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1. 发明授权

US5562383A Treatment apparatus 失效
标题翻译：治疗仪器
公开(公告)号：US5562383A
公开(公告)日：1996-10-08
申请号：US583669
申请日：1996-01-05
申请人： Hiroyuki Iwai , Tamotsu Tanifuji , Takanobu Asano , Ryoichi Okura
发明人： Hiroyuki Iwai , Tamotsu Tanifuji , Takanobu Asano , Ryoichi Okura
IPC分类号： H01L21/304 , H01L21/677 , H01L21/00
CPC分类号： H01L21/67769 , H01L21/67772 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A treatment apparatus comprises a treatment chamber for performing a treatment for a workpiece W, a loading chamber connected to the treatment chamber, for loading and unloading a holding member which contains the workpiece into and from the treatment chamber, and an input/output chamber for inputting and outputting the workpiece to and from the loading chamber. The input/output chamber includes a cassette accommodating vessel port which holds a cassette accommodating vessel. The vessel is filled with clean air or an inert gas, and is airtightly closed. A cassette receiving mechanism is disposed below the port and lowers only the cassette of the vessel so as to receive the cassette. Thus, when the cassette is input and output to and from the outside of the treatment apparatus, the workpiece contained within the cassette is not exposed to the atmosphere in a working region. Consequently, it is not necessary to improve the cleanliness level of the atmosphere in the working region. As a result, the construction cost of the clean room and the operation cost thereof can be reduced. A clean air blowing device is disposed below the port. The clean air blowing device blows a side flow of clean air. Thus, the atmosphere at a position below the port where air tends to stay is circulated. Thus, since the surface of the workpiece loaded in the treatment chamber is exposed to the side flow, particles and the like that adhere thereto are purged.
摘要翻译：处理装置包括：处理室，用于对工件W进行处理，连接到处理室的装载室，用于将包含工件的保持构件装载到处理室和从处理室中卸载;以及输入/输出室，将工件输入和输出到装载室。输入/输出室包括容纳容纳容器的盒式磁带容纳容器端口。容器内装有清洁空气或惰性气体，并且气密地关闭。盒接收机构设置在端口下方，并且仅降低容器的盒以便接收盒。因此，当盒子从处理设备的外部输入和输出时，包含在盒内的工件不会暴露在工作区域中的大气中。因此，不需要提高工作区域的气氛的清洁度。因此，能够降低洁净室的建筑成本及其运转成本。清洁吹风装置设置在端口下方。清洁吹风装置吹扫清洁空气的侧流。因此，空气倾向于停留的港口下方的气氛被循环。因此，由于装载在处理室中的工件的表面暴露于侧流，所以清除附着在其上的颗粒等。

2. 发明授权

US5829939A Treatment apparatus 失效
公开(公告)号：US5829939A
公开(公告)日：1998-11-03
申请号：US667584
申请日：1996-06-24
申请人： Hiroyuki Iwai , Tamotsu Tanifuji , Takanobu Asano , Ryoichi Okura
发明人： Hiroyuki Iwai , Tamotsu Tanifuji , Takanobu Asano , Ryoichi Okura
IPC分类号： H01L21/304 , H01L21/677 , H01L21/00
CPC分类号： H01L21/67769 , H01L21/67772 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A treatment apparatus comprises a treatment chamber for performing a treatment for a workpiece W, a loading chamber connected to the treatment chamber, for loading and unloading a holding member which contains the workpiece into and from the treatment chamber, and an input/output chamber for inputting and outputting the workpiece to and from the loading chamber. The input/output chamber includes a cassette accommodating vessel port which holds a cassette accommodating vessel. The vessel is filled with clean air or an inert gas, and is airtightly closed. A cassette receiving mechanism is disposed below the port and lowers only the cassette of the vessel so as to receive the cassette. Thus, when the cassette is input and output to and from the outside of the treatment apparatus, the workpiece contained within the cassette is not exposed to the atmosphere in a working region. Consequently, it is not necessary to improve the cleanliness level of the atmosphere in the working region. As a result, the construction cost of the clean room and the operation cost thereof can be reduced. A clean air blowing device is disposed below the port. The clean air blowing device blows a side flow of clean air. Thus, the atmosphere at a position below the port where air tends to stay is circulated. Thus, since the surface of the workpiece loaded in the treatment chamber is exposed to the side flow, particles and the like that adhere thereto are purged.

