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1. 发明申请

US20090326234A1 (S)-(-)-Amlodipine Camsylate or Hydrate Thereof And Pharmaceutical Composition Comprising Same 审中-公开
标题翻译：（S） - （ - ） - 氨氯地平卡姆磺酸盐或其水合物及其组成的药物组合物
公开(公告)号：US20090326234A1
公开(公告)日：2009-12-31
申请号：US12374087
申请日：2007-07-16
申请人： Jaeheon Lee , Moon Sub Lee , Weon Ki Yang , Jaeho Yoo , Jae-Chul Lee , Chang-Ju Choi , Han Kyong Kim , Young-Kil Chang , Gwansun Lee
发明人： Jaeheon Lee , Moon Sub Lee , Weon Ki Yang , Jaeho Yoo , Jae-Chul Lee , Chang-Ju Choi , Han Kyong Kim , Young-Kil Chang , Gwansun Lee
IPC分类号： C07D213/80
CPC分类号： C07D211/90
摘要： Disclosed is (S)-(−)-amlodipine camsylate or a hydrate thereof having good photostability and high solubility, and a pharmaceutical composition comprising same, which can be efficiently used in treating cardiovascular diseases.
摘要翻译：公开了具有良好的光稳定性和高溶解度的（S） - （ - ） - 氨磺酸樟脑磺酸盐或其水合物，以及包含该组合物的药物组合物，其可有效地用于治疗心血管疾病。

2. 发明授权

US07638642B2 Method for the preparation of D-erythro-2,2-difluoro-2-deoxy-1-oxoribose derivative 失效
标题翻译： D-赤式-2,2-二氟-2-脱氧-1-氧代糖配合物的制备方法
公开(公告)号：US07638642B2
公开(公告)日：2009-12-29
申请号：US11572404
申请日：2005-06-23
申请人： Jaeheon Lee , Gha-Seung Park , Moonsub Lee , Cheol-Kyong Kim , Jae-Chul Lee , Young-Kil Chang , Gwan-Sun Lee
发明人： Jaeheon Lee , Gha-Seung Park , Moonsub Lee , Cheol-Kyong Kim , Jae-Chul Lee , Young-Kil Chang , Gwan-Sun Lee
IPC分类号： C07D307/02
CPC分类号： C07H3/08
摘要： 3R-carboxylate enantiomer derivative of formula (III) can be prepared easily and selectively by the method of the present invention, and a highly pure D-erythro-2,2-difluoro-2-deoxy-1-oxoribose derivative can be prepared efficiently from the compound of formula (III) as an intermediate.
摘要翻译：可以通过本发明的方法容易地和选择性地制备式（III）的3R-羧酸酯对映异构体衍生物，并且可以有效地制备高纯度的D-赤式-2,2-二氟-2-脱氧-1-氧代果糖衍生物由作为中间体的式（III）化合物制备。

3. 发明申请

US20080058509A1 Method for the Preparation of D-Erythro-2,2-Difluoro-2-Deoxy-1-Oxoribose Derivative 失效
标题翻译： D-赤型-2,2-二氟-2-脱氧-1-氧代糖衍生物的制备方法
公开(公告)号：US20080058509A1
公开(公告)日：2008-03-06
申请号：US11572404
申请日：2005-06-23
申请人： Jaeheon Lee , Gha-Seung Park , Moonsub Lee , Cheol-Kyong Kim , Jae-Chul Lee , Young-Kil Chang , Gwan-Sun Lee
发明人： Jaeheon Lee , Gha-Seung Park , Moonsub Lee , Cheol-Kyong Kim , Jae-Chul Lee , Young-Kil Chang , Gwan-Sun Lee
IPC分类号： C07H19/00 , C07D317/14
CPC分类号： C07H3/08
摘要： 3R-carboxylate enantiomer derivative of formula (III) can be prepared easily and selectively by the method of the present invention, and a highly pure D-erythro-2,2-difluoro-2-deoxy-1-oxoribose derivative can be prepared efficiently from the compound of formula (III) as an intermediate.
摘要翻译：可以通过本发明的方法容易地和选择性地制备式（III）的3R-羧酸酯对映异构体衍生物，并且可以有效地制备高纯度的D-赤式-2,2-二氟-2-脱氧-1-氧代果糖衍生物由作为中间体的式（III）化合物制备。

