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1. 发明授权

US08076198B2 Method of fabricating nonvolatile memory device 有权
标题翻译：制造非易失性存储器件的方法
公开(公告)号：US08076198B2
公开(公告)日：2011-12-13
申请号：US12657092
申请日：2010-01-13
申请人： Hyosan Lee , Boun Yoon , Kuntack Lee , Donghyun Kim , Daehyuk Kang , Imsoo Park , Youngok Kim , Young-Hoo Kim , Sang Won Bae
发明人： Hyosan Lee , Boun Yoon , Kuntack Lee , Donghyun Kim , Daehyuk Kang , Imsoo Park , Youngok Kim , Young-Hoo Kim , Sang Won Bae
IPC分类号： H01L21/336 , H01L21/76 , H01L21/4763 , H01L21/461
CPC分类号： H01L27/11551 , H01L27/11556 , H01L27/11578 , H01L29/66825 , H01L29/7881
摘要： A method of fabricating a nonvolatile memory device with a three-dimensional structure includes alternately stacking first and second material layers in two or more layers on a semiconductor substrate, forming trenches penetrating the stacked first and second material layers by performing a first etching process, and removing the second material layers exposed in the trenches by performing a second etching process. The first and second material layers are formed of materials that have the same main component but have different impurity contents, respectively.
摘要翻译：一种制造具有三维结构的非易失性存储器件的方法包括在半导体衬底上交替堆叠两层或多层第一和第二材料层，通过执行第一蚀刻工艺形成贯穿层叠的第一和第二材料层的沟槽，以及通过执行第二蚀刻工艺去除在沟槽中暴露的第二材料层。第一和第二材料层由具有相同主要成分但具有不同杂质含量的材料形成。

2. 发明授权

US07968454B2 Method of forming pattern structure 有权
标题翻译：形成图案结构的方法
公开(公告)号：US07968454B2
公开(公告)日：2011-06-28
申请号：US12656084
申请日：2010-01-15
申请人： Imsoo Park , Kuntack Lee
发明人： Imsoo Park , Kuntack Lee
IPC分类号： H01L21/4763
CPC分类号： H01L21/76804 , H01L21/0337 , H01L21/31111 , H01L21/31144 , H01L21/3212 , H01L21/76825 , H01L21/76831 , H01L27/1052 , H01L27/11517
摘要： A method of forming a pattern structure includes forming a thin film pattern on a substrate, the thin film pattern including depression portions with first bottom widths, forming a protection layer on the thin film pattern by implanting ions into the thin film pattern, and etching a lower portion of the thin film pattern selectively using the protection layer as a mask to increase the first bottom widths of the depression portions into second bottom widths.
摘要翻译：形成图案结构的方法包括在基板上形成薄膜图案，所述薄膜图案包括具有第一底部宽度的凹陷部分，通过将离子注入到薄膜图案中在薄膜图案上形成保护层，并蚀刻选择性地使用保护层作为掩模的薄膜图案的下部部分将凹陷部分的第一底部宽度增加到第二底部宽度。

3. 发明申请

US20100184288A1 Method of forming pattern structure 有权
标题翻译：形成图案结构的方法
公开(公告)号：US20100184288A1
公开(公告)日：2010-07-22
申请号：US12656084
申请日：2010-01-15
申请人： Imsoo Park , Kuntack Lee
发明人： Imsoo Park , Kuntack Lee
IPC分类号： H01L21/3205
CPC分类号： H01L21/76804 , H01L21/0337 , H01L21/31111 , H01L21/31144 , H01L21/3212 , H01L21/76825 , H01L21/76831 , H01L27/1052 , H01L27/11517
摘要： A method of forming a pattern structure includes forming a thin film pattern on a substrate, the thin film pattern including depression portions with first bottom widths, forming a protection layer on the thin film pattern by implanting ions into the thin film pattern, and etching a lower portion of the thin film pattern selectively using the protection layer as a mask to increase the first bottom widths of the depression portions into second bottom widths.
摘要翻译：形成图案结构的方法包括在基板上形成薄膜图案，所述薄膜图案包括具有第一底部宽度的凹陷部分，通过将离子注入到薄膜图案中在薄膜图案上形成保护层，并蚀刻选择性地使用保护层作为掩模的薄膜图案的下部部分将凹陷部分的第一底部宽度增加到第二底部宽度。

