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91. 发明授权

US07209213B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07209213B2
公开(公告)日：2007-04-24
申请号：US10959403
申请日：2004-10-07
申请人： Christian Wagner
发明人： Christian Wagner
IPC分类号： G03B27/42
CPC分类号： G03F7/70258 , G03F7/70341
摘要： A final element of a projection system of an immersion lithographic apparatus is configured for a liquid having a refractive index greater than a refractive index of the final element. In an embodiment, the final element comprises a convex meniscus shaped lens. Such a final element enables the effective numerical aperture of the lithographic apparatus to be increased and reduce total internal reflection of the projected beam as it passes through the final element to the liquid.
摘要翻译：浸没式光刻设备的投影系统的最终元件被配置为具有大于最终元件的折射率的折射率的液体。在一个实施例中，最终元件包括凸起的弯月面形透镜。这样的最终元件使得能够增加光刻设备的有效数值孔径，并且当投影光束通过最终元件到液体时，能够减少投射光束的全内反射。

92. 发明申请

US20070071303A1 Optical system and method for improving imaging properties thereof 审中-公开
标题翻译：用于改善其成像特性的光学系统和方法
公开(公告)号：US20070071303A1
公开(公告)日：2007-03-29
申请号：US11238841
申请日：2005-09-29
申请人： Thomas Stammler , Christian Wagner , Gerd Reisinger
发明人： Thomas Stammler , Christian Wagner , Gerd Reisinger
IPC分类号： G06K9/00
CPC分类号： G03F7/70258 , G03F7/705 , G03F7/706
摘要： An optical system has at least two optical elements whose spatial relation with respect to each other can be changed. At least one of the optical elements comprises a plurality of optical components. The optical system comprises first measuring means for individually measuring an image defect of each optical component, and first computing means for computing first target positions for the plurality of optical components such that an overall image defect of the at least one of the optical elements is below a predetermined threshold value. Second measuring means are provided for measuring an overall image defect of the optical system, and second computing means represent the measured overall image defect as a linear combination of base functions of an orthogonal function set. The second computing means calculate second target position for the at least two optical elements so as to reduce the overall image defect.
摘要翻译：光学系统具有至少两个可相对于彼此的空间关系的光学元件。至少一个光学元件包括多个光学部件。光学系统包括用于单独测量每个光学部件的图像缺陷的第一测量装置和用于计算多个光学部件的第一目标位置的第一计算装置，使得至少一个光学元件的整体图像缺陷低于预定的阈值。提供第二测量装置用于测量光学系统的整体图像缺陷，第二计算装置将所测量的整体图像缺陷表示为正交函数集的基本函数的线性组合。第二计算装置计算用于至少两个光学元件的第二目标位置，以便减小整体图像缺陷。

93. 发明授权

US07180667B2 Objective with fluoride crystal lenses 有权
标题翻译：目标是氟化物晶体镜片
公开(公告)号：US07180667B2
公开(公告)日：2007-02-20
申请号：US10817527
申请日：2004-04-01
申请人： Daniel Krähmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christof Zaczek
发明人： Daniel Krähmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christof Zaczek
IPC分类号： G02B5/30
CPC分类号： G03F7/70966 , G02B1/02 , G02B1/08 , G02B5/3083 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , Y10S359/90
摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.
摘要翻译：微光刻投影系统的目的在于至少有一个氟化物晶体透镜。如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个其他。通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。

94. 发明申请

US20060281080A1 Novel lipases and uses thereof 失效
标题翻译：新型脂肪酶及其用途
公开(公告)号：US20060281080A1
公开(公告)日：2006-12-14
申请号：US10524983
申请日：2003-08-15
申请人： Richard Albang , Andreas Fritz , Oliver Heinrich , Hilmar Ilgenfritz , Dieter Maier , Christian Wagner , Ulrike Folkers , Beatrix Gerhard , Fabio Spreafico , Lex De Boer , Roelf Meima
发明人： Richard Albang , Andreas Fritz , Oliver Heinrich , Hilmar Ilgenfritz , Dieter Maier , Christian Wagner , Ulrike Folkers , Beatrix Gerhard , Fabio Spreafico , Lex De Boer , Roelf Meima
IPC分类号： C12Q1/68 , A21D8/02 , C07H21/04 , C12P21/06 , C12N9/20 , C12N1/16 , C12N15/74
CPC分类号： C12N9/20
摘要： The invention relates to a newly identified polynucleotide sequence comprising a gene that encodes a novel lipolytic enzyme from Aspergillus niger. The invention features the full length nucleotide sequence of the novel gene, the cDNA sequence comprising the full length coding sequence of the novel lipolytic enzyme as well as the amino acid sequence of the full-length functional protein and functional equivalents thereof. The invention also relates to methods of using these enzymes in industrial processes and methods of diagnosing fungal infections. Also included in the invention are cells transformed with a polynucleotide according to the invention and cells wherein a lipolytic enzyme according to the invention is genetically modified to enhance its activity and/or level of expression.
摘要翻译：本发明涉及新鉴定的多核苷酸序列，其包含编码来自黑曲霉的新型脂解酶的基因。本发明的特征在于新基因的全长核苷酸序列，cDNA序列包含新型脂肪分解酶的全长编码序列以及全长功能蛋白的氨基酸序列及其功能等同物。本发明还涉及在工业过程中使用这些酶的方法和诊断真菌感染的方法。本发明还包括用根据本发明的多核苷酸转化的细胞和其中根据本发明的脂肪分解酶被遗传修饰以增强其活性和/或表达水平的细胞。

