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1. 发明授权

US07803680B2 Self-aligned patterning method by using non-conformal film and etch back for flash memory and other semiconductor applications 有权
标题翻译：通过使用非保形膜的自对准图案化方法，并对闪存和其他半导体应用进行回蚀
公开(公告)号：US07803680B2
公开(公告)日：2010-09-28
申请号：US11653649
申请日：2007-01-12
申请人： Shenging Fang , Kuo-Tung Chang , Tim Thurgate , YouSeok Suh , Allison Holbrook
发明人： Shenging Fang , Kuo-Tung Chang , Tim Thurgate , YouSeok Suh , Allison Holbrook
IPC分类号： H01L21/336
CPC分类号： H01L27/11568 , H01L27/115
摘要： A method for fabricating a memory device with a self-aligned trap layer which is optimized for scaling is disclosed. In the present invention, a non-conformal oxide is deposited over the charge trapping layer to form a thick oxide on top of the core source/drain region and a pinch off and a void at the top of the STI trench. An etch is performed on the pinch-off oxide and the thin oxide on the trapping layer on the STI oxide. The trapping layer is then partially etched between the core cells. A dip-off of the oxide on the trapping layer is performed. And a top oxide is formed. The top oxide converts the remaining trap layer to oxide and thus isolate the trap layer.
摘要翻译：公开了一种用于制造具有自对准陷阱层的存储器件的方法，其被优化用于缩放。在本发明中，在电荷捕获层上沉积非保形氧化物，以在芯源极/漏极区域的顶部上形成厚的氧化物，并在STI沟槽的顶部形成空隙。对STI氧化物上的捕获层上的夹断氧化物和薄氧化物进行蚀刻。然后在核心单元之间部分蚀刻捕获层。进行捕获层上的氧化物的偏移。并形成顶部氧化物。顶部氧化物将剩余的陷阱层转化为氧化物，从而隔离陷阱层。

2. 发明授权

US07906395B2 Self-aligned patterning method by using non-conformal film and etch back for flash memory and other semiconductor applications 有权
标题翻译：通过使用非保形膜的自对准图案化方法，并对闪存和其他半导体应用进行回蚀
公开(公告)号：US07906395B2
公开(公告)日：2011-03-15
申请号：US12891481
申请日：2010-09-27
申请人： Shenqing Fang , Kuo-Tung Chang , Tim Thurgate , YouSeok Suh , Allison Holbrook
发明人： Shenqing Fang , Kuo-Tung Chang , Tim Thurgate , YouSeok Suh , Allison Holbrook
IPC分类号： H01L21/336
CPC分类号： H01L27/11568 , H01L27/115
摘要： A method for fabricating a memory device with a self-aligned trap layer which is optimized for scaling is disclosed. In the present invention, a non-conformal oxide is deposited over the charge trapping layer to form a thick oxide on top of the core source/drain region and a pinch off and a void at the top of the STI trench. An etch is performed on the pinch-off oxide and the thin oxide on the trapping layer on the STI oxide. The trapping layer is then partially etched between the core cells. A dip-off of the oxide on the trapping layer is performed. And a top oxide is formed. The top oxide converts the remaining trap layer to oxide and thus isolate the trap layer.
摘要翻译：公开了一种用于制造具有自对准陷阱层的存储器件的方法，其被优化用于缩放。在本发明中，在电荷捕获层上沉积非保形氧化物，以在芯源极/漏极区域的顶部上形成厚的氧化物，并在STI沟槽的顶部形成空隙。对STI氧化物上的捕获层上的夹断氧化物和薄氧化物进行蚀刻。然后在核心单元之间部分地蚀刻捕获层。进行捕获层上的氧化物的偏移。并形成顶部氧化物。顶部氧化物将剩余的陷阱层转化为氧化物，从而隔离陷阱层。

