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1. 发明授权

US07746453B2 Pattern defect inspection apparatus and method 有权
标题翻译：图案缺陷检查装置及方法
公开(公告)号：US07746453B2
公开(公告)日：2010-06-29
申请号：US12113781
申请日：2008-05-01
申请人： Hidetoshi Nishiyama , Kei Shimura , Sachio Uto , Minori Noguchi
发明人： Hidetoshi Nishiyama , Kei Shimura , Sachio Uto , Minori Noguchi
IPC分类号： G01N21/00
CPC分类号： G01N21/95607 , G01N21/94 , G01N21/9501 , G01N2021/4711
摘要： A pattern defect inspection apparatus capable of detecting minute defects on a sample with high sensitivity without generating speckle noise in signals is realized. Substantially the same region on a surface of a wafer is detected by using two detectors at mutually different timings. Output signals from the two detectors are summed and averaged to eliminate noise. Since a large number of rays of illumination light are not simultaneously irradiated to the same region on the wafer, a pattern defect inspection apparatus capable of suppressing noise resulting from interference of a large number of rays, eliminating noise owing to other causes and detecting with high sensitivity minute defects on the sample without the occurrence of speckle noise in the signal can be accomplished.
摘要翻译：实现能够以高灵敏度检测样品上的微小缺陷而不产生信号中的斑点噪声的图案缺陷检查装置。通过在相互不同的定时使用两个检测器来检测晶片表面上的基本上相同的区域。来自两个检测器的输出信号被相加和平均以消除噪声。由于大量的照明光线不能同时照射到晶片上的相同区域，所以能够抑制由于大量光线的干扰而产生的噪声的图案缺陷检查装置，消除由于其它原因引起的噪声和高检测可以实现样品上的灵敏度微小缺陷，而不会在信号中发生斑点噪声。

2. 发明授权

US08467048B2 Pattern defect inspection apparatus and method 有权
标题翻译：图案缺陷检查装置及方法
公开(公告)号：US08467048B2
公开(公告)日：2013-06-18
申请号：US13535955
申请日：2012-06-28
申请人： Hidetoshi Nishiyama , Kei Shimura , Sachio Uto , Minori Noguchi
发明人： Hidetoshi Nishiyama , Kei Shimura , Sachio Uto , Minori Noguchi
IPC分类号： G01N21/00
CPC分类号： G01N21/95607 , G01N21/94 , G01N21/9501 , G01N2021/4711
摘要： A pattern defect inspection apparatus capable of detecting minute defects on a sample with high sensitivity without generating speckle noise in signals is realized. Substantially the same region on a surface of a wafer is detected by using two detectors at mutually different timings. Output signals from the two detectors are summed and averaged to eliminate noise. Since a large number of rays of illumination light are not simultaneously irradiated to the same region on the wafer, a pattern defect inspection apparatus capable of suppressing noise resulting from interference of a large number of rays, eliminating noise owing to other causes and detecting with high sensitivity minute defects on the sample without the occurrence of speckle noise in the signal can be accomplished.
摘要翻译：实现能够以高灵敏度检测样品上的微小缺陷而不产生信号中的斑点噪声的图案缺陷检查装置。通过在相互不同的定时使用两个检测器来检测晶片表面上的基本上相同的区域。来自两个检测器的输出信号被相加和平均以消除噪声。由于大量的照明光线不能同时照射到晶片上的相同区域，所以能够抑制由于大量光线的干扰而产生的噪声的图案缺陷检查装置，消除由于其它原因引起的噪声和高检测可以实现样品上的灵敏度微小缺陷，而不会在信号中发生斑点噪声。

3. 发明授权

US08233145B2 Pattern defect inspection apparatus and method 有权
标题翻译：图案缺陷检查装置及方法
公开(公告)号：US08233145B2
公开(公告)日：2012-07-31
申请号：US12781682
申请日：2010-05-17
申请人： Hidetoshi Nishiyama , Kei Shimura , Sachio Uto , Minori Noguchi
发明人： Hidetoshi Nishiyama , Kei Shimura , Sachio Uto , Minori Noguchi
IPC分类号： G01N21/00
CPC分类号： G01N21/95607 , G01N21/94 , G01N21/9501 , G01N2021/4711
摘要： A pattern defect inspection apparatus capable of detecting minute defects on a sample with high sensitivity without generating speckle noise in signals is realized. Substantially the same region on a surface of a wafer is detected by using two detectors at mutually different timings. Output signals from the two detectors are summed and averaged to eliminate noise. Since a large number of rays of illumination light are not simultaneously irradiated to the same region on the wafer, a pattern defect inspection apparatus capable of suppressing noise resulting from interference of a large number of rays, eliminating noise owing to other causes and detecting with high sensitivity minute defects on the sample without the occurrence of speckle noise in the signal can be accomplished.
摘要翻译：实现能够以高灵敏度检测样品上的微小缺陷而不产生信号中的斑点噪声的图案缺陷检查装置。通过在相互不同的定时使用两个检测器来检测晶片表面上的基本上相同的区域。来自两个检测器的输出信号被相加和平均以消除噪声。由于大量的照明光线不能同时照射到晶片上的相同区域，所以能够抑制由于大量光线的干扰而产生的噪声的图案缺陷检查装置，消除由于其它原因引起的噪声和高检测可以实现样品上的灵敏度微小缺陷，而不会在信号中发生斑点噪声。