95. 发明授权

US07113260B2 Projection exposure system for microlithography and method for generating microlithographic images 有权
标题翻译：用于微光刻的投影曝光系统和用于产生微光刻图像的方法
公开(公告)号：US07113260B2
公开(公告)日：2006-09-26
申请号：US11248684
申请日：2005-10-11
申请人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
发明人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
IPC分类号： G03B27/54 , G03B27/42 , G03B27/72
CPC分类号： G02B17/0892 , G02B17/08 , G02B27/28 , G03B27/72 , G03F7/70125 , G03F7/70225 , G03F7/70566
摘要： A method and an arrangement for microlithographic projection exposure at high aperture achieve a contrast increase by the polarization of the light perpendicular to the plane of incidence on the resist. Arrangements are provided which influence the tangential polarization or the linear polarization adapted to the dipole illumination in the illuminating system and in the reduction objective.
摘要翻译：用于在高孔径处的微光刻投影曝光的方法和装置通过垂直于抗蚀剂入射平面的光的偏振来实现对比度增加。提供了影响在照明系统和还原目标中适应于偶极子照明的切向偏振或线偏振的布置。

96. 发明授权

US07068349B2 Method of and preventing focal plane anomalies in the focal plane of a projection system 有权
标题翻译：投影系统焦平面焦平面异常的方法和防止
公开(公告)号：US07068349B2
公开(公告)日：2006-06-27
申请号：US10830406
申请日：2004-04-23
申请人： Ingrid Minnaert-Janssen , Johannes Jacobus Matheus Baselmans , Frits Jurgen Van Hout , Peter Van Oorschot , Christian Wagner , Adriaan Roelof Van Zwol , Roderik Willem Van Es , Petrus Augustinus Marie Van Der Wielen , Hubrecht Lodewijk Van Ginneken
发明人： Ingrid Minnaert-Janssen , Johannes Jacobus Matheus Baselmans , Frits Jurgen Van Hout , Peter Van Oorschot , Christian Wagner , Adriaan Roelof Van Zwol , Roderik Willem Van Es , Petrus Augustinus Marie Van Der Wielen , Hubrecht Lodewijk Van Ginneken
IPC分类号： G03B27/68 , G03B27/52
CPC分类号： G03B27/68 , G03F7/706
摘要： To reduce and prevent local field anomalies created localized thinning of the coating of optical elements in the apparatus. The projection system is flood exposed to an intense beam of radiation for a substantial period of time. As the rate of thinning of the coating decreases with time, a uniform coating results.
摘要翻译：为了减少和防止局部场异常造成设备中光学元件涂层的局部变薄。投影系统在相当长的一段时间内暴露于强烈的辐射束。随着涂层变薄的速度随时间的推移而降低，可以得到均匀的涂层。

97. 发明授权

US06930758B2 Projection exposure system for microlithography and method for generating microlithographic images 失效
公开(公告)号：US06930758B2
公开(公告)日：2005-08-16
申请号：US09797961
申请日：2001-03-05
申请人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
发明人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
IPC分类号： G02B19/00 , G02B5/30 , G02B17/08 , G02B27/28 , G03F7/20 , G03F9/00 , H01L21/027 , G03B27/54 , G03B27/42
CPC分类号： G02B17/0892 , G02B17/08 , G02B27/28 , G03B27/72 , G03F7/70125 , G03F7/70225 , G03F7/70566
摘要： A method and an arrangement for microlithographic projection exposure at high aperture achieve a contrast increase by the polarization of the light perpendicular to the plane of incidence on the resist. Arrangements are provided which influence the tangential polarization or the linear polarization adapted to the dipole illumination in the illuminating system and in the reduction objective.

