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    • 93. 发明授权
    • Photodiode manufacturing method and photodiodes
    • 光电二极管制造方法和光电二极管
    • US08564087B2
    • 2013-10-22
    • US13148091
    • 2010-02-15
    • Kazuhisa YamamuraAkira SakamotoTerumasa Nagano
    • Kazuhisa YamamuraAkira SakamotoTerumasa Nagano
    • H01L31/00H01L29/06H01L21/00
    • H01L31/1804H01L31/02327H01L31/02363H01L31/035281Y02E10/547
    • A semiconductor substrate 2 is dry etched before an insulating layer 4 is exposed, whereby a hole H1 penetrating through the semiconductor substrate 2 and reaching the insulating layer 4 is formed at a position corresponding to a photosensitive region S1. Next, an irregular asperity 22 is formed in a surface 7 of an n+ type embedded layer 6 exposed in the hole H1. The surface of the n+ type embedded layer 6 exposed in the hole H1 through the insulating layer 4 is irradiated with a picosecond to femtosecond pulsed laser beam, whereby the insulating layer 4 is removed and the surface 7 of the n+ type embedded layer 6 exposed in the hole H1 is roughened by the picosecond to femtosecond pulsed laser beam, to form the irregular asperity 22 in the entire area of the surface 7. Then the substrate with the irregular asperity 22 therein is subjected to a thermal treatment.
    • 在绝缘层4露出之前对半导体衬底2进行干蚀刻,从而在对应于感光区域S1的位置处形成贯穿半导体衬底2并到达绝缘层4的孔H1。 接下来,在露出在孔H1中的n +型嵌入层6的表面7中形成不规则的凹凸22。 通过绝缘层4暴露在孔H1中的n +型嵌入层6的表面用皮秒照射到飞秒脉冲激光束,由此去除绝缘层4,并将n +型嵌入层6的表面7暴露在 通过皮秒对飞秒脉冲激光束使孔H1粗糙化,在表面7的整个区域中形成不规则的凹凸22。然后对其中具有不规则凹凸22的基板进行热处理。
    • 96. 发明申请
    • OPTICAL FIXING APPARATUS, IMAGE FORMING APPARATUS, AND OPTICAL FIXING METHOD
    • 光学固定装置,图像形成装置和光学固定方法
    • US20130045019A1
    • 2013-02-21
    • US13366619
    • 2012-02-06
    • Masato MATSUZUKITetsuro KODERAAkira SAKAMOTO
    • Masato MATSUZUKITetsuro KODERAAkira SAKAMOTO
    • G03G15/20
    • G03G15/201
    • An optical fixing apparatus includes a transport unit that transports a recording medium in a first direction in a first fixing process and a second fixing process subsequent thereto and transports the recording medium in a second direction after the first fixing process and before the second fixing process; a light irradiating unit that irradiates the recording medium with light having a predetermined intensity while the recording medium is transported in the first and second fixing processes; a controller that performs a control so that the intensity of the light is lower than the predetermined intensity in a first period before the end of the first fixing process and a second period after the start of the second fixing process, and so that an area of the recording medium irradiated in the first period and an area of the recording medium irradiated in the second period overlap.
    • 一种光学定影装置包括:传送单元,其在第一定影处理中在第一方向上传送记录介质,并在其之后传送第二定影处理,并且在第一定影处理之后和第二定影处理之前沿第二方向传送记录介质; 光照射单元,其在第一和第二定影过程中在记录介质被传送的同时照射具有预定强度的光; 控制器,其在第一定影处理结束之前的第一时段和第二定影处理开始之后的第二时段内执行使得光的强度低于预定强度的控制,并且使得 在第一周期中照射的记录介质和在第二周期中照射的记录介质的区域重叠。