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91. 发明授权

US08550734B2 Transportation guide mechanism and recording device having the same 有权
标题翻译：运输导向机构和具有相同的记录装置
公开(公告)号：US08550734B2
公开(公告)日：2013-10-08
申请号：US12550308
申请日：2009-08-28
申请人： Ichiro Nakayama
发明人： Ichiro Nakayama
IPC分类号： B41J13/00
CPC分类号： B65H35/04 , B65H29/52 , B65H2404/611 , B65H2408/13 , B65H2511/20 , B65H2601/11 , B65H2701/1936 , B65H2220/01 , B65H2220/11 , B65H2220/08
摘要： A transportation guide mechanism and a recording device having the transportation guide mechanism can smoothly and stably discharge sheet media without impairing the ease of maintenance. The transportation guide mechanism 61 is disposed between the paper exit 4 of a paper feed mechanism 3 that can open and close to the printing unit 2 and a ticket transportation path 12 through which recording paper P discharged from the paper feed mechanism 3 passes, and guides the recording paper P discharged from the paper exit 4 to the ticket transportation path 12. The transportation guide mechanism 61 has a bottom guide panel 63 that renders the guide path 64 through which the recording paper P can pass. The bottom guide panel 63 is supported so that it is pushed by the paper feed mechanism 3 opening and closing to the printing unit 2 and can be displaced to a position outside the path of paper feed mechanism 3 movement.
摘要翻译：具有输送引导机构的输送引导机构和记录装置能够平滑且稳定地排出纸介质而不损害维护的便利性。输送引导机构61设置在可以打开和关闭打印单元2的供纸机构3的出纸口4和从进给机构3排出的记录纸P通过的票传送路径12之间，并且引导从纸张出口4排出到记录纸传送路径12的记录纸P.输送引导机构61具有底部引导面板63，该引导面板63使得记录纸P能通过的引导路径64。底部引导面板63被支撑，使得其被打印机构3打开和关闭到打印单元2被推动，并且可以移动到进纸机构3的运动路径外侧的位置。

92. 发明授权

US07205250B2 Plasma processing method and apparatus 失效
标题翻译：等离子体处理方法和装置
公开(公告)号：US07205250B2
公开(公告)日：2007-04-17
申请号：US10801551
申请日：2004-03-17
申请人： Yoshihiro Yanagi , Ichiro Nakayama
发明人： Yoshihiro Yanagi , Ichiro Nakayama
IPC分类号： H01L21/26 , H01L21/42
CPC分类号： H01L21/306 , H01L21/3065 , H01L21/31138 , H01L21/32136
摘要： A Plasma processing method and apparatus exhibit excellent characteristics of reducing the amount of electric charge on a plasma-processed processing-object substrate and of preventing plasma damage and dielectric breakdown. Before the processing-object substrate is plasma-processed, top-and-bottom surfaces of the processing-object substrate are simultaneously subjected to a weak plasma in gas composed mainly of inert gas, which makes it possible to neutralize the charges on the processing-object substrate. The inert gas is any one of Ar, He, N2, H2, and vaporized H2O gas or a mixed gas of these gases.
摘要翻译：等离子体处理方法和装置显示出降低等离子体处理的处理对象基板上的电荷量并防止等离子体损伤和介质击穿的优异特性。在处理对象基板被等离子体处理之前，处理对象基板的上下表面同时经受主要由惰性气体组成的气体中的弱等离子体，这使得可以中和加工对象基板上的电荷，物体衬底。惰性气体是Ar，He，N 2 H 2，H 2 2和气化的H 2 O 2气体中的任何一种，或这些气体的混合气体气体。