4. 发明申请

US20100225903A1 PATTERN DEFECT INSPECTION APPARATUS AND METHOD 有权
标题翻译：图案缺陷检查装置及方法
公开(公告)号：US20100225903A1
公开(公告)日：2010-09-09
申请号：US12781682
申请日：2010-05-17
申请人： Hidetoshi NISHIYAMA , Kei Shimura , Sachio Uto , Minori Noguchi
发明人： Hidetoshi NISHIYAMA , Kei Shimura , Sachio Uto , Minori Noguchi
IPC分类号： G01N21/00
CPC分类号： G01N21/95607 , G01N21/94 , G01N21/9501 , G01N2021/4711
摘要： A pattern defect inspection apparatus capable of detecting minute defects on a sample with high sensitivity without generating speckle noise in signals is realized. Substantially the same region on a surface of a wafer is detected by using two detectors at mutually different timings. Output signals from the two detectors are summed and averaged to eliminate noise. Since a large number of rays of illumination light are not simultaneously irradiated to the same region on the wafer, a pattern defect inspection apparatus capable of suppressing noise resulting from interference of a large number of rays, eliminating noise owing to other causes and detecting with high sensitivity minute defects on the sample without the occurrence of speckle noise in the signal can be accomplished.
摘要翻译：实现能够以高灵敏度检测样品上的微小缺陷而不产生信号中的斑点噪声的图案缺陷检查装置。通过在相互不同的定时使用两个检测器来检测晶片表面上的基本上相同的区域。来自两个检测器的输出信号被相加和平均以消除噪声。由于大量的照明光线不能同时照射到晶片上的相同区域，所以能够抑制由于大量光线的干扰而产生的噪声的图案缺陷检查装置，消除由于其它原因引起的噪声和高检测可以实现样品上的灵敏度微小缺陷，而不会在信号中发生斑点噪声。

5. 发明授权

US08482728B2 Apparatus and method for inspecting defect on object surface 有权
标题翻译：检测物体表面缺陷的装置和方法
公开(公告)号：US08482728B2
公开(公告)日：2013-07-09
申请号：US12244958
申请日：2008-10-03
申请人： Sachio Uto , Hidetoshi Nishiyama , Minori Noguchi
发明人： Sachio Uto , Hidetoshi Nishiyama , Minori Noguchi
IPC分类号： G01N21/00
CPC分类号： H01L21/02334 , B08B6/00 , G01B11/0625 , G01B11/303 , G01N3/04 , G01N21/15 , G01N21/94 , G01N21/9501 , G01N21/95623 , G01N2021/9563 , H01L21/02057 , H01L21/02082
摘要： An aspect of the invention provides a defect inspection apparatus being able to accurately inspect a micro foreign matter or defect at a high speed for an inspection target substrate in which a repetitive pattern and a non-repetitive pattern are mixed. In a foreign matter anti-adhesive means 180, a transparent plate 187 is placed on a placement table 34 through a frame 185. In the foreign matter anti-adhesive means 180, a shaft 181 which is rotatably supported by two columnar supports 184 fixed onto a base 186 is coupled to a motor 182 by a coupling 183. The shaft 181 is inserted into a part of a frame 185 between the two columnar supports 184 such that the frame 185 and the transparent plate 187 are turnable about the shaft 181. Therefore, the whole of the frame 185 is opened and closed in a Z-direction about the shaft 181, and a wafer 1 on the placement table 34 can be covered with the frame 185 and the transparent plate 187.
摘要翻译：本发明的一个方面提供了一种缺陷检查装置，其能够精确地检查混合有重复图案和非重复图案的检查对象基板的高速微细异物或缺陷。在异物防粘连装置180中，通过框架185将透明板187放置在放置台34上。在异物防粘装置180中，轴181可旋转地由两个柱状支撑件184支撑固定到基座186通过联轴器183联接到马达18.轴181插入到两个柱状支撑件184之间的框架185的一部分中，使得框架185和透明板187围绕轴181可转动。因此，整个框架185围绕轴181沿Z方向打开和关闭，并且放置台34上的晶片1可以被框架185和透明板187覆盖。

6. 发明授权

US08094295B2 Inspection method and inspection apparatus 有权
公开(公告)号：US08094295B2
公开(公告)日：2012-01-10
申请号：US12555610
申请日：2009-09-08
申请人： Akira Hamamatsu , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Takahiro Jingu , Sachio Uto
发明人： Akira Hamamatsu , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Takahiro Jingu , Sachio Uto
IPC分类号： G01N21/00
CPC分类号： G01N21/8806 , G01N21/94 , G01N21/9501 , G01N21/95623
摘要： The present invention provides an inspection apparatus and inspection method. The inspection apparatus includes a stage mechanism for supporting an object under inspection. A spatial filter is provided in the detection optical system to inspect the object. A printer is used to print the results of the spatial filter. The spatial filter can be provided in the form of a Fourier transformed image.

