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1. 发明授权

US4860369A Flat speaker unit 失效
标题翻译：平板扬声器单元
公开(公告)号：US4860369A
公开(公告)日：1989-08-22
申请号：US36340
申请日：1987-04-09
申请人： Katsumi Koshimura , Akio Koike
发明人： Katsumi Koshimura , Akio Koike
IPC分类号： H04R1/02 , H04R1/24 , H04R9/04
CPC分类号： H04R1/025 , H04R1/24 , H04R9/047 , H04R2201/021
摘要： A flat speaker device having a flat speaker unit fitted into a through-hole for mounting a speaker of a wall surface board having its back secured to a wall surface leaving a specific spacing therebetween, the flat speaker unit comprising a total-drive type flat speaker comprising a plurality of magnets juxtaposed on a plane and a diaphragm formed from a plurality of projections for respectively covering the plurality of magnets, a speaker frame with a mounting flange mounted on the flat speaker so as to encircle the outer periphery of the flat speaker, rod-like screw members mounted so as to pass through the speaker frame from the front surface towards the back, and swining blades each disposed on the back of the speaker frame with one end threadedly engaged with a respective rod-like screw member and having a length such that when the blade is swung outwardly of a diagonal line of the speaker frame, the tip portion of the blade extends outwardly from the speaker frame.
摘要翻译：一种扁平扬声器装置，其具有安装在通孔中的平板扬声器单元，所述通孔用于安装壁表面板的扬声器，所述壁表面板的背面固定在墙壁表面上，留下一定间隔，所述平板扬声器单元包括全驱动型平板扬声器包括并列在平面上的多个磁体和由用于分别覆盖所述多个磁体的多个突起形成的隔膜;扬声器框架，其具有安装在所述平坦扬声器上的安装凸缘，以围绕所述平坦扬声器的外周; 杆状螺纹构件安装成从前表面朝向背面穿过扬声器框架，并且将每个设置在扬声器框架背面的叶片切割成一个与相应的杆状螺钉构件螺纹接合的一端，并且具有长度使得当叶片从扬声器框架的对角线向外摆动时，叶片的尖端部分从扬声器框架向外延伸。

2. 发明授权

US08491983B2 Glass substrate for semiconductor device component and process for producing glass substrate for semiconductor device component 有权
标题翻译：用于半导体器件部件的玻璃基板和用于制造用于半导体器件部件的玻璃基板的工艺
公开(公告)号：US08491983B2
公开(公告)日：2013-07-23
申请号：US13172638
申请日：2011-06-29
申请人： Motoshi Ono , Akio Koike
发明人： Motoshi Ono , Akio Koike
IPC分类号： B32B3/24 , B23K26/40
CPC分类号： B23K26/382 , B23K26/384 , B23K26/40 , B23K2103/50 , C03C3/076 , C03C23/0025 , Y10T428/24273
摘要： It is an object of the present invention to provide a glass substrate having plural through-holes which is not likely to peel from a silicon wafer, even though laminated on and jointed to a the silicon wafer and then subjected to heat treatment. The above object is accomplished by a glass substrate having an average thermal expansion coefficient of from 10×10−7 to 50×10−7/K within a range of from 50° C. to 300° C., having plural through-holes with a taper angle of from 0.1 to 20° and having a thickness of from 0.01 to 5 mm.
摘要翻译：本发明的目的是提供一种具有多个不易从硅晶片剥离的通孔的玻璃基板，即使层压在硅晶片上并与硅晶片接合，然后进行热处理。上述目的是通过在50℃至300℃的范围内具有10×10-7至50×10-7 / K的平均热膨胀系数的玻璃基板实现的，具有多个通孔锥角为0.1〜20°，厚度为0.01〜5mm。