93. 发明申请

US20050208502A1 Method for detection of base sequence of interest 有权
标题翻译：感兴趣的碱基序列的检测方法
公开(公告)号：US20050208502A1
公开(公告)日：2005-09-22
申请号：US10802055
申请日：2004-03-17
申请人： Hisanori Nasu , Hiroaki Ono , Akito Mugita , Ichiro Nakayama , Takanori Kobayashi , Tetsuji Masaoka , Satoru Kuhara , Yoshizumi Ishino
发明人： Hisanori Nasu , Hiroaki Ono , Akito Mugita , Ichiro Nakayama , Takanori Kobayashi , Tetsuji Masaoka , Satoru Kuhara , Yoshizumi Ishino
IPC分类号： C12Q1/68
CPC分类号： C12Q1/6837 , C12Q2537/125
摘要： There is provided a method for the detection of a base sequence of interest when amount of a sample DNA or RNA is little and plural base sequences of interest to be detected are present in the sample DNA or RNA. The Problem is solved by a method for the detection of an base sequence of interest in a sample DNA or RNA comprising the steps of (1) contacting a sample DNA or RNA to a probe DNAs or RNAs in an aqueous solution to form a hybridization complex; (2) isolating the hybridization complex; (3) dissociating the complex to recover the probe DNAs or RNAs; and (4) identifying the said probe DNAs or RNAs to detect an base sequence of interest in the sample DNA or RNA.
摘要翻译：提供了当样品DNA或RNA的量少的情况下检测到目标碱基序列的方法，并且待检测的多个碱基序列存在于样品DNA或RNA中。该问题通过检测样品DNA或RNA中感兴趣的碱基序列的方法来解决，所述方法包括以下步骤：（1）使样品DNA或RNA与水溶液中的探针DNA或RNA接触以形成杂交复合物 ; （2）分离杂交复合物; （3）解离复合物以回收探针DNA或RNA; 和（4）鉴定所述探针DNA或RNA以检测样品DNA或RNA中的目标碱基序列。

94. 发明申请

US20050037629A1 Plasma processing method and apparatus 失效
标题翻译：等离子体处理方法和装置
公开(公告)号：US20050037629A1
公开(公告)日：2005-02-17
申请号：US10801551
申请日：2004-03-17
申请人： Yoshihiro Yanagi , Ichiro Nakayama
发明人： Yoshihiro Yanagi , Ichiro Nakayama
IPC分类号： H01L21/306 , H01L21/3065 , H01L21/311 , H01L21/3213 , H01L21/469
CPC分类号： H01L21/306 , H01L21/3065 , H01L21/31138 , H01L21/32136
摘要： Plasma processing method and apparatus exhibit excellent characteristics of reducing the amount of charges electrified on a plasma-processed processing-object substrate and preventing plasma damage and dielectric breakdown. Before the processing-object substrate is plasma-processed, top-and-bottom surfaces of the processing-object substrate are simultaneously subjected to a weak plasma in gas composed mainly of inert gas, which makes it possible to neutralize the charges on the processing-object substrate. The inert gas is any one of Ar, He, N2, H2, and vaporized H2O gas or a mixed gas of these gases.
摘要翻译：等离子体处理方法和装置显示了降低在等离子体处理的处理对象基板上带电的电荷量并防止等离子体损伤和介质击穿的优异特性。在处理对象基板被等离子体处理之前，处理对象基板的上下表面同时经受主要由惰性气体组成的气体中的弱等离子体，这使得可以中和加工对象基板上的电荷，物体衬底。惰性气体是Ar，He，N 2，H 2和蒸发的H 2 O气体中的任何一种或这些气体的混合气体。