3. 发明申请

US20110012191A1 SELF-ALIGNED PATTERNING METHOD BY USING NON-CONFORMAL FILM AND ETCH BACK FOR FLASH MEMORY AND OTHER SEMICONDUCTUR APPLICATIONS 有权
标题翻译：通过使用非一致性膜和自动对准闪存和其他半导体应用的自对准图案
公开(公告)号：US20110012191A1
公开(公告)日：2011-01-20
申请号：US12891481
申请日：2010-09-27
申请人： Shenqing FANG , Kuo-Tung CHANG , Tim THURGATE , YouSeok SUH , Allison HOLBROOK
发明人： Shenqing FANG , Kuo-Tung CHANG , Tim THURGATE , YouSeok SUH , Allison HOLBROOK
IPC分类号： H01L29/792 , H01L21/76
CPC分类号： H01L27/11568 , H01L27/115
摘要： A method for fabricating a memory device with a self-aligned trap layer which is optimized for scaling is disclosed. In the present invention, a non-conformal oxide is deposited over the charge trapping layer to form a thick oxide on top of the core source/drain region and a pinch off and a void at the top of the STI trench. An etch is performed on the pinch-off oxide and the thin oxide on the trapping layer on the STI oxide. The trapping layer is then partially etched between the core cells. A dip-off of the oxide on the trapping layer is performed. And a top oxide is formed. The top oxide converts the remaining trap layer to oxide and thus isolate the trap layer.
摘要翻译：公开了一种用于制造具有自对准陷阱层的存储器件的方法，其被优化用于缩放。在本发明中，在电荷捕获层上沉积非保形氧化物，以在芯源极/漏极区域的顶部上形成厚的氧化物，并在STI沟槽的顶部形成空隙。对STI氧化物上的捕获层上的夹断氧化物和薄氧化物进行蚀刻。然后在核心单元之间部分蚀刻捕获层。进行捕获层上的氧化物的偏移。并形成顶部氧化物。顶部氧化物将剩余的陷阱层转化为氧化物，从而隔离陷阱层。

4. 发明授权

US06567303B1 Charge injection 有权
标题翻译：电荷注入
公开(公告)号：US06567303B1
公开(公告)日：2003-05-20
申请号：US10050483
申请日：2002-01-16
申请人： Darlene G. Hamilton , Janet S. Y. Wang , Narbeh Derhacobian , Tim Thurgate , Michael K. Han
发明人： Darlene G. Hamilton , Janet S. Y. Wang , Narbeh Derhacobian , Tim Thurgate , Michael K. Han
IPC分类号： G11C1604
CPC分类号： G11C16/3409 , G11C11/5671 , G11C16/0475 , G11C16/10 , G11C16/3404 , G11C16/3436 , G11C16/3445
摘要： A system and methodology is provided for programming first and second bits of a memory array of dual bit memory cells at a substantially high delta VT. The substantially higher VT assures that the memory array will maintain programmed data and erase data consistently after higher temperature stresses and/or customer operation over substantial periods of time. At a substantially higher delta VT, programming of the first bit of the memory cell causes the second bit to program harder and faster due to the shorter channel length. Therefore, the present invention employs selected gate and drain voltages and programming pulse widths during programming of the first and second bit that assures a controlled first bit VT and slows down programming of the second bit. Furthermore, the selected programming parameters keep the programming times short without degrading charge loss.
摘要翻译：提供了一种用于以基本上高的delta VT对双位存储器单元的存储器阵列的第一和第二位进行编程的系统和方法。基本上更高的VT确保存储器阵列将维持编程数据并且在相当长的一段时间内在较高的温度应力和/或客户操作之后一致地擦除数据。在基本上较高的增量VT下，存储器单元的第一位的编程使得第二位由于较短的通道长度而更硬更快地编程。因此，本发明在第一和第二位的编程期间采用选择的栅极和漏极电压以及编程脉冲宽度，以确保受控的第一位VT并减慢第二位的编程。此外，所选择的编程参数保持编程时间短而不降低电荷损耗。

5. 发明申请

US20080171416A1 Self-aligned patterning method by using non-conformal film and etch back for flash memory and other semiconductor applications 有权
标题翻译：通过使用非保形膜的自对准图案化方法，并对闪存和其他半导体应用进行回蚀
公开(公告)号：US20080171416A1
公开(公告)日：2008-07-17
申请号：US11653649
申请日：2007-01-12
申请人： Shenging Fang , Kuo-Tung Chang , Tim Thurgate , YouSeok Suh , Allison Holbrook
发明人： Shenging Fang , Kuo-Tung Chang , Tim Thurgate , YouSeok Suh , Allison Holbrook
IPC分类号： H01L21/336
CPC分类号： H01L27/11568 , H01L27/115
摘要： A method for fabricating a memory device with a self-aligned trap layer which is optimized for scaling is disclosed. In the present invention, a non-conformal oxide is deposited over the charge trapping layer to form a thick oxide on top of the core source/drain region and a pinch off and a void at the top of the STI trench. An etch is performed on the pinch-off oxide and the thin oxide on the trapping layer on the STI oxide. The trapping layer is then partially etched between the core cells. A dip-off of the oxide on the trapping layer is performed. And a top oxide is formed. The top oxide converts the remaining trap layer to oxide and thus isolate the trap layer.
摘要翻译：公开了一种用于制造具有自对准陷阱层的存储器件的方法，其被优化用于结垢。在本发明中，在电荷捕获层上沉积非保形氧化物，以在芯源极/漏极区域的顶部上形成厚的氧化物，并在STI沟槽的顶部形成空隙。对STI氧化物上的捕获层上的夹断氧化物和薄氧化物进行蚀刻。然后在核心单元之间部分蚀刻捕获层。进行捕获层上的氧化物的偏移。并形成顶部氧化物。顶部氧化物将剩余的陷阱层转化为氧化物，从而隔离陷阱层。

