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1. 发明申请

US20150279703A1 Semiconductor Substrate Cleaning Method and Cleaning System 有权
标题翻译：半导体衬底清洁方法和清洁系统
公开(公告)号：US20150279703A1
公开(公告)日：2015-10-01
申请号：US14432818
申请日：2013-09-30
申请人： Yuichi OGAWA , Haruyoshi YAMAKAWA , Kurita Water Industries Ltd.
发明人： Yuichi Ogawa , Haruyoshi Yamakawa
IPC分类号： H01L21/67 , H01L21/02
CPC分类号： H01L21/67051 , H01L21/02068 , H01L21/28518 , H01L21/32134
摘要： A method and system for cleaning a semiconductor substrate in which Al is at least partially exposed on a silicon substrate and which is silicided with a metallic substance, without damaging Al and a silicide layer, comprising a cleaning portion (2) for cleaning a semiconductor substrate 100 in which Al is at least partially exposed on a silicon substrate and which is silicided with a metallic substance; a delivery portion (30) disposed in the cleaning portion for delivering a cleaning solution to the semiconductor substrate in the cleaning portion to bring the cleaning solution into contact with the semiconductor substrate; a sulfuric acid solution transfer path (5) connected to the delivery portion for transferring a sulfuric acid solution comprising an oxidant to the delivery portion; and an adsorptive inhibitor solution transfer path (11) connected to the delivery portion for transferring a solution comprising an adsorptive inhibitor having any one or more of N-based, S-based, and P-based polar groups to the delivery portion. The sulfuric acid solution and the adsorptive inhibitor solution may be mixed or separately transferred to come into contact with or on the semiconductor substrate.
摘要翻译：一种用于清洁半导体衬底的方法和系统，其中Al至少部分地暴露在硅衬底上并且被金属物质硅化，而不损坏Al和硅化物层，包括用于清洁半导体衬底的清洁部分（2） 100，其中Al至少部分地暴露在硅衬底上并且被金属物质硅化; 设置在清洁部分中的输送部分（30），用于将清洁溶液输送到清洁部分中的半导体衬底，以使清洗溶液与半导体衬底接触; 连接到输送部分的用于将包含氧化剂的硫酸溶液转移到输送部分的硫酸溶液转移路径（5）以及连接到输送部分的吸附抑制剂溶液转移路径（11），用于将包含具有任何一种或多种N基，S基和P基极性基团的吸附抑制剂的溶液转移到输送部分。硫酸溶液和吸附抑制剂溶液可以混合或分开转移以与半导体衬底接触或接触。

2. 发明申请

US20150262811A1 METHOD AND SYSTEM FOR CLEANING SEMICONDUCTOR SUBSTRATE 审中-公开
标题翻译：清洁半导体衬底的方法和系统
公开(公告)号：US20150262811A1
公开(公告)日：2015-09-17
申请号：US14423270
申请日：2013-08-19
申请人： YUICHI OGAWA , HARUYOSHI YAMAKAWA
发明人： Yuichi Ogawa , Haruyoshi Yamakawa
IPC分类号： H01L21/02 , B08B3/10 , C25F1/00
CPC分类号： H01L21/02068 , B08B3/10 , B08B3/102 , C11D3/3947 , C11D11/0047 , C11D11/0064 , C25B1/285 , C25B15/08 , C25F1/00 , H01L21/28088 , H01L21/32134 , H01L21/67017
摘要： A cleaning method including a persulphuric acid producing step of causing a cleaning sulfuric acid solution to travel into an electrolyzing section and to circulate therethrough to produce persulphuric acid having a predetermined concentration by electrolysis in the electrolyzing section, a solution mixing step of mixing the sulfuric acid solution containing the persulphuric acid produced in the persulphuric acid producing step with a halide solution containing one or more types of halide ion without causing the solutions to travel into the electrolyzing section to produce a mixed solution having a post-mixture concentration of oxidant including the persulphuric acid that ranges from 0.001 to 2 mol/L, a heating step of heating the mixed solution, and a cleaning step of cleaning a semiconductor substrate by transporting the heated mixed solution to cause the heated mixed solution to come into contact with the semiconductor substrate.
摘要翻译：一种清洗方法，其特征在于，包括使硫酸溶液进入电解部并进行循环的硫酸生产工序，在所述电解部中通过电解生成具有规定浓度的过硫酸的溶液混合工序;将所述硫酸在含有一种或多种卤化物离子的卤化物溶液中含有在过硫酸生产步骤中产生的过硫酸的溶液，而不会使溶液进入电解部分，以产生具有包含硫化氢的氧化剂的后期浓度的混合溶液酸，范围为0.001〜2mol / L，加热混合溶液的加热步骤，以及通过输送加热的混合溶液以使加热的混合溶液与半导体基板接触来清洁半导体基板的清洗步骤。

