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1. 发明授权

US08305556B2 Projection optical system, exposure apparatus, exposure method, display manufacturing method, mask, and mask manufacturing method 有权
标题翻译：投影光学系统，曝光装置，曝光方法，显示制造方法，掩模和掩模制造方法
公开(公告)号：US08305556B2
公开(公告)日：2012-11-06
申请号：US12190260
申请日：2008-08-12
申请人： Masato Kumazawa , Tatsuo Fukui
发明人： Masato Kumazawa , Tatsuo Fukui
IPC分类号： G03B27/44 , G03B27/00 , G03B27/42
CPC分类号： G02B17/0804 , G03F1/144 , G03F7/70275 , G03F7/70791 , G03F9/7084
摘要： An exposure apparatus of the present invention is an exposure apparatus for, while moving a first object M and a second object P along a scanning direction, performing projection exposure on the second object, which has a first projection optical system PL10 for forming an enlargement image of a portion on the first object in a first region being a partial region on the second object, and a second projection optical system PL11 for forming an enlargement image of a different portion from the portion on the first object in a second region different from the partial region on the second object, and which also has a first stage MST holding the first object and making at least one of the portion and the different portion of the first object movable along the non-scanning direction, wherein the first region and the second region are arranged at a predetermined interval along the non-scanning direction intersecting with the scanning direction.
摘要翻译：本发明的曝光装置是用于在第一物体M和第二物体P沿着扫描方向移动的同时对第二物体进行投射曝光的曝光装置，该第二物体具有用于形成放大图像的第一投影光学系统PL10 在第一区域中的第一区域上的部分是第二物体上的部分区域;以及第二投影光学系统PL11，用于在不同于第二物体的第二区域中形成与第一物体上的部分不同部分的放大图像并且还具有保持第一物体的第一级MST，并且使得第一物体的部分和不同部分中的至少一个沿着非扫描方向可移动，其中第一区域和第二物体区域沿着与扫描方向相交的非扫描方向以预定间隔布置。

2. 发明授权

US4744662A Apparatus for measuring dimensions of micropattern 失效
标题翻译：用于测量微图案尺寸的装置
公开(公告)号：US4744662A
公开(公告)日：1988-05-17
申请号：US881391
申请日：1986-07-02
申请人： Takeshi Suto , Masato Kumazawa , Tatsumi Ishizeki
发明人： Takeshi Suto , Masato Kumazawa , Tatsumi Ishizeki
IPC分类号： G01B11/02 , G01B11/14 , G01N21/88 , G01N21/956 , G03F7/20 , H01L21/027 , H01L21/30 , H01L21/66
CPC分类号： G03F7/70483 , G01B11/02
摘要： An apparatus for measuring dimensions of a micropattern has a photoelectric sensor for scanning an enlarged image of a pattern and detects the positions of the leading and trailing edges by use of a predetermined slice level from a photoelectric signal which is derived by this sensor, thereby detecting the interval between those edges. The slice level is corrected in accordance with the interval between the edges to be measured. An amount of correction is stored as a predetermined table. A determination is made by an interval discriminating section to see if the correction needs to be performed or not.
摘要翻译：用于测量微图案尺寸的装置具有用于扫描图案的放大图像的光电传感器，并且通过使用由该传感器导出的光电信号的预定限幅电平来检测前缘和后缘的位置，由此检测这些边缘之间的间隔。切片电平根据要测量的边缘之间的间隔进行校正。作为预定表存储校正量。由区间识别部判定是否需要进行校正。

3. 发明申请

US20080165334A1 Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method 有权
标题翻译：投影光学装置，曝光方法和装置，光掩模，装置和光掩模制造方法
公开(公告)号：US20080165334A1
公开(公告)日：2008-07-10
申请号：US12000074
申请日：2007-12-07
申请人： Masato Kumazawa , Hitoshi Hatada
发明人： Masato Kumazawa , Hitoshi Hatada
IPC分类号： G03B27/42 , G03B27/54 , G03F1/00
CPC分类号： G03F7/70791 , G03F7/70216 , G03F7/70275 , G03F7/70475
摘要： When forming a magnified image of a mask pattern on an object with a plurality of projection optical systems, projected images of the projection optical systems are formed to be accurately continuous to enable satisfactory pattern transfer. A first projection optical system directs light beam from point a on a mask to point A on a plate and forms a magnified image of the mask on the plate. A second projection optical system directs light beam from point b on the mask to point on the plate and forms a magnified image of the mask on the plate. A first line segment linking point A and point a′, which orthogonally projects point a on the plate, and a second line segment linking point B and point b′, which orthogonally projects point b on the plate PT, overlap each other as viewed in a non-scanning direction.
摘要翻译：当在具有多个投影光学系统的物体上形成掩模图案的放大图像时，投影光学系统的投影图像形成为准确连续，以实现令人满意的图案转印。第一投影光学系统将光束从掩模上的点a引导到板上的点A，并在该板上形成掩模的放大图像。第二投影光学系统将来自点b的光束引导到掩模上以指向板上并在该板上形成掩模的放大图像。连接点A和点a'的第一线段，其正交地投影在板上的点a，并且连接点B和点b'的第二线段，其在板PT上正交投影点b，彼此重叠，如非扫描方向。