95. 发明授权

US5502953A Method for transporting/storing a wafer in a wafer carrier 失效
标题翻译：在晶片载体中输送/储存晶片的方法
公开(公告)号：US5502953A
公开(公告)日：1996-04-02
申请号：US281676
申请日：1994-07-28
申请人： Ichiro Nakayama , Masuo Tanno , Kazuhiro Mori
发明人： Ichiro Nakayama , Masuo Tanno , Kazuhiro Mori
IPC分类号： B65D83/00 , B65D85/00 , B65D85/86 , B65G1/00 , B65G1/02 , B65G49/07 , H01L21/673 , H01L21/677 , B65B23/00
CPC分类号： H01L21/67353 , H01L21/67383 , H01L21/67706 , H01L21/6773
摘要： A wafer transporting/storing method includes steps of accommodating one wafer in each flat casing, and transporting/storing the casing. A wafer carrier includes a flat casing, one side surface of which is opened as a wafer entrance/exit, a cover for closing the wafer entrance/exit, and a cover urging device, disposed between the casing and the cover, for urging the cover in a closed direction. The flat casing has a space for accommodating one wafer. In the carrier, at both sides of intermediate portions of the upper and lower surfaces of the space are inclined in the directions from each intermediate portion toward both ends of each of the upper and lower surfaces so that an interval between the upper and lower surfaces of the space becomes narrower toward both ends of the space.
摘要翻译：晶片输送/储存方法包括在每个扁平壳体中容纳一个晶片，以及运送/储存壳体的步骤。晶片载体包括：平坦壳体，其一个侧表面作为晶片入口/出口打开，用于封闭晶片入口/出口的盖，以及设置在壳体和盖之间的盖推动装置，用于推动盖在封闭的方向。扁平壳体具有用于容纳一个晶片的空间。在载体中，在空间的上表面和下表面的中间部分的两侧在从每个中间部分到上表面和下表面中的每一个的两端的方向上倾斜，使得上下表面之间的间隔空间朝向空间的两端变窄。

96. 发明授权

US5436424A Plasma generating method and apparatus for generating rotating electrons in the plasma 失效
标题翻译：用于在等离子体中产生旋转电子的等离子体产生方法和装置
公开(公告)号：US5436424A
公开(公告)日：1995-07-25
申请号：US80824
申请日：1993-06-24
申请人： Ichiro Nakayama , Noboru Nomura , Tokuhiko Tamaki , Mitsuhiro Okuni , Masafumi Kubota
发明人： Ichiro Nakayama , Noboru Nomura , Tokuhiko Tamaki , Mitsuhiro Okuni , Masafumi Kubota
IPC分类号： H01L21/302 , H01J37/32 , H01L21/3065 , H05H1/46 , B23K10/00
CPC分类号： H01J37/32091 , H01J37/32165
摘要： A plasma generating apparatus includes a vacuum chamber having an insulated inner surface, more than two electrodes arranged on the insulated inner surface of the vacuum chamber, a high frequency applying device for applying high frequencies having different phases in order of positions of the electrodes, and a holder on which an object to be processed is placed. In the apparatus, a magnetic field is produced under plural alternating electric fields, so that electrons in a plasma generating portion are rotated to generate high density plasma under a high vacuum when the high frequencies are applied to the electrodes to generate the plasma and a specified process such as etching, CVD, or doping is carried on the object by reaction products generated at the portion.
摘要翻译：一种等离子体发生装置，包括具有绝缘内表面的真空室，布置在真空室绝缘内表面上的多于两个电极的高频施加装置，用于按照电极位置的顺序施加具有不同相位的高频; 放置待处理物体的支架。在该装置中，在多个交变电场下产生磁场，使得当将高频施加到电极以产生等离子体和指定的等离子体时，等离子体产生部分中的电子在高真空下旋转以产生高密度等离子体通过在该部分产生的反应产物在物体上进行诸如蚀刻，CVD或掺杂的工艺。

