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1. 发明授权

US07771831B2 Infrared shielding film-coated glass plate and process for its production 有权
标题翻译：红外屏蔽薄膜镀膜玻璃板及其生产工艺
公开(公告)号：US07771831B2
公开(公告)日：2010-08-10
申请号：US11695893
申请日：2007-04-03
申请人： Hirokazu Kodaira , Hiroyuki Tomonaga , Kazuo Sunahara , Yuichi Yamamoto , Daisuke Kobayashi
发明人： Hirokazu Kodaira , Hiroyuki Tomonaga , Kazuo Sunahara , Yuichi Yamamoto , Daisuke Kobayashi
IPC分类号： B32B15/04 , B32B17/06
CPC分类号： C03C17/007 , C03C2217/45 , C03C2217/475 , C03C2217/476 , C03C2218/11
摘要： An infrared shielding film-coated glass plate comprising a glass substrate and an infrared shielding film formed thereon, wherein the infrared shielding film comprises fine ITO particles having an average primary particle diameter of at most 100 nm dispersed in a matrix containing silicon oxide as the main component and containing nitrogen in an amount of at least 2 at % based on Si and has a film thickness of from 200 to 3,000 nm.
摘要翻译：一种红外线屏蔽薄膜包覆玻璃板，包括玻璃基板和形成在其上的红外屏蔽膜，其中所述红外线屏蔽膜包括分散在含有氧化硅为主体的基体中的平均一次粒径为至多100nm的细小ITO颗粒组分，并且含有基于Si至少2at％的氮并具有200-3000nm的膜厚度。

2. 发明申请

US20070178317A1 INFRARED SHIELDING FILM-COATED GLASS PLATE AND PROCESS FOR ITS PRODUCTION 审中-公开
标题翻译：红外屏蔽薄膜涂层玻璃板及其生产工艺
公开(公告)号：US20070178317A1
公开(公告)日：2007-08-02
申请号：US11627605
申请日：2007-01-26
申请人： Hirokazu KODAIRA , Hiroyuki Tomonaga , Kazuo Sunahara
发明人： Hirokazu KODAIRA , Hiroyuki Tomonaga , Kazuo Sunahara
IPC分类号： B05D7/00 , B32B17/06
CPC分类号： C03C17/007 , C03C17/008 , C03C17/366 , C03C2217/212 , C03C2217/213 , C03C2217/23 , C03C2217/231 , C03C2217/45 , C03C2217/475 , C03C2217/476 , C03C2217/948 , C03C2218/111 , C03C2218/113
摘要： An infrared shielding film-coated glass plate comprising a glass substrate and an infrared shielding film formed thereon, wherein the infrared shielding film comprises fine ITO particles having an average primary particle diameter of at most 100 nm dispersed in a matrix containing silicon oxide and titanium oxide and has a film thickness of from 100 to 1,500 nm.
摘要翻译：一种红外屏蔽薄膜包覆玻璃板，包括玻璃基板和形成在其上的红外屏蔽膜，其中红外屏蔽膜包括分散在含有氧化硅和氧化钛的基体中的平均初级粒径为至多100nm的细小ITO颗粒膜厚为100〜1500nm。

