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    • 4. 发明授权
    • Measuring instrument with memory
    • 记忆测量仪器
    • US06173600B1
    • 2001-01-16
    • US09224773
    • 1999-01-04
    • Yasuyuki HaradaJiro MurayamaYasushi HaketaTetsuya SatoEiji KatoAkihiko Kato
    • Yasuyuki HaradaJiro MurayamaYasushi HaketaTetsuya SatoEiji KatoAkihiko Kato
    • G01L2700
    • G01N27/286G01N27/4167
    • According to the present invention, there is provided a measuring instrument with a memory or measuring electrodes each having a memory, which does not require setting of a calibration or correction value at each replacement of the electrode, permits automatic recognition of information such as the model name or the manufacture No. of the electrode in the instrument body, and allows free selection of an appropriate electrode for each use. The measuring instrument 1 has an instrument body 20 and a measuring electrode 10 releasably connected to the instrument body 20. Storage means 15 for storing information regarding the measuring electrode 10 in the measuring electrode 10, or in a cable 12 or a connector 13 for connecting the measuring electrode 10 to the instrument body 20.
    • 根据本发明,提供了一种具有存储器或测量电极的测量仪器,每个存储器或测量电极具有存储器,其不需要在每次更换电极时设置校准或校正值,允许自动识别诸如模型的信息 名称或仪器主体中的电极的制造编号,并且可以为每种使用自由选择适当的电极。 测量仪器1具有可释放地连接到仪器主体20的仪器主体20和测量电极10.用于存储关于测量电极10中的测量电极10的信息的存储装置15或用于连接的电缆12或连接器13 测量电极10连接到仪器主体20。
    • 9. 发明授权
    • Washing apparatus and washing method
    • 洗衣机和洗涤方法
    • US06325081B1
    • 2001-12-04
    • US09214240
    • 1999-05-17
    • Nobuhiro MikiTakahisa NittaYasuyuki HaradaTadahiro Ohmi
    • Nobuhiro MikiTakahisa NittaYasuyuki HaradaTadahiro Ohmi
    • B08B302
    • H01L21/02052B08B3/02B08B2203/0288H01L21/67051
    • A washing apparatus and a washing method, which further improve a washing effect and enable highly clean washing with a small amount of chemical. Also, it is an object of the invention to provide a washing apparatus of high throughput involving rapid switching of various chemicals of high responsibility and capable of performing a series of washing operations at high speed. The washing apparatus comprises undiluted cleaning liquid injection means for injecting an undiluted solution or undiluted gas of a cleaning liquid into a ultrapure water channel to make a cleaning liquid of a desired concentration, cleaning liquid supplying means connected to the super demineralized water channel for simultaneously supplying front and rear surface of a substrate with a cleaning liquid adjusted to a desired concentration or a ultrapure water, means for superposing ultrasonic wave or high frequency sound waves of 0.5 MHz or more on the substrate through the cleaning liquid, and means for rotating the substrate or means for moving either of the substrate and the cleaning liquid supplying means in one direction, whereby injection of the undiluted solution or undiluted gas into the ultrapure water channel is controlled to continuously perform washing of the substrate by the cleaning liquid and washing by the ultrapure water.
    • 一种洗涤装置和洗涤方法,其进一步改善洗涤效果并且能够用少量化学品进行高度清洁的洗涤。 另外,本发明的目的是提供一种高产量的洗涤装置,涉及快速切换各种高度责任的化学品,能够高速地进行一系列洗涤操作。洗涤装置包括未稀释的清洗液注入装置, 将未稀释的溶液或清洁液体的未稀释气体输送到超纯水通道中以制备所需浓度的清洗液体,连接到超级软化水通道的清洗液供应装置,用于同时向基材的前表面和后表面提供清洁液体 调节到期望浓度或超纯水的装置,用于通过清洁液体在衬底上叠加超声波或0.5MHz以上的高频声波的装置,以及用于旋转衬底或用于移动衬底和清洁装置的装置的装置 液体供应装置在一个方向上,由此注射未稀释的 控制溶液或未稀释气体进入超纯水通道,以通过清洗液体连续地进行基材清洗,并通过超纯水进行洗涤。
    • 10. 发明授权
    • Apparatus and method for cleaning a precision substrate
    • 用于清洁精密基板的装置和方法
    • US6050276A
    • 2000-04-18
    • US22432
    • 1998-02-12
    • Yasuyuki HaradaMitsuru NakadaTadahiro Ohmi
    • Yasuyuki HaradaMitsuru NakadaTadahiro Ohmi
    • B08B3/02B08B3/10B08B3/12G11B23/50H01L21/00H01L21/304B08B3/00
    • H01L21/67051B08B3/02G11B23/505B08B2203/0288
    • There are disclosed an apparatus and method for cleaning a precision substrate through use of high-frequency- or ultrasonic-applied cleaning liquid. An object substrate is horizontally held and rotated. High-frequency- or ultrasonic-applied cleaning liquid is jetted toward the surface of the object substrate from first cleaning liquid jetting unit disposed above the object substrate, and the nozzle of the first cleaning liquid jetting unit is moved in parallel with the surface of the object substrate. Cleaning liquid is also fed toward the central portion of the surface of the object substrate from cleaning liquid feed-to-center unit during cleaning. In the cleaning apparatus and method, a sufficiently high cleaning speed is attained. Further, there is not involved the problem that the film of cleaning liquid becomes thin on the central portion of a substrate during cleaning due to the effect of a centrifugal force with a resultant difficulty in transmission of high frequency or ultrasonic vibration to the central portion and the problem that during cleaning, due to the effect of a centrifugal force, no liquid film is present on the central portion, which thus becomes dry and contaminated. The cleaning apparatus and method also proves a cost advantage.
    • 公开了一种通过使用高频或超声波清洗液来清洁精密基板的装置和方法。 物体基板水平保持旋转。 从设置在物体基板上方的第一清洗液喷射单元向对象基板的表面喷射高频或超声波清洗液,第一清洗液喷射单元的喷嘴平行于 物体衬底。 在清洁期间,清洁液体也从清洁液体供给到中心单元朝向物体基板的表面的中心部分供给。 在清洁装置和方法中,达到足够高的清洁速度。 此外,不存在由于离心力的影响而导致的清洗液的中​​心部位的清洗液的薄膜变薄的问题,导致难以将高频或超声波振动传递到中心部分, 在清洗过程中,由于离心力的作用,在中心部分没有液膜存在,因此变得干燥和污染。 清洁装置和方法也证明了成本优势。