6. 发明授权

US06287917B1 Process for fabricating an MNOS flash memory device 有权
标题翻译：制造MNOS闪存设备的过程
公开(公告)号：US06287917B1
公开(公告)日：2001-09-11
申请号：US09392675
申请日：1999-09-08
申请人： Stephen Keetai Park , Tim Thurgate , Bharath Rangarajan
发明人： Stephen Keetai Park , Tim Thurgate , Bharath Rangarajan
IPC分类号： H01L218247
CPC分类号： H01L27/11568 , H01L27/115
摘要： A process for fabricating an MNOS device includes the steps of forming a hardmask containing at least first and second openings over a core array area of a semiconductor substrate. An angle doping process is carried out to form halo regions in precise locations within the substrate at the edges of the first and second openings in the hardmask. Another doping process is carried out to form buried bit-lines in the substrate using the hardmask as a doping mask. Once the halo regions and the buried bit-lines are formed, the hardmask is removed and a composite dielectric layer is formed overlying the substrate. A gate layer is deposited to overlie the composite dielectric layer, and an etching process is carried out to form a control gate electrode and a charge storage electrode in the MNOS device
摘要翻译：制造MNOS器件的方法包括以下步骤：在半导体衬底的芯阵列区域上形成至少包含第一和第二开口的硬掩模。进行角度掺杂处理以在硬掩模中的第一和第二开口的边缘处在衬底内的精确位置中形成晕圈。进行另一种掺杂工艺以使用硬掩模作为掺杂掩模在衬底中形成掩埋位线。一旦形成了光晕区域和掩埋位线，就去除了硬掩模，并且在衬底上形成复合介电层。沉积栅极层以覆盖复合介电层，并且进行蚀刻处理以在MNOS器件中形成控制栅电极和电荷存储电极

7. 发明授权

US09564331B2 Apparatus and method for rounded ONO formation in a flash memory device 有权
标题翻译：闪存装置中圆形ONO形成的装置和方法
公开(公告)号：US09564331B2
公开(公告)日：2017-02-07
申请号：US13540373
申请日：2012-07-02
申请人： Shenqing Fang , Tung-Sheng Chen , Tim Thurgate , Di Li
发明人： Shenqing Fang , Tung-Sheng Chen , Tim Thurgate , Di Li
IPC分类号： H01L29/792 , H01L21/28 , H01L29/66 , H01L27/115 , H01L21/762
CPC分类号： H01L21/28282 , H01L21/76224 , H01L27/11568 , H01L29/66833 , H01L29/792
摘要： A method and apparatus for continuously rounded charge trapping layer formation in a flash memory device. The memory device includes a semiconductor layer, including a source/drain region. An isolation region is disposed adjacent to the source/drain region. A first insulator is disposed above the source/drain region. A charge trapping layer is disposed within the first insulator, wherein the charge trapping layer comprises a bulk portion and a first tip and a second tip on either side of said bulk portion, wherein said charge trapping layer extends beyond the width of the source/drain region. A second insulator is disposed above the charge trapping layer. A polysilicon gate structure is disposed above the second insulator, wherein a width of said control gate is wider than the width of said source/drain region.
摘要翻译：一种用于在闪速存储器件中连续成形的电荷俘获层形成的方法和装置。存储器件包括包括源/漏区的半导体层。隔离区域邻近源极/漏极区域设置。第一绝缘体设置在源极/漏极区域的上方。电荷捕获层设置在第一绝缘体内，其中电荷捕获层包括主体部分和在所述主体部分的任一侧上的第一尖端和第二尖端，其中所述电荷捕获层延伸超过源极/漏极的宽度地区。第二绝缘体设置在电荷捕获层上方。多晶硅栅极结构设置在第二绝缘体上方，其中所述控制栅极的宽度比所述源极/漏极区域的宽度宽。

