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    • 7. 发明授权
    • Radiation detector
    • 辐射检测器
    • US4492869A
    • 1985-01-08
    • US313171
    • 1981-10-20
    • Atsushi SuzukiHiromichi YamadaYoko UchidaHideki KohnoMinoru Yoshida
    • Atsushi SuzukiHiromichi YamadaYoko UchidaHideki KohnoMinoru Yoshida
    • A61B6/00G01T1/164G01T1/20
    • G01T1/2002G01T1/2018
    • In a radiation detector having a radiation-stimulated light emitting scintillator and a photodetector for receiving the light emission from the scintillator, the scintillator is formed of a layer of phosphor particles and a light scattering layer is provided in an optical path between the phosphor particle layer and the photodetector. Light generated in the surface of the scintillator is scattered and absorbed by the light scattering layer in some degree so that the reduced quantity of light incident upon the photodetector lowers the output of the photodetector. This effect is balanced with the lowering of the photodetector output due to the absorption and scattering of light generated at the inner parts of the scintillator and further removes anisotropic light emission. As a result, signal-to-noise ratio is greatly improved.A shielding layer between the scintillator and photodetector prevents secondary radiation such as scattered and fluorescent radiation from reaching the photodetector. The shielding layer can also serve as the scattering layer.
    • 在具有辐射激发的发光闪烁体的辐射检测器和用于接收来自闪烁体的发光的光检测器中,闪烁体由荧光体颗粒层形成,并且光散射层设置在荧光体颗粒层 和光电检测器。 在闪烁器表面产生的光在一定程度上被光散射层散射和吸收,使得入射到光电检测器上的光的减少使得光电检测器的输出降低。 由于在闪烁器的内部部分产生的光的吸收和散射,光电检测器输出的降低会使这种效果平衡,并进一步消除各向异性发光。 结果,信噪比大大提高。 闪烁体和光电检测器之间的屏蔽层防止二次辐射如散射和荧光辐射到达光电探测器。 屏蔽层也可以用作散射层。
    • 9. 发明授权
    • Pattern inspection device of substrate surface and pattern inspection method of the same
    • 基板表面图案检查装置及图案检验方法相同
    • US08736830B2
    • 2014-05-27
    • US13145968
    • 2009-12-10
    • Masahiro WatanabeToshihiko NakataYasuhiro YoshitakeHideaki SasazawaMinoru Yoshida
    • Masahiro WatanabeToshihiko NakataYasuhiro YoshitakeHideaki SasazawaMinoru Yoshida
    • G01N21/00
    • G01Q60/22G01N21/95607G11B5/84
    • There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.
    • 提供了一种用于基板表面的图案检查装置,其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。 用于基板表面的图案检查装置包括:具有精细重复图案的近场光学头101; a&thetas; 驱动单元311,其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201,用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。