4. 发明申请

US20100178755A1 Method of fabricating nonvolatile memory device 有权
标题翻译：制造非易失性存储器件的方法
公开(公告)号：US20100178755A1
公开(公告)日：2010-07-15
申请号：US12657092
申请日：2010-01-13
申请人： Hyosan Lee , Boun Yoon , Kuntack Lee , Donghyun Kim , Daehyuk Kang , Imsoo Park , Youngok Kim , Young-Hoo Kim , Sang Won Bae
发明人： Hyosan Lee , Boun Yoon , Kuntack Lee , Donghyun Kim , Daehyuk Kang , Imsoo Park , Youngok Kim , Young-Hoo Kim , Sang Won Bae
IPC分类号： H01L21/20
CPC分类号： H01L27/11551 , H01L27/11556 , H01L27/11578 , H01L29/66825 , H01L29/7881
摘要： A method of fabricating a nonvolatile memory device with a three-dimensional structure includes alternately stacking first and second material layers in two or more layers on a semiconductor substrate, forming trenches penetrating the stacked first and second material layers by performing a first etching process, and removing the second material layers exposed in the trenches by performing a second etching process. The first and second material layers are formed of materials that have the same main component but have different impurity contents, respectively.
摘要翻译：一种制造具有三维结构的非易失性存储器件的方法包括在半导体衬底上交替堆叠两层或多层第一和第二材料层，通过执行第一蚀刻工艺形成贯穿层叠的第一和第二材料层的沟槽，以及通过执行第二蚀刻工艺去除在沟槽中暴露的第二材料层。第一和第二材料层由具有相同主要成分但具有不同杂质含量的材料形成。

5. 发明申请

US20100200431A1 WAFER TEST METHOD AND WAFER TEST APPARATUS 失效
标题翻译： WAFER测试方法和WAFER测试设备
公开(公告)号：US20100200431A1
公开(公告)日：2010-08-12
申请号：US12704206
申请日：2010-02-11
申请人： Youngok Kim , Jeongnam Han , Changki Hong , Boun Yoon , Kuntack Lee , Young-Hoo Kim
发明人： Youngok Kim , Jeongnam Han , Changki Hong , Boun Yoon , Kuntack Lee , Young-Hoo Kim
IPC分类号： G01N27/26
CPC分类号： H01L22/14
摘要： The inventive concept provides a wafer test method and a wafer test apparatus. The wafer test method can recognize the amount of residuals generated in a sidewall of the metal-containing layer pattern and the extent of corrosion of a sidewall of the metal-containing layer pattern using the measured electric resistance by supplying an electrolyte so that the electrolyte is in contact with a portion of the metal-containing layer pattern in a predetermined chip region and measuring an electric resistance between a first electrode which is electrically in contact with the other portion of the metal-containing layer pattern and a second electrode which is in contact with the electrolyte in the predetermined region. Thus, a wafer test method and a wafer test apparatus can be embodied by an in-line method without dividing a wafer into each chip.
摘要翻译：本发明的概念提供了晶片测试方法和晶片测试装置。晶片测试方法可以通过提供电解质来确定含金属层图案的侧壁中产生的残留量以及含金属层图案的侧壁的腐蚀程度，使得电解质为与预定芯片区域中的含金属层图案的一部分接触，并且测量与含金属层图案的另一部分电接触的第一电极和接触的第二电极之间的电阻电解液在预定区域内。因此，可以通过在线方式来实现晶片测试方法和晶片测试装置，而不将晶片分成每个芯片。