3. 发明授权

US10032623B2 Method and system for cleaning semiconductor substrate 有权
公开(公告)号：US10032623B2
公开(公告)日：2018-07-24
申请号：US14423270
申请日：2013-08-19
申请人： Yuichi Ogawa , Haruyoshi Yamakawa
发明人： Yuichi Ogawa , Haruyoshi Yamakawa
IPC分类号： H01L21/02 , B08B3/10 , C25B15/08 , C25B1/28 , H01L21/3213 , H01L21/67 , H01L21/28 , C25F1/00 , H01L21/32
摘要： A cleaning method including a persulphuric acid producing step of causing a cleaning sulfuric acid solution to travel into an electrolyzing section and to circulate therethrough to produce persulphuric acid having a predetermined concentration by electrolysis in the electrolyzing section, a solution mixing step of mixing the sulfuric acid solution containing the persulphuric acid produced in the persulphuric acid producing step with a halide solution containing one or more types of halide ion without causing the solutions to travel into the electrolyzing section to produce a mixed solution having a post-mixture concentration of oxidant including the persulphuric acid that ranges from 0.001 to 2 mol/L, a heating step of heating the mixed solution, and a cleaning step of cleaning a semiconductor substrate by transporting the heated mixed solution to cause the heated mixed solution to come into contact with the semiconductor substrate.

4. 发明授权

US08601182B2 Data communication control device 有权
公开(公告)号：US08601182B2
公开(公告)日：2013-12-03
申请号：US12382748
申请日：2009-03-23
申请人： Satoru Nishita , Yuichi Ogawa
发明人： Satoru Nishita , Yuichi Ogawa
IPC分类号： G06F3/00
CPC分类号： G06F13/28
摘要： A data communication control device. The data communication control device includes, a controller comprising a first data storing part, the first data storing part including multiple channels, each channel being applied to store a command for data transfer based on a destination of data, the controller executing the command stored in the channel from the head to transfer data and, an overall controller storing the command in the channel of the first data storing part when the number of commands in a certain channel is not over a upper limit, and stopping to store the command in the channel of the first data storing part and creating a second data storing part and storing the command in the second data storing part when the number of commands in a certain channel is over the upper limit.

5. 发明授权

US08483587B2 Apparatus and method for image forming including density correction according to a phase based on correction information 有权
标题翻译：用于图像形成的装置和方法，包括基于校正信息的相位的密度校正
公开(公告)号：US08483587B2
公开(公告)日：2013-07-09
申请号：US12825104
申请日：2010-06-28
申请人： Takayuki Fukutani , Yuuji Takayama , Tomoyuki Saiki , Tae Mutsuo , Yuichi Ogawa
发明人： Takayuki Fukutani , Yuuji Takayama , Tomoyuki Saiki , Tae Mutsuo , Yuichi Ogawa
IPC分类号： G03G15/00
CPC分类号： G03G15/5008 , G03G15/0131 , G03G15/0194 , G03G15/1615 , G03G15/5058 , G03G2215/00059 , G03G2215/0129 , G03G2215/0164
摘要： An apparatus includes an image formation unit including a photosensitive drum and a motor for driving the image formation unit. The apparatus acquires a frequency generator signal, which is phase information output from the motor as the motor rotates. In addition, the apparatus corrects unevenness of the density that may occur due to the rotation of the motor according to the acquired phase information.
摘要翻译：一种装置包括：图像形成单元，包括感光鼓和用于驱动图像形成单元的马达。该装置获取频率发生器信号，该频率发生器信号是当马达旋转时从马达输出的相位信息。此外，该装置根据获取的相位信息来校正由于电动机的旋转而可能发生的密度的不均匀性。