7. 发明授权

US07586593B2 Inspection method and inspection apparatus 失效
标题翻译：检验方法和检验仪器
公开(公告)号：US07586593B2
公开(公告)日：2009-09-08
申请号：US11605239
申请日：2006-11-29
申请人： Akira Hamamatsu , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Takahiro Jingu , Sachio Uto
发明人： Akira Hamamatsu , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Takahiro Jingu , Sachio Uto
IPC分类号： G01N21/00
CPC分类号： G01N21/8806 , G01N21/94 , G01N21/9501 , G01N21/95623
摘要： The present invention provides an inspection apparatus and inspection method. The inspection apparatus includes a stage mechanism for supporting an object under inspection. A spatial filter is provided in the detection optical system to inspect the object. A printer is used to print the results of the spatial filter. The spatial filter can be provided in the form of a Fourier transformed image.
摘要翻译：本发明提供一种检查装置和检查方法。检查装置包括用于支撑被检查物体的台架机构。在检测光学系统中设置空间滤波器来检查物体。打印机用于打印空间滤镜的结果。空间滤波器可以以傅里叶变换图像的形式提供。

8. 发明申请

US20120262709A1 DEFECTS INSPECTING APPARATUS AND DEFECTS INSPECTING METHOD 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US20120262709A1
公开(公告)日：2012-10-18
申请号：US13529363
申请日：2012-06-21
申请人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
发明人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
IPC分类号： G01N21/88
CPC分类号： G01N21/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148
摘要： An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.
摘要翻译：一种检查装置和方法，包括：第一和第二照明单元，用于以不同的入射角照射待检查样本的表面;以及第一和第二检测光学单元，其以不同的仰角方向布置在样本的表面上，用于检测样本的图像由第一和第二照明单元照亮。

9. 发明申请

US20110310382A1 DEFECTS INSPECTING APPARATUS AND DEFECTS INSPECTING METHOD 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US20110310382A1
公开(公告)日：2011-12-22
申请号：US13221935
申请日：2011-08-31
申请人： Sachio UTO , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
发明人： Sachio UTO , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
IPC分类号： G01N21/00
CPC分类号： G01N21/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148
摘要： An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.
摘要翻译：一种检查装置和方法，包括：第一和第二照明单元，用于以不同的入射角照射待检查样本的表面;以及第一和第二检测光学单元，其以不同的仰角方向布置在样本的表面上，用于检测样本的图像由第一和第二照明单元照亮。

10. 发明授权

US07586594B2 Method for inspecting defect and apparatus for inspecting defect 有权
标题翻译：检查缺陷的方法和缺陷检查装置
公开(公告)号：US07586594B2
公开(公告)日：2009-09-08
申请号：US11770217
申请日：2007-06-28
申请人： Akira Hamamatsu , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Takahiro Jingu , Sachio Uto
发明人： Akira Hamamatsu , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Takahiro Jingu , Sachio Uto
IPC分类号： G01N21/00
CPC分类号： G01N21/8806 , G01N21/94 , G01N21/9501 , G01N21/95623
摘要： The present invention is an apparatus for inspecting foreign particles/defects, comprises an illumination optical system, a detection optical system, a shielding unit which is provided in said detection optical system to selectively shield diffracted light pattern coming from circuit pattern existing on an inspection object and an arithmetic processing system, wherein said shielding unit comprises a micro-mirror array device or a reflected type liquid crystal, or a transmission type liquid crystal, or an object which is transferred a shielding pattern to an optical transparent substrate, or a substrate or a film which is etched so as to leave shielding patterns, or an optical transparent substrate which can be changed in transmission by heating, sudden cold, or light illumination, or change of electric field or magnetic field, or a shielding plate of cylindrical shape or plate shape.
摘要翻译：本发明是用于检查异物的缺陷的装置，包括照明光学系统，检测光学系统，屏蔽单元，其设置在所述检测光学系统中，以选择性地屏蔽来自存在于检查对象上的电路图案的衍射光图案以及算术处理系统，其中所述屏蔽单元包括微镜阵列器件或反射型液晶或透射型液晶，或将屏蔽图案转印到光学透明基板或基板或蚀刻以留下屏蔽图案的薄膜，或通过加热，突然冷或光照射或电场或磁场的变化或透镜中的可变化的光学透明基板或圆柱形的屏蔽板或板形。

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