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1. 发明申请

US20080156356A1 Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method 审中-公开
标题翻译：清洗液，清洗方法，液体发生装置，曝光装置和装置制造方法
公开(公告)号：US20080156356A1
公开(公告)日：2008-07-03
申请号：US11987633
申请日：2007-12-03
申请人： Hiroyuki Nagasaka , Hiroshi Morita , Hiroto Tokoshima
发明人： Hiroyuki Nagasaka , Hiroshi Morita , Hiroto Tokoshima
IPC分类号： B08B13/00 , C11D10/00 , G03B27/52
CPC分类号： G03F7/70925 , G03F7/70341 , Y10T137/0318
摘要： An exposure apparatus exposes a substrate through an exposure liquid with exposure light. A cleaning liquid is provided to the exposure apparatus, in order to clean at least part of the exposure apparatus. In the clearing liquid, a prescribed gas of an amount that is greater than or equal to the saturation concentration is dissolved.
摘要翻译：曝光装置通过具有曝光光的曝光液体曝光基板。为了清洁曝光装置的至少一部分，向曝光装置提供清洁液。在清液中，溶解了大于或等于饱和浓度的规定气体。

2. 发明授权

US08721803B2 Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method 有权
标题翻译：清洗液，清洗方法，液体发生装置，曝光装置和装置制造方法
公开(公告)号：US08721803B2
公开(公告)日：2014-05-13
申请号：US13307773
申请日：2011-11-30
申请人： Hiroyuki Nagasaka , Hiroshi Morita , Hiroto Tokoshima
发明人： Hiroyuki Nagasaka , Hiroshi Morita , Hiroto Tokoshima
IPC分类号： B08B3/04
CPC分类号： G03F7/70925 , G03F7/70341 , Y10T137/0318
摘要： An exposure apparatus exposes a substrate through an exposure liquid with exposure light. A cleaning liquid is provided to the exposure apparatus, in order to clean at least part of the exposure apparatus. In the cleaning liquid, a prescribed gas of an amount that is greater than or equal to the saturation concentration is dissolved.
摘要翻译：曝光装置通过具有曝光光的曝光液体曝光基板。为了清洁曝光装置的至少一部分，向曝光装置提供清洁液。在清洗液中，溶解了大于或等于饱和浓度的规定气体。

3. 发明申请

US20120067380A1 CLEANING LIQUID, CLEANING METHOD, LIQUID GENERATING APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATING METHOD 有权
标题翻译：清洗液，清洗方法，液体生成装置，曝光装置和装置制造方法
公开(公告)号：US20120067380A1
公开(公告)日：2012-03-22
申请号：US13307773
申请日：2011-11-30
申请人： Hiroyuki Nagasaka , Hiroshi Morita , Hiroto Tokoshima
发明人： Hiroyuki Nagasaka , Hiroshi Morita , Hiroto Tokoshima
IPC分类号： B08B3/08 , B01F3/00 , B08B5/00
CPC分类号： G03F7/70925 , G03F7/70341 , Y10T137/0318
摘要： An exposure apparatus exposes a substrate through an exposure liquid with exposure light. A cleaning liquid is provided to the exposure apparatus, in order to clean at least part of the exposure apparatus. In the cleaning liquid, a prescribed gas of an amount that is greater than or equal to the saturation concentration is dissolved.
摘要翻译：曝光装置通过具有曝光光的曝光液体曝光基板。为了清洁曝光装置的至少一部分，向曝光装置提供清洁液。在清洗液中，溶解了大于或等于饱和浓度的规定气体。