98. 发明申请

US20050064403A1 Novel Genes Encoding Novel Proteolytic Enzymes 失效
标题翻译：编码新型蛋白水解酶的新基因
公开(公告)号：US20050064403A1
公开(公告)日：2005-03-24
申请号：US10469204
申请日：2002-02-22
申请人： Luppo Edens , Dijk Alard , Philipp Krubasik , Kaj Albermann , Stock Alexander , Erik Kimpel , Sabine Klugbauer , Christian Wagner , Andreas Fritz , Gustedt Wilk , Oliver Heinrich , Dieter Maier , Fabio Spreafico , Ulrike Folkers , Sylvia Hopper , Wolfram Kemmner , Pamela Tan , Josephine Stiebler , Richard Albang
发明人： Luppo Edens , Dijk Alard , Philipp Krubasik , Kaj Albermann , Stock Alexander , Erik Kimpel , Sabine Klugbauer , Christian Wagner , Andreas Fritz , Gustedt Wilk , Oliver Heinrich , Dieter Maier , Fabio Spreafico , Ulrike Folkers , Sylvia Hopper , Wolfram Kemmner , Pamela Tan , Josephine Stiebler , Richard Albang
IPC分类号： A23J3/16 , A23J3/34 , A23L1/29 , A23L1/305 , A23L2/02 , A23L2/84 , C07K16/40 , C12H1/00 , C12N9/62 , C12N15/57 , C12N15/63 , C12Q1/37 , G01N33/569 , G01N33/573 , C12Q1/68 , C07H21/04 , C12N9/64
CPC分类号： A23J3/16 , A23J3/343 , A23J3/344 , A23J3/346 , A23L2/02 , A23L2/84 , A23L33/18 , A23L33/40 , C07K2319/00 , C12H1/003 , C12N9/62 , C12Q1/37 , G01N33/56961 , G01N33/573 , G01N2333/38
摘要： The invention relates to newly identified gene sequences that encode novel proteases obtainable from Aspergillus niger. The invention features the full length gene sequence of the novel genes, their cDNA sequences as well as the full-length functional protein and fragments thereof. The invention also relates to methods of using these enzymes in industrial processes and methods of diagnosing fungal infections. Also included in the invention are cells transformed with DNA according to the invention and cells wherein a protease according to the invention is genetically modified to enhance or reduce its activity and/or level of expression.
摘要翻译：本发明涉及新鉴定的编码从黑曲霉获得的新型蛋白酶的基因序列。本发明的特征在于新基因的全长基因序列，其cDNA序列以及全长功能蛋白及其片段。本发明还涉及在工业过程中使用这些酶的方法和诊断真菌感染的方法。本发明还包括用根据本发明的DNA转化的细胞和其中根据本发明的蛋白酶被遗传修饰以增强或降低其活性和/或表达水平的细胞。

99. 发明授权

US06781668B2 Optical arrangement 失效
标题翻译：光学布置
公开(公告)号：US06781668B2
公开(公告)日：2004-08-24
申请号：US09752282
申请日：2000-12-29
申请人： Karl-Heinz Schuster , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
发明人： Karl-Heinz Schuster , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
IPC分类号： G03B2752
CPC分类号： G03F7/70058 , G03F7/70216 , G03F7/70891
摘要： An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. An optical element (5) is therefore acted upon in a rotationally non-symmetrical manner by the radiation of a light source. To temper the optical element (5), a supply apparatus (11, 19 to 23) for gas is used. The latter having at least one supply line (21) and at least one gas directing device (11). The latter is aligned relative to the optical element (5) and controllable in such a way that the gas is directed by the gas directing device (11) towards the optical element (5). The volumetric flow of the exiting gas therefore has a magnitude and spatial distribution (17), which are adapted to the intensity distribution (6) of the radiation. By virtue of such tempering, rotationally non-symmetrical light-induced image defects in the optical element (5) are avoided or compensated.
摘要翻译：光学布置，特别是微光刻投影印刷装置，特别地具有槽形图像场或旋转非对称照明。因此，光学元件（5）通过光源的辐射以旋转非对称的方式作用。为了回火光学元件（5），使用用于气体的供给装置（11,19〜23）。后者具有至少一个供应管线（21）和至少一个气体引导装置（11）。后者相对于光学元件（5）对准并且可以以气体被气体引导装置（11）引向光学元件（5）的方式控制。因此，出口气体的体积流量具有适于辐射的强度分布（6）的大小和空间分布（17）。由于这种回火，避免或补偿光学元件（5）中的旋转非对称的光诱导图像缺陷。

100. 发明授权

US06504597B2 Optical arrangement 有权
标题翻译：光学布置
公开(公告)号：US06504597B2
公开(公告)日：2003-01-07
申请号：US09755423
申请日：2001-01-05
申请人： Karl-Heinz Schuster , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
发明人： Karl-Heinz Schuster , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
IPC分类号： G03B2754
CPC分类号： G03F7/70891 , G02B7/028 , G03F7/70825 , G03F7/70983
摘要： An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. An optical element (1) is therefore acted upon in a rotationally non-symmetrical manner by the radiation of the light source. A compensating light supply device (11, 14 to 19) is optically coupled via the peripheral surface (13) of the optical element (1) to the latter. It supplies compensating light (16, 12) to the optical element (1) in such a way that the temperature distribution in the optical element (1), which arises as a result of cumulative heating of the optical element (1) with projection light (2) and compensating light (12), is at least partially homogenized. In said manner image defects induced by the projection light are corrected.
摘要翻译：光学布置，特别是微光刻投影印刷装置，特别地具有槽形图像场或旋转非对称照明。因此，光学元件（1）通过光源的辐射以旋转非对称的方式作用。补偿光供给装置（11,14〜19）经由光学元件（1）的周面（13）光耦合到光学元件（1）。它以这样的方式向光学元件（1）供应补偿光（16,12），使得由于用投影光累积加热光学元件（1）而导致的光学元件（1）中的温度分布（2）和补偿光（12）至少部分均匀化。以所述方式校正由投影光引起的图像缺陷。

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