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    • 1. 发明授权
    • Direct view display device with array of tapered waveguide on viewer side
    • 在观察器侧具有锥形波导阵列的直视显示装置
    • US5481385A
    • 1996-01-02
    • US86414
    • 1993-07-01
    • Scott M. ZimmermanKarl W. BeesonMichael J. McFarlandJames T. YardleyPaul M. Ferm
    • Scott M. ZimmermanKarl W. BeesonMichael J. McFarlandJames T. YardleyPaul M. Ferm
    • G02F1/1335
    • G02F1/133524
    • A direct view display including a light generating means for generating light, a modulating means for modulating light from said light generating means to form an image, and an image display means for displaying said image from said modulating means positioned adjacent to the light output surface of said modulating means, said display means comprising an array of tapered optical waveguides on a planar substrate the tapered end of each of said waveguides extending outward from said substrate and having a light input surface adjacent said substrate and a light output surface distal from said light input surface. The area of the light input surface of each waveguide is greater than the area of its light output surface, and the center-to-center distance between the light input surfaces of adjacent waveguides in said array is equal to the center-to-center distance between the light output surfaces thereof, so that the angular distribution of light emerging from the output surfaces of the waveguides is larger than the angular distribution of light entering the waveguides. Also, the waveguides in said array are separated by interstitial regions with a lower refractive index than the refractive index of said waveguides.
    • 一种包括用于产生光的发光装置的直视图显示器,用于调制来自所述光产生装置的光以形成图像的调制装置,以及用于显示所述图像从所述调制装置显示所述图像的图像显示装置,所述调制装置邻近所述光输出表面 所述调制装置,所述显示装置包括在平面基板上的锥形光波导阵列,每个所述波导的锥形端从所述基板向外延伸并且具有与所述基板相邻的光输入表面和远离所述光输入的光输出表面 表面。 每个波导的光输入表面的面积大于其光输出表面的面积,并且所述阵列中相邻波导的光输入表面之间的中心到中心距离等于中心到中心距离 在其光输出表面之间,使得从波导的输出表面出射的光的角分布大于进入波导的光的角分布。 此外,所述阵列中的波导通过具有比所述波导的折射率更低的折射率的间隙区域分开。
    • 3. 发明授权
    • High resolution photoresist of imide containing polymers
    • 含有聚酰亚胺的高分辨率光刻胶
    • US4968581A
    • 1990-11-06
    • US361985
    • 1989-06-06
    • Chengjiu WuAnne M. MooringMichael J. McFarlandChristopher E. OsuchJames T. Yardley
    • Chengjiu WuAnne M. MooringMichael J. McFarlandChristopher E. OsuchJames T. Yardley
    • G03F7/004G03F7/023G03F7/039
    • G03F7/004G03F7/0233G03F7/039
    • Photoresist compositions suitable for deep UV and excimer laser lithography are disclosed that are mixtures of a photoacid and a polymer having imide residues to which acid labile groups are attached. These compositions provide high resolution, high contrast and high sensitivity in the deep UV (wavelength of 250-300 nm), mid-UV (wavelength of 300-350 nm) or conventional (wavelength of 350-450 nm) exposure bands. The compositions are also suitable for exposure at wavelengths commonly associated with excimer laser sources (248, 308 nm) or for exposure by X-radiation.In the compositions disclosed, the imide group ##STR1## can be blocked with certain groups, X, to form compounds containing the structure ##STR2## which have solubility properties different from the unblocked imide. These groups, X, can be cleaved by acid under the proper conditions to regenerate the unblocked imide. Also, where the imide group is incorporated in a polymer, the polymer with blocked imide groups can be made to function as a resist when compounded with a substance capable of forming an acid upon exposure to radiation.The exact nature of the imide containing polymer is not critical, providing that: (1) in the unblocked state, the polymer is completely soluble in aqueous alkali; (2) in the blocked state, it is insoluble in the same aqueous solution, while simultaneously; (3) in the blocked state, it is soluble in a solvent capable of dissolving a suitable sensitizer; and (4) it is film forming. Other secondary properties may be selected (to enhance the characteristics of the resist) by varying the structure of the imide or a comonomer.