4. 发明申请

US20090165829A1 Process for Producing Gas-Containing Cleaning Water, Apparatus for Producing the Cleaning Water and Cleaning Apparatus 失效
标题翻译：用于生产含气体清洁水的方法，用于生产清洁水和清洁设备的设备
公开(公告)号：US20090165829A1
公开(公告)日：2009-07-02
申请号：US12225038
申请日：2007-03-12
申请人： Hiroshi Morita , Hiroto Tokoshima
发明人： Hiroshi Morita , Hiroto Tokoshima
IPC分类号： B08B3/04 , B01F3/04 , B08B3/10 , B01D19/00 , C02F1/20 , B01D61/14
CPC分类号： C02F1/70 , B01D19/0036 , B01F3/04269 , B01F2003/04404 , B01F2003/04914 , B08B3/12 , B08B9/0321 , C01B3/501 , C01B2203/0405 , C01B2203/0495 , C02F1/444 , C11D3/0052 , H01L21/67057
摘要： A process for producing a gas-containing cleaning water which contains a specific gas dissolved in water, which process comprises dissolving the specific gas into water under an increased pressure exceeding an atmospheric pressure to prepare a gas-containing water having a concentration of the gas exceeding solubility of the gas under an atmospheric pressure and, then, removing a portion of the dissolved gas by decreasing pressure on the gas-containing water; an apparatus for producing a gas-containing cleaning water which comprises an apparatus for dissolving a gas (14) in which a specific gas is dissolved into water under a pressure exceeding the atmospheric pressure and an apparatus for removing a portion of a dissolved gas (15) in which the pressure on the gas-containing water obtained from the apparatus for dissolving a gas is decreased to a pressure lower than the pressure under which the gas has been dissolved so that a portion of the dissolved gas is removed; and a cleaning apparatus using the gas-containing cleaning water. A gas-containing cleaning water having a desired concentration of the gas can be produced safely without using a mechanism for decreasing the pressure such as a vacuum pump. Water and the specific gas in the gas-containing cleaning water after being used can be reused. The process and the apparatuses can be advantageously applied to cleaning electronic members requiring a great degree of cleanliness.
摘要翻译：一种生产含有溶解在水中的特定气体的含气清洗水的方法，该方法包括在超过大气压的压力下将特定气体溶解在水中，以制备浓度超过气体的含气体水气体在大气压下的溶解度，然后通过降低含气水的压力来除去一部分溶解的气体; 一种用于生产含气体清洗水的装置，包括一种在超过大气压力的压力下将特定气体溶解在水中的气体（14）的装置和用于除去溶解气体的一部分的装置（15 ），其中从用于溶解气体的装置获得的含气体水的压力降低到低于已经溶解气体的压力的压力，从而去除部分溶解气体; 以及使用含气体清洗水的清洗装置。可以安全地制造具有期望浓度的气体的含气体清洁水，而不使用用于降低诸如真空泵的压力的机构。使用后的含水清洗水中的水和比气体可以重复使用。该方法和装置可以有利地应用于需要很高清洁度的清洁电子部件。

5. 发明授权

US09129797B2 Cleaning method 有权
标题翻译：清洗方法
公开(公告)号：US09129797B2
公开(公告)日：2015-09-08
申请号：US13518583
申请日：2010-12-21
申请人： Hiroto Tokoshima , Hiroshi Morita
发明人： Hiroto Tokoshima , Hiroshi Morita
IPC分类号： H01L21/02 , H01L21/67
CPC分类号： H01L21/0206 , H01L21/02052 , H01L21/67051
摘要： Disclosed is a low-cost and resource-saving cleaning method wherein high cleaning effects are obtained by high-pressure jet cleaning or two-fluid cleaning using a gas-dissolved water. In the high-pressure jet cleaning method or the two-fluid cleaning method, a cleaning liquid or a mixed fluid of the cleaning liquid and a gas is jetted from a cleaning fluid jetting nozzle toward a subject to be cleaned, and the subject is cleaned. The cleaning liquid introduced into the cleaning fluid jetting nozzle contains the dissolved gas in a quantity equal to or more than the saturation solubility at the liquid temperature of the cleaning liquid.
摘要翻译：公开了一种低成本且节省资源的清洗方法，其中通过高压喷射清洗或使用溶解气体的水进行双流体清洗获得高清洗效果。在高压喷射清洗方法或双液清洗方法中，将清洗液和气体的清洗液或清洗液喷射到被清洗对象物上，从而清洗被检体。引入清洗流体喷射喷嘴的清洗液含有等于或大于在清洗液体的液体温度下的饱和溶解度的溶解气体。

6. 发明申请

US20120325927A1 CLEANING METHOD 有权
标题翻译：清洁方法
公开(公告)号：US20120325927A1
公开(公告)日：2012-12-27
申请号：US13518583
申请日：2010-12-21
申请人： Hiroto Tokoshima , Hiroshi Morita
发明人： Hiroto Tokoshima , Hiroshi Morita
IPC分类号： B08B3/02
CPC分类号： H01L21/0206 , H01L21/02052 , H01L21/67051
摘要： Disclosed is a low-cost and resource-saving cleaning method wherein high cleaning effects are obtained by high-pressure jet cleaning or two-fluid cleaning using a gas-dissolved water. In the high-pressure jet cleaning method or the two-fluid cleaning method, a cleaning liquid or a mixed fluid of the cleaning liquid and a gas is jetted from a cleaning fluid jetting nozzle toward a subject to be cleaned, and the subject is cleaned. The cleaning liquid introduced into the cleaning fluid jetting nozzle contains the dissolved gas in a quantity equal to or more than the saturation solubility at the liquid temperature of the cleaning liquid.
摘要翻译：公开了一种低成本且节省资源的清洗方法，其中通过高压喷射清洗或使用溶解气体的水进行双流体清洗获得高清洗效果。在高压喷射清洗方法或双液清洗方法中，将清洗液和气体的清洗液或清洗液喷射到被清洗对象物上，从而清洗被检体。引入清洗流体喷射喷嘴的清洗液含有等于或大于在清洗液体的液体温度下的饱和溶解度的溶解气体。