3. 发明授权

US5110248A Vertical heat-treatment apparatus having a wafer transfer mechanism 失效
标题翻译：具有晶片传送机构的立式热处理装置
公开(公告)号：US5110248A
公开(公告)日：1992-05-05
申请号：US550981
申请日：1990-07-11
申请人： Takanobu Asano , Hirofumi Kitayama , Hiroyuki Iwai , Yuuji Ono
发明人： Takanobu Asano , Hirofumi Kitayama , Hiroyuki Iwai , Yuuji Ono
IPC分类号： H01L21/00 , H01L21/677
CPC分类号： H01L21/67115 , H01L21/67781
摘要： A vertical heat-treatment apparatus is provided with a mechanism for automatically transferring semiconductor wafers from carriers to a boat for a vertical type furnace. The automatic transferring mechanism comprises a port for receiving a plurality of carriers arranged in series in an upright state, a posture change mechanism for changing the posture of wafers in the carriers from the upright state to the horizontal state, a parallel transfer mechanism for transferring the carriers on the boat to the posture change mechanism, a carrier loading/unloading mechanism for loading the carriers on a station, a wafer loading/unloading mechanism for taking out the wafers from the carriers on the station in turn and transferring the taken-out wafers to the boat in turn, and a mounting mechanism for mounting the boat in the furnace. The carrier loading/unloading mechanism and the wafer loading/unloading mechanism are mounted on a common frame and are rotated and lifted at the same time.
摘要翻译：立式热处理装置设置有用于将半导体晶片从载体自动转移到垂直型炉的船的机构。自动转印机构包括用于接收以直立状态串联布置的多个载体的端口，用于将载体中的晶片的姿势从直立状态改变为水平状态的姿势改变机构，用于传送船上的载体到姿势改变机构，用于将载体载载在车站上的载体装载/卸载机构，用于依次从车站上的载体取出晶片的晶片装载/卸载机构，并传送取出的晶片依次转到船上，以及用于将船安装在炉中的安装机构。载体装载/卸载机构和晶片装载/卸载机构安装在公共框架上并同时旋转和提升。

4. 发明授权

US5055036A Method of loading and unloading wafer boat 失效
标题翻译：装载和卸载晶圆舟的方法
公开(公告)号：US5055036A
公开(公告)日：1991-10-08
申请号：US661103
申请日：1991-02-26
申请人： Takanobu Asano , Hiroyuki Iwai , Yuji Ono
发明人： Takanobu Asano , Hiroyuki Iwai , Yuji Ono
IPC分类号： C30B35/00 , F27B17/00 , H01L21/677 , H01L21/687
CPC分类号： H01L21/67757 , C30B35/005 , F27B17/0025 , H01L21/67781 , H01L21/68707
摘要： A wafer boats supporting wafers is loaded into and unloaded from a reaction tube with a lid therebelow in a vertical heat treatment apparatus, while holding the wafer boat vertical with respect to the lid. An arm is provided in a space below the reaction tube, for transferring wafer boats along a path, while holding the wafer boats vertical and in a substantially horizontal plane. Three stations are formed in the path. At the first station, unprocessed wafers are mounted on a first wafer boat located, while wafers mounted on a first wafer boat is being heat-treated in said reaction tube. Then, the first wafer boat is transferred from the first station to the third station, and is held at the third station. While the first wafer boat is held at the third station, the second wafer boat is lowered to the second station to unload the second wafer boat from the reaction tube, and then is transferred to the first station. Thereafter, the heat-treated wafers are removed from the second wafer boat located at the first station. Next, the first wafer boat is transferred from the third station to the second station, while the second wafer boat is located at the first station, and then is mounted onto the lid, thereby to load the first wafer boat into the reaction tube.
摘要翻译：在垂直热处理装置中，将晶片舟片装载在具有盖的反应管中并从其卸载，同时将晶片舟皿相对于盖垂直。在反应管下面的空间中设置有一个臂，用于沿着路径传送晶片舟，同时将晶片舟垂直并且在基本水平的平面中。路上形成了三个站。在第一站处，未加工的晶片安装在位于第一晶片舟的位置上，而安装在第一晶片舟皿上的晶片在所述反应管中进行热处理。然后，将第一晶片舟从第一站传送到第三站，并保持在第三站。当第一晶片舟被保持在第三站时，第二晶片舟被降低到第二站，以将第二晶片舟从反应管卸载，然后被传送到第一站。此后，将热处理的晶片从位于第一工位的第二晶片舟皿移除。接下来，将第一晶片舟从第三站传送到第二站，而第二晶片舟位于第一站，然后安装到盖上，从而将第一晶片舟装载到反应管中。