3. 发明授权

US08240172B2 Process for production of synthetic quartz glass 有权
标题翻译：合成石英玻璃生产工艺
公开(公告)号：US08240172B2
公开(公告)日：2012-08-14
申请号：US13080704
申请日：2011-04-06
申请人： Chikaya Tamitsuji , Kunio Watanabe , Akio Koike
发明人： Chikaya Tamitsuji , Kunio Watanabe , Akio Koike
IPC分类号： C03B37/018
CPC分类号： C03B19/1461 , C03B2201/12 , C03B2201/42 , C03C3/06 , C03C2201/12 , C03C2201/42
摘要： The present invention relates to a process for production of a synthetic quartz glass having a fluorine concentration of 1,000 mass ppm or more, the process comprising: (a) a step of depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass forming raw material onto a substrate, to thereby form a porous glass body; (b) a step of keeping the porous glass body in a reaction vessel that is filled with elemental fluorine (F2) or a mixed gas comprising elemental fluorine (F2) diluted with an inert gas and contains a solid metal fluoride, to thereby obtain a fluorine-containing porous glass body; and (c) a step of heating the fluorine-containing porous glass body to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body.
摘要翻译：本发明涉及一种氟浓度为1000质量ppm以上的合成石英玻璃的制造方法，其特征在于，包括：（a）沉积和生长通过玻璃成形的火焰水解得到的石英玻璃微粒子的工序原料在基板上，从而形成多孔玻璃体; （b）将多孔玻璃体保持在填充有元素氟（F2）的反应容器或包含用惰性气体稀释的元素氟（F2）的混合气体并含有固体金属氟化物的步骤，从而获得含氟多孔玻璃体; 和（c）将含氟多孔质玻璃体加热至透明玻璃化温度的步骤，得到含氟透明玻璃体。

4. 发明申请

US20110239707A1 METHOD FOR PRODUCTION OF SYNTHETIC QUARTZ GLASS 审中-公开
标题翻译：合成石英玻璃的生产方法
公开(公告)号：US20110239707A1
公开(公告)日：2011-10-06
申请号：US13078427
申请日：2011-04-01
申请人： Chikaya Tamitsuji , Kunio Watanabe , Akio Koike
发明人： Chikaya Tamitsuji , Kunio Watanabe , Akio Koike
IPC分类号： C03B20/00
CPC分类号： C03B19/1461 , C03B19/1453 , C03B2201/12 , C03B2201/42
摘要： The present invention relates to a method for production of a synthetic quartz glass having a fluorine concentration of 1,000 ppm by mass or higher, comprising the following steps (a) to (c): (a) depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass-forming material onto a substrate, to thereby form a porous glass body; (b) maintaining the porous glass body in a reaction vessel under an elemental fluorine (F2)-containing atmosphere of a pressure of Pb1 and a temperature of 400° C. or lower, and followed by maintaining in the reaction vessel under condition of a pressure Pb2 lower than the pressure Pb1 and a temperature of 400° C. or lower, to thereby obtain a fluorine-containing porous glass body; and (c) heating the fluorine-containing porous glass body in a vitrification furnace to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body.
摘要翻译：本发明涉及一种氟浓度为1000质量ppm以上的合成石英玻璃的制造方法，其特征在于，包括以下工序（a）〜（c）：（a）沉积和生长石英玻璃微粒，其由将玻璃形成材料火焰水解成基材，从而形成多孔玻璃体; （b）在Pb1的压力和温度为400℃以下的元素含氟（F2）的气氛下，将多孔玻璃体保持在反应容器中，然后在反应容器的保持条件压力Pb2低于压力Pb1，温度为400℃以下，得到含氟多孔玻璃体; 和（c）将玻璃化炉中的含氟多孔质玻璃体加热至透明玻璃化温度，得到含氟透明玻璃体。

