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1. 发明授权

US07277172B2 Measuring overlay and profile asymmetry using symmetric and anti-symmetric scatterometry signals 有权
标题翻译：使用对称和反对称散射测量信号测量覆盖层和轮廓不对称
公开(公告)号：US07277172B2
公开(公告)日：2007-10-02
申请号：US11325872
申请日：2006-01-04
申请人： Daniel Kandel , Kenneth P. Gross , Michael Friedmann , Jiyou Fu , Shakar Krishnan , Boris Golovanevsky
发明人： Daniel Kandel , Kenneth P. Gross , Michael Friedmann , Jiyou Fu , Shakar Krishnan , Boris Golovanevsky
IPC分类号： G01J4/00 , G01N21/86
CPC分类号： G01N21/211 , G01N21/9501 , G01N21/956 , G03F7/70633
摘要： Systems and methods are disclosed for using ellipsometer configurations to measure the partial Mueller matrix and the complete Jones matrix of a system that may be isotropic or anisotropic. In one embodiment two or more signals, which do not necessarily satisfy any symmetry assumptions individually, are combined into a composite signal which satisfies a symmetry assumption. The individual signals are collected at two or more analyzer angles. Symmetry properties of the composite signals allow easy extraction of overlay information for any relative orientation of the incident light beam with respect to a 1D grating target, as well as for targets comprising general 2D gratings. Signals of a certain symmetry property also allow measurement of profile asymmetry in a very efficient manner. In another embodiment a measurement methodology is defined to measure only signals which satisfy a symmetry assumption. An optional embodiment comprises a single polarization element serving as polarizer and analyzer. Another optional embodiment uses an analyzing prism to simultaneously collect two polarization components of reflected light.
摘要翻译：公开了使用椭偏仪配置来测量可能是各向同性或各向异性的系统的部分Mueller矩阵和完整琼斯矩阵的系统和方法。在一个实施例中，不一定满足任何对称假设的两个或更多个信号被组合成满足对称假设的复合信号。各个信号以两个或多个分析器角度收集。复合信号的对称属性允许容易地提取用于入射光束相对于1D光栅目标的任何相对取向以及包括通用2D光栅的目标的覆盖信息。具有某种对称性质的信号也可以以非常有效的方式测量轮廓不对称。在另一个实施例中，测量方法被定义为仅测量满足对称假设的信号。可选实施例包括用作偏振器和分析器的单个偏振元件。另一个可选实施例使用分析棱镜来同时收集反射光的两个偏振分量。

2. 发明申请

US20060274310A1 Measuring overlay and profile asymmetry using symmetric and anti-symmetric scatterometry signals 有权
标题翻译：使用对称和反对称散射测量信号测量覆盖层和轮廓不对称
公开(公告)号：US20060274310A1
公开(公告)日：2006-12-07
申请号：US11325872
申请日：2006-01-04
申请人： Daniel Kandel , Kenneth Gross , Michael Friedmann , Jiyou Fu , Shankar Krishnan , Boris Golovanevsky
发明人： Daniel Kandel , Kenneth Gross , Michael Friedmann , Jiyou Fu , Shankar Krishnan , Boris Golovanevsky
IPC分类号： G01J4/00
CPC分类号： G01N21/211 , G01N21/9501 , G01N21/956 , G03F7/70633
摘要： Systems and methods are disclosed for using ellipsometer configurations to measure the partial Mueller matrix and the complete Jones matrix of a system that may be isotropic or anisotropic. In one embodiment two or more signals, which do not necessarily satisfy any symmetry assumptions individually, are combined into a composite signal which satisfies a symmetry assumption. The individual signals are collected at two or more analyzer angles. Symmetry properties of the composite signals allow easy extraction of overlay information for any relative orientation of the incident light beam with respect to a ID grating target, as well as for targets comprising general 2D gratings. Signals of a certain symmetry property also allow measurement of profile asymmetry in a very efficient manner. In another embodiment a measurement methodology is defined to measure only signals which satisfy a symmetry assumption. An optional embodiment comprises a single polarization element serving as polarizer and analyzer. Another optional embodiment uses an analyzing prism to simultaneously collect two polarization components of reflected light.
摘要翻译：公开了使用椭偏仪配置来测量可能是各向同性或各向异性的系统的部分Mueller矩阵和完整琼斯矩阵的系统和方法。在一个实施例中，不一定满足任何对称假设的两个或更多个信号被组合成满足对称假设的复合信号。各个信号以两个或多个分析器角度收集。复合信号的对称属性允许容易地提取用于入射光束相对于ID光栅目标的任何相对取向以及包括通用2D光栅的目标的覆盖信息。具有某种对称性质的信号也可以以非常有效的方式测量轮廓不对称。在另一个实施例中，测量方法被定义为仅测量满足对称假设的信号。可选实施例包括用作偏振器和分析器的单个偏振元件。另一个可选实施例使用分析棱镜来同时收集反射光的两个偏振分量。

