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91. 发明申请

WO2021247380A1 VAPOR DEPOSITION APPARATUS AND METHOD FOR COATING A SUBSTRATE IN A VACUUM CHAMBER 审中-公开
公开(公告)号：WO2021247380A1
公开(公告)日：2021-12-09
申请号：PCT/US2021/034611
申请日：2021-05-27
申请人： APPLIED MATERIALS, INC.
发明人： BANGERT, Stefan , LOPP, Andreas
IPC分类号： C23C14/56 , C23C14/24 , C23C14/042 , C23C14/16 , C23C14/54 , C23C14/562 , C23C14/564
摘要： A vapor deposition apparatus is described. The vapor deposition apparatus includes a substrate support for supporting a substrate to be coated; a vapor source with a plurality of nozzles for directing vapor toward the substrate support through a vapor propagation volume; and a heatable shield extending from the vapor source toward the substrate support. The heatable shield surrounds the vapor propagation volume at least partially and includes an edge exclusion portion for masking areas of the substrate not to be coated. The substrate support may be a rotatable drum with a curved drum surface, and the vapor deposition apparatus may be configured to move the substrate on the curved drum surface past the vapor source in a circumferential direction.

93. 发明公开

EP4334227A1 ROLLER FOR TRANSPORTING A FLEXIBLE SUBSTRATE, VACUUM PROCESSING APPARATUS, AND METHODS THEREFOR 审中-实审
公开(公告)号：EP4334227A1
公开(公告)日：2024-03-13
申请号：EP22799280.7
申请日：2022-04-18
申请人： Applied Materials, Inc.
发明人： DEPPISCH, Thomas , BANGERT, Stefan , ARMSTRONG, Claire , SCHNAPPENBERGER, Frank
IPC分类号： B65H20/14 , C23C14/56 , C23C14/24

94. 发明公开

EP4200460A1 MATERIAL DEPOSITION APPARATUS HAVING AT LEAST ONE HEATING ASSEMBLY AND METHOD FOR PRE-AND/OR POST-HEATING A SUBSTRATE 审中-实审
公开(公告)号：EP4200460A1
公开(公告)日：2023-06-28
申请号：EP21858829.1
申请日：2021-08-09
申请人： Applied Materials, Inc.
发明人： LOPP, Andreas , BANGERT, Stefan , BUSCHBECK, Wolfgang
IPC分类号： C23C14/56 , C23C14/54 , C23C14/24 , C23C14/02 , C23C14/58 , C23C16/54 , C23C16/46 , C23C16/02 , C23C16/56

95. 发明授权

EP2494646B1 SHADOW MASK ALIGNMENT AND MANAGEMENT SYSTEM 有权
标题翻译：阴影遮罩对齐和管理系统
公开(公告)号：EP2494646B1
公开(公告)日：2017-12-06
申请号：EP10828765.7
申请日：2010-10-18
申请人： Applied Materials, Inc.
发明人： KWAK, Byung-Sung, Leo , BANGERT, Stefan , HOFMANN, Ralf , KOENIG, Michael
IPC分类号： H01M10/04 , H01M10/0562 , H01M6/18 , H01G9/025 , C23C14/04
CPC分类号： H01M6/40 , C23C14/042 , H01M4/02 , H01M4/13 , H01M4/139 , H01M4/5825 , H01M4/621 , H01M4/623 , H01M4/663 , H01M2004/028 , Y02E60/122 , Y10T29/49002 , Y10T29/5313
摘要： A magnetic handling assembly for thin-film processing of a substrate, a system and method for assembling and disassembling a shadow mask to cover a top of a workpiece for exposure to a processing condition. The assembly may include a magnetic handling carrier and a shadow mask disposed over, and magnetically coupled to, the magnetic handling carrier to cover a top of a workpiece that is to be disposed between the shadow mask and the magnetic handling carrier when exposed to a processing condition. A system includes a first chamber with a first support to hold the shadow mask, a second support to hold a handling carrier, and an alignment system to align the shadow mask a workpiece to be disposed between the carrier and shadow mask. The first and second supports are moveable relative to each other.

