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1. 发明授权

US4642438A Workpiece mounting and clamping system having submicron positioning repeatability 失效
标题翻译：具有亚微米定位重复性的工件安装和夹紧系统
公开(公告)号：US4642438A
公开(公告)日：1987-02-10
申请号：US672724
申请日：1984-11-19
申请人： Karl W. Beumer , Charles A. Gaston , Charles H. Locke , Alfred Mack , Brian C. O'Neill , Warren J. Pinckney , Alan D. Wilson
发明人： Karl W. Beumer , Charles A. Gaston , Charles H. Locke , Alfred Mack , Brian C. O'Neill , Warren J. Pinckney , Alan D. Wilson
IPC分类号： H01L21/30 , H01J37/20 , H01L21/027 , H01L21/68 , B23K26/00
CPC分类号： H01L21/68 , H01J37/20
摘要： A high precision, high throughput submicrometer workpiece positioning system, particularly useful as a workpiece positioning means in electron beam lithography tools. The positioning system increases mechanical stability by essentially eliminating mechanical hysteresis, which allows state of the art electron beam lithography systems to provide the repeatable, accurate and dense circuit patterns that modern semiconductor trends demand.The positioning system in preferred form comprises a movable positioning table, a workpiece supporting superstructure which is elastically joined to the movable positioning table by three geometrically distinct kinematic support means and a two-stage coupling means which mounts a workpiece (i.e., semiconductor mask or wafer) to the workpiece supporting superstructure. A laser interferometer locating-positioning system is utilized to position the workpiece. The interferometer mirrors are integral with the workpiece supporting superstructure.The coupling means mounts a workpiece to the workpiece supporting superstructure with a minimum of mechanical distortion. Three two-stage coupling means are utilized in preferred form. The first stage is removable from the positioning, and allows for workpiece loading and unloading outside of the positioning system. The removable stage comprises an integral unit which includes two opposing arms with large radii spherical ends and a tab member. The spherical end center lines are collinear, providing for vertical clamping of the workpiece. The second stage is stationary and integral with the workpiece supporting superstructure. The stationary stage comprises two opposing arms with large radii spherical ends and clamps the tab of the removable stage by vertical clamping.
摘要翻译：高精度，高吞吐量的亚微米工件定位系统，特别适用于电子束光刻工具中的工件定位手段。定位系统通过基本上消除机械滞后来增加机械稳定性，这允许现有技术的电子束光刻系统提供现代半导体趋势需要的可重复，准确和密集的电路图案。优选形式的定位系统包括可移动定位台，通过三个几何不同的运动支撑装置弹性地连接到可移动定位台的工件支撑上部结构和安装工件（即半导体掩模或晶片）的两级联接装置）到工件支撑上部结构。使用激光干涉仪定位定位系统来定位工件。干涉仪镜与工件支撑上部结构是一体的。联接装置以最小的机械变形将工件安装到工件支撑上部结构。以优选的形式使用三个两级耦合装置。第一阶段可以从定位中移除，并允许在定位系统之外的工件加载和卸载。可拆卸台包括整体单元，其包括具有大半径球面端的两个相对臂和突片构件。球形端中心线是共线的，用于垂直夹紧工件。第二阶段是固定的，与工件支撑上部结构成一体。固定台包括两个具有大半径球面的相对臂，并通过垂直夹紧夹紧可拆卸台的突出部。

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