5. 发明申请

US20100323873A1 TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USING THE SAME 失效
标题翻译：含有二氧化硅的硅胶玻璃和光学元件用于使用它的光刻
公开(公告)号：US20100323873A1
公开(公告)日：2010-12-23
申请号：US12870156
申请日：2010-08-27
申请人： Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa
发明人： Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa
IPC分类号： C03C3/04
CPC分类号： C03B19/1461 , C03B19/1453 , C03B2201/12 , C03B2201/42 , C03C3/06 , C03C2201/12 , C03C2203/46 , C03C2203/52 , C03C2203/54 , Y02P40/57
摘要： The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion upon irradiation with high EUV energy light is substantially zero, which is suitable as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a halogen content of 100 ppm or more; a fictive temperature of 1,100° C. or lower; an average coefficient of linear thermal expansion in the range of from 20 to 100° C. of 30 ppb/° C. or lower; a temperature width ΔT, in which a coefficient of linear thermal expansion is 0±5 ppb/° C., of 5° C. or greater; and a temperature, at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 30 to 150° C.
摘要翻译：本发明提供了一种TiO 2 -SiO 2玻璃，其在高EUV能量光照射时的线性热膨胀系数基本为零，这适合作为EUVL用曝光工具的光学部件。本发明涉及卤素含量为100ppm以上的含TiO 2的二氧化硅玻璃，假想温度为1100℃或更低; 20〜100℃范围内的平均线性热膨胀系数为30ppb /℃以下; 5℃以上的线性热膨胀系数为0±5ppb /℃的温度宽度＆amp; T; T; 以及线性热膨胀系数为0ppb /℃的温度在30〜150℃的范围内。

6. 发明申请

US20070042893A1 Silica glass containing TiO2 and process for its production 有权
标题翻译：含二氧化硅的硅玻璃及其生产工艺
公开(公告)号：US20070042893A1
公开(公告)日：2007-02-22
申请号：US11589875
申请日：2006-10-31
申请人： Akio Koike , Yasutomi Iwahashi , Yasuyuki Takimoto , Shinya Kikugawa
发明人： Akio Koike , Yasutomi Iwahashi , Yasuyuki Takimoto , Shinya Kikugawa
IPC分类号： C03C3/06 , C03B19/00 , C03B23/00 , C03B32/00
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/12 , C03B2201/23 , C03B2201/42 , C03C2201/12 , C03C2201/23 , C03C2201/42
摘要： It is to provide a silica glass containing TiO2, having a wide temperature range wherein the coefficient of thermal expansion is substantially zero. A silica glass containing TiO2, which has a TiO2 concentration of from 3 to 10 mass %, a OH group concentration of at most 600 mass ppm and a Ti3+ concentration of at most 70 mass ppm, characterized by having a fictive temperature of at most 1,200° C., a coefficient of thermal expansion from 0 to 100° C. of 0±150 ppb/° C., and an internal transmittance T400-700 per 1 mm thickness in a wavelength range of from 400 to 700 nm of at least 80%. A process for producing a silica glass containing TiO2, which comprises porous glass body formation step, F-doping step, oxygen treatment step, densification step and vitrification step.
摘要翻译：提供含有TiO 2的二氧化硅玻璃，其具有宽的温度范围，其中热膨胀系数基本上为零。含有TiO 2浓度为3〜10质量％，OH基浓度为600质量ppm以下且Ti 3 +浓度为70质量ppm以下，其特征在于，假想温度为1200℃以下，0〜100℃的热膨胀系数为0±150ppb /℃。并且在400至700nm的波长范围内每1mm厚度的内部透射率T 400-700 至少为80％。一种制备含有TiO 2的二氧化硅玻璃的方法，其包括多孔玻璃体形成步骤，F掺杂步骤，氧处理步骤，致密化步骤和玻璃化步骤。

