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    • 5. 发明授权
    • Molded elastomer
    • 成型弹性体
    • US06515064B1
    • 2003-02-04
    • US09889009
    • 2001-07-06
    • Hiroyuki TanakaMasanori HasegawaTsuyoshi NoguchiKatsuhiko Higashino
    • Hiroyuki TanakaMasanori HasegawaTsuyoshi NoguchiKatsuhiko Higashino
    • C08K304
    • C08J5/00C08J2321/00C08K3/04C08L21/00
    • To provide an elastomer molded article for a semiconductor manufacturing equipment which not only has cleanliness required but also has an excellent plasma resistance and an excellent property of metal-elution inhibition. The elastomer molded article is obtained by crosslinking a crosslinkable elastomer composition comprising a crosslinkable elastomer component and a carbon black filler having an average particle size of not more than 700 &mgr;m and an impurity metal content measured by an ashing analysis method of not more than 300 ppm and has an impurity metal content measured by an ashing analysis method of not more than 100 ppm. An increasing rate of particles generated by irradiating oxygen plasma to the article is not more than 500% or an amount of impurity metals extracted from the article with a 50% aqueous solution of HF is not more than 500 ppb.
    • 为了提供一种用于半导体制造设备的弹性体模塑制品,其不仅需要清洁度,而且具有优异的等离子体电阻和优异的金属洗脱抑制性能。 弹性体成型体是将包含交联性弹性体成分和平均粒径为700μm以下的炭黑填料的交联性弹性体组合物和通过灰化分析法测定的杂质金属含量为300ppm以下, 并且通过灰化分析方法测定的不大于100ppm的杂质金属含量。 通过向制品照射氧等离子体而产生的颗粒的增加率不大于500%,或者用50%的HF水溶液从制品中提取的杂质金属的量不超过500ppb。