 , Y10T29/49117
摘要： The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.
摘要翻译：本发明涉及一种制造静电夹具的方法，所述静电夹具被配置为将制品静电地夹持在光刻设备中的制品支撑件上。该方法包括提供第一层材料，蚀刻第一层材料中的凹槽，以及将电极设置在第一层材料的凹槽中。

98. 发明申请

US20110090495A1 LITHOGRAPHIC APPARATUS AND CONTAMINATION DETECTION METHOD 有权
标题翻译：光刻设备和污染检测方法
公开(公告)号：US20110090495A1
公开(公告)日：2011-04-21
申请号：US12935786
申请日：2009-03-27
申请人： Anastasius Jacobus Anicetus Bruinsma , Johannes Hubertus Josephina Moors , Lucas Henricus Johannes Stevens , Abraham Veefkind , Peter Gerhardus Wilhelmu Bussink , Egbert Anne Martijn Brouwer
发明人： Anastasius Jacobus Anicetus Bruinsma , Johannes Hubertus Josephina Moors , Lucas Henricus Johannes Stevens , Abraham Veefkind , Peter Gerhardus Wilhelmu Bussink , Egbert Anne Martijn Brouwer
IPC分类号： G01N21/17
CPC分类号： G03F7/70916 , G01N21/94 , G03F7/70525 , G03F7/70566 , G03F7/70591 , G03F7/70808 , G03F7/7085 , G03F7/70941
摘要： A lithographic apparatus includes a vessel that encloses a component with a test surface to be probed for contamination control; and an optical probe configured to transmit and receive an optical probing beam. The vessel includes a first optical port configured to transfer the optical probing beam towards the test surface, and a second optical port configured to receive a reflected optical probing beam. The optical probe includes a light source configured to provide the optical probing beam, a polarization conditioner configured to provide a predefined polarization state to the probing beam, and a spectral analyzer. The polarization conditioner is preset to provide a minimal transmission for a minimal transmission wavelength, and the spectral analyzer is arranged to detect a wavelength shift of the minimal transmission wavelength in response to a polarization change due to the presence of contamination.
摘要翻译：光刻设备包括：容器，其包围具有待探测以用于污染控制的测试表面的部件; 以及被配置为发送和接收光学探测光束的光学探针。该容器包括被配置为将光学探测光束传送到测试表面的第一光学端口和被配置为接收反射光学探测光束的第二光学端口。光探头包括被配置为提供光学探测光束的光源，被配置为向探测光束提供预定极化状态的偏振光学调节器和光谱分析器。偏振调节器被预设为为最小传输波长提供最小的传输，并且频谱分析仪布置成响应于由于污染的存在而导致的偏振变化来检测最小传输波长的波长偏移。

99. 发明授权

US07928412B2 Lithographic apparatus, and device manufacturing method 失效
标题翻译：光刻设备和器件制造方法
公开(公告)号：US07928412B2
公开(公告)日：2011-04-19
申请号：US12405831
申请日：2009-03-17
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Johannes Peterus Henricus De Kuster , Johannes Hubertus Josephina Moors , Lucas Henricus Johannes Stevens , Bastiaan Theodoor Wolschrijn , Yurii Victorovitch Sidelnikov , Marc Hubertus Lorenz Van der Velden , Wouter Anthon Soer , Thomas Stein , Kurt Gielissen
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Johannes Peterus Henricus De Kuster , Johannes Hubertus Josephina Moors , Lucas Henricus Johannes Stevens , Bastiaan Theodoor Wolschrijn , Yurii Victorovitch Sidelnikov , Marc Hubertus Lorenz Van der Velden , Wouter Anthon Soer , Thomas Stein , Kurt Gielissen
IPC分类号： G21K5/00
CPC分类号： G03F7/70925 , G03F7/7085 , G03F7/70908 , G03F7/70916
摘要： A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
摘要翻译：公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。该装置包括第一辐射剂量检测器和第二辐射剂量检测器，每个检测器包括被配置为接收辐射通量并由于接收到辐射通量而发射二次电子的二次电子发射表面，位于上游的第一辐射剂量检测器相对于相对于辐射传播方向观察的第二辐射剂量检测器，以及连接到每个检测器的仪表，以检测由相应的电子发射表面产生的二次电子发射产生的电流或电压。

100. 发明申请

US20110013157A1 LITHOGRAPHIC APPARATUS COMPRISING A MAGNET, METHOD FOR THE PROTECTION OF A MAGNET IN A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：包含磁铁的平面设备，用于保护磁铁的方法和设备制造方法
公开(公告)号：US20110013157A1
公开(公告)日：2011-01-20
申请号：US12735823
申请日：2009-02-19
申请人： Johannes Hubertus Josephina Moors , Norbertus Benedictus Koster , Erik Roelof Loopstra , Martin Frans Pierre Smeets , Antonius Theodorus Wilhelmus Kempen
发明人： Johannes Hubertus Josephina Moors , Norbertus Benedictus Koster , Erik Roelof Loopstra , Martin Frans Pierre Smeets , Antonius Theodorus Wilhelmus Kempen
IPC分类号： G03B27/32 , H01F7/02
CPC分类号： G03F7/70933 , G03F7/70808 , G03F7/70858 , G03F7/70916
摘要： A lithographic apparatus includes a magnet being contained in a protective enclosure, the protective enclosure being arranged to protect the magnet from contact with a H2-containing or H-atom containing gas. The enclosure may further contain a hydrogen getter, such as a magnet-surface modifying gas, or a non-hydrogen containing gas. A non-hydrogen containing gas flow may be provided or a non-hydrogen getter gas flow may be provided through at least part of the protective enclosure.
摘要翻译：光刻设备包括容纳在保护壳体中的磁体，保护壳体被布置成保护磁体免受含H2或含H原子气体的接触。外壳还可以包含氢气吸气剂，例如磁体表面改性气体或非含氢气体。可以提供不含氢的气流，或者可以通过保护外壳的至少一部分提供非氢吸气剂气流。

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