4. 发明授权

US07244608B2 Microorganism producing 5′-inosinic acid and process for producing 5′-inosinic acid using the same 有权
标题翻译：产生5'-肌苷酸的微生物和使用其产生5'-肌苷酸的方法
公开(公告)号：US07244608B2
公开(公告)日：2007-07-17
申请号：US10227508
申请日：2002-08-23
申请人： Hyun-Soo Kim , Sung-Oh Chung , Jin-Ho Lee , Sung-Goo Kang , Jeong-Hwan Kim , Soo-Youn Hwang , Byung-Chon Lee , Jae-Chul Lee
发明人： Hyun-Soo Kim , Sung-Oh Chung , Jin-Ho Lee , Sung-Goo Kang , Jeong-Hwan Kim , Soo-Youn Hwang , Byung-Chon Lee , Jae-Chul Lee
IPC分类号： C12N1/20 , C12P13/04
CPC分类号： C12R1/15 , C12P19/32
摘要： The present invention relates to a novel microorganism, Corynebacterium ammoniagenes strain CJIP009 having Accession No. KCCM-10226, which is capable of producing 5′-inosinic acid and a process for producing 5′-inosinic acid using the same.
摘要翻译：本发明涉及一种能够产生5'-肌苷酸的新型微生物，具有登录号KCCM-10226的产氨杆菌菌株CJIP009和使用该微生物产生5'-肌苷酸的方法。

5. 发明申请

US20050127036A1 Method of cleaning a reaction chamber 审中-公开
标题翻译：清洁反应室的方法
公开(公告)号：US20050127036A1
公开(公告)日：2005-06-16
申请号：US10989754
申请日：2004-11-16
申请人： Young-Jin Kim , Jin-Kuk Kim , Won-Sik Shin , Byung-Ho Ahn , Jae-Chul Lee , Ki-Hyun Hwang
发明人： Young-Jin Kim , Jin-Kuk Kim , Won-Sik Shin , Byung-Ho Ahn , Jae-Chul Lee , Ki-Hyun Hwang
IPC分类号： H01L21/3065 , B08B7/00 , C23C14/56 , C23F1/00 , H01J37/32
CPC分类号： C23C14/564 , B08B7/00 , B08B7/0035 , H01J37/32412 , H01J37/32862
摘要： A method of cleaning a reaction chamber is provided. In the method, a wafer is removed from the reaction chamber, and a nitrogen triflouride (NF3) gas or NF3 plasma is implanted into the reaction chamber. The NF3 gas or NF3 plasma reacts with a phosphorous polymer located in the reaction chamber, and the phosphorus polymer is removed from the reaction chamber.
摘要翻译：提供一种清洁反应室的方法。在该方法中，将晶片从反应室中取出，并将氮三氟化氮（NF 3 3）气体或者NF 3等离子体注入到反应室中。 NF 3气体或NF 3 N 3等离子体与位于反应室中的磷聚合物反应，并将磷聚合物从反应室中除去。