96. 发明公开

EP3245311A1 HOLDING ARRANGEMENT FOR SUPPORTING A SUBSTRATE CARRIER AND A MASK CARRIER DURING LAYER DEPOSITION IN A PROCESSING CHAMBER, APPARATUS FOR DEPOSITING A LAYER ON A SUBSTRATE, AND METHOD FOR ALIGNING A SUBSTRATE CARRIER SUPPORTING A SUBSTRATE AND A MASK CARRIER 审中-公开
标题翻译：在处理室中用于支撑基板载体和掩模载体以沉积层的装置，用于在基板上沉积层的装置以及用于对准基板支撑基板和掩模载体的方法
公开(公告)号：EP3245311A1
公开(公告)日：2017-11-22
申请号：EP15700291.6
申请日：2015-01-12
申请人： Applied Materials, Inc.
发明人： VERCESI, Tommaso , HAAS, Dieter , BANGERT, Stefan , HEIMEL, Oliver , GISLON, Daniele
IPC分类号： C23C14/04 , C23C16/04 , C23C14/50 , C23C14/12 , C23C16/458 , H01L51/00 , H01L21/68
CPC分类号： C23C16/4587 , C23C14/042 , C23C14/12 , C23C14/50 , C23C16/042 , H01L21/682 , H01L51/0011
摘要： A holding arrangement for supporting a substrate carrier and a mask carrier during layer deposition in a processing chamber is provided. The holding arrangement includes two or more alignment actuators connectable to at least one of the substrate carrier and the mask carrier, wherein the holding arrangement is configured to support the substrate carrier in, or parallel to, a first plane, wherein a first alignment actuator of the two or more alignment actuators is configured to move the substrate carrier and the mask carrier relative to each other at least in a first direction, wherein a second alignment actuator of the two or more alignment actuators is configured to move the substrate carrier and the mask carrier relative to each other at least in the first direction and a second direction different from the first direction, and wherein the first direction and the second direction are in the first plane.

97. 发明公开

EP3215650A1 MATERIAL SOURCE ARRANGMENT AND NOZZLE FOR VACUUM DEPOSITION 审中-公开
标题翻译：用于真空沉积的材料源布置和喷嘴
公开(公告)号：EP3215650A1
公开(公告)日：2017-09-13
申请号：EP14796078.5
申请日：2014-11-07
申请人： Applied Materials, Inc.
发明人： BANGERT, Stefan , SCHÜßLER, Uwe , DIEGUEZ-CAMPO, Jose Manuel
IPC分类号： C23C14/12 , C23C14/56 , C23C16/455 , C23C14/24
CPC分类号： C23C14/24 , C23C14/12 , C23C14/562 , C23C16/45578
摘要： A material source arrangement for depositing a material on a substrate in a vacuum deposition chamber is described. The material source arrangement includes a distribution pipe being configured to be in fluid communication with a material source providing the material to the distribution pipe; and at least one nozzle configured for guiding the material provided in the distribution pipe to the vacuum deposition chamber. The nozzle includes a thread for repeatedly connecting and disconnecting the nozzle to the distribution pipe. Further, a deposition apparatus for depositing material on a substrate including a material source arrangement, a nozzle for a material source arrangement, and a method for providing a distribution pipe and a nozzle for a material source arrangement are described.
摘要翻译：描述了用于在真空沉积室（110）中的基底（121）上沉积材料的材料源装置（100）。所述材料源装置包括分配管（106），所述分配管（106）被构造成与将所述材料提供到所述分配管（106）的材料源（102）流体连通; 和至少一个喷嘴（200; 712），所述喷嘴被构造成用于将设置在分配管（106）中的材料引导至真空沉积室（110）。喷嘴（200; 712）包括用于重复地将喷嘴连接到分配管和将喷嘴与分配管断开的螺纹。此外，用于在包括材料源装置，用于材料源装置的喷嘴以及用于提供分配管（106）和喷嘴（200; 712）的方法的基板（121）上沉积材料的沉积装置（300）描述了材料源装置（100）。

98. 发明公开

EP3119920A1 EVAPORATION SOURCE FOR ORGANIC MATERIAL 审中-公开
标题翻译：有机物蒸发源
公开(公告)号：EP3119920A1
公开(公告)日：2017-01-25
申请号：EP14712648.6
申请日：2014-03-21
申请人： Applied Materials, Inc.
发明人： DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , LOPP, Andreas , SCHÜSSLER, Uwe
IPC分类号： C23C14/24 , C23C14/04 , C23C14/56
CPC分类号： C23C14/243 , C23C14/042 , C23C14/56 , H01L51/001 , H01L51/0011 , H01L51/56
摘要： An evaporation source array for depositing two or more organic materials on a substrate is described. The evaporation source array includes two or more evaporation crucibles, wherein the two or more evaporation crucibles are configured to evaporate the two or more organic materials, two or more distribution pipes with outlets provided along the length of the two or more distribution pipes, wherein a first distribution pipe of the two or more distribution pipes is in fluid communication with a first evaporation crucible of the two or more evaporation crucibles, two or more heat shields, which surround the first distribution pipe, a cooling shield arrangement provided at at least one side of the two or more distribution pipes, wherein the at least one side is the side at which the outlets are provided, and a cooling element provided at or in the cooling shield arrangement for active cooling of the cooling shield arrangement.
摘要翻译：描述了用于在衬底上沉积两种或更多种有机材料的蒸发源阵列。所述蒸发源阵列包括两个或更多个蒸发坩埚，其中所述两个或更多个蒸发坩埚被配置为蒸发所述两种或更多种有机材料，两个或更多个分配管，所述分配管具有沿着所述两个或更多个分配管的长度设置的出口，两个或更多个分配管的第一分配管与两个或更多个蒸发坩埚中的第一蒸发坩埚流体连通，围绕第一分配管的两个或更多个隔热罩，设置在至少一侧其中所述至少一个侧面是设置有所述出口的侧面;以及冷却元件，所述冷却元件设置在所述冷却防护装置上或所述冷却防护装置中，用于主动冷却所述冷却防护装置。