3. 发明申请

US20100091284A1 APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY 有权
标题翻译：用于使用散射检测来检测重叠错误的装置和方法
公开(公告)号：US20100091284A1
公开(公告)日：2010-04-15
申请号：US12641663
申请日：2009-12-18
申请人： Walter D. Mieher , Ady Levy , Boris Golovanevsky , Michael Friedmann , Ian Smith , Michael Adel , Anatoly Fabrikant , Christopher F. Bevis , John Fielden , Noah Bareket , Kenneth P. Gross , Piotr Zalicki , Dan Wack , Paola Dececco , Thaddeus G. Dziura , Mark Ghinovker
发明人： Walter D. Mieher , Ady Levy , Boris Golovanevsky , Michael Friedmann , Ian Smith , Michael Adel , Anatoly Fabrikant , Christopher F. Bevis , John Fielden , Noah Bareket , Kenneth P. Gross , Piotr Zalicki , Dan Wack , Paola Dececco , Thaddeus G. Dziura , Mark Ghinovker
IPC分类号： G01B11/00
CPC分类号： G03F9/7088 , G01N21/956 , G01N2021/213 , G03F7/70625 , G03F7/70633 , G03F7/70683 , G03F9/7049 , G03F9/7084
摘要： Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. A plurality of targets is provided. Each target includes a portion of the first and second structures and each is designed to have an offset between its first and second structure portions. The targets are illuminated with electromagnetic radiation to thereby obtain spectra from each target at a −1st diffraction order and a +1st diffraction order. It is determined whether there are any overlay error between the first structures and the second structures using a scatterometry technique based on the detected spectra by (i) for each target, determining a first differential intensity between the −1st diffraction order and a +1st diffraction order, (ii) for a plurality of pairs of targets each having a first target and a second target, determining a second differential intensity between the first differential intensity of the first target and the first differential intensity of the second target, and (iii) determining any overlay error between the first structures and the second structures using a scatterometry technique based on the second differential intensities determined from each target pair.
摘要翻译：公开了用于确定样品的两层之间的重叠误差的技术，装置和目标。提供多个目标。每个目标包括第一和第二结构的一部分，并且每个目标被设计成在其第一和第二结构部分之间具有偏移。用电磁辐射照射靶，从而以第一衍射级和+ 1衍射级获得每个靶的光谱。使用基于检测到的光谱的第一结构和第二结构之间是否存在任何覆盖误差（i）对于每个目标，确定第一衍射级和第+第一衍射之间的第一差分强度（ii）对于具有第一目标和第二目标的多对目标对，确定第一目标的第一差分强度与第二目标的第一差分强度之间的第二差分强度，以及（iii）使用基于从每个目标对确定的第二差分强度的散射测量技术来确定第一结构和第二结构之间的任何覆盖误差。