5. 发明申请

US20100064969A1 SEMICONDUCTOR MANUFACTURING PLANT 失效
标题翻译：半导体制造厂
公开(公告)号：US20100064969A1
公开(公告)日：2010-03-18
申请号：US12278407
申请日：2007-02-07
申请人： Jiro Hiraiwa , Osamu Yoshimoto , Hiroshi Hayakawa , Tetsuro Tojo , Tsuneyuki Okabe , Takanobu Asano , Shinichi Wada , Ken Nakao , Hitoshi Kato
发明人： Jiro Hiraiwa , Osamu Yoshimoto , Hiroshi Hayakawa , Tetsuro Tojo , Tsuneyuki Okabe , Takanobu Asano , Shinichi Wada , Ken Nakao , Hitoshi Kato
IPC分类号： H01L21/46
CPC分类号： F17D1/04 , C01B7/19 , F17C2250/032 , F17C2270/0518 , H01L21/67017 , H01L21/67276
摘要： Fluorine gas generators are connected with semiconductor manufacturing apparatuses through a gas supplying system including a storage tank that can store a predetermined quantity of fluorine gas generated in the on-site fluorine gas generators. When one or more of the on-site fluorine gas generators are stopped, fluorine gas is supplied to the semiconductor manufacturing apparatuses from the storage tank storing a predetermined quantity of fluorine gas, so as to keep the operations of the semiconductor manufacturing apparatuses. Thereby obtained is a semiconductor manufacturing plant in which fluorine gas generated in the fluorine gas generators can be safely and stably supplied to the semiconductor manufacturing apparatuses, and with superior cost performance.
摘要翻译：氟气发生器通过包括存储在现场氟气发生器中产生的预定量的氟气的储罐的气体供给系统与半导体制造装置连接。当一个或多个现场氟气发生器停止时，从储存预定量的氟气的储罐向半导体制造装置供应氟气，以保持半导体制造装置的操作。由此，能够将在氟气发生器中产生的氟气安全稳定地供给到半导体制造装置，并具有优异的成本性能的半导体制造工厂。

6. 发明授权

US5533243A Notch position aligning apparatus and process for using the apparatus to independently align individual wafers in a wafer cassette 失效
标题翻译：凹口位置对准装置和使用该装置以独立地对准晶片盒中的各个晶片的工艺
公开(公告)号：US5533243A
公开(公告)日：1996-07-09
申请号：US365429
申请日：1994-12-28
申请人： Takanobu Asano
发明人： Takanobu Asano
IPC分类号： H01L21/68 , B23B5/22 , B65G47/24
CPC分类号： H01L21/68 , Y10S269/903 , Y10S414/136 , Y10S414/138 , Y10T29/41
摘要： According to this invention, there is provided a notch position aligning mechanism and a process for using the mechanism including a base which can be vertically movably inserted into a cassette through a lower opening of the cassette for storing a plurality of targets to be aligned having notches formed in edge portions of the targets wherein can be fitted, a rotating/supporting mechanism, including a first rotary member which is arranged on the base, and has a plurality of fitting grooves in which the notches of the targets can be fitted, a second rotary member which can be rotated and is arranged on the base, and a drive unit for rotating at least one of the first and second rotary members, the rotating/supporting mechanism supporting and rotating the targets using the first and second rotary members while the targets are spaced apart from the cassette, and a support member, arranged on the base, for supporting the targets having the notches fitted in the fitting grooves of the first rotary member to stop rotations of the targets.
摘要翻译：根据本发明，提供了一种切口位置对准机构和使用该机构的方法，该机构包括基座，该基座可以通过盒的下部开口垂直移动地插入到盒中，用于存储多个待对准的目标，具有凹口形成在能够嵌合的靶的边缘部分的旋转/支撑机构，包括布置在基座上的第一旋转构件，并且具有多个配合槽，靶可以嵌合在其中，第二旋转构件，其可以旋转并布置在基座上;驱动单元，用于旋转第一和第二旋转构件中的至少一个，旋转/支撑机构使用第一和第二旋转构件支撑并旋转靶，同时靶与盒子间隔开，并且支撑构件布置在基座上，用于支撑具有装配在冷杉的装配槽中的凹口的靶 t旋转构件以停止目标的旋转。