99. 发明公开

EP3119919A1 EVAPORATION SOURCE FOR ORGANIC MATERIAL 审中-公开
标题翻译： VERDAMPFUNGSQUELLEFÜR组织材料
公开(公告)号：EP3119919A1
公开(公告)日：2017-01-25
申请号：EP14712647.8
申请日：2014-03-21
申请人： Applied Materials, Inc.
发明人： BANGERT, Stefan , DIEGUEZ-CAMPO, Jose Manuel , SCHÜSSLER, Uwe , LOPP, Andreas
IPC分类号： C23C14/24 , C23C14/04
CPC分类号： H01L51/56 , C23C14/042 , C23C14/243 , C23C14/26 , H01L51/001 , H01L51/0011 , H01L51/0012
摘要： An evaporation source for organic material is described. The evaporation source includes an evaporation crucible, wherein the evaporation crucible is configured to evaporate the organic material, a distribution pipe with one or more outlets provided along the length of the distribution pipe, wherein the distribution pipe is in fluid communication with the evaporation crucible, and wherein the distribution pipe has a cross-section perpendicular to the length of the distribution pipe, which is non-circular, and which includes: an outlet side at which the one or more outlets are provided, wherein the width of the outlet side of the cross-section is 30% or less of the maximum dimension of the cross-section.
摘要翻译：描述了有机材料的蒸发源。蒸发源包括蒸发坩埚，其中蒸发坩埚被构造成蒸发有机材料，分配管具有沿着分配管的长度设置的一个或多个出口，其中分配管与蒸发坩埚流体连通，并且其中所述分配管具有垂直于所述分配管的长度的横截面，所述分布管是非圆形的，并且包括：设置所述一个或多个出口的出口侧，其中所述出口侧的宽度横截面为截面最大尺寸的30％以下。

100. 发明公开

EP3077567A1 DEPOSITING ARRANGEMENT, DEPOSITION APPARATUS AND METHODS OF OPERATION THEREOF 有权
标题翻译： VERDAMPFUNGSANORDNUNG，ABSCHEIDUNGSVORRICHTUNG UND VERFAHREN ZUM BETRIEB DAVON
公开(公告)号：EP3077567A1
公开(公告)日：2016-10-12
申请号：EP13814860.6
申请日：2013-12-06
申请人： Applied Materials, Inc.
发明人： SCHÜßLER, Uwe , BANGERT, Stefan , KEIM, Karl-Albert , DIEGUEZ-CAMPO, Jose Manuel
IPC分类号： C23C14/14 , C23C14/24 , C23C14/54 , B01D1/00
CPC分类号： C23C14/14 , B01D1/0064 , B01D1/0082 , C23C14/24 , C23C14/246 , C23C14/542 , C23C14/545
摘要： A depositing arrangement for evaporation of a material including an alkali metal or alkaline earth metal, and for deposition of the material on a substrate is described. The depositing arrangement includes a first chamber configured for liquefying the material, wherein the first chamber comprises a gas inlet configured for inlet of a gas in the first chamber, an evaporation zone configured for vaporizing the liquefied material, a line providing a fluid communication between the first chamber and the evaporation zone for the liquefied material, wherein the line includes a first portion defining a flow resistance of the line, a valve configured for controlling the flow rate of the gas in the first chamber for controlling a flow rate of the liquefied material through the line having said flow resistance, and one or more outlets for directing the vaporized material towards the substrate.
摘要翻译：描述了用于蒸发包括碱金属或碱土金属的材料并用于将材料沉积在基底上的沉积布置。沉积装置包括被配置用于液化材料的第一室，其中第一室包括构造成用于第一室中的气体入口的气体入口，被配置为蒸发液化材料的蒸发区，第一室和用于液化材料的蒸发区，其中所述管线包括限定管线的流动阻力的第一部分，构造成用于控制第一室中的气体的流量以控制液化材料的流量的阀通过具有所述流动阻力的管线，以及一个或多个用于将蒸发的材料引向衬底的出口。

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