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91. 发明专利

CA3060385A1 PVD BOND COAT 未知
公开(公告)号：CA3060385A1
公开(公告)日：2018-10-25
申请号：CA3060385
申请日：2018-04-19
申请人： OERLIKON SURFACE SOLUTIONS AG PFAFFIKON
发明人： RAMM JURGEN , WIDRIG BENO , POLCIK PETER , GINDRAT MALKO
IPC分类号： C23C14/00 , C23C14/02 , C23C14/16 , C23C14/32 , C23C28/00
摘要： Superalloy workpiece comprising: - a superalloy substrate - an interface layer (IF-1) of essentially the same superalloy composition directly on a surface of the superalloy substrate, followed by - a transition layer (TL) of essentially the same superalloy and supperalloy oxides or a different metal composition and different metal oxides whereby oxygen content of the transition layer is increasing from IF-1 towards - a barrier layer (IF-2) of super alloy oxides or of different metal oxides.

92. 发明专利

CA2971754A1 ALCRN-BASED COATING PROVIDING ENHANCED CRATER WEAR RESISTANCE 未知
公开(公告)号：CA2971754A1
公开(公告)日：2016-06-30
申请号：CA2971754
申请日：2015-12-03
申请人： OERLIKON SURFACE SOLUTIONS AG PFAFFIKON
发明人： ERIKSSON ANDERS OLOF , ARNDT MIRJAM , STEIN SEBASTIAN
IPC分类号： C23C14/00 , C23C14/02 , C23C14/06 , C23C14/32 , C23C28/00 , C23C28/04
摘要： Coating (210) deposited on a surface of a substrate (201) comprising a multi-layered film (216) consisting of a plurality of A-layers and a plurality of B-layers deposited alternating one on each other forming a A/B/A/B/A... architecture, the A-layers comprising aluminium chromium boron nitride and the B-layers comprising aluminium chromium nitride and not comprising boron, whereas the multi-layered film (216) comprises at least a first portion (216a) and a last portion (216c), wherein the average boron content in the first coating portion (216a) is higher than the average boron content in the last coating portion (216c), and both the first coating portion (216a) and the last coating portion (216c) exhibit inherent compressive stresses and wherein the inherent compressive stress in the first coating portion (216a) is lower than it in the last coating portion (216c).

93. 发明专利

CA2929460A1 OXIDATION BARRIER LAYER 未知
公开(公告)号：CA2929460A1
公开(公告)日：2015-05-07
申请号：CA2929460
申请日：2014-10-31
申请人： OERLIKON SURFACE SOLUTIONS AG PFAFFIKON
发明人： RAMM JURGEN , SEIBERT FLORIAN , WIDRIG BENO , FOPP-SPORI DORIS
IPC分类号： C23C14/32 , C23C14/00 , C23C14/08
摘要： The invention relates to a method for producing an oxidation barrier layer on a workpiece substrate, the oxidation barrier layer being produced by means of physical vapor deposition (PVD) and being an oxide which is materially related to the uncoated surface of the workpiece.

94. 发明专利

CA2924785A1 GAS FLOW DEVICE FOR A SYSTEM FOR THE RADIATION TREATMENT OF SUBSTRATES 未知
公开(公告)号：CA2924785A1
公开(公告)日：2015-03-26
申请号：CA2924785
申请日：2014-09-05
申请人： OERLIKON SURFACE SOLUTIONS AG PFAFFIKON
发明人： RIBEIRO CARLOS
IPC分类号： B05D3/06 , B29B13/06 , B29C35/04 , B29C35/08 , B29C37/00 , B29C71/04 , F26B3/28
摘要： The invention relates to a system for the radiation treatment of substrates, which comprises at least one radiation source in a chamber above the substrate holders for loading substrates to be treated, and wherein the chamber comprises means for maintaining a gas flow in the chamber, said means having at least one gas inlet and at least one gas outlet, characterized in that the at least one gas inlet is arranged in the region of the substrate holders, such that gas flowing in through the at least one gas inlet firstly flows around the substrate holders before leaving the chamber again through the gas outlet either directly and/or after flowing round the at least one radiation source.