7. 发明申请

US20050246918A1 Dry air-supplying apparatus and treating apparatus 失效
标题翻译：干燥供气装置和处理装置
公开(公告)号：US20050246918A1
公开(公告)日：2005-11-10
申请号：US10528230
申请日：2003-09-19
申请人： Takashi Tanahashi , Takanobu Asano , Ken Nakao , Katsuhiro Yamashita
发明人： Takashi Tanahashi , Takanobu Asano , Ken Nakao , Katsuhiro Yamashita
IPC分类号： B01D53/06 , B01D53/26 , F24F3/14 , F26B21/06 , F26B3/00
CPC分类号： F24F3/1423 , B01D53/06 , B01D53/261 , B01D2253/108 , B01D2253/25 , B01D2253/3425 , B01D2257/70 , B01D2257/80 , B01D2259/40007 , B01D2259/40052 , B01D2259/4009 , F24F2203/1032 , F24F2203/1056 , F24F2203/1072 , F24F2203/1084 , F24F2203/1088 , F24F2203/1096
摘要： Two rotors 18a, 18b each housing a honeycomb structure 25 carrying an absorbent is driven for rotation by a common motor 19. Partitioning members 17 define an absorbing zone S and a recovery zone U in the rotor depending on the angular positional relationship between the partitioning members 17 and the rotor corresponding thereto. In the absorbing zone S, the absorbent removes moisture and organic matters from air passing therethrough. In the recovery zone U, recovery of the absorbent deteriorated by absorbing the moisture and the organic matters is preformed by using heated dry air. Air sucked from a transfer space 10 of the processing system sequentially passes through the absorbing zones of both the rotors via a circulation passage 20, thereafter returned to the transfer space. A part of clean dry air having passed through the absorbing zones of both the rotors is supplied into an exhaust passage 21, and is heated by a heater, and passes through the recovery zones of both the rotors.
摘要翻译：每个容纳携带吸收剂的蜂窝结构25的两个转子18a，18b被驱动以便由公共电动机19旋转。分隔构件17根据分隔构件17和与其对应的转子之间的角度位置关系来限定转子中的吸收区域S和恢复区域U. 在吸收区S中，吸收剂从通过其的空气中除去水分和有机物质。在回收区U中，通过吸收水分和有机物而劣化的吸收剂的回收通过使用加热的干燥空气来预处理。从处理系统的传送空间10吸入的空气经由循环通道20依次通过两个转子的吸收区，然后返回到传送空间。已经通过两个转子的吸收区的清洁干燥空气的一部分被供给到排气通道21中，并被加热器加热，并且通过两个转子的回收区。

8. 发明授权

US5030057A Semiconductor wafer transferring method and apparatus and boat for thermal treatment of a semiconductor wafer 失效
标题翻译：半导体晶片转印方法及用于半导体晶片热处理的装置和船
公开(公告)号：US5030057A
公开(公告)日：1991-07-09
申请号：US266651
申请日：1988-11-03
申请人： Hironobu Nishi , Kenichi Yamaga , Takanobu Asano , Kazutoshi Sawado , Masashi Fumoto , Shozo Ito , Yoshinori Mochizuki
发明人： Hironobu Nishi , Kenichi Yamaga , Takanobu Asano , Kazutoshi Sawado , Masashi Fumoto , Shozo Ito , Yoshinori Mochizuki
IPC分类号： H01L21/00 , H01L21/205 , H01L21/22 , H01L21/673 , H01L21/677
CPC分类号： H01L21/67313 , H01L21/67294 , H01L21/67326 , H01L21/67781 , Y10S414/136 , Y10S414/138 , Y10S414/14
摘要： A wafer transferring method for transferring wafers between a cassette and a boat having grooves to hold the wafers, comprises the steps of providing an identification mechanism for positional alignment on the boat in advance, detecting the identification mechanism, and aligning the boat to a predetermined position based on a detection result and transferring the wafers from the cassette to the boat. A wafer transferring apparatus comprises a loading device for extracting wafers from a cassette and transferring the wafers onto a boat, a detection device for detecting an identification section provided on the boat in order to identify a wafer transferring position on the boat, and a control device for acquiring the wafer transferring position on the boat based on a detection result attained from the detection device and controlling a mutual position between the boat and the cassette to come to a predetermined position.
摘要翻译：一种晶片转印方法，用于在具有用于保持晶片的槽的盒和舟皿之间转移晶片，包括以下步骤：提供用于在船上进行位置对准的识别机构，检测识别机构，以及将船对准到预定位置基于检测结果并将晶片从盒转移到船。晶片转印装置包括用于从盒中提取晶片并将晶片转移到船上的装载装置，用于检测设置在船上的识别部分以识别船上的晶片转移位置的检测装置，以及控制装置用于基于从检测装置获得的检测结果获取船上的晶片转移位置，并控制船和盒之间的相互位置到达预定位置。