3. 发明申请

US20060124890A1 Liquid composition for forming ferroelectric thin film and process for producing ferroelectric thin film 审中-公开
标题翻译：用于形成铁电薄膜的液体组合物和用于制备铁电薄膜的方法
公开(公告)号：US20060124890A1
公开(公告)日：2006-06-15
申请号：US11340548
申请日：2006-01-27
申请人： Kazuo Sunahara , Hiroyuki Tomonaga , Yoshihisa Beppu
发明人： Kazuo Sunahara , Hiroyuki Tomonaga , Yoshihisa Beppu
IPC分类号： H01L41/18
CPC分类号： H01L21/02197 , B82Y30/00 , C01G23/003 , C01G29/00 , C01P2004/64 , C01P2006/40 , H01B1/22 , H01L21/02282 , H01L21/316 , H01L21/31691
摘要： The present invention provides a liquid composition for forming a thin film, with which a ferroelectric thin film having excellent characteristics can be prepared even by baking at a low temperature, and a process for producing a ferroelectric thin film using it. A liquid composition for forming a ferroelectric thin film is used, which is characterized by comprising a liquid medium, crystalline ferroelectric oxide particles represented by the formula (Bi2O2)2+(Bim-1TimO3.5m-0.5)2− (wherein m is an integer of from 1 to 5) or (Bi2O2)2+(Am-1TimO3.5m-0.5)2− (wherein A is Bi3+ or La3+, the La3+/Bi3+ ratio is from 0.05 to 0.5, and m is an integer of from 1 to 5) and having an average primary particle diameter of at most 100 nm, dispersed in the liquid medium, and a soluble metal compound capable of forming a ferroelectric oxide by heating, dissolved in the liquid medium.
摘要翻译：本发明提供了一种用于形成薄膜的液体组合物，即使通过低温烘烤也可制备出具有优异特性的铁电薄膜，以及使用该薄膜制造铁电薄膜的方法。使用用于形成铁电薄膜的液体组合物，其特征在于包括液体介质，由式（Bi 2 O 2 O 2）表示的结晶铁电氧化物颗粒，（2-m-1）Ti 3 O 3 3.5m-0.5 3）2 - / SUP >（其中m是1至5的整数）或（Bi 2 O 2 O 2）2 +（A m- 1 3 3 （其中A是Bi 3+ 或La 3+，La 3+ / Bi 3+比为0.05至0.5，m为1至 5），分散在液体介质中的平均一次粒径为100nm以下，溶解在液体介质中的能够通过加热形成铁电氧化物的可溶性金属化合物。

4. 发明申请

US20060008928A1 Process for producing fine particles of bismuth titanate 有权
标题翻译：生产钛酸铋微粒的方法
公开(公告)号：US20060008928A1
公开(公告)日：2006-01-12
申请号：US11223984
申请日：2005-09-13
申请人： Yoshihisa Beppu , Kazuo Sunahara , Hiroyuki Tomonaga , Kumiko Takahashi
发明人： Yoshihisa Beppu , Kazuo Sunahara , Hiroyuki Tomonaga , Kumiko Takahashi
IPC分类号： H01L21/00
CPC分类号： C01G29/00 , B82Y30/00 , C01P2004/10 , C01P2004/20 , C01P2004/52 , C01P2004/54 , C01P2004/62 , C01P2004/64 , Y10S977/775 , Y10S977/776 , Y10S977/90
摘要： It is an object to provide fine particles of bismuth titanate having excellent dielectric characteristics, high crystallinity and a small particle diameter, and a process for their production. The object is accomplished by a process which comprises a step of obtaining a melt comprising, as represented by mol % based on oxides, from 23 to 72% of Bi2O3, from 4 to 64% of TiO2 and from 6 to 50% of B2O3, a step of quickly quenching this melt to obtain an amorphous material, a step of crystallization of bismuth titanate crystals from the above amorphous material, and a step of separating the bismuth titanate crystals from the obtained crystallized material, in this order.
摘要翻译：本发明的目的是提供具有优异的介电特性，高结晶度和小粒径的钛酸铋微粒及其生产方法。该目的通过一种方法来实现，该方法包括获得熔体的步骤，其包含以氧化物计的摩尔％表示的23％至72％的Bi 2 O 3 ，4〜64％的TiO 2和6〜50％的B 2 O 3 3，将该熔体迅速骤冷至获得无定形材料，从上述无定形材料中结晶钛酸铋晶体的步骤，以及从获得的结晶材料中依次分离钛酸铋晶体的步骤。