7. 发明授权

US08123833B2 Process for producing gas-containing cleaning water, apparatus for producing the cleaning water and cleaning apparatus 失效
标题翻译：用于生产含气清洗水的方法，用于生产清洗水的设备和清洁设备
公开(公告)号：US08123833B2
公开(公告)日：2012-02-28
申请号：US12225038
申请日：2007-03-12
申请人： Hiroshi Morita , Hiroto Tokoshima
发明人： Hiroshi Morita , Hiroto Tokoshima
IPC分类号： B01D53/22 , B01D19/00 , B08B3/10 , C02F1/20
CPC分类号： C02F1/70 , B01D19/0036 , B01F3/04269 , B01F2003/04404 , B01F2003/04914 , B08B3/12 , B08B9/0321 , C01B3/501 , C01B2203/0405 , C01B2203/0495 , C02F1/444 , C11D3/0052 , H01L21/67057
摘要： A process for producing a gas-containing cleaning water which contains a specific gas dissolved in water, which process comprises dissolving the specific gas into water under an increased pressure exceeding an atmospheric pressure to prepare a gas-containing water having a concentration of the gas exceeding solubility of the gas under an atmospheric pressure and, then, removing a portion of the dissolved gas by decreasing pressure on the gas-containing water; an apparatus for producing a gas-containing cleaning water which comprises an apparatus for dissolving a gas (14) in which a specific gas is dissolved into water under a pressure exceeding the atmospheric pressure and an apparatus for removing a portion of a dissolved gas (15) in which the pressure on the gas-containing water obtained from the apparatus for dissolving a gas is decreased to a pressure lower than the pressure under which the gas has been dissolved so that a portion of the dissolved gas is removed; and a cleaning apparatus using the gas-containing cleaning water. A gas-containing cleaning water having a desired concentration of the gas can be produced safely without using a mechanism for decreasing the pressure such as a vacuum pump. Water and the specific gas in the gas-containing cleaning water after being used can be reused. The process and the apparatuses can be advantageously applied to cleaning electronic members requiring a great degree of cleanliness.
摘要翻译：一种生产含有溶解在水中的特定气体的含气清洗水的方法，该方法包括在超过大气压的压力下将特定气体溶解在水中，以制备浓度超过气体的含气体水气体在大气压下的溶解度，然后通过降低含气水的压力来除去一部分溶解的气体; 一种用于生产含气体清洗水的装置，包括一种在超过大气压力的压力下将特定气体溶解在水中的气体（14）的装置和用于除去溶解气体的一部分的装置（15 ），其中从用于溶解气体的装置获得的含气体水的压力降低到低于已经溶解气体的压力的压力，从而去除部分溶解气体; 以及使用含气体清洗水的清洗装置。可以安全地制造具有期望浓度的气体的含气体清洁水，而不使用用于降低诸如真空泵的压力的机构。使用后的含水清洗水中的水和比气体可以重复使用。该方法和装置可以有利地应用于需要很高清洁度的清洁电子部件。

8. 发明申请

US20110042281A1 GAS-DISSOLVED WATER SUPPLY SYSTEM 审中-公开
标题翻译：气体溶解水供应系统
公开(公告)号：US20110042281A1
公开(公告)日：2011-02-24
申请号：US12735657
申请日：2009-03-13
申请人： Hiroto Tokoshima , Hiroshi Morita , Shigeji Kametani
发明人： Hiroto Tokoshima , Hiroshi Morita , Shigeji Kametani
IPC分类号： C02F1/74 , B01D61/00 , B01D65/00
CPC分类号： C02F1/68 , C02F1/66 , C02F1/685 , C02F1/727 , C02F1/74
摘要： Provided is a gas-dissolved water supply system that can efficiently produce highly concentrated gas-dissolved water and can circulate and supply the water to a use point. To a storage tank 1, waste water (cleaning waste water) that is water containing dissolved gas (oxygen) used for cleaning an object to be cleaned is reserved through piping 15, and feeding water is supplied through feeding water piping 1a. The water in the storage tank 1 is sent to a purification device 4 via a pressure feeding pump 2 and a heat exchanger 3 for keeping the water temperature constant. The water from which foreign substances are removed by the purification device 4 is sent to a degasser 6 via a flowmeter 5. Then, a gas is dissolved in the water by a gas-dissolving apparatus 7, a chemical is added to the water, and the water is supplied to a use point.
摘要翻译：提供了一种能够有效地产生高浓度的溶解水的水，并且可以将水循环并供给到使用点的气体溶解的供水系统。向贮存罐1中通过配管15预留含有用于清洗被清洗物的溶解气体（氧气）的水的废水（清洗废水），通过给水管道1a供给给水。储存罐1中的水通过加压泵2和用于保持水温恒定的热交换器3被送至净化装置4。由净化装置4除去异物的水通过流量计5送到脱气装置6.然后，通过气体溶解装置7将气体溶解在水中，向水中添加化学物质，水被供应到使用点。