8. 发明授权

US06475816B1 Method for measuring source and drain junction depth in silicon on insulator technology 失效
标题翻译：硅绝缘体技术测量源极和漏极结深度的方法
公开(公告)号：US06475816B1
公开(公告)日：2002-11-05
申请号：US09781435
申请日：2001-02-13
申请人： Concetta Riccobene , Nga-Ching Wong , Tim Thurgate
发明人： Concetta Riccobene , Nga-Ching Wong , Tim Thurgate
IPC分类号： H01L2166
CPC分类号： H01L22/14 , G01R31/27
摘要： A method is provided for accurately determining the junction depth of silicon-on-insulator (SOI) devices. Embodiments include determining the junction depth in an SOI device under inspection by measuring the threshold voltage of its “bottom transistor” formed by its source and drain regions together with its substrate acting as a gate. The threshold voltage of the bottom transistor of an SOI device varies with its junction depth in a predictable way. Thus, the junction depth of the inspected device is determined by comparing its bottom transistor threshold voltage with the bottom transistor threshold voltage of corresponding reference SOI devices of known junction depth to find a match. For example, simulated SOI devices with the same characteristics as the inspected device, whose junction depth and bottom transistor threshold voltages have been previously calculated, are used as a “reference library”. If the bottom transistor threshold voltage of the inspected device has about the same value as that of a particular one of the reference devices, then the inspected device has the junction depth of that particular reference device. Thus, junction depth of the inspected SOI device is accurately determined by a simple electrical measurement of threshold voltage.
摘要翻译：提供了一种用于精确地确定绝缘体上硅（SOI）器件的结深度的方法。实施例包括通过测量其源极和漏极区域形成的其“底部晶体管”及其衬底作为栅极的阈值电压来确定被检查的SOI器件中的结深度。 SOI器件的底部晶体管的阈值电压以其可预测的方式随其结深度而变化。因此，通过将其底部晶体管阈值电压与已知结深度的相应参考SOI器件的底部晶体管阈值电压进行比较来确定被检查器件的结深度以找到匹配。例如，具有与被预先计算的结深度和底部晶体管阈值电压的被检查器件相同特性的模拟SOI器件被用作“参考库”。如果被检查装置的底部晶体管阈值电压具有与特定参考装置的底部晶体管阈值电压相同的值，则所检查的装置具有该特定参考装置的结深度。因此，通过阈值电压的简单电测量精确地确定被检查的SOI器件的结深度。

9. 发明授权

US06452840B1 Feedback method to optimize electric field during channel erase of flash memory devices 有权
标题翻译：用于优化闪存器件通道擦除期间电场的反馈方法
公开(公告)号：US06452840B1
公开(公告)日：2002-09-17
申请号：US09693649
申请日：2000-10-21
申请人： Ravi S. Sunkavalli , Lee Cleveland , Sameer S. Haddad , Richard Fastow , Tim Thurgate
发明人： Ravi S. Sunkavalli , Lee Cleveland , Sameer S. Haddad , Richard Fastow , Tim Thurgate
IPC分类号： G11C1604
CPC分类号： G11C16/3477 , G11C16/344 , G11C16/3445 , G11C16/3472
摘要： A method of erasing a flash memory device that improves reliability and reduces the decrease in erase speed. The state of erasure is determined either during an erase phase or a verify phase and the information is fedback to a controller that adjusts the erase vertical electrical field that is to be applied to the array. The vertical electrical field is adjusted by changing the gate voltage, the well voltage or changing both simultaneously.
摘要翻译：一种擦除闪速存储器件的方法，其提高可靠性并减少擦除速度的降低。在擦除阶段或验证阶段期间确定擦除状态，并将信息反馈到调整要应用于阵列的擦除垂直电场的控制器。通过改变栅极电压，井电压或同时改变两者来调节垂直电场。

10. 发明授权

US06355528B1 Method to form narrow structure using double-damascene process 有权
标题翻译：使用双镶嵌工艺形成窄结构的方法
公开(公告)号：US06355528B1
公开(公告)日：2002-03-12
申请号：US09426911
申请日：1999-10-26
申请人： Emi Ishida , Scott Luning , Tim Thurgate
发明人： Emi Ishida , Scott Luning , Tim Thurgate
IPC分类号： H01L21336
CPC分类号： H01L29/66583 , H01L21/26586 , H01L21/28141 , H01L29/66492 , H01L29/66537 , H01L29/66545 , H01L29/66553 , H01L29/6659 , Y10S438/947
摘要： A narrow groove is formed over a substrate. To form such a narrow groove, a first material is formed over a substrate, the first material having a sidewall. A spacer is formed abutting the sidewall. Subsequently a second material is formed adjacent to the spacer. The spacer is removed leaving a groove between the first material and second material. In one embodiment, the groove is filled with material for a narrow feature, such as a gate, and the first material and second material are removed. As a result a gate or other narrow feature is formed having a length defined by the width of a spacer. In another embodiment, an implant is performed through the small groove, resulting in a small localized implant.
摘要翻译：在衬底上形成窄槽。为了形成这样的窄槽，在基板上形成第一材料，第一材料具有侧壁。形成邻接侧壁的间隔物。随后，与间隔物相邻地形成第二材料。去除间隔物，留下第一材料和第二材料之间的凹槽。在一个实施例中，槽被填充用于诸如门的窄特征的材料，并且第一材料和第二材料被去除。结果，形成具有由间隔物的宽度限定的长度的门或其他窄特征。在另一个实施例中，通过小凹槽执行植入物，导致小的局部植入物。

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