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    • 1. 发明授权
    • Temperature controller for gas laser
    • 气体激光器温度控制器
    • US08238392B2
    • 2012-08-07
    • US12710722
    • 2010-02-23
    • Yukio WatanabeHideyuki HayashiKouji KakizakiMichio ShinozakiHideo Hoshino
    • Yukio WatanabeHideyuki HayashiKouji KakizakiMichio ShinozakiHideo Hoshino
    • H01S3/00H01S3/04H01S3/22H01S3/223
    • H01S3/0407F25B2400/06F25D17/02H01S3/03H01S3/041H01S3/22
    • A temperature controller for a gas laser which controls temperatures of a plurality of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control as compared with the first temperature-controlled portion and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion and each second temperature-controlled portion in parallel.
    • 一种用于气体激光器的温度控制器,其控制多个温度控制装置的温度,包括需要高精度温度控制的第一温度控制部分和需要低精度温度控制的第二温度控制部分 与第一温度控制部分相比,第一温度控制部分与低温或高温的温度控制相比,包括产生冷却剂的第一温度控制部分或用于调节每个第一温度控制部分的温度的加热剂 温度控制部分,产生冷却剂的第二温度控制部分或用于调节每个第二温度控制部分的温度的加热剂,将第一温度控制部分和第一温度控制部分并联连接的第一管道系统, 以及连接第二回火的第二管道系统 所述控制部分和每个第二温度控制部分并联。
    • 2. 发明授权
    • Temperature controller for gas laser
    • 气体激光器温度控制器
    • US08498317B2
    • 2013-07-30
    • US13543510
    • 2012-07-06
    • Yukio WatanabeHideyuki HayashiKouji KakizakiMichio ShinozakiHideo Hoshino
    • Yukio WatanabeHideyuki HayashiKouji KakizakiMichio ShinozakiHideo Hoshino
    • H01S3/04H01S3/22
    • H01S3/0407F25B2400/06F25D17/02H01S3/03H01S3/041H01S3/22
    • A temperature controller for a gas laser which controls temperatures of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion and each second temperature-controlled portion in parallel.
    • 一种气体激光器的温度控制器,其控制包括需要高精度温度控制的第一温度控制部分和需要低精度温度控制的第二温度控制部分的温度控制装置的温度, 与第一温度控制部分相比,具有低或高温度的控制包括产生冷却剂的第一温度控制部分或用于调节每个第一温度控制部分的温度的加热剂,第二温度控制部分产生 冷却剂或用于调节每个第二温度控制部分的温度的加热剂,将第一温度控制部分和第一温度控制部分并联连接的第一管道系统和将第二温度控制部分和 第二个温度受控部分 平行
    • 3. 发明申请
    • TEMPERATURE CONTROLLER FOR GAS LASER
    • 气体激光温度控制器
    • US20120267343A1
    • 2012-10-25
    • US13543510
    • 2012-07-06
    • Yukio WATANABEHideyuki HayashiKouji KakizakiMichio ShinozakiHideo Hoshino
    • Yukio WATANABEHideyuki HayashiKouji KakizakiMichio ShinozakiHideo Hoshino
    • G05D23/00B23K26/42
    • H01S3/0407F25B2400/06F25D17/02H01S3/03H01S3/041H01S3/22
    • A temperature controller for a gas laser which controls temperatures of a plurality of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control as compared with the first temperature-controlled portion and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion and each second temperature-controlled portion in parallel.
    • 一种用于气体激光器的温度控制器,其控制多个温度控制装置的温度,包括需要高精度温度控制的第一温度控制部分和需要低精度温度控制的第二温度控制部分 与第一温度控制部分相比,第一温度控制部分与低温或高温的温度控制相比,包括产生冷却剂的第一温度控制部分或用于调节每个第一温度控制部分的温度的加热剂 温度控制部分,产生冷却剂的第二温度控制部分或用于调节每个第二温度控制部分的温度的加热剂,将第一温度控制部分和第一温度控制部分并联连接的第一管道系统, 以及连接第二回火的第二管道系统 所述控制部分和每个第二温度控制部分并联。
    • 4. 发明申请
    • TEMPERATURE CONTROLLER FOR GAS LASER
    • 气体激光温度控制器
    • US20100217444A1
    • 2010-08-26
    • US12710722
    • 2010-02-23
    • Yukio WatanabeHideyuki HayashiKouji KakizakiMichio ShinozakiHideo Hoshino
    • Yukio WatanabeHideyuki HayashiKouji KakizakiMichio ShinozakiHideo Hoshino
    • G05D23/19G05D7/06
    • H01S3/0407F25B2400/06F25D17/02H01S3/03H01S3/041H01S3/22
    • A temperature controller for a gas laser which controls temperatures of a plurality of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control as compared with the first temperature-controlled portion and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion and each second temperature-controlled portion in parallel.