7. 发明申请

US20060258967A1 Walking aid device 有权
标题翻译：行走辅助装置
公开(公告)号：US20060258967A1
公开(公告)日：2006-11-16
申请号：US10557338
申请日：2004-03-15
申请人： Takako Fujil , Yoshirou Koyama , Hisashi Katoh , Takashi Hirata , Akio Koike , Taiji Koyama
发明人： Takako Fujil , Yoshirou Koyama , Hisashi Katoh , Takashi Hirata , Akio Koike , Taiji Koyama
IPC分类号： A61F5/00
CPC分类号： B25J9/0006 , A61F5/0102 , A61H1/0255 , A61H3/00 , A61H3/008 , A61H2201/0192 , A61H2201/1215 , A61H2201/163 , A61H2201/1642 , A61H2201/165 , A61H2205/081
摘要： In order to provide a walking assistance device capable of favorably providing an assisting force for maintaining the upright posture while reducing the sense of pressure when worn by the user, a hip support member (1) of the walking assisting device, which comprises an assisting force generator (hip joint actuator 10) disposed at least on a side of a hip joint to provide an assisting force to a movement of a lower limb, is provided with: a back support (4) equipped with pads (18, 19, 20) for respectively abutting an intermediate portion between right and left erector spinae muscles, lateral outer sides of the spinae muscles and right and left iliac crests; and a belt (5) connected to the back support for tightening a lower part of the rectus abdominis muscle. In this way, a supporting force can be provided to the lumbar vertebrae to steadily keep the upright posture while reducing a resistance to a bending movement of the waist caused by the support member. Further, the drive torque from the assisting force generator can be supported by the whole hip portion and this can contribute to preventing inadvertent move of the support member.
摘要翻译：为了提供一种行走辅助装置，其能够有利地提供用于维持直立姿势的辅助力，同时在使用者佩戴时降低压力感觉，行走辅助装置的臀部支撑构件（1）包括辅助力至少设置在髋关节一侧以提供对下肢运动的辅助力的发生器（髋关节致动器10）设置有：配备有垫（18,19,20）的后支撑件（4）用于分别邻接右和左耳直肌之间的中间部分，脊肌的侧外侧和右髂骨和左髂骨顶; 以及连接到后支撑件的带（5），用于收紧腹直肌的下部。以这种方式，可以向腰椎提供支撑力以稳定地保持直立姿势，同时减少由支撑构件引起的腰部弯曲运动的阻力。此外，来自辅助力发生器的驱动扭矩可以由整个臀部支撑，并且这可以有助于防止支撑构件的意外移动。

8. 发明授权

US08735308B2 Optical member comprising TiO2-containing silica glass 有权
标题翻译：含有TiO 2的石英玻璃的光学构件
公开(公告)号：US08735308B2
公开(公告)日：2014-05-27
申请号：US12718776
申请日：2010-03-05
申请人： Akio Koike , Chikaya Tamitsuji , Kunio Watanabe , Tomonori Ogawa
发明人： Akio Koike , Chikaya Tamitsuji , Kunio Watanabe , Tomonori Ogawa
IPC分类号： C03C15/00 , C03C17/00 , C03C19/00 , C03C3/06
CPC分类号： C03C3/06 , C03B19/1423 , C03B19/1453 , C03B19/1461 , C03B25/02 , C03B2201/075 , C03B2201/12 , C03B2201/42 , C03B2207/36 , C03C4/0085 , C03C2201/12 , C03C2201/23 , C03C2201/42 , C03C2203/54
摘要： The present invention relates to an optical member including a TiO2-containing silica glass having: a TiO2 concentration of from 3 to 10% by mass; a Ti3+ concentration of 100 wt ppm or less; a thermal expansion coefficient at from 0 to 100° C., CTE0-100, of 0±150 ppb/° C.; and an internal transmittance in the wavelength range of 400 to 700 nm per a thickness of 1 mm, T400-700, of 80% or more, in which the optical member has a ratio of variation of Ti3+ concentration to an average value of the Ti3+ concentration, ΔTi3+/Ti3+, on an optical use surface, is 0.2 or less.
摘要翻译：本发明涉及一种含有TiO2含量为3〜10质量％的含TiO 2的二氧化硅玻璃的光学构件， Ti3 +浓度为100重量ppm以下; 0-100℃的热膨胀系数，CTE0-100，为0±150ppb /℃。并且在400〜700nm的波长范围内的内部透射率，每1mm厚度，T400〜700，为80％以上，其中光学部件具有Ti 3+浓度的变化比与Ti 3+的平均值的比值，在光学用表面上的浓度＆Dgr; Ti 3+ / Ti 3+为0.2以下。