4. 发明授权

US07372544B2 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 失效
标题翻译：曝光装置，光学投影装置和调整光学投影装置的方法
公开(公告)号：US07372544B2
公开(公告)日：2008-05-13
申请号：US11797605
申请日：2007-05-04
申请人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
发明人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
IPC分类号： G03B27/32 , G03B27/42 , G03B27/44 , G03B27/54
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/045 , G02B17/0605 , G02B17/08 , G02B17/0812 , G02B17/082 , G02B17/0828 , G02B17/086 , G02B27/144 , G02B27/145 , G03B27/32 , G03F7/70066 , G03F7/70216 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70791
摘要： An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.
摘要翻译：曝光装置包括多个投影光学系统，每个投影光学系统具有布置在第一表面和第二表面之间的光路中的光学元件，并且通过光学器件从第一表面形成辐射图案到第二表面上的曝光场元素。所述装置还包括相对于所述多个投影光学系统设置在所述第二表面的侧面中的可移动部分，所述多个投影光学系统在所述物体与所述投影光学系统的扫描曝光期间在第一方向上相对于所述曝光场保持要移动的物体辐射图。多个投影光学系统中的每一个在第二表面的一侧是远心的，并且曝光区域在与第一方向交叉的第二方向上布置在不同的位置。

5. 发明申请

US20070216885A1 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 失效
标题翻译：曝光装置，光学投影装置和调整光学投影装置的方法
公开(公告)号：US20070216885A1
公开(公告)日：2007-09-20
申请号：US11797605
申请日：2007-05-04
申请人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
发明人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
IPC分类号： G03B27/32
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/045 , G02B17/0605 , G02B17/08 , G02B17/0812 , G02B17/082 , G02B17/0828 , G02B17/086 , G02B27/144 , G02B27/145 , G03B27/32 , G03F7/70066 , G03F7/70216 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70791
摘要： An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.
摘要翻译：曝光装置包括多个投影光学系统，每个投影光学系统具有布置在第一表面和第二表面之间的光路中的光学元件，并且通过光学器件从第一表面形成辐射图案到第二表面上的曝光场元素。所述装置还包括相对于所述多个投影光学系统设置在所述第二表面的侧面中的可移动部分，所述多个投影光学系统在所述物体与所述投影光学系统的扫描曝光期间在第一方向上相对于所述曝光场保持要移动的物体辐射图。多个投影光学系统中的每一个在第二表面的一侧是远心的，并且曝光区域在与第一方向交叉的第二方向上布置在不同的位置。

6. 发明授权

US08130364B2 Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method 有权
标题翻译：投影光学装置，曝光方法和装置，光掩模，装置和光掩模制造方法
公开(公告)号：US08130364B2
公开(公告)日：2012-03-06
申请号：US12000074
申请日：2007-12-07
申请人： Masato Kumazawa , Hitoshi Hatada
发明人： Masato Kumazawa , Hitoshi Hatada
IPC分类号： G03B27/54 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70791 , G03F7/70216 , G03F7/70275 , G03F7/70475
摘要： When forming a magnified image of a mask pattern on an object with a plurality of projection optical systems, projected images of the projection optical systems are formed to be accurately continuous to enable satisfactory pattern transfer. A first projection optical system directs light beam from point a on a mask to point A on a plate and forms a magnified image of the mask on the plate. A second projection optical system directs light beam from point b on the mask to point on the plate and forms a magnified image of the mask on the plate. A first line segment linking point A and point a′, which orthogonally projects point a on the plate, and a second line segment linking point B and point b′, which orthogonally projects point b on the plate PT, overlap each other as viewed in a non-scanning direction.
摘要翻译：当在具有多个投影光学系统的物体上形成掩模图案的放大图像时，投影光学系统的投影图像被形成为准确连续以实现令人满意的图案转印。第一投影光学系统将光束从掩模上的点a引导到板上的点A，并在该板上形成掩模的放大图像。第二投影光学系统将来自点b的光束引导到掩模上以指向板上并在该板上形成掩模的放大图像。连接点A和点a'的第一线段，其正交地投影在板上的点a，并且连接点B和点b'的第二线段，其在板PT上正交投影点b，彼此重叠，如非扫描方向。

7. 发明授权

US07372543B2 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 失效
公开(公告)号：US07372543B2
公开(公告)日：2008-05-13
申请号：US11471658
申请日：2006-06-21
申请人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
发明人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
IPC分类号： G03B27/32 , G03B27/54 , G03B27/44
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/045 , G02B17/0605 , G02B17/08 , G02B17/0812 , G02B17/082 , G02B17/0828 , G02B17/086 , G02B27/144 , G02B27/145 , G03B27/32 , G03F7/70066 , G03F7/70216 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70791
摘要： An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.