97. 发明授权

US5424905A Plasma generating method and apparatus 失效
标题翻译：等离子体产生方法和装置
公开(公告)号：US5424905A
公开(公告)日：1995-06-13
申请号：US40297
申请日：1993-03-30
申请人： Noboru Nomura , Kenji Harafuji , Masafumi Kubota , Tokuhiko Tamaki , Mitsuhiro Ohkuni , Ichiro Nakayama
发明人： Noboru Nomura , Kenji Harafuji , Masafumi Kubota , Tokuhiko Tamaki , Mitsuhiro Ohkuni , Ichiro Nakayama
IPC分类号： H01J37/32 , H01J37/317
CPC分类号： H01J37/32302 , H01J37/32192 , H01J2237/3341
摘要： Three electrodes are disposed at lateral sides of a plasma generating chamber of an etching apparatus serving as a plasma generating apparatus. A sample stage is disposed at a lower part of the plasma generating chamber, and an opposite electrode is disposed at an upper part thereof. High frequency electric power having a first frequency is supplied to the sample stage and the opposite electrode. Respectively supplied to the three electrodes 4, 5, 6 are high frequency electric powers which are oscillated by a three-phase magnetron, which have a second frequency different from the first frequency and of which respective phases are successively different by about 120.degree. from one another, thus forming a rotational electric field in the plasma generating chamber.
摘要翻译：在作为等离子体发生装置的蚀刻装置的等离子体发生室的侧面设置三个电极。样品台设置在等离子体发生室的下部，相对电极设置在其上部。具有第一频率的高频电力被提供给样品台和相对电极。分别提供给三个电极4,5,6的是由三相磁控管振荡的高频电力，三相磁控管具有与第一频率不同的第二频率，并且各相相互相差约120度从而在等离子体发生室中形成旋转电场。

98. 发明授权

US5404079A Plasma generating apparatus 失效
标题翻译：等离子体发生装置
公开(公告)号：US5404079A
公开(公告)日：1995-04-04
申请号：US97230
申请日：1993-07-27
申请人： Mitsuhiro Ohkuni , Masafumi Kubota , Noboru Nomura , Ichiro Nakayama , Tokuhiko Tamaki
发明人： Mitsuhiro Ohkuni , Masafumi Kubota , Noboru Nomura , Ichiro Nakayama , Tokuhiko Tamaki
IPC分类号： H01J37/32 , H01J7/24
CPC分类号： H01J37/32082 , H01J37/32165
摘要： On the inner surface of a chamber are circumferentially disposed three lateral electrodes at regular intervals. To the lateral electrodes are applied three high-frequency electric powers of 50 MHz, each differing in phase by approximately 120.degree.. On the bottom of the chamber is placed a sample stage serving as a second electrode, around which is provided a ring-shaped earth electrode. To the sample stage is applied high-frequency electric power of 13.56 MHz. The distance between each of the three lateral electrodes and the earth electrode is longer than the distance between the sample stage and the earth electrode.
摘要翻译：在室的内表面上以规则的间隔周向设置三个横向电极。向横向电极施加50MHz的三个高频电功率，每个相位相差大约120°。在室的底部放置有用作第二电极的样品台，围绕其设置环形接地电极。采样阶段采用13.56 MHz的高频电源。三个横向电极和接地电极之间的距离比样品台和接地电极之间的距离长。

99. 发明授权

US4906464A Method for preparing dispersions containing antibiotic power 失效
标题翻译：制备含抗生素能力的分散体的方法
公开(公告)号：US4906464A
公开(公告)日：1990-03-06
申请号：US288025
申请日：1988-12-21
申请人： Tatuo Yamamoto , Masashi Uchida , Yasuo Kurihara , Ichiro Nakayama
发明人： Tatuo Yamamoto , Masashi Uchida , Yasuo Kurihara , Ichiro Nakayama
IPC分类号： A61L9/16 , A01N25/04 , A01N25/10 , A01N59/16 , A01N61/00 , A61K33/06 , B01J13/00 , C08K3/00 , C08L101/00
CPC分类号： A61K33/06
摘要： A method for preparing a dispersion containing antibiotic powder comprises mixing the antibiotic powder and a dispersing medium at a temperature at which the dispersing medium is in the form of a liquid under a reduced pressure of not more than 470 Torr. According to this method, the antibiotic powder is uniformly dispersed in various dispersing mediums and antibiotic products having high antibiotic action is effectively be provided by using the resulting dispersion.

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