6. 发明申请

US20120062351A1 Ferromagnetic amorphous alloy ribbon with reduced surface protrusions, method of casting and application thereof 有权
标题翻译：具有减小的表面突起的铁磁性非晶合金带，铸造方法及其应用
公开(公告)号：US20120062351A1
公开(公告)日：2012-03-15
申请号：US12923224
申请日：2010-09-09
申请人： Eric A. Theisen , James Perrozi , Yuichi Ogawa , Yuji Matsumoto , Daichi Azuma , Ryusuke Hasegawa
发明人： Eric A. Theisen , James Perrozi , Yuichi Ogawa , Yuji Matsumoto , Daichi Azuma , Ryusuke Hasegawa
IPC分类号： H01F27/25 , B22D11/00 , H01F7/06 , H01F1/01
CPC分类号： B22D11/0611 , B22D11/001 , H01F1/15308 , H01F1/15333 , H01F27/25 , H01F41/0226 , Y10T29/49071
摘要： A ferromagnetic amorphous alloy ribbon includes an alloy having a composition represented by FeaSibBcCd where 80.5≦a≦83 at. %, 0.5≦b≦6 at. %, 12≦c≦16.5 at. %, 0.01≦d≦1 at. % with a+b+c+d=100 and incidental impurities, the ribbon being cast from a molten state of the alloy with a molten alloy surface tension of greater than or equal to 1.1 N/m on a chill body surface; the ribbon having a ribbon length, a ribbon thickness, and a ribbon surface facing the chill body surface; the ribbon having ribbon surface protrusions being formed on the ribbon surface facing the chill body surface; the ribbon surface protrusions being measured in terms of a protrusion height and a number of protrusions; the protrusion height exceeding 3 μm and less than four times the ribbon thickness, and the number of protrusions being less than 10 within 1.5 m of the cast ribbon length; and the alloy ribbon in its annealed straight strip form having a saturation magnetic induction exceeding 1.60 T and exhibiting a magnetic core loss of less than 0.14 W/kg when measured at 60 Hz and at 1.3 T induction level in its annealed straight strip form. The ribbon is suitable for transformer cores, rotational machines, electrical chokes, magnetic sensors, and pulse power devices.
摘要翻译：铁磁非晶合金带包括具有由FeaSibBcCd表示的组成的合金，其中80.5＆lt; 1; a＆nlE; 83 at。％，0.5＆nlE; b＆nlE; 6 at。％，12＆nlE; c＆nlE; 16.5 at。％，0.01＆nlE; d＆nlE; 1 at。％+ a + b + c + d = 100和偶然的杂质，该带从合金的熔融状态浇铸，熔融合金的表面张力大于或等于1.1N / m; 所述带具有带长度，带厚度和面向所述冷却体表面的带状表面; 所述带状带表面突起形成在所述带状表面上面向所述冷却体表面; 根据突出高度和突出数量来测量带状表面突起; 突出高度超过3μm且小于带厚度的四倍，并且在铸带长度的1.5μm内的突起数量小于10; 并且其退火的直条形状的合金带形状具有超过1.60T的饱和磁感应，并且在其退火的直条形式下以60Hz和1.3T的感应电平测量时，磁芯损耗小于0.14W / kg。该带适用于变压器铁芯，旋转机，电扼流圈，磁传感器和脉冲功率器件。