6. 发明授权

US06370930B1 Continuous shear deformation device 失效
标题翻译：连续剪切变形装置
公开(公告)号：US06370930B1
公开(公告)日：2002-04-16
申请号：US09638761
申请日：2000-08-15
申请人： Jae-Chul Lee , Hyun-Kwang Seok , Jong-Woo Park , Young-Hoon Chung , Ho-In Lee
发明人： Jae-Chul Lee , Hyun-Kwang Seok , Jong-Woo Park , Young-Hoon Chung , Ho-In Lee
IPC分类号： B21C2300
CPC分类号： B21C23/005 , B21C23/001
摘要： The present invention relates to a continuous shear deformation device. In order to occur shear deformation at the position at which a material is inserted into a molding path from a rotary guide apparatus for the purpose of solving the problem that the amount of shear deformation of a material is non-uniform and insufficient due to the gap between the curved portion of the molding path and the lower parts of the material, there is provided a continuous shear deformation device, characterized in that a curved portion is constructed by collaboration between the rotary guide apparatus and the molding path. In addition, there are provided additional constructions for effectively performing shear deformation by a small power by reducing the friction at the molding path excepting the curved portion. The present invention thusly constructed can be utilized for continuously and effectively mass-produce sheared materials.
摘要翻译：本发明涉及连续剪切变形装置。为了解决材料的剪切变形量由于间隙而不均匀和不足的问题，为了在从旋转引导装置插入到模制路径中的位置处发生剪切变形在模制路径的弯曲部分和材料的下部之间提供连续的剪切变形装置，其特征在于，通过旋转导向装置和模制路径之间的协作构造弯曲部分。此外，还提供了通过减小除了弯曲部分之外的模制路径处的摩擦力来通过小功率有效地执行剪切变形的附加结构。这样构造的本发明可以用于连续且有效地大量生产剪切材料。

7. 发明申请

US20100036708A1 APPARATUS AND METHOD FOR SCHEDULE SETTING IN A PORTABLE COMMUNICATION SYSTEM 审中-公开
标题翻译：用于便携式通信系统中的时间表设置的装置和方法
公开(公告)号：US20100036708A1
公开(公告)日：2010-02-11
申请号：US12484621
申请日：2009-06-15
申请人： Jae-Chul Lee , Won-Gi Lee
发明人： Jae-Chul Lee , Won-Gi Lee
IPC分类号： G06Q10/00 , G06F3/048
CPC分类号： G06Q10/109 , G06Q10/1093
摘要： An apparatus and method for schedule setting in a portable communication system are provided. The apparatus includes an event manager for performing a process to set a schedule by appointing a duration of a day intended to perform schedule setting by a touch, or a process to set a schedule by a touch input defining a predefined menu input for the schedule setting.
摘要翻译：提供了一种便携式通信系统中的时间表设置的装置和方法。该装置包括：事件管理器，用于执行通过指定用于通过触摸来执行调度设置的一天的持续时间来设置调度的处理，或者通过触摸输入来设置调度的处理，所述触摸输入定义用于调度设置的预定菜单输入。

8. 发明申请

US20090322359A1 DETECTING DEVICE FOR VALVE OPENING-CLOSING 有权
标题翻译：检测阀门开启关闭装置
公开(公告)号：US20090322359A1
公开(公告)日：2009-12-31
申请号：US12177148
申请日：2008-07-24
申请人： Byoung-Hoo Rho , Mun-Su Bok , Ki-Jong Jin , Jae-Chul Lee , Jung-hwan Lim
发明人： Byoung-Hoo Rho , Mun-Su Bok , Ki-Jong Jin , Jae-Chul Lee , Jung-hwan Lim
IPC分类号： G01R27/08
CPC分类号： F16K31/535 , F16K1/221 , F16K37/0041 , Y10T137/8242
摘要： Disclosed is a device for sensing the opening degree of a valve, which can easily determine the upper and lower limits without using upper and lower limit switches so that, besides simplifying the mechanical structure, the device can be easily installed, maintained, and repaired. The device can avoid basic errors and improve the opening degree sensing performance without using upper and lower limit switches, cams, and a spline so that, by simplifying the mechanical structure, the device can be manufactured, installed, maintained, and repaired at a low cost, and its long-term durability is improved. The device has a main gear adapted to disengage from the meter gear when the main gear is rotated excessively so that any damage to the meter gear and potentiometer, which may occur during installation or use, is prevented.
摘要翻译：公开了一种用于感测阀的开度的装置，其可以容易地确定上限和下限而不使用上限和下限开关，使得除了简化机械结构之外，装置可以容易地安装，维护和修理。该装置可以避免基本误差，并且不使用上下限开关，凸轮和花键来提高开度感测性能，从而通过简化机械结构，可以以低的速度制造，安装，维护和维修设备成本，其长期耐久性得到改善。当主齿轮过度旋转时，该装置具有适于与仪表齿轮脱离的主齿轮，从而防止在安装或使用期间可能发生的对仪表齿轮和电位计的任何损坏。