95. 发明专利

IL259263A Sputtering arrangement and sputtering method for optimized distribution of the energy flow 未知
公开(公告)号：IL259263A
公开(公告)日：2022-04-01
申请号：IL25926318
申请日：2018-05-10
申请人： OERLIKON SURFACE SOLUTIONS AG PFAFFIKON , KRASSNITZER SIEGFRIED , LENDI DANIEL , KURAPOV DENIS
发明人： KRASSNITZER SIEGFRIED , LENDI DANIEL , KURAPOV DENIS
IPC分类号： H01J37/34 , C23C14/34
摘要： The present disclosure relates to a sputtering arrangement, a vacuum coating system, and a method for carrying out HiPIMS coating methods; the sputtering arrangement has at least two different interconnection possibilities and the switch to the second interconnection possibility, in which two sputtering sub-assemblies are operated simultaneously with high power pulses, achieves a productivity gain.

96. 发明专利

IL289483D0 Cathodic arc source 未知
公开(公告)号：IL289483D0
公开(公告)日：2022-02-01
申请号：IL28948321
申请日：2021-12-29
申请人： OERLIKON SURFACE SOLUTIONS AG PFAFFIKON
IPC分类号： C23C14/00 , C23C14/06 , C23C14/08 , C23C14/32 , H01J37/32 , H01J37/34
摘要： The invention refers to a cathodic arc evaporation apparatus comprising: - a target (3) which has a target surface (3') comprising an active surface (3'') from where material can be evaporated in a cathodic arc process; - a confinement (4) surrounding an outer boarder of the target surface (3'); - an anode (2) having an electron receiving surface (2', 2", 2'''), the anode (2) encompassing at least one of the target (3) and the confinement (4) in at least one of a target plane and an axial distance in front of the active surface; - a magnetic guidance system adapted to provide a magnetic field at the target surface being essentially in parallel to at least an outer region of the target surface so that magnetic field lines are in parallel to the target surface or inclined to it in an acute angle α, whereat an active surface (3'') is defined in a surface (3') area where magnetic field lines enter the target surface in an acute angle α≤ 45°; - a central axis Z or a central plane Z'; wherein the confinement (4) and the anode (2) both are made in closed geometry and both are electrically isolated against each other and the target, whereat the minimum distance of the electron receiving surface (2', 2", 2''') from the active surface (3'') is defined by at least one of a radial distance Δr14 of an outer boarder of the target surface (3') to an inner boarder of the electron receiving surface, whereby the outer boarder of the target surface (3') has a radial distance r1 from the middle of the target and the inner boarder of the electron receiving surface has a radial distance r4 from the middle of the target, and an axial distance hi from the target surface (3') to an upper boarder of the confinement or an axial distance h2 from the target surface (3') to a lower boarder of the electron receiving surface (2', 2'', 2''').

97. 发明专利

IL284169D0 Cathodic arc ignition device 未知
公开(公告)号：IL284169D0
公开(公告)日：2021-08-31
申请号：IL28416921
申请日：2021-06-17
申请人： OERLIKON SURFACE SOLUTIONS AG PFAFFIKON , KRASSNITZER SIEGFRIED , HAGMANN JUERG , TREUHOLZ ANDREAS PETER , WIDMER DOMINIK ERWIN
发明人： KRASSNITZER SIEGFRIED , HAGMANN JUERG , TREUHOLZ ANDREAS PETER , WIDMER DOMINIK ERWIN
IPC分类号： C23C14/32 , H01J37/32
摘要： An arc ignition device for cathodic arc deposition of a target material onto a substrate, comprising a trigger finger arranged moveable between a contacting position and a resting position, wherein in the contacting position a side surface of an adjacent target can be physically contacted by the trigger finger, and in the resting position the adjacent target cannot be contacted by the trigger finger, wherein during cathodic arc deposition of a target material, the trigger finger is arranged movable between the contacting position and the resting position in such a way that the contamination of the trigger finger with deposited target material during the cathodic arc deposition of the target material can be minimized.