9. 发明授权

US5007788A Pitch changing device for changing pitches of plate-like objects and method of changing pitches 失效
标题翻译：用于改变板状物体的间距的变桨装置和改变桨距的方法
公开(公告)号：US5007788A
公开(公告)日：1991-04-16
申请号：US342345
申请日：1989-04-24
申请人： Takanobu Asano , Kenichi Yamaga , Wataru Ohkase
发明人： Takanobu Asano , Kenichi Yamaga , Wataru Ohkase
IPC分类号： H01L21/677
CPC分类号： H01L21/67781
摘要： A pitch changing device of the present invention includes a lift mechanism for unloading a plurality of wafers arranged in a cassette at predetermined pitches from the cassette while the pitches are kept unchanged, and a chuck mechanism for holding the unloaded wafers while the pitches are kept unchanged. The chuck mechanism includes moving pieces mounted to be movable in an arrangement direction of the wafers, for respectively supporting the wafers, elastic members mounted in the movable pieces to be expandible/contractible in the arrangement direction of the wafers, and a driving mechanism for expanding/contracting the elastic members. When the elastic members expand/contract by the driving mechanism, the pitches of the wafers are changed while the wafers are held. The lift mechanism includes a handler for variably moving wafer stands in the arrangement direction of the wafers, and changes the pitches while the wafers are lifted.
摘要翻译：本发明的变桨装置包括一个提升机构，用于在间距保持不变的情况下以预定间距从盒子中卸载设置在盒中的多个晶片;以及夹持机构，用于保持未加载的晶片，同时间距保持不变。卡盘机构包括安装成能够在晶片的布置方向上移动的移动件，用于分别支撑晶片，安装在可移动片中的弹性构件可在晶片的排列方向上可扩展/收缩;以及驱动机构，用于扩展 /收缩弹性构件。当弹性构件通过驱动机构膨胀/收缩时，在保持晶片的同时改变晶片的间距。升降机构包括用于在晶片的排列方向上可变地移动晶片架的处理器，并且在晶片被提升时改变间距。

10. 发明授权

US07207123B2 Dry air-supplying apparatus and treating apparatus 失效
标题翻译：干燥供气装置和处理装置
公开(公告)号：US07207123B2
公开(公告)日：2007-04-24
申请号：US10528230
申请日：2003-09-19
申请人： Takashi Tanahashi , Takanobu Asano , Ken Nakao , Katsuhiro Yamashita
发明人： Takashi Tanahashi , Takanobu Asano , Ken Nakao , Katsuhiro Yamashita
IPC分类号： F26B21/06
CPC分类号： F24F3/1423 , B01D53/06 , B01D53/261 , B01D2253/108 , B01D2253/25 , B01D2253/3425 , B01D2257/70 , B01D2257/80 , B01D2259/40007 , B01D2259/40052 , B01D2259/4009 , F24F2203/1032 , F24F2203/1056 , F24F2203/1072 , F24F2203/1084 , F24F2203/1088 , F24F2203/1096
摘要： Two rotors 18a, 18b each housing a honeycomb structure 25 carrying an absorbent is driven for rotation by a common motor 19. Partitioning members 17 define an absorbing zone S and a recovery zone U in the rotor depending on the angular positional relationship between the partitioning members 17 and the rotor corresponding thereto. In the absorbing zone S, the absorbent removes moisture and organic matters from air passing therethrough. In the recovery zone U, recovery of the absorbent deteriorated by absorbing the moisture and the organic matters is preformed by using heated dry air. Air sucked from a transfer space 10 of the processing system sequentially passes through the absorbing zones of both the rotors via a circulation passage 20, thereafter returned to the transfer space. A part of clean dry air having passed through the absorbing zones of both the rotors is supplied into an exhaust passage 21, and is heated by a heater, and passes through the recovery zones of both the rotors.
摘要翻译：每个容纳携带吸收剂的蜂窝结构25的两个转子18a，18b被驱动以便由公共电动机19旋转。分隔构件17根据分隔构件17和与其对应的转子之间的角度位置关系来限定转子中的吸收区域S和恢复区域U. 在吸收区S中，吸收剂从通过其的空气中除去水分和有机物质。在回收区U中，通过吸收水分和有机物而劣化的吸收剂的回收通过使用加热的干燥空气来预处理。从处理系统的传送空间10吸入的空气经由循环通道20依次通过两个转子的吸收区，然后返回到传送空间。已经通过两个转子的吸收区的清洁干燥空气的一部分被供给到排气通道21中，并被加热器加热，并且通过两个转子的回收区。

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