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    • 8. 发明申请
    • IN-SITU THICKNESS AND REFRACTIVE INDEX MONITORING AND CONTROL SYSTEM FOR THIN FILM DEPOSITION
    • 薄膜沉积的现场厚度和折射率指数监测和控制系统
    • WO0229358A9
    • 2002-10-17
    • PCT/US0131026
    • 2001-10-04
    • OPNETICS CORPZHANG JIANPAN JING
    • ZHANG JIANPAN JING
    • G01B11/06G01N21/39G01N21/41G01N21/59G01N21/84
    • G01N21/4133G01B11/0625G01B11/0683G01N21/39G01N21/41G01N21/59G01N21/8422
    • A method of determining thickness and refractive index of an optical thin film is described. The method includes generating a diagnostic light beam having a first and a second wavelength. The method also includes measuring unattenuated light intensities at the first and the second wavelength of the diagnostic light beam. The method also includes measuring attenuated light intensities at the first and the second wavelength of the diagnostic light beam after transmission through the optical thin film. A null light intensity for the diagnostic light beam at the first and second wavelength is also determined. A first and second normalized intensity function is determined using the measured unattenuated light intensities, the measured attenuated light intensities, and the measured null light intensities. The thickness and refractive index of the optical thin film is then determined by solving the first and second normalized intensity function for thickness and refractive index.
    • 描述了确定光学薄膜的厚度和折射率的方法。 该方法包括产生具有第一和第二波长的诊断光束。 该方法还包括在诊断光束的第一和第二波长处测量未衰减的光强度。 该方法还包括在通过光学薄膜传输之后测量诊断光束的第一和第二波长处的衰减光强度。 还确定了在第一和第二波长处的诊断光束的零光强度。 使用测量的非衰减光强度,测量的衰减光强度和测量的零光强度来确定第一和第二归一化强度函数。 然后通过求解厚度和折射率的第一和第二归一化强度函数来确定光学薄膜的厚度和折射率。