    • 一种用于气体激光器的温度控制器,其控制多个温度控制装置的温度,包括需要高精度温度控制的第一温度控制部分和需要低精度温度控制的第二温度控制部分 与第一温度控制部分相比,第一温度控制部分与低温或高温的温度控制相比,包括产生冷却剂的第一温度控制部分或用于调节每个第一温度控制部分的温度的加热剂 温度控制部分,产生冷却剂的第二温度控制部分或用于调节每个第二温度控制部分的温度的加热剂,将第一温度控制部分和第一温度控制部分并联连接的第一管道系统, 以及连接第二回火的第二管道系统 所述控制部分和每个第二温度控制部分并联。
    • 5. 发明授权
    • Extreme ultraviolet light source apparatus
    • 极紫外光源设备
    • US09052615B2
    • 2015-06-09
    • US12543582
    • 2009-08-19
    • Toshihiro NishisakaYukio WatanabeOsamu WakabayashiKouji KakizakiMichio Shinozaki
    • Toshihiro NishisakaYukio WatanabeOsamu WakabayashiKouji KakizakiMichio Shinozaki
    • G21K5/04G03F7/20
    • G03F7/70033G03F7/70975H05G2/00H05G2/003H05G2/008
    • An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.
    • EUV光源装置能够容易地进行EUV光源装置的维护,EUV光源装置能够容易地进行腔室或腔室的一部分的移动,到维护区域的移动以及相对于投影光学元件的高精度放置。 EUV光源装置是通过将激光束施加到室内的目标材料并且将从等离子体辐射的EUV光输入到曝光设备的投影光学器件中来产生等离子体的装置,并且包括用于定位腔室或维护的定位机构 在所述收集的极紫外光的光轴和所述曝光设备的投影光学元件的光轴对准的预定位置处的所述室的单元,以及用于将所述室或所述室的维护单元移动到所述室 预定位置和维护区域。
    • 10. 发明授权
    • Image-forming apparatus
    • 图像形成装置
    • US5821976A
    • 1998-10-13
    • US534972
    • 1995-09-28
    • Minoru InagakiMichio ShinozakiTomio AndohTomoyuki MarugameKunio Omura
    • Minoru InagakiMichio ShinozakiTomio AndohTomoyuki MarugameKunio Omura
    • B41J2/315B41J13/12B41J2/325B41J13/10
    • B41J13/12B41J2/315
    • An image-forming apparatus based on an observation of a coincidence of a circular length and a chord length. A precise transfer of the image on a transfer object is accomplished without breaking of the image by maintaining a fixed attitude of the object; by allowing the object's movement at heating and pressing of the transfer film and the object; and by preventing an adhesive layer of the film from adhering to clamps for the object and a rubber. Transfer of an accurate image from the film onto the transfer object by the image transfer apparatus is accomplished by a movable stage which is movable in a longitudinal direction of the film to locate a transfer object to be pressed and heated via a transfer film by a heating roller and a holding apparatus which is located on or on a side of the stage and which is relatively moved along with the stage while partially holding the transfer object.
    • 基于圆形长度和弦长的一致性的观察的图像形成装置。 通过保持物体的固定姿态,在转印物体上精确地转印图像而不破坏图像; 通过允许物体在加热和按压转印膜和物体时的移动; 并且通过防止膜的粘合剂层粘附到物体的夹具和橡胶上。 通过图像转印装置将精确图像从胶片转印到转印体上是通过可移动的载物台实现的,该可移动的载物台可在胶片的纵向方向上移动,以便通过加热定位要经由转印膜被压制和加热的转印体 辊子和保持装置,其位于舞台的一侧或侧面,并且在保持转印物体的同时与舞台相对移动。