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    • 4. 发明授权
    • Magnetic recording medium including plural FePt alloy layers including carbon, oxides or nitrides
    • 磁记录介质包括包含碳,氧化物或氮化物的多个FePt合金层
    • US08679654B2
    • 2014-03-25
    • US13372116
    • 2012-02-13
    • Hiroaki NemotoIkuko TakekumaKimio NakamuraJunichi Sayama
    • Hiroaki NemotoIkuko TakekumaKimio NakamuraJunichi Sayama
    • G11B5/66G11B5/65C22C38/00C22C5/04
    • G11B5/653C22C5/04C22C38/002C22C2202/02G11B5/65G11B5/66
    • Surface flatness of magnetic recording medium to which a magnetic recording layer made of L10 FePt magnetic alloy thin film, with distance between a magnetic head and a magnetic recording medium sufficiently reduced. The magnetic recording layer includes: magnetic layers containing a magnetic alloy including Fe and Pt as principal materials; and one non-magnetic material selected from carbon, oxide and nitride. The first magnetic layer disposed closer to a substrate has a granular structure in which magnetic alloy grains including FePt alloy as the principal material are separated from grain boundaries including the non-magnetic material as the principal material. The second magnetic layer disposed closer to the surface than the first magnetic layer is fabricated so as to have a homogeneous structure in which an FePt alloy and the non-magnetic material are mixed in a state finer than diameters of the FePt magnetic alloy grains in the first magnetic layer.
    • 由L10FePt磁性合金薄膜制成的磁记录层,磁头和磁记录介质之间的距离充分降低的磁记录介质的表面平整度。 磁记录层包括:含有以Fe和Pt为主要材料的磁性合金的磁性层; 和一种选自碳,氧化物和氮化物的非磁性材料。 靠近基板设置的第一磁性层具有以包含FePt合金作为主要材料的磁性合金颗粒与包括非磁性材料在内的晶界作为主要材料的颗粒结构。 制造比第一磁性层更靠近表面的第二磁性层,以具有均匀的结构,其中FePt合金和非磁性材料以比FePt磁性合金粒子的直径小的状态混合 第一磁性层。
    • 7. 发明授权
    • Liquid for immersion exposure and immersion exposure method
    • 液体浸渍曝光和浸渍曝光方法
    • US07580111B2
    • 2009-08-25
    • US10588263
    • 2005-05-19
    • Takashi MiyamatsuHiroaki NemotoYong Wang
    • Takashi MiyamatsuHiroaki NemotoYong Wang
    • G03B27/42G03B27/52
    • G03F7/2041
    • An immersion exposure liquid which exhibits a high refractive index, prevents elution and dissolution of a photoresist film or its upper layer film component, and reduces defects during formation of a resist pattern when used in an immersion exposure method, and an immersion exposure method using the immersion exposure liquid. The immersion exposure liquid is used for an immersion exposure device or an immersion exposure method in which a substrate is exposed through a liquid provided between a lens of a projection optical system and the substrate, the immersion exposure liquid being liquid in an operating temperature range of the immersion exposure device and including an alicyclic hydrocarbon compound or a cyclic hydrocarbon compound containing a silicon atom in the ring structure.
    • 表现出高折射率的浸渍曝光液体,防止光刻胶膜或其上层膜成分的溶出和溶解,并且在浸渍曝光方法中使用时减少形成抗蚀剂图案时的缺陷,以及使用 浸渍曝光液体。 浸渍曝光液体用于浸没曝光装置或浸渍曝光方法,其中通过设置在投影光学系统的透镜和基板之间的液体曝光基板,浸没曝光液体在液晶的工作温度范围内 浸渍曝光装置,并且在环结构中包含脂环族烃化合物或含有硅原子的环状烃化合物。