9. 发明授权

US08178450B2 TiO2-containing silica glass and optical member for EUV lithography using high energy densities as well as special temperature controlled process for its manufacture 失效
标题翻译：含TiO 2的石英玻璃和用于EUV光刻的光学构件，使用高能量密度以及用于其制造的特殊温度控制方法
公开(公告)号：US08178450B2
公开(公告)日：2012-05-15
申请号：US12868900
申请日：2010-08-26
申请人： Akio Koike , Kenta Saito , Long Shao , Yasutomi Iwahashi , Shinya Kikugawa
发明人： Akio Koike , Kenta Saito , Long Shao , Yasutomi Iwahashi , Shinya Kikugawa
IPC分类号： C03C3/06 , C03C3/04 , C03B37/018
CPC分类号： C03B19/1453 , C03B19/1415 , C03B2201/075 , C03B2201/23 , C03B2201/42 , C03B2207/70 , C03B2207/81 , C03C3/06 , C03C3/076 , C03C2201/23 , C03C2201/42 , C03C2203/44 , C03C2203/52 , C03C2203/54 , Y02P40/57
摘要： The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion in the range of the time of irradiation with EUV light is substantially zero when used as an optical member of an exposure tool for EUVL and which has extremely high surface smoothness. The present invention relates to a TiO2-containing silica glass having a TiO2 content of from 7.5 to 12% by mass, a temperature at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 40 to 110° C., and a standard deviation (σ) of a stress level of striae of 0.03 MPa or lower within an area of 30 mm×30 mm in at least one plane.
摘要翻译：本发明提供一种TiO 2 -SiO 2玻璃，当用作EUVL的曝光工具的光学部件并且具有非常高的表面光滑度时，在EUV光的照射时间范围内的线性热膨胀系数基本上为零。本发明涉及TiO 2含量为7.5〜12质量％，线膨胀系数为0ppb /℃的温度，在40〜 110℃，在至少一个平面内在30mm×30mm的区域内的条纹应力水平为0.03MPa以下的标准偏差（＆sgr）。

10. 发明授权

US08012653B2 Substrate for EUV mask blanks 有权
标题翻译：基板用于EUV掩模空白
公开(公告)号：US08012653B2
公开(公告)日：2011-09-06
申请号：US12490833
申请日：2009-06-24
申请人： Akio Koike , Ken Ebihara
发明人： Akio Koike , Ken Ebihara
IPC分类号： G03F1/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , C03B19/1415 , C03B19/1453 , C03B19/1469 , C03B19/1492 , C03B2201/21 , C03B2201/42 , C03C3/06 , C03C2201/14 , C03C2201/21 , C03C2201/23 , C03C2201/42 , Y02P40/57
摘要： A substrate that is suitable for an EUV mask or an EUV mask blank and excellent in flatness, is provided.A substrate for an EUV mask blank, which is made of a silica glass containing from 1 to 12 mass % of TiO2, wherein the surface roughness (rms) in a surface quality area of the substrate is at most 2 nm, and the maximum variation (PV) of the stress in the surface quality area of the substrate is at most 0.2 MPa.
摘要翻译：提供了适用于EUV掩模或EUV掩模坯料并且具有优异的平面度的基板。由含有1〜12质量％的TiO 2的二氧化硅玻璃构成的EUV掩模坯的基板，其中，所述基板的表面质量区域的表面粗糙度（rms）为2nm以下，最大变化量基板的表面质量区域的应力的最大值（PV）为0.2MPa以下。

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