    • 公开了适用于深UV和准分子激光光刻的光刻胶组合物,其是光酸和具有酸不稳定基团所连接的酰亚胺残基的聚合物的混合物。 这些组合物在深UV(波长250-300nm),中紫外(波长300-350nm)或常规(波长350-450nm)曝光带中提供高分辨率,高对比度和高灵敏度。 组合物还适用于通常与准分子激光源(248,308nm)相关的波长或​​通过X射线曝光的波长下的曝光。 在所公开的组合物中,酰亚胺基团可以被某些基团X封闭,形成含有与未封端酰亚胺不同的溶解性质的结构“IMAGE”的化合物。 这些基团X可以在合适的条件下被酸裂解以再生未封闭的酰亚胺。 此外,当酰亚胺基团结合在聚合物中时,当与能够在暴露于辐射时形成酸的物质复合时,具有封闭的酰亚胺基团的聚合物可以用作抗蚀剂。 含酰亚胺聚合物的确切性质不是关键的,条件是:(1)在未封闭状态下,聚合物完全溶于碱水溶液中; (2)在封闭状态下,同时溶于同一水溶液; (3)在封闭状态下,可溶于能够溶解合适的敏化剂的溶剂中; 和(4)是成膜。 可以通过改变酰亚胺或共聚单体的结构来选择其它二次性质(以增强抗蚀剂的特性)。
    • 4. 发明授权
    • High resolution photoresist of imide containing polymers
    • 含有聚酰亚胺的高分辨率光刻胶
    • US4837124A
    • 1989-06-06
    • US832116
    • 1986-02-24
    • Chengjiu WuAnne M. MooringMichael J. McFarlandChristopher E. OsuchJames T. Yardley
    • Chengjiu WuAnne M. MooringMichael J. McFarlandChristopher E. OsuchJames T. Yardley
    • G03C1/72G03F7/004G03F7/023G03F7/039H01L21/027
    • G03F7/039G03F7/004G03F7/0233
    • Photoresist compositions suitable for deep UV and excimer laser lithography are disclosed that are mixtures of a photoacid and a polymer having imide residues to which acid labile groups are attached. These compositions provide high resolution, high contrast and high sensitivity in the deep UV (wavelength of 250-300 nm), mid-UV (wavelength of 300-350 nm) or conventional (wavelength of 350-450 nm) exposure bands. The compositions are also suitable for exposure at wavelengths commonly associated with excimer laser sources (248, 308 nm) or for exposure by X-radiation.In the compositions disclosed, the imide group ##STR1## can be blocked with certain groups, X, to form compounds containing the structure ##STR2## which have solubility properties different from the unblocked imide. These groups, X, can be cleaved by acid under the proper conditions to regenerate the unblocked imide. Also, where the imide group is incorporated in a polymer, the polymer with blocked imide groups can be made to function as a resist when compounded with a substrate capable of forming an acid upon exposure to radiation.The exact nature of the imide containing polymer is not critical, providing that: (1) in the unblocked state, the polymer is completely soluble in aqueous alkali; (2) in the blocked state, it is insoluble in the same aqueous solution, while simultaneously; (3) in the blocked state, it is soluble in a solvent capable of dissolving a suitable sensitizer; and (4) it is film forming. Other secondary properties may be selected (to enhance the characteristics of the resist) by varying the structure of the imide or a comonomer.
    • 公开了适用于深UV和准分子激光光刻的光刻胶组合物,其是光酸和具有酸不稳定基团所连接的酰亚胺残基的聚合物的混合物。 这些组合物在深UV(波长250-300nm),中紫外(波长300-350nm)或常规(波长350-450nm)曝光带中提供高分辨率,高对比度和高灵敏度。 组合物还适用于通常与准分子激光源(248,308nm)相关的波长或​​通过X射线曝光的波长下的曝光。 在所公开的组合物中,酰亚胺基团可以被某些基团X封闭,形成含有与未封端酰亚胺不同的溶解性质的结构“IMAGE”的化合物。 这些基团X可以在合适的条件下被酸裂解以再生未封闭的酰亚胺。 此外,当酰亚胺基团掺入聚合物中时,具有封闭的酰亚胺基团的聚合物可以在与能够在暴露于辐射时形成酸的基材复合时用作抗蚀剂。 含酰亚胺聚合物的确切性质不是关键的,条件是:(1)在未封闭状态下,聚合物完全溶于碱水溶液中; (2)在封闭状态下,同时溶于同一水溶液; (3)在封闭状态下,可溶于能够溶解合适的敏化剂的溶剂中; 和(4)是成膜。 可以通过改变酰亚胺或共聚单体的结构来选择其它二次性质(以增强抗蚀剂的特性)。