专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2012176996A3 INJECTION MEMBER USED IN THE MANUFACTURE OF A SEMICONDUCTOR, AND SUBSTRATE TREATMENT APPARATUS HAVING SAME 审中-公开
标题翻译：在半导体制造中使用的注射成员和具有该半导体的基板处理装置
公开(公告)号：WO2012176996A3
公开(公告)日：2013-04-04
申请号：PCT/KR2012004267
申请日：2012-05-30
申请人： KOOKJE ELECTRIC KOREA CO LTD , PARK YONG SUNG , LEE SUNG KWANG , KIM DONG YEUL , BANG HONG JOO , KIM MIN SEOK
发明人： PARK YONG SUNG , LEE SUNG KWANG , KIM DONG YEUL , BANG HONG JOO , KIM MIN SEOK
IPC分类号： H01L21/3065 , H01L21/205
CPC分类号： H01L21/02104 , B05B1/005 , H01J37/3244 , H01L21/68764 , H01L21/68771
摘要： The present invention relates to a substrate treatment apparatus. The substrate treatment apparatus comprises: a process chamber receiving a plurality of substrates in order to perform a plasma treatment process; a support member installed within the process chamber in order to mount the plurality of substrates on the same plane thereof; an injection member installed opposite the support member and including a plurality of independent baffles for independently injecting at least one reaction gas and a purge gas into positions corresponding to the plurality of substrates placed on the support member; and a driving part for rotating the support member or the injection member so that the baffles of the injection member are successively rotated toward the upper sides of the plurality of substrates placed on the support member. The injection member comprises a plasma generator, installed on at least one baffle for injecting the reaction gas from the plurality of baffles, for plasmarizing the reaction gas to be injected onto the substrates.
摘要翻译：本发明涉及一种基板处理装置。基板处理装置包括：处理室，其接收多个基板以执行等离子体处理工艺; 安装在处理室内的支撑件，以将多个基板安装在同一平面上; 喷射构件，其安装在所述支撑构件的对面并且包括多个独立的挡板，用于独立地将至少一个反应气体和吹扫气体喷射到与放置在所述支撑构件上的所述多个基板相对应的位置中; 以及用于使支撑构件或喷射构件旋转的驱动部件，使得喷射构件的挡板朝向位于支撑构件上的多个基板的上侧依次旋转。注射构件包括等离子体发生器，其安装在至少一个挡板上，用于从多个挡板喷射反应气体，用于使待注射到基底上的反应气体均匀化。

2. 发明公开

KR20120011232A Substrate susceptor and depositon apparatus using sysceptor 有权
标题翻译：使用SYSCEPTOR的衬底不锈钢和沉积设备
公开(公告)号：KR20120011232A
公开(公告)日：2012-02-07
申请号：KR20100072963
申请日：2010-07-28
申请人： KOOKJE ELECTRIC KOREA CO LTD
发明人： PARK YONG SUNG , LEE SUNG KWANG , KIM DONG YEUL
IPC分类号： H01L21/205 , H01L21/683
CPC分类号： C23C16/46 , C23C16/45551 , C23C16/45565 , C23C16/4581 , C23C16/4584 , H01L21/67109 , H01L21/68764 , H01L21/68771
摘要： PURPOSE: A substrate susceptor and a deposition apparatus including the same are provided to utilize thermal energy for heating a substrate. CONSTITUTION: A processing chamber(100) comprises an exhaust duct(120) and an exhaust pipe(114). A substrate susceptor(200) is installed in the internal space of the processing chamber. A spraying member(300) respectively sprays a gas to four substrates placed on the substrate susceptor. The spraying member receives first and second reaction gases and a purge gas from a supply member(400). The supply member comprises a first gas supply member(410a), a second gas supply member(410b), and a purge gas supply member(420).
摘要翻译：目的：提供一种衬底感受体和包括该衬底感光体的沉积设备以利用热能来加热衬底。构成：处理室（100）包括排气管（120）和排气管（114）。衬底基座（200）安装在处理室的内部空间中。喷射构件（300）分别将气体喷射到放置在基板基座上的四个基板上。喷射构件从供应构件（400）接收第一和第二反应气体和净化气体。供给构件包括第一气体供给构件（410a），第二气体供给构件（410b）和净化气体供给构件（420）。