4. 发明授权

US07933016B2 Apparatus and methods for detecting overlay errors using scatterometry 有权
标题翻译：使用散射法检测重叠误差的装置和方法
公开(公告)号：US07933016B2
公开(公告)日：2011-04-26
申请号：US12641663
申请日：2009-12-18
申请人： Walter D. Mieher , Ady Levy , Boris Golovanevsky , Michael Friedmann , Ian Smith , Michael Adel , Anatoly Fabrikant , Christopher F. Bevis , John Fielden , Noah Bareket , Kenneth P. Gross , Piotr Zalicki , Dan Wack , Paola Dececco , Thaddeus G. Dziura , Mark Ghinovker
发明人： Walter D. Mieher , Ady Levy , Boris Golovanevsky , Michael Friedmann , Ian Smith , Michael Adel , Anatoly Fabrikant , Christopher F. Bevis , John Fielden , Noah Bareket , Kenneth P. Gross , Piotr Zalicki , Dan Wack , Paola Dececco , Thaddeus G. Dziura , Mark Ghinovker
IPC分类号： G01B11/00
CPC分类号： G03F9/7088 , G01N21/956 , G01N2021/213 , G03F7/70625 , G03F7/70633 , G03F7/70683 , G03F9/7049 , G03F9/7084
摘要： Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. A plurality of targets is provided. Each target includes a portion of the first and second structures and each is designed to have an offset between its first and second structure portions. The targets are illuminated with electromagnetic radiation to thereby obtain spectra from each target at a −1st diffraction order and a +1st diffraction order. It is determined whether there are any overlay error between the first structures and the second structures using a scatterometry technique based on the detected spectra by (i) for each target, determining a first differential intensity between the −1st diffraction order and a +1st diffraction order, (ii) for a plurality of pairs of targets each having a first target and a second target, determining a second differential intensity between the first differential intensity of the first target and the first differential intensity of the second target, and (iii) determining any overlay error between the first structures and the second structures using a scatterometry technique based on the second differential intensities determined from each target pair.
摘要翻译：公开了用于确定样品的两层之间的重叠误差的技术，装置和目标。提供多个目标。每个目标包括第一和第二结构的一部分，并且每个目标被设计成在其第一和第二结构部分之间具有偏移。用电磁辐射照射靶，从而以第一衍射级和+ 1衍射级获得每个靶的光谱。使用基于检测到的光谱的第一结构和第二结构之间是否存在任何覆盖误差（i）对于每个目标，确定第一衍射级和第+第一衍射之间的第一差分强度（ii）对于具有第一目标和第二目标的多对目标对，确定第一目标的第一差分强度与第二目标的第一差分强度之间的第二差分强度，以及（iii）使用基于从每个目标对确定的第二差分强度的散射测量技术来确定第一结构和第二结构之间的任何覆盖误差。

5. 发明授权

US08908175B1 Flexible scatterometry metrology system and method 有权
标题翻译：灵活的散射测量系统和方法
公开(公告)号：US08908175B1
公开(公告)日：2014-12-09
申请号：US11521118
申请日：2006-09-13
申请人： Daniel Kandel , Michael Adel , Joel Seligson , Boris Golovanevsky
发明人： Daniel Kandel , Michael Adel , Joel Seligson , Boris Golovanevsky
IPC分类号： G01N21/00
CPC分类号： G01N21/211
摘要： A scatterometry tool including an illumination source for directing a light beam into a first optical beam shaping and positioning element at an illumination pupil plane of the tool where the light beam is modulated and directed to an objective lens system having a high numerical aperture. The objective receiving the modulated light beam and directing it onto a target to generate a scattering signal. The objective lens collects the scattering signal and directs it to a second optical beam shaping and positioning element at a collection pupil plane where the signal is modulated and then directed to detectors for receiving and processing the signal to determine surface characteristics of the target.
摘要翻译：散射测量工具，其包括用于将光束引导到工具的照明光瞳平面处的第一光束成形和定位元件的照明源，其中光束被调制并被引导到具有高数值孔径的物镜系统。接收调制光束并将其引导到目标上以产生散射信号的目的。物镜收集散射信号，并将其引导到收集光瞳平面处的第二光束整形和定位元件，信号被调制，然后被引导到检测器以接收和处理信号以确定目标的表面特性。

6. 发明申请

US20070229829A1 Apparatus and methods for detecting overlay errors using scatterometry 有权
标题翻译：使用散射法检测重叠误差的装置和方法
公开(公告)号：US20070229829A1
公开(公告)日：2007-10-04
申请号：US11525320
申请日：2006-09-21
申请人： Daniel Kandel , Walter D. Mieher , Boris Golovanevsky
发明人： Daniel Kandel , Walter D. Mieher , Boris Golovanevsky
IPC分类号： G01B11/00
CPC分类号： G03F7/70633
摘要： Embodiments of the invention include a scatterometry target for use in determining the alignment between substrate layers. A target arrangement is formed on a substrate and comprises a plurality of target cells. Each cell has two layers of periodic features constructed such that an upper layer is arranged above a lower layer and configured so that the periodic features of the upper layer have an offset and/or different pitch than periodic features of the lower layer. The pitches are arranged to generate a periodic signal when the target is exposed to an illumination source. The target also includes disambiguation features arranged between the cells and configured to resolve ambiguities caused by the periodic signals generated by the cells when exposed to the illumination source.
摘要翻译：本发明的实施例包括用于确定衬底层之间的对准的散射仪。目标装置形成在基板上并且包括多个目标单元。每个单元具有两层周期性特征，其被构造为使得上层布置在下层上方并且被配置为使得上层的周期特征具有与下层的周期特征相比偏移和/或不同的间距。当目标暴露于照明源时，间距被布置成产生周期性信号。目标还包括布置在单元之间的消歧特征，并被配置为解决由暴露于照明源时由单元产生的周期性信号引起的模糊。