6. 发明授权

US08202369B2 Method and apparatus for controlled transient cavitation 有权
标题翻译：用于控制瞬态空化的方法和装置
公开(公告)号：US08202369B2
公开(公告)日：2012-06-19
申请号：US12119313
申请日：2008-05-12
申请人： Frank Holsteyns , Kuntack Lee
发明人： Frank Holsteyns , Kuntack Lee
IPC分类号： B08B7/04 , B08B7/00 , B08B7/02
CPC分类号： B08B3/02 , B08B3/12 , B08B2203/0288 , G10K15/043 , H01L21/02052 , H01L21/67051 , H01L21/67057 , Y10S134/902
摘要： Methods and apparatus for creating and controlling transient cavitation are disclosed. An example method includes selecting a range of bubble sizes to be created in a liquid and selecting characteristics for an acoustic field to be applied to the liquid. The method further includes creating gas bubbles of the selected range of bubble sizes in the liquid, creating an acoustic field with the selected characteristics and subjecting the liquid to the acoustic field. In the example method, at least one of the range of bubble sizes and the characteristics of the acoustic field is selected in correspondence with the other so as to control transient cavitation in the liquid for the selected range of bubble sizes. Particularly, the methods and apparatus may be used for the cleaning of a surface, such as a semiconductor substrate.
摘要翻译：公开了用于创建和控制瞬时空化的方法和装置。一个示例性方法包括选择要在液体中产生的气泡大小的范围，并选择要施加到液体的声场的特性。该方法还包括在液体中产生气泡尺寸选定范围的气泡，产生具有选定特性的声场并使液体经受声场。在该示例性方法中，气泡尺寸范围和声场的特性中的至少一个与另一个对应地选择，以便在所选择的气泡尺寸范围内控制液体中的瞬时空化。特别地，所述方法和装置可用于清洁表面，例如半导体衬底。

7. 发明申请

US20080276960A1 Method and Apparatus for Controlled Transient Cavitation 有权
标题翻译：控制瞬态气蚀的方法和装置
公开(公告)号：US20080276960A1
公开(公告)日：2008-11-13
申请号：US12119313
申请日：2008-05-12
申请人： Frank Holsteyns , Kuntack Lee
发明人： Frank Holsteyns , Kuntack Lee
IPC分类号： B08B3/12 , C25F3/30 , B01D47/02 , A01G31/06
CPC分类号： B08B3/02 , B08B3/12 , B08B2203/0288 , G10K15/043 , H01L21/02052 , H01L21/67051 , H01L21/67057 , Y10S134/902
摘要： The invention relates to a method for creating transient cavitation comprising the steps of creating gas bubbles having a range of bubble sizes in a liquid, creating an acoustic field and subjecting the liquid to the acoustic field, characterized in that the range of bubble sizes and/or the characteristics of the acoustic field are selected to tune them to each other, thereby controlling transient cavitation in the selected range of bubble sizes. It also relates to an apparatus suitable for performing the method according to the invention.
摘要翻译：本发明涉及一种用于产生瞬时空化的方法，包括以下步骤：产生具有液体中气泡尺寸范围的气泡，产生声场并使液体经受声场，其特征在于，气泡尺寸和/ 或者选择声场的特性来使它们彼此调谐，从而控制在所选择的气泡尺寸范围内的瞬时空化。它还涉及适用于执行根据本发明的方法的装置。

8. 发明申请

US20150368557A1 METAL ETCHANT COMPOSITIONS AND METHODS OF FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME 审中-公开
标题翻译：金属蚀刻剂组合物和使用其制造半导体器件的方法
公开(公告)号：US20150368557A1
公开(公告)日：2015-12-24
申请号：US14312043
申请日：2014-06-23
申请人： Hyosan Lee , Yongsun Ko , Kyoungseob Kim , Kuntack Lee , Jihoon Jeong , Chen Lin , Christopher K. Ober
发明人： Hyosan Lee , Yongsun Ko , Kyoungseob Kim , Kuntack Lee , Jihoon Jeong , Chen Lin , Christopher K. Ober
IPC分类号： C09K13/00
CPC分类号： C09K13/08 , C23F1/18 , C23F1/20 , C23F1/26 , H01L21/02063 , H01L21/0273 , H01L21/31111 , H01L21/32134 , H01L21/67017 , H01L21/6708 , H01L21/76802 , H01L24/03 , H01L24/11 , H01L2224/03614 , H01L2224/0401 , H01L2224/05571 , H01L2224/05624 , H01L2224/05647 , H01L2224/05666 , H01L2224/05681 , H01L2224/05684 , H01L2924/04941 , H01L2924/04953 , H01L2924/20102 , H01L2924/20103 , H01L2924/20104
摘要： The present inventive concepts provide metal etchant compositions and methods of fabricating a semiconductor device using the same. The metal etchant composition includes an organic peroxide in a range of about 0.1 wt % to about 20 wt %, an organic acid in a range of about 0.1 wt % to about 70 wt %, and an alcohol-based solvent in a range of about 10 wt % to about 99.8 wt %. The metal etchant composition may be used in an anhydrous system.
摘要翻译：本发明构思提供金属蚀刻剂组合物和使用其制造半导体器件的方法。金属蚀刻剂组合物包括约0.1重量％至约20重量％范围内的有机过氧化物，约0.1重量％至约70重量％范围内的有机酸和约0.001重量％至约70重量％范围内的醇系溶剂 10重量％至约99.8重量％。金属蚀刻剂组合物可用于无水体系中。