9. 发明授权

US09105397B2 Capacitor embedded between busbars, electric power device and electric power conversion device 有权
标题翻译：母线，电力装置和电力转换装置之间的电容器
公开(公告)号：US09105397B2
公开(公告)日：2015-08-11
申请号：US13880895
申请日：2011-10-11
申请人： Yuichiro Yoshitake , Shuji Katoh , Hiroshi Morita , Atsushi Ootake
发明人： Yuichiro Yoshitake , Shuji Katoh , Hiroshi Morita , Atsushi Ootake
IPC分类号： H02M7/537 , H01G4/002 , H02M7/00 , H01G7/06 , H01G4/33 , H01G4/40
CPC分类号： H01G4/002 , H01G2/06 , H01G4/1218 , H01G4/33 , H01G4/40 , H01G7/06 , H01L25/16 , H01L2924/0002 , H02M7/003 , H01L2924/00
摘要： The present invention provides an inter-bus-bar built-in capacitor capable of reducing the size of a capacitor used in an inverter or the like or downsizing the capacitor, and provides power equipment as well as a power converting apparatus. The inter-bus-bar built-in capacitor is provided between a pair of opposing bus bars and includes a high-dielectric-constant material which has a relative dielectric constant of at least 50 when a voltage of 1,000 V is applied at a temperature of 25° C. Thus, it is possible to provide the inter-bus-bar built-in capacitor capable of reducing the size of a capacitor used in an inverter or the like or downsizing the capacitor and provide the power equipment as well as the power converting apparatus.
摘要翻译：本发明提供一种能够减小逆变器等中使用的电容器的尺寸的集成电路的内置电容器，或者使电容器小型化，并且提供电力设备以及电力转换装置。母线间内置电容器设置在一对相对的母线之间，并且包括高介电常数材料，当在1000V的温度下施加1,000V的电压时，其具有至少50的相对介电常数因此，可以提供能够减小逆变器等中使用的电容器的尺寸的母线间内置的电容器，或者使电容器的尺寸缩小，并提供电力设备以及功率转换装置。

10. 发明授权

US08975506B2 Solar cell module and photovoltaic power generator using the same 有权
标题翻译：太阳能电池组件和光伏发电机使用相同
公开(公告)号：US08975506B2
公开(公告)日：2015-03-10
申请号：US13273056
申请日：2011-10-13
申请人： Shuichi Fujii , Yosuke Inomata , Tomonari Sakamoto , Koichiro Niira , Yuko Fukawa , Hiroshi Morita , Koji Nishi , Tatsuya Yashiki , Mitsuo Yamashita , Kenji Fukui
发明人： Shuichi Fujii , Yosuke Inomata , Tomonari Sakamoto , Koichiro Niira , Yuko Fukawa , Hiroshi Morita , Koji Nishi , Tatsuya Yashiki , Mitsuo Yamashita , Kenji Fukui
IPC分类号： H01L31/042 , H01L31/02 , H01L31/05 , H01L31/0224 , H01L31/048
CPC分类号： H01L31/0201 , H01L31/02013 , H01L31/022433 , H01L31/048 , H01L31/049 , H01L31/0504 , H01L31/0508 , Y02E10/50
摘要： A surface electrode (5) is installed on the light receiving surface of a solar cell element, the surface electrode (5) comprises three bus bar electrodes (5a) for extracting light-produced at the solar cell element to the outside and collecting finger electrodes (5b) connected to these bus bar electrodes (5a), and the bus bar electrodes (5a) are not less than 0.5 mm and not more than 2 mm in width and the finger electrodes (5b) are not less than 0.05 mm and not more than 0.1 mm in width. A high-efficient solar cell module can be obtained with substantially lowered resistance by increasing the number of bus bar electrode (5a) and thereby decreasing the lengths of the finger electrodes (5b).
摘要翻译：表面电极（5）安装在太阳能电池元件的光接收表面上，表面电极（5）包括三个汇流条电极（5a），用于将在太阳能电池元件处产生的光提取到外部并收集指状电极（5b），汇流条电极（5a）的宽度不小于0.5mm且不大于2mm，手指电极（5b）不小于0.05mm，而不是宽度大于0.1mm。通过增加汇流条电极（5a）的数量，从而减小手指电极（5b）的长度，可以获得具有显着降低的电阻的高效太阳能电池模块。

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