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    • 2. 发明授权
    • Sub-threshold memory cell circuit with high density and high robustness
    • 子阈值存储单元电路具有高密度和高鲁棒性
    • US08559213B2
    • 2013-10-15
    • US13322859
    • 2009-08-13
    • Jun YangNa BaiJie LiChen HuLongxing Shi
    • Jun YangNa BaiJie LiChen HuLongxing Shi
    • G11C11/00
    • G11C11/412
    • A high-density and high-robustness sub-threshold memory cell circuit, having two PMOS transistors P1 and P2 and five NMOS transistors N1˜N5, wherein, the each base electrode of the two PMOS transistors and NMOS transistors N3, N4, and N5 is connected with the local grid electrode respectively; the base electrode of the NMOS transistors N1 and N2, are grounded respectively; the NMOS transistor N1 form an phase inverter with the PMOS transistor P1, and the NMOS transistor N2 form another phase inverter with the PMOS transistor P2; the two phase inverters are connected with each other in a cross coupling manner via the cut-off NMOS transistor N5, the output end of the phase inverter N1 and P1 directly connected to the input end of the phase inverter N2 and P2, and the output end of the phase inverter N2 and P2 connected to the input end of the phase inverter N1 and P1 via the cut-off NMOS transistor N5; the NMOS transistor N3 is connected with the write bit line (WBL) of the phase inverter N1 and P1, and the NMOS transistor N4 is connected with the NOT WBL and read word line (RWL) of the phase inverter N2 and P2.
    • 具有两个PMOS晶体管P1和P2以及五个NMOS晶体管N1〜N5的高密度和高鲁棒性子阈值存储单元电路,其中,两个PMOS晶体管和NMOS晶体管N3,N4和N5的每个基极 分别与局部栅电极连接; NMOS晶体管N1和N2的基极分别接地; NMOS晶体管N1与PMOS晶体管P1形成相位逆变器,NMOS晶体管N2与PMOS晶体管P2形成另一个反相器; 两相逆变器通过截止NMOS晶体管N5,直流连接到相位逆变器N2和P2的输入端的相位反相器N1和P1的输出端以交叉耦合方式彼此连接,并且输出 通过截止NMOS晶体管N5连接到相位反相器N1和P1的输入端的相位逆变器N2和P2的端部; NMOS晶体管N3与相位反相器N1和P1的写入位线(WBL)连接,NMOS晶体管N4与相位逆变器N2和P2的NOT WBL和读出字线(RWL)连接。
    • 6. 发明申请
    • SUB-THRESHOLD MEMORY CELL CIRCUIT WITH HIGH DENSITY AND HIGH ROBUSTNESS
    • 具有高密度和高可靠性的子阈值存储单元电路
    • US20120069650A1
    • 2012-03-22
    • US13322859
    • 2009-08-13
    • Jun YangNa BaiJie LiChen HuLongxing Shi
    • Jun YangNa BaiJie LiChen HuLongxing Shi
    • G11C11/34
    • G11C11/412
    • A high-density and high-robustness sub-threshold memory cell circuit, having two PMOS transistors P1 and P2 and five NMOS transistors N1˜N5, wherein, the each base electrode of the two PMOS transistors and NMOS transistors N3, N4, and N5 is connected with the local grid electrode respectively; the base electrode of the NMOS transistors N1 and N2, are grounded respectively; the NMOS transistor N1 form an phase inverter with the PMOS transistor P1, and the NMOS transistor N2 form another phase inverter with the PMOS transistor P2; the two phase inverters are connected with each other in a cross coupling manner via the cut-off NMOS transistor N5, the output end of the phase inverter N1 and P1 directly connected to the input end of the phase inverter N2 and P2, and the output end of the phase inverter N2 and P2 connected to the input end of the phase inverter N1 and P1 via the cut-off NMOS transistor N5; the NMOS transistor N3 is connected with the write bit line (WBL) of the phase inverter N1 and P1, and the NMOS transistor N4 is connected with the NOT WBL and read word line (RWL) of the phase inverter N2 and P2.
    • 具有两个PMOS晶体管P1和P2以及五个NMOS晶体管N1〜N5的高密度和高鲁棒性子阈值存储单元电路,其中,两个PMOS晶体管和NMOS晶体管N3,N4和N5的每个基极 分别与局部栅电极连接; NMOS晶体管N1和N2的基极分别接地; NMOS晶体管N1与PMOS晶体管P1形成相位逆变器,NMOS晶体管N2与PMOS晶体管P2形成另一个反相器; 两相逆变器通过截止NMOS晶体管N5,直流连接到相位逆变器N2和P2的输入端的相位反相器N1和P1的输出端以交叉耦合方式彼此连接,并且输出 通过截止NMOS晶体管N5连接到相位反相器N1和P1的输入端的相位逆变器N2和P2的端部; NMOS晶体管N3与相位反相器N1和P1的写入位线(WBL)连接,NMOS晶体管N4与相位逆变器N2和P2的NOT WBL和读出字线(RWL)连接。