9. 发明授权

US09027576B2 Substrate treatment systems using supercritical fluid 有权
标题翻译：使用超临界流体的底物处理系统
公开(公告)号：US09027576B2
公开(公告)日：2015-05-12
申请号：US13844149
申请日：2013-03-15
申请人： Yong-Jhin Cho , Yongsun Ko , Kyoungseob Kim , Kwangsu Kim , SeokHoon Kim , Jung-Min Oh , Kuntack Lee , Wonho Jang , Yongmyung Jun
发明人： Yong-Jhin Cho , Yongsun Ko , Kyoungseob Kim , Kwangsu Kim , SeokHoon Kim , Jung-Min Oh , Kuntack Lee , Wonho Jang , Yongmyung Jun
IPC分类号： H01L21/67
CPC分类号： H01L21/67017 , H01L21/67051 , H01L21/6708
摘要： Substrate treatment systems are provided. The substrate treatment systems may include a treating device configured to treat a substrate with a supercritical fluid, and a supplying device configured to supply the supercritical fluid to the treating device. The treating device may include a supercritical process zone in which the substrate is treated with the supercritical fluid, and a pre-supercritical process zone in which the supercritical fluid is expanded and then provided into the supercritical process zone to create a supercritical state in the supercritical process zone.
摘要翻译：提供底物处理系统。衬底处理系统可以包括被配置为用超临界流体处理衬底的处理装置和被配置为将超临界流体供应到处理装置的供给装置。处理装置可以包括其中用超临界流体处理衬底的超临界过程区，以及超临界过程区，其中超临界流体被膨胀，然后被提供到超临界过程区以在超临界流体中产生超临界状态过程区。

10. 发明授权

US08228089B2 Wafer test method and wafer test apparatus 失效
标题翻译：晶圆试验方法和晶圆试验装置
公开(公告)号：US08228089B2
公开(公告)日：2012-07-24
申请号：US12704206
申请日：2010-02-11
申请人： Youngok Kim , Jeongnam Han , Changki Hong , Boun Yoon , Kuntack Lee , Young-Hoo Kim
发明人： Youngok Kim , Jeongnam Han , Changki Hong , Boun Yoon , Kuntack Lee , Young-Hoo Kim
IPC分类号： G01R31/26 , G01R31/08 , H01L21/66
CPC分类号： H01L22/14
摘要： The inventive concept provides a wafer test method and a wafer test apparatus. The wafer test method can recognize the amount of residuals generated in a sidewall of the metal-containing layer pattern and the extent of corrosion of a sidewall of the metal-containing layer pattern using the measured electric resistance by supplying an electrolyte so that the electrolyte is in contact with a portion of the metal-containing layer pattern in a predetermined chip region and measuring an electric resistance between a first electrode which is electrically in contact with the other portion of the metal-containing layer pattern and a second electrode which is in contact with the electrolyte in the predetermined region. Thus, a wafer test method and a wafer test apparatus can be embodied by an in-line method without dividing a wafer into each chip.
摘要翻译：本发明的概念提供了晶片测试方法和晶片测试装置。晶片测试方法可以通过提供电解质来确定含金属层图案的侧壁中产生的残留量以及含金属层图案的侧壁的腐蚀程度，使得电解质为与预定芯片区域中的含金属层图案的一部分接触，并且测量与含金属层图案的另一部分电接触的第一电极和接触的第二电极之间的电阻电解液在预定区域内。因此，可以通过在线方式来实现晶片测试方法和晶片测试装置，而不将晶片分成每个芯片。

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