5. 发明申请

US20120038976A1 COATING SOLUTION FOR FORMING ULTRAVIOLET-ABSORBING FILM, AND ULTRAVIOLET-ABSORBING GLASS ARTICLE 审中-公开
标题翻译：用于形成超紫外线吸收膜的涂层溶液和超紫外线吸收玻璃制品
公开(公告)号：US20120038976A1
公开(公告)日：2012-02-16
申请号：US13279654
申请日：2011-10-24
申请人： Hirokazu KODAIRA , Hiroyuki Tomonaga
发明人： Hirokazu KODAIRA , Hiroyuki Tomonaga
IPC分类号： F21V9/06 , G02B5/22 , C09D5/32 , C09D183/06
CPC分类号： C03C17/30 , C03C2217/74 , C08G77/14 , C09D183/06 , Y10T428/31663
摘要： To provide a coating solution for forming an ultraviolet-absorbing film which has mechanical durability such as abrasion resistance and which is little susceptible to deterioration of the ultraviolet-absorbing ability by use for a long period of time, and an ultraviolet-absorbing glass article having an ultraviolet-absorbing film formed by using such a coating solution, which has mechanical durability such as abrasion resistance and which is little susceptible to deterioration of the ultraviolet-absorbing ability by use for a long period of time.A coating solution which comprises a component derived from an epoxidized organooxysilane compound, a component derived from an organooxysilane compound which is a reaction product of a hydroxylated benzophenone compound and an epoxidized organooxysilane compound, and a component derived from an organooxysilane compound other than the above both organooxysilane compounds, and an ultraviolet-absorbing glass article obtained by using the coating solution.
摘要翻译：为了提供一种用于形成具有机械耐久性如耐磨性并且几乎不易长期使用的紫外线吸收能力劣化的紫外线吸收膜的涂布溶液和具有紫外线吸收性玻璃制品的紫外线吸收玻璃制品，通过使用具有机械耐久性如耐磨性并且几乎不易长时间使用的紫外线吸收能力劣化的涂布溶液形成的紫外线吸收膜。包含衍生自环氧化有机氧基硅烷化合物的成分，来自作为羟基化二苯甲酮化合物与环氧化有机氧基硅烷化合物的反应产物的有机氧基硅烷化合物的成分和除上述以外的有机氧基硅烷化合物的成分的涂布液有机氧基硅烷化合物和通过使用该涂布溶液得到的紫外线吸收玻璃制品。

6. 发明申请

US20060046320A1 Liquid composition for forming ferroelectric thin film and process for producing ferroelectric thin film 失效
标题翻译：用于形成铁电薄膜的液体组合物和用于制备铁电薄膜的方法
公开(公告)号：US20060046320A1
公开(公告)日：2006-03-02
申请号：US11260209
申请日：2005-10-28
申请人： Kazuo Sunahara , Hiroyuki Tomonaga , Yoshihisa Beppu
发明人： Kazuo Sunahara , Hiroyuki Tomonaga , Yoshihisa Beppu
IPC分类号： H01L21/00
CPC分类号： C01G49/0054 , B82Y30/00 , C01G23/003 , C01G23/005 , C01G23/006 , C01G25/00 , C01G33/00 , C01G35/00 , C01G49/0027 , C01G49/0036 , C01P2002/34 , C01P2004/54 , C01P2004/64 , C01P2006/40 , C23C18/1216 , C23C18/127 , H01L21/31691
摘要： It is an object to provide a liquid composition for forming a thin film, with which a ferroelectric thin film having excellent characteristics can be prepared even by baking at a low temperature, and a process for producing a ferroelectric thin film using it. The above object is achieved by use of a liquid composition for forming a ferroelectric thin film, characterized in that in a liquid medium, ferroelectric oxide particles being plate or needle crystals, which are represented by the formula ABO3 (wherein A is at least one member selected from the group consisting of Ba2+, Sr2+, Ca2+, Pb2+, La2+, K+ and Na+, and B is at least one member selected from the group consisting of Ti4+, Zr4+, Nb5+, Ta5+ and Fe3+) and have a Perovskite structure and which have an average primary particle size of at most 100 nm and an aspect ratio of at least 2, are dispersed, and a soluble metal compound which forms a ferroelectric oxide by heating, is dissolved.
摘要翻译：本发明的目的是提供一种用于形成薄膜的液体组合物，即使通过低温烘烤也可制备出具有优异特性的铁电薄膜，以及使用该薄膜制造铁电薄膜的工艺。上述目的通过使用用于形成铁电薄膜的液体组合物来实现，其特征在于，在液体介质中，由式ABO 3 3表示的板状或针状晶体的铁电氧化物颗粒（其中A是选自Ba 2+，Sr 2+，Ca 2+，Pb 2+中的至少一种。 > 2 + ，La 2+，K + +和Na + +，B是选自以下的至少一种：由Ti 4+，Zr 4+，Nb 5+，Ta 5+和Fe 4+组成， 3 +），并且具有钙钛矿结构，其平均初级粒径为至多100nm，纵横比为2以上，通过加热形成铁电氧化物的可溶性金属化合物，溶解