3. 发明授权

KR101108577B1 Tape heater 有权
标题翻译：胶带加热器
公开(公告)号：KR101108577B1
公开(公告)日：2012-01-30
申请号：KR20100072964
申请日：2010-07-28
申请人： KOOKJE ELECTRIC KOREA CO LTD
发明人： PARK YONG SUNG , LEE SUNG KWANG , KIM DONG YEUL
IPC分类号： H01L21/02 , H01L21/205
CPC分类号： H01L21/67098 , F16L53/30 , F16L55/1686
摘要： PURPOSE: A tape heater is provided to be universally used regardless of the size of a pipe and to be easily installed to the pipe. CONSTITUTION: The heat generation film part(100) of a tape form is includes a heating element(130) in inside. A first film sheet and a second film sheet support the heating element. A keeping warm film part(200) is provided to be stepped from the upper side of the heat generation film part and covers the upper side of the heat generation film part. The keeping warm film part comprises a connecting part which is bonded to a part of the upper side of the heat generation film part and a cover part which covers the upper side of the heat generation film part which is exposed. A velcro fastener is installed in the upper side of the heat generation film part and the bottom surface of the cover part.
摘要翻译：目的：无论管道的尺寸如何，都能提供普遍使用的带式加热器，并且易于安装到管道上。构成：带状的发热膜部分（100）包括内部的加热元件（130）。第一膜片和第二膜片支撑加热元件。保温膜部（200）从发热膜部的上侧设置为阶梯状，覆盖发热膜部的上侧。保温膜部分包括粘合到发热膜部分的上侧的一部分的连接部分和覆盖发热膜部分的暴露的上侧的盖部分。天花布紧固件安装在发热膜部分的上侧和盖部分的底表面上。

4. 发明申请

WO2010056053A3 METHOD FOR PREDICTING ACTIVATION ENERGY USING AN ATOMIC FINGERPRINT DESCRIPTOR OR AN ATOMIC DESCRIPTOR 审中-公开
标题翻译：使用原子指纹描述符或原子描述符预测激活能的方法
公开(公告)号：WO2010056053A3
公开(公告)日：2010-09-10
申请号：PCT/KR2009006660
申请日：2009-11-12
申请人： BIOINFORMATICS & MOLECULAR DES , NO KYOUNG TAI , KIM DOO NAM , OH WON SEOK , LEE SUNG KWANG , JUNG JI HOON , CHO KWANG HWI , LEE CHANG JOON , NAM KY YOUB
发明人： NO KYOUNG TAI , KIM DOO NAM , OH WON SEOK , LEE SUNG KWANG , JUNG JI HOON , CHO KWANG HWI , LEE CHANG JOON , NAM KY YOUB
IPC分类号： C12Q1/26 , G06F19/00 , G06F19/16
CPC分类号： G06F19/704 , G06F19/702 , G06F19/706 , G06F19/709
摘要： The present invention provides a process for constructing an atomic fingerprint descriptor database, and a method for predicting activation energy using an atomic fingerprint descriptor or an atomic descriptor. The method comprises the steps of: (i) calculating an atomic fingerprint descriptor of a substrate; (ii) comparing the calculated atomic fingerprint descriptor with the atomic fingerprint descriptor database constructed by the abovementioned process to select the atomic position at which the metabolic responses by the cytochrome P450 enzyme may occur; and (iii) predicting activation energy for the selected atomic position by using an atomic descriptor. Further, the present invention provides a method for predicting the activation energy of phase I metabolism performed by the CYP450 enzyme through use of an effective atomic descriptor. In detail, the present invention provides a method for predicting the activation energy of the formation of tetrahedral intermediate from a hydrogen separation or aromatic hydroxylation by the cytochrome P450 enzyme through use of an equation containing an effective atomic descriptor. The present invention can rapidly predict activation energy for metabolites of phase I at a practical level even without a docking experiment between any additional CYP450 and the substrate, or a quantum mechanical calculation, to thereby make the development of new drugs using a computer even easier. The present invention may propose a strategy for increasing the bioavailability of drugs through metabolite avoidance design by analysis of the metabolic reaction possibilities of drugs. Further, the activation energy prediction of the present invention enables the prediction of i) metabolic products, ii) the relative speed of metabolism, iii) metabolic regioselectivity iv) metabolic inhibition v) drug interaction, and vi) the toxicity of a metabolite.
摘要翻译：本发明提供了一种用于构建原子指纹描述符数据库的过程以及一种使用原子指纹描述符或原子描述符来预测活化能的方法。该方法包括以下步骤：（i）计算衬底的原子指纹描述符; （ii）将计算的原子指纹描述符与通过上述过程构建的原子指纹描述符数据库进行比较，以选择细胞色素P450酶可能发生代谢反应的原子位置; 和（iii）通过使用原子描述符来预测所选原子位置的活化能。此外，本发明提供了一种通过使用有效原子描述符预测由CYP450酶进行的I期代谢活化能的方法。具体而言，本发明提供了一种通过使用包含有效原子描述符的方程来预测由细胞色素P450酶进行氢分离或芳族羟基化而形成四面体中间体的活化能的方法。即使没有任何额外的CYP450与底物之间的对接实验或量子力学计算，本发明也可以在实际水平上快速预测阶段I的代谢物的活化能，从而使得使用计算机的新药物的开发更容易。本发明可以提出通过分析药物的代谢反应可能性来通过代谢避免设计增加药物的生物利用度的策略。此外，本发明的活化能预测能够预测i）代谢产物，ii）代谢的相对速度，iii）代谢区域选择性，iv）代谢抑制，v）药物相互作用，以及vi）代谢物的毒性。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式