98. 发明专利

IL282907D0 Cubic al-rich altin coatings deposited from ceramic targets 未知
公开(公告)号：IL282907D0
公开(公告)日：2021-06-30
申请号：IL28290721
申请日：2021-05-04
申请人： OERLIKON SURFACE SOLUTIONS AG PFAFFIKON , MITSUBISHI HITACHI TOOL ENG LTD , YALAMANCHILI SIVA PHANI KUMAR , KURAPOV DENIS , SASAKI TOMOYA , KUBOTA KAZUYUKI
发明人： YALAMANCHILI SIVA PHANI KUMAR , KURAPOV DENIS , SASAKI TOMOYA , KUBOTA KAZUYUKI
IPC分类号： C23C14/06 , C23C14/32 , C23C14/34
摘要： The present invention discloses a non-reactive PVD coating process for producing an aluminium-rich AlxTi1−xN-based thin film having an aluminium content of >75 at-% based on the total amount of aluminium and titanium in the thin film, a cubic crystal structure, and a columnar microstructure, wherein ceramic targets are used as a material source for the aluminium-rich AlxTi1−xN-based thin film.

99. 发明专利

CA3140095A1 PVD COATINGS COMPRISING MULTI-ANION HIGH ENTROPY ALLOY OXY-NITRIDES 未知
公开(公告)号：CA3140095A1
公开(公告)日：2020-11-26
申请号：CA3140095
申请日：2020-05-25
申请人： OERLIKON SURFACE SOLUTIONS AG PFAFFIKON
发明人： YALAMANCHILI SIVA PHANI KUMAR , RUDIGIER HELMUT , FOPP-SPORI DORIS
IPC分类号： C23C14/06 , C23C14/32 , C23C14/35
摘要： Method for producing a coating comprising at least one PVD coating layer, wherein for the production of the at least one PVD coating layer materials from one or more targets are evaporated by using a PVD technique in a coating chamber comprising oxygen and nitrogen as reactive gases, wherein during deposition of the at least one PVD coating layer a multi-anion HEA-oxynitride structure is formed, which comprises a cation lattice formed of five or more elements and an anion lattice formed of two or more elements, wherein if only two elements are present in the anion lattice, they are oxygen and nitrogen.

100. 发明专利

IL253069A Alcrn-based coating providing enhanced crater wear resistance 未知
公开(公告)号：IL253069A
公开(公告)日：2020-10-29
申请号：IL25306917
申请日：2017-06-21
申请人： OERLIKON SURFACE SOLUTIONS AG PFAFFIKON , ERIKSSON ANDERS OLOF , ARNDT MIRJAM , STEIN SEBASTIAN
发明人： ERIKSSON ANDERS OLOF , ARNDT MIRJAM , STEIN SEBASTIAN
IPC分类号： C23C14/00 , C23C14/02 , C23C14/06 , C23C14/14 , C23C14/32 , C23C14/46 , C23C28/00 , C23C28/02 , C23C28/04
摘要： Coating (210) deposited on a surface of a substrate (201) comprising a multi-layered film (216) consisting of a plurality of A-layers and a plurality of B-layers deposited alternating one on each other forming a A/B/A/B/A . . . architecture, the A-layers comprising aluminium chromium boron nitride and the B-layers comprising aluminium chromium nitride and not comprising boron, whereas the multi-layered film (216) comprises at least a first portion (216a) and a last portion (216c), wherein the average boron content in the first coating portion (216a) is higher than the average boron content in the last coating portion (216c), and both the first coating portion (216a) and the last coating portion (216c) exhibit inherent compressive stresses and wherein the inherent compressive stress in the first coating portion (216a) is lower than it in the last coating portion (216c).

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