7. 发明申请

US20120049992A1 Ferromagnetic amorphous alloy ribbon and fabrication thereof 有权
标题翻译：铁磁非晶合金带及其制造
公开(公告)号：US20120049992A1
公开(公告)日：2012-03-01
申请号：US12923076
申请日：2010-08-31
申请人： Daichi Azuma , Ryusuke Hasegawa , Yuichi Ogawa , Eric A. Theisen , Yuji Matsumoto
发明人： Daichi Azuma , Ryusuke Hasegawa , Yuichi Ogawa , Eric A. Theisen , Yuji Matsumoto
IPC分类号： H01F27/25 , B22D11/00 , H01F1/153
CPC分类号： B22D11/0611 , H01F1/15308 , H01F1/15333 , H01F27/25 , H01F41/0226
摘要： A ferromagnetic amorphous alloy ribbon includes an alloy having a composition represented by FeaSibBcCd where 80.5≦a≦83 at. %, 0.5≦b≦6 at. %, 12≦c≦16.5 at. %, 0.01≦d≦1 at. % with a+b+c+d=100 and incidental impurities; the ribbon being cast from a molten state of the alloy, with a molten alloy surface tension of greater than or equal to 1.1 N/m; the defect length along a direction of the ribbon's length being between 5 mm and 200 mm, the defect depth being less than 0.4×t μm and the defect occurrence frequency being less than 0.05×w times within 1.5 m of ribbon length, where t is the ribbon thickness and w is the ribbon width, and the ribbon having a saturation magnetic induction exceeding 1.60 T and exhibiting a magnetic core loss of less than 0.14 W/kg when measured at 60 Hz and at 1.3 T induction level in an annealed straight strip form, and a core magnetic loss of less than 0.3 W/kg and an exciting power of less than 0.4 VA/kg in an annealed wound transformer core form. The ribbon is suitable for use in transformer cores, rotational machines, electrical chokes, magnetic sensors and pulse power devices.
摘要翻译：铁磁非晶合金带包括具有由FeaSibBcCd表示的组成的合金，其中80.5＆lt; 1; a＆nlE; 83 at。％，0.5＆nlE; b＆nlE; 6 at。％，12＆nlE; c＆nlE; 16.5 at。％，0.01＆nlE; d＆nlE; 1 at。％+ a + b + c + d = 100和杂质; 该钢带从合金的熔融状态铸造，熔融合金表面张力大于或等于1.1N / m; 沿着带长度的方向的缺陷长度在5mm和200mm之间，缺陷深度小于0.4×tμm，缺陷发生频率在丝带长度的1.5μm内小于0.05×w倍，其中t是带状厚度和w是带宽，并且具有超过1.60T的饱和磁感应的带，并且在退火的直条中以60Hz和1.3T的感应水平测量时，磁芯损耗小于0.14W / kg 形式，并且在退火的卷绕变压器铁芯形式中的小于0.3W / kg的磁芯损耗和小于0.4VA / kg的激励功率。该带适用于变压器铁芯，旋转机，电扼流圈，磁传感器和脉冲功率器件。

8. 发明申请

US20120048428A1 Ferromagnetic amorphous alloy ribbon and fabrication thereof 有权
标题翻译：铁磁非晶合金带及其制造
公开(公告)号：US20120048428A1
公开(公告)日：2012-03-01
申请号：US12923074
申请日：2010-08-31
申请人： Yuichi Ogawa , Eric A. Theisen , Yuji Matsumoto , James Perrozi , Ryusuke Hasegawa
发明人： Yuichi Ogawa , Eric A. Theisen , Yuji Matsumoto , James Perrozi , Ryusuke Hasegawa
IPC分类号： H01F1/047 , B23P17/00 , B22D11/00
CPC分类号： B22D11/0611 , H01F1/15308 , H01F1/15333 , H01F41/0226 , Y10T29/49988
摘要： A ferromagnetic amorphous alloy ribbon includes an alloy having a composition represented by FeaSibBcCd where 80.5≦a≦83 at. %, 0.5≦b≦6 at. %, 12≦c≦16.5 at. %, 0.01≦d≦1 at. % with a+b+c+d=100 and incidental impurities, the defect length along a direction of the ribbon's length being between 5 mm and 200 mm, the defect depth being less than 0.4×t μm and the defect occurrence frequency being less than 0.05×w times within 1.5 m of ribbon length, where t and w are ribbon thickness and ribbon width, respectively, and the ribbon in its annealed state and straight strip form of the ribbon, has a saturation magnetic induction exceeding 1.60 T, and exhibits a magnetic core loss of less than 0.14 W/kg when measured at 60 Hz and at 1.3 T induction level. The ribbon is suitable for use in transformer cores, rotational machines, electrical chokes, magnetic sensors and pulse power devices.
摘要翻译：铁磁非晶合金带包括具有由FeaSibBcCd表示的组成的合金，其中80.5＆lt; 1; a＆nlE; 83 at。％，0.5＆nlE; b＆nlE; 6 at。％，12＆nlE; c＆nlE; 16.5 at。％，0.01＆nlE; d＆nlE; 1 at。％+ b + c + d = 100和附带杂质，沿着色带长度方向的缺陷长度在5mm至200mm之间，缺陷深度小于0.4×tμm，缺陷发生频率较小在丝带长度1.5μm以内，分别为丝带厚度和带宽度为t和w的0.05×w倍以上，带状退火状态的丝带和带状带状形状的饱和磁感应超过1.60T，当在60Hz和1.3T诱导水平下测量时，磁芯损耗小于0.14W / kg。该带适用于变压器铁芯，旋转机，电扼流圈，磁传感器和脉冲功率器件。