7. 发明申请

US20060001069A1 Composition for forming dielectric layer, MIM capacitor and process for its production 失效
标题翻译：用于形成介电层的组合物，MIM电容器及其制造方法
公开(公告)号：US20060001069A1
公开(公告)日：2006-01-05
申请号：US11150231
申请日：2005-06-13
申请人： Hiroyuki Tomonaga , Katsuaki Miyatani , Yoshihisa Beppu , Kumiko Takahashi , Kazuo Sunahara
发明人： Hiroyuki Tomonaga , Katsuaki Miyatani , Yoshihisa Beppu , Kumiko Takahashi , Kazuo Sunahara
IPC分类号： H01L21/8242 , H01L27/108
CPC分类号： H01L21/02197 , H01G4/1218 , H01G4/1236 , H01G4/1254 , H01L21/31691 , H01L28/55 , H01L28/65
摘要： To provide a composition for forming a dielectric layer excellent in dielectric constant and withstand voltage properties, a MIM capacitor and a process for its production. A composition for forming a dielectric layer, which comprises fine particles of perovskite type dielectric crystal, glass frit, and a hydrolysable silicon compound or its oligomer, and a MIM capacitor comprising a substrate, and a bottom electrode layer, a dielectric layer having a structure such that fine particles of perovskite type dielectric crystal are dispersed in a silicon oxide matrix containing glass-forming ions and a top electrode, formed on the substrate in this order.
摘要翻译：为了提供用于形成介电常数和耐电压性能优异的介电层的组合物，MIM电容器及其制造方法。一种用于形成电介质层的组合物，其包含钙钛矿型电介质晶体的微细颗粒，玻璃料和可水解硅化合物或其低聚物，以及包含基底的MIM电容器和底部电极层，具有结构使得细小颗粒的钙钛矿型电介质晶体分散在含有玻璃形成离子的氧化硅基体和顶部电极中，所述氧化硅基体依次形成在基板上。

8. 发明授权

US07300806B2 Process for producing fine particles of bismuth titanate 有权
标题翻译：生产钛酸铋微粒的方法
公开(公告)号：US07300806B2
公开(公告)日：2007-11-27
申请号：US11223984
申请日：2005-09-13
申请人： Yoshihisa Beppu , Kazuo Sunahara , Hiroyuki Tomonaga , Kumiko Takahashi
发明人： Yoshihisa Beppu , Kazuo Sunahara , Hiroyuki Tomonaga , Kumiko Takahashi
IPC分类号： H01L21/00
CPC分类号： C01G29/00 , B82Y30/00 , C01P2004/10 , C01P2004/20 , C01P2004/52 , C01P2004/54 , C01P2004/62 , C01P2004/64 , Y10S977/775 , Y10S977/776 , Y10S977/90
摘要： It is an object to provide fine particles of bismuth titanate having excellent dielectric characteristics, high crystallinity and a small particle diameter, and a process for their production. The object is accomplished by a process which comprises a step of obtaining a melt comprising, as represented by mol % based on oxides, from 23 to 72% of Bi2O3, from 4 to 64% of TiO2 and from 6 to 50% of B2O3, a step of quickly quenching this melt to obtain an amorphous material, a step of crystallization of bismuth titanate crystals from the above amorphous material, and a step of separating the bismuth titanate crystals from the obtained crystallized material, in this order.
摘要翻译：本发明的目的是提供具有优异的介电特性，高结晶度和小粒径的钛酸铋微粒及其生产方法。该目的通过一种方法来实现，该方法包括获得熔体的步骤，其包含以氧化物计的摩尔％表示的23％至72％的Bi 2 O 3 ，4〜64％的TiO 2和6〜50％的B 2 O 3 3，将该熔体迅速骤冷至获得无定形材料，从上述无定形材料中结晶钛酸铋晶体的步骤，以及从获得的结晶材料中依次分离钛酸铋晶体的步骤。