8. 发明授权

US06795169B2 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 失效
标题翻译：曝光装置，光学投影装置和调整光学投影装置的方法
公开(公告)号：US06795169B2
公开(公告)日：2004-09-21
申请号：US10382874
申请日：2003-03-07
申请人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
发明人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
IPC分类号： G03B2742
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/045 , G02B17/0605 , G02B17/08 , G02B17/0812 , G02B17/082 , G02B17/0828 , G02B17/086 , G02B27/144 , G02B27/145 , G03B27/32 , G03F7/70066 , G03F7/70216 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70791
摘要： An exposure apparatus having a plurality of projection optical systems where each of the projection optical systems projects a predetermined pattern onto a substrate and forms an exposure field on the substrate. The exposure apparatus also includes a substrate stage which holds the substrate and which moves in at least a scanning direction extending in a straight line. The plurality of exposure fields are arranged along a direction crossing the scanning direction, and the projection optical systems and the substrate relatively move during a pattern projecting operation along the scanning direction.
摘要翻译：一种具有多个投影光学系统的曝光装置，其中每个投影光学系统将预定图案投影到基板上并在基板上形成曝光场。曝光装置还包括保持基板并沿至少沿直线延伸的扫描方向移动的基板台。多个曝光区域沿着与扫描方向交叉的方向排列，并且投影光学系统和基板沿着扫描方向在图案投影操作期间相对移动。

9. 发明授权

US06351305B1 Exposure apparatus and exposure method for transferring pattern onto a substrate 失效
标题翻译：用于将图案转印到基板上的曝光装置和曝光方法
公开(公告)号：US06351305B1
公开(公告)日：2002-02-26
申请号：US09173530
申请日：1998-10-15
申请人： Masahi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
发明人： Masahi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
IPC分类号： G03B2732
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/045 , G02B17/0605 , G02B17/08 , G02B17/0812 , G02B17/082 , G02B17/0828 , G02B17/086 , G02B27/144 , G02B27/145 , G03B27/32 , G03F7/70066 , G03F7/70216 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70791
摘要： An exposure method includes first through third steps. In the first step, respective first and second illumination regions of a mask having a predetermined pattern are illuminated with an illumination light having a predetermined wavelength. In the second step, an image of the mask is formed, respectively, in first and second exposure regions (formed on a substrate) based on the illumination that passes through the first and second illumination regions. The first and second exposure regions each have a substantially polygonal shape defined by two parallel sides and two sides other than the two parallel sides. In the third step, the first and second exposure regions and the substrate are moved relatively in a first direction such that the first and second exposure regions are formed in different positions in a second direction which crosses the first direction.
摘要翻译：曝光方法包括第一至第三步骤。在第一步骤中，用具有预定波长的照明光照射具有预定图案的掩模的相应的第一和第二照明区域。在第二步骤中，基于通过第一和第二照明区域的照明，分别在第一和第二曝光区域（形成在基板上）形成掩模的图像。第一曝光区域和第二曝光区域各自具有由两个平行侧和除了两个平行侧之外的两个侧面限定的大致多边形形状。在第三步骤中，第一和第二曝光区域和衬底相对于第一方向移动，使得第一和第二曝光区域在与第一方向交叉的第二方向上形成在不同的位置。

10. 发明申请

US20080192216A1 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 有权
标题翻译：曝光装置，光学投影装置和调整光学投影装置的方法
公开(公告)号：US20080192216A1
公开(公告)日：2008-08-14
申请号：US12078863
申请日：2008-04-07
申请人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
发明人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
IPC分类号： G03B27/44
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/045 , G02B17/0605 , G02B17/08 , G02B17/0812 , G02B17/082 , G02B17/0828 , G02B17/086 , G02B27/144 , G02B27/145 , G03B27/32 , G03F7/70066 , G03F7/70216 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70791
摘要： An apparatus includes a plurality of projection optical systems, each including optical elements arranged in an optical path between a first plane and a second plane and forming a radiation pattern from the first plane onto an exposure field on the second plane via the optical elements. A movable portion is disposed in the side of the second plane with respect to the projection optical systems, which holds an object to be moved relative to the exposure field in a first direction in the second plane during scanning exposure of the object in which the radiation patterns are formed on the object as the object is moved in the first direction. The projection optical systems may include an adjustable wedge prism. The projection optical systems may include first and second optical units, optical axes of the first and second optical units being decentered from each other.
摘要翻译：一种装置包括多个投影光学系统，每个投影光学系统包括布置在第一平面和第二平面之间的光路中的光学元件，并且通过光学元件将第一平面的辐射图形形成在第二平面上的曝光场上。可移动部分相对于投影光学系统设置在第二平面的侧面，该投影光学系统在扫描曝光期间在第二平面中沿第一方向相对于曝光场移动物体，其中辐射当物体沿第一方向移动时，在物体上形成图案。投影光学系统可以包括可调楔形棱镜。投影光学系统可以包括第一和第二光学单元，第一和第二光学单元的光轴彼此偏心。

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