9. 发明申请

US20060063391A1 Method of forming silicon oxynitride layer in semiconductor device and apparatus of forming the same 有权
标题翻译：在半导体器件中形成氧氮化硅层的方法及其形成装置
公开(公告)号：US20060063391A1
公开(公告)日：2006-03-23
申请号：US11181213
申请日：2005-07-13
申请人： Young-Sub You , Cheol-Kyu Yang , Woong Lee , Jae-Chul Lee , Hun-Hyeoung Leam
发明人： Young-Sub You , Cheol-Kyu Yang , Woong Lee , Jae-Chul Lee , Hun-Hyeoung Leam
IPC分类号： H01L21/31
CPC分类号： H01L21/0214 , H01L21/02238 , H01L21/02247 , H01L21/02332 , H01L21/0234 , H01L21/28202 , H01L21/3144 , H01L29/518
摘要： There are provided a method and an apparatus of forming an insulating layer including silicon oxynitride. The method includes performing a plasma treatment process for supplying a plasma reaction gas to a substrate to be treated after completing the annealing process. The apparatus includes as sealed processing room having gas supply and exhaust lines running thereto. A quartz inner tube and quartz inlet pipe both include holes therethrough, but in orthogonal directions to one another, to flow a reaction gas onto the wafers loaded within the sealed processing room.
摘要翻译：提供了形成包括氮氧化硅的绝缘层的方法和装置。该方法包括在完成退火处理之后执行等离子体处理以将等离子体反应气体供应到待处理的基板。该装置包括作为密封处理室，其具有运行于其上的气体供应和排气管线。石英内管和石英入口管都包括穿过其中的孔，但彼此正交的方向，将反应气体流动到装载在密封处理室内的晶片上。

10. 发明申请

US20050263073A1 Furnace for heating a wafer and chemical vapor deposition apparatus having the same 审中-公开
标题翻译：用于加热晶片的炉和具有该炉的化学气相沉积设备
公开(公告)号：US20050263073A1
公开(公告)日：2005-12-01
申请号：US11123783
申请日：2005-05-06
申请人： Sung-Ho Kang , Jae-Chul Lee , Sang-Cheol Ha , In-Pil Cha , Duk-Young Jang , Sung-Bum Park , Cheol-Kyu Yang
发明人： Sung-Ho Kang , Jae-Chul Lee , Sang-Cheol Ha , In-Pil Cha , Duk-Young Jang , Sung-Bum Park , Cheol-Kyu Yang
IPC分类号： H01L21/205 , C23C16/00 , C23C16/46
CPC分类号： C23C16/46
摘要： A furnace for heating a wafer is provided comprising a process chamber including a space for processing a plurality of wafers. A heating member is disposed in the process chamber which generates a light and heat for heating the wafers. Moreover, a light blocking member is disposed in the process chamber for preventing the light from being transmitted onto the wafers but which permits the heat to be transmitted onto the wafers for heating the wafers. The furnace can be employed in an apparatus for chemical vapor deposition.
摘要翻译：提供一种用于加热晶片的炉子，其包括处理室，该处理室包括用于处理多个晶片的空间。加热构件设置在处理室中，其产生用于加热晶片的光和热。此外，在处理室中设置遮光部件，以防止光被传送到晶片上，但是允许热量传递到用于加热晶片的晶片上。该炉可用于化学气相沉积装置。

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