7. 发明授权

US07616313B2 Apparatus and methods for detecting overlay errors using scatterometry 有权
标题翻译：使用散射法检测重叠误差的装置和方法
公开(公告)号：US07616313B2
公开(公告)日：2009-11-10
申请号：US11525320
申请日：2006-09-21
申请人： Daniel Kandel , Walter D. Mieher , Boris Golovanevsky
发明人： Daniel Kandel , Walter D. Mieher , Boris Golovanevsky
IPC分类号： G01B11/00
CPC分类号： G03F7/70633
摘要： Embodiments of the invention include a scatterometry target for use in determining the alignment between substrate layers. A target arrangement is formed on a substrate and comprises a plurality of target cells. Each cell has two layers of periodic features constructed such that an upper layer is arranged above a lower layer and configured so that the periodic features of the upper layer have an offset and/or different pitch than periodic features of the lower layer. The pitches are arranged to generate a periodic signal when the target is exposed to an illumination source. The target also includes disambiguation features arranged between the cells and configured to resolve ambiguities caused by the periodic signals generated by the cells when exposed to the illumination source.
摘要翻译：本发明的实施例包括用于确定衬底层之间的对准的散射仪。目标装置形成在基板上并且包括多个目标单元。每个单元具有两层周期性特征，其被构造为使得上层布置在下层上方并且被配置为使得上层的周期特征具有与下层的周期特征相比偏移和/或不同的间距。当目标暴露于照明源时，间距被布置成产生周期性信号。目标还包括布置在单元之间的消歧特征，并被配置为解决由暴露于照明源时由单元产生的周期性信号引起的模糊。

8. 发明授权

US07663753B2 Apparatus and methods for detecting overlay errors using scatterometry 有权
标题翻译：使用散射法检测重叠误差的装置和方法
公开(公告)号：US07663753B2
公开(公告)日：2010-02-16
申请号：US11963730
申请日：2007-12-21
申请人： Walter D. Mieher , Ady Levy , Boris Golovanevsky , Michael Friedmann , Ian Smith , Michael Adel , Anatoly Fabrikant , Christopher F. Bevis , John Fielden , Noah Bareket , Ken Gross , Piotr Zalicki , Dan Wack , Paola Dececco , Thaddeus G. Dziura , Mark Ghinovker
发明人： Walter D. Mieher , Ady Levy , Boris Golovanevsky , Michael Friedmann , Ian Smith , Michael Adel , Anatoly Fabrikant , Christopher F. Bevis , John Fielden , Noah Bareket , Ken Gross , Piotr Zalicki , Dan Wack , Paola Dececco , Thaddeus G. Dziura , Mark Ghinovker
IPC分类号： G01B11/00
CPC分类号： G03F9/7088 , G01N21/956 , G01N2021/213 , G03F7/70625 , G03F7/70633 , G03F7/70683 , G03F9/7049 , G03F9/7084
摘要： Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. Target A is designed to have an offset Xa between its first and second structures portions; target B is designed to have an offset Xb; target C is designed to have an offset Xc; and target D is designed to have an offset Xd. Each of the offsets Xa, Xb, Xc and Xd is preferably different from zero; Xa is an opposite sign and differ from Xb; and Xc is an opposite sign and differs from Xd. The targets A, B, C and D are illuminated with electromagnetic radiation to obtain spectra SA, SB, SC, and SD from targets A, B, C, and D, respectively. Any overlay error between the first structures and the second structures is then determined using a linear approximation based on the obtained spectra SA, SB, SC, and SD.
摘要翻译：公开了用于确定样品的两层之间的重叠误差的技术，装置和目标。目标A设计成在其第一和第二结构部分之间具有偏移Xa; 目标B设计为具有偏移Xb; 目标C被设计为具有偏移Xc; 并且目标D被设计为具有偏移量Xd。偏移量Xa，Xb，Xc和Xd中的每一个优选地不同于零; Xa是相反的符号，不同于Xb; Xc是相反的符号，与Xd不同。目标A，B，C和D用电磁辐射照射，分别从目标A，B，C和D获得光谱SA，SB，SC和SD。然后使用基于获得的光谱SA，SB，SC和SD的线性近似来确定第一结构和第二结构之间的任何覆盖误差。