9. 发明授权

US07270765B2 Composition for forming dielectric layer, MIM capacitor and process for its production 失效
标题翻译：用于形成介电层的组合物，MIM电容器及其制造方法
公开(公告)号：US07270765B2
公开(公告)日：2007-09-18
申请号：US11150231
申请日：2005-06-13
申请人： Hiroyuki Tomonaga , Katsuaki Miyatani , Yoshihisa Beppu , Kumiko Takahashi , Kazuo Sunahara
发明人： Hiroyuki Tomonaga , Katsuaki Miyatani , Yoshihisa Beppu , Kumiko Takahashi , Kazuo Sunahara
IPC分类号： H01L29/12 , H01L21/8242 , H01L27/108 , C04B35/00
CPC分类号： H01L21/02197 , H01G4/1218 , H01G4/1236 , H01G4/1254 , H01L21/31691 , H01L28/55 , H01L28/65
摘要： To provide a composition for forming a dielectric layer excellent in dielectric constant and withstand voltage properties, a MIM capacitor and a process for its production.A composition for forming a dielectric layer, which comprises fine particles of perovskite type dielectric crystal, glass frit, and a hydrolysable silicon compound or its oligomer, and a MIM capacitor comprising a substrate, and a bottom electrode layer, a dielectric layer having a structure such that fine particles of perovskite type dielectric crystal are dispersed in a silicon oxide matrix containing glass-forming ions and a top electrode, formed on the substrate in this order.
摘要翻译：为了提供用于形成介电常数和耐电压性能优异的介电层的组合物，MIM电容器及其制造方法。一种用于形成电介质层的组合物，其包含钙钛矿型电介质晶体的微细颗粒，玻璃料和可水解硅化合物或其低聚物，以及包含基底的MIM电容器和底部电极层，具有结构使得细小颗粒的钙钛矿型电介质晶体分散在含有玻璃形成离子的氧化硅基体和顶部电极中，所述氧化硅基体依次形成在基板上。

10. 发明授权

US07208324B2 Liquid composition for forming ferroelectric thin film and process for producing ferroelectric thin film 失效
标题翻译：用于形成铁电薄膜的液体组合物和用于制备铁电薄膜的方法
公开(公告)号：US07208324B2
公开(公告)日：2007-04-24
申请号：US11260209
申请日：2005-10-28
申请人： Kazuo Sunahara , Hiroyuki Tomonaga , Yoshihisa Beppu
发明人： Kazuo Sunahara , Hiroyuki Tomonaga , Yoshihisa Beppu
IPC分类号： H01L21/00 , C01G49/00
CPC分类号： C01G49/0054 , B82Y30/00 , C01G23/003 , C01G23/005 , C01G23/006 , C01G25/00 , C01G33/00 , C01G35/00 , C01G49/0027 , C01G49/0036 , C01P2002/34 , C01P2004/54 , C01P2004/64 , C01P2006/40 , C23C18/1216 , C23C18/127 , H01L21/31691
摘要： It is an object to provide a liquid composition for forming a thin film, with which a ferroelectric thin film having excellent characteristics can be prepared even by baking at a low temperature, and a process for producing a ferroelectric thin film using it. The above object is achieved by use of a liquid composition for forming a ferroelectric thin film, characterized in that in a liquid medium, ferroelectric oxide particles being plate or needle crystals, which are represented by the formula ABO3 (wherein A is at least one member selected from the group consisting of Ba2+, Sr2+, Ca2+, Pb2+, La3+, K+ and Na+, and B is at least one member selected from the group consisting of Ti4+, Zr4+, Nb5+, Ta5+ and Fe3+) and have a Perovskite structure and which have an average primary particle size of at most 100 nm and an aspect ratio of at least 2, are dispersed, and a soluble metal compound which forms a ferroelectric oxide by heating, is dissolved.
摘要翻译：本发明的目的是提供一种用于形成薄膜的液体组合物，即使通过低温烘烤也可制备出具有优异特性的铁电薄膜，以及使用该薄膜制造铁电薄膜的工艺。上述目的通过使用用于形成铁电薄膜的液体组合物来实现，其特征在于，在液体介质中，由式ABO 3表示的铁电氧化物颗粒为平板或针状晶体（其中A为至少一个成员选自Ba 2+，Sr 2+，Ca 2+，Pb 2+，Pb 2+， La 3+，K +和/或Na +，B是至少一种选自Ti 4+ Zr 4+，Nb 5+，Ta 5+和Fe 3+）和具有平均一次粒径为100nm以上，长径比为2以上的钙钛矿结构，并且通过加热溶解形成铁电氧化物的可溶性金属化合物。

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