9. 发明申请

US20120008142A1 METHOD FOR MEASURING CHARACTERISTIC OF OBJECT TO BE MEASURED, STRUCTURE CAUSING DIFFRACTION PHENOMENON, AND MEASURING DEVICE 有权
标题翻译：用于测量待测物体特征的方法，结构导致衍射原子和测量装置
公开(公告)号：US20120008142A1
公开(公告)日：2012-01-12
申请号：US13239830
申请日：2011-09-22
申请人： Seiji Kamba , Takashi Kondo , Koji Tanaka , Kazuhiro Takigawa , Yuichi Ogawa
发明人： Seiji Kamba , Takashi Kondo , Koji Tanaka , Kazuhiro Takigawa , Yuichi Ogawa
IPC分类号： G01J3/28
CPC分类号： G01N21/4788 , G01N33/54373
摘要： A method of attaching an object to be measured to a structure causing a diffraction phenomenon; irradiating the structure to which the object to be measured is attached and which causes the diffraction phenomenon with an electromagnetic wave; detecting the electromagnetic wave scattered by the structure causing the diffraction phenomenon; and measuring a characteristic of the object to be measured from the frequency characteristic of the detected electromagnetic wave. The object to be measured is attached directly to the surface of the structure causing the diffraction phenomenon. Thus, the method for measuring the characteristic of an object to be measured exhibits an improved measurement sensitivity and high reproducibility. A structure causing a diffraction phenomenon and used for the method, and a measuring device are provided.
摘要翻译：将测量对象附着到引起衍射现象的结构的方法; 照射被测定对象物的结构，并用电磁波引起衍射现象; 检测由结构散射的电磁波引起的衍射现象; 并根据检测到的电磁波的频率特性来测量待测物体的特性。要测量的物体直接附着在结构的表面，引起衍射现象。因此，用于测量待测物体的特性的方法具有改进的测量灵敏度和高再现性。提供引起衍射现象并用于该方法的结构和测量装置。

10. 发明申请

US20100108887A1 PELLET FOR SPECTROMETRY, PROCESS FOR PRODUCING THE PELLET, AND METHOD FOR SPECTROMETRY USING THE PELLET 审中-公开
标题翻译：用于分光光度计的分散体，用于生产小片的方法，以及使用薄片分光光度法的方法
公开(公告)号：US20100108887A1
公开(公告)日：2010-05-06
申请号：US12595571
申请日：2008-04-11
申请人： Yuichi Ogawa , Masashi Okamoto
发明人： Yuichi Ogawa , Masashi Okamoto
IPC分类号： G01J5/02 , B29B9/08 , G01N31/00
CPC分类号： G01N21/3563 , G01N1/286 , G01N21/278 , G01N21/3581 , G01N2021/3572 , G01N2021/3595
摘要： A pellet used for spectrometry is manufactured by, for example, mixing polyethylene powder having an average particle size not greater than 35 μm with powder of an analysis target, and compressing the mixture. A sample pellet (B) prepared by compacting only polyethylene powder having an average particle size not grater than 35 μm exhibits a high transmittance in the wave number range of 10-340 cm−1. In spectrometry using a pellet of the present invention, spectrum waveform of the analysis target material at a range of wave number 140-250 cm−1 is measured.
摘要翻译：用于光谱测定的颗粒通过例如将平均粒度不大于35μm的聚乙烯粉末与分析靶的粉末混合并压缩混合物来制造。通过仅压制平均粒径不超过35μm的聚乙烯粉末制备的样品颗粒（B）在10-340cm -1的波数范围内具有高透射率。在使用本发明的颗粒的光谱法中，测量在140-250cm -1波数范围内的分析对象材料的光谱波形。

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