9. 发明授权

US07298481B2 Apparatus and methods for detecting overlay errors using scatterometry 有权
标题翻译：使用散射法检测重叠误差的装置和方法
公开(公告)号：US07298481B2
公开(公告)日：2007-11-20
申请号：US10785395
申请日：2004-02-23
申请人： Walter D. Mieher , Ady Levy , Boris Golovanevsky , Michael Friedmann , Ian Smith , Michael E. Adel , Anatoly Fabrikant , Mark Ghinovker , John Fielden , Noah Bareket
发明人： Walter D. Mieher , Ady Levy , Boris Golovanevsky , Michael Friedmann , Ian Smith , Michael E. Adel , Anatoly Fabrikant , Mark Ghinovker , John Fielden , Noah Bareket
IPC分类号： G01B11/00
CPC分类号： G03F9/7088 , G01N21/956 , G01N2021/213 , G03F7/70625 , G03F7/70633 , G03F7/70683 , G03F9/7049 , G03F9/7084
摘要： Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For each of a plurality of periodic targets target that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, a plurality of optical signals are measured at a plurality of incident angles, wherein there are predefined offsets between the first and second structures. An overlay error is then determined between the first and second structures by analyzing the measured optical signals at the plurality of incident angles from the periodic targets using a scatterometry overlay technique based on the predefined offsets without using a calibration operation.
摘要翻译：公开了一种确定多层样本的两层之间的覆盖误差的方法。对于每个具有由第一层形成的第一结构和由第二层样品形成的第二结构的多个周期性目标中的每一个，多个光信号以多个入射角测量，其中存在第一和第二结构之间的预定偏移量。然后，在不使用校准操作的情况下，通过使用基于预定义的偏移的散射测量覆盖技术来分析来自周期性靶的多个入射角的测量光信号，从而在第一和第二结构之间确定覆盖误差。

10. 发明授权

US07804994B2 Overlay metrology and control method 有权
标题翻译：覆盖计量和控制方法
公开(公告)号：US07804994B2
公开(公告)日：2010-09-28
申请号：US10367124
申请日：2003-02-13
申请人： Michael Adel , Mark Ghinovker , Elyakim Kassel , Boris Golovanevsky , John C. Robinson , Chris A. Mack , Jorge Poplawski , Pavel Izikson , Moshe Preil
发明人： Michael Adel , Mark Ghinovker , Elyakim Kassel , Boris Golovanevsky , John C. Robinson , Chris A. Mack , Jorge Poplawski , Pavel Izikson , Moshe Preil
IPC分类号： G06K9/00
CPC分类号： G03F9/7019 , G03F7/705 , G03F7/70516 , G03F7/70633 , G03F9/7011
摘要： An overlay method for determining the overlay error of a device structure formed during semiconductor processing is disclosed. The overlay method includes producing calibration data that contains overlay information relating the overlay error of a first target at a first location to the overlay error of a second target at a second location for a given set of process conditions. The overlay method also includes producing production data that contains overlay information associated with a production target formed with the device structure. The overlay method further includes correcting the overlay error of the production target based on the calibration data.
摘要翻译：公开了一种用于确定在半导体处理期间形成的器件结构的覆盖误差的覆盖方法。所述覆盖方法包括产生校准数据，所述校准数据包含与第一位置处的第一目标的覆盖误差相关的第二目标的覆盖误差，所述叠加信息在给定的一组处理条件的第二位置。覆盖方法还包括产生包含与由该设备结构形成的生产目标相关联的覆盖信息的生产数据。覆盖方法还包括基于校准数据校正生产目标的覆盖误差。

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