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    • 1. 发明授权
    • Process for producing aluminum alloy substrate for lithographic printing plate
    • 用于制造平版印刷版铝合金基板的方法
    • US06387198B1
    • 2002-05-14
    • US09245237
    • 1999-02-05
    • Hideki SuzukiYasuhisa NishikawaTomohide YamagishiKazumitsu MizushimaHirokazu SawadaHirokazu Sakaki
    • Hideki SuzukiYasuhisa NishikawaTomohide YamagishiKazumitsu MizushimaHirokazu SawadaHirokazu Sakaki
    • C22F104
    • C22C21/00B41N1/083C22F1/04
    • In order to produce an aluminum alloy substrate for a lithographic printing plate wherein grain structure refining and homogenizing are promoted, and the uniformity of the appearance of the grained surface is particularly improved, the process of the present invention comprises the steps of: homogenizing an aluminum alloy ingot comprising 0.10 to 0.40 wt % of Fe, 0.03 to 0.30 wt % of Si, 0.004 to 0.050 wt % of Cu, 0.01 to 0.05 wt % of Ti, 0.0001 to 0.02 wt % of B and the balance of Al and unavoidable impurities, at temperatures of 350 to 480° C., successively hot-rolling the ingot with a plurality of passes in such a manner that the aluminum alloy is not recrystallized prior to the hot rolling of the final pass and recrystallized at least in the surface layer of the hot-rolled plate by only the hot rolling thereof to form a recrystallized structure having an average recrystallized grain size of less than 50 &mgr;m in a direction normal to the rolling direction, and cold-rolling the hot-rolled plate. The reduction of the plate in the hot rolling of the final pass is desirably at least 55%.
    • 为了生产促进晶粒细化和均质化的平版印刷版的铝合金基板,并且特别提高了晶粒表面的外观的均匀性,本发明的方法包括以下步骤:使铝均匀化 含有0.10〜0.40重量%的Fe,0.03〜0.30重量%的Si,0.004〜0.050重量%的Cu,0.01〜0.05重量%的Ti,0.0001〜0.02重量%的B,余量的Al和不可避免的杂质 ,在350〜480℃的温度下,以多次通过依次热轧锭,使铝合金在最后通过热轧之前不再结晶,至少在表面层中再结晶 的热轧板,在与轧制方向正交的方向上形成平均再结晶晶粒尺寸小于50μm的再结晶组织,并将该热轧板 ed板 最终通过的热轧中的板的还原期望为至少55%。
    • 2. 发明授权
    • Aluminum alloy support for lithographic printing plate and process for producing substrate for support
    • 用于平版印刷版的铝合金支架和用于制造支撑用基板的工艺
    • US06337136B1
    • 2002-01-08
    • US09363127
    • 1999-07-28
    • Hideki SuzukiIchiro OkamotoKazumitsu MizushimaTadashi AsahiHirokazu SawadaHirokazu Sakaki
    • Hideki SuzukiIchiro OkamotoKazumitsu MizushimaTadashi AsahiHirokazu SawadaHirokazu Sakaki
    • B32B1501
    • C22C21/00B41N1/083B41N3/034
    • The present invention provides a support for a lithographic printing plate prepared by cold rolling a sheet while intermediate annealing is omitted to save energy and the number of the cold rolling steps are decreased to simplify the sheet production steps and to give a desired strength of the sheet, and by inhibiting precipitation of Si particles in the substrate to give extremely excellent resistance to ink staining in the nonimage areas during printing, and a process for producing a substrate therefore. The production process comprises homogenization heat-treating an aluminum alloy slab comprising 0.10 to 0.40 wt % of Fe, 0.03 to 0.15 wt % of Si, 0.004 to 0.03 wt % of Cu, and the balance of Al and unavoidable impurities, hot rolling the heat-treated slab, and cold-rolling the hot-rolled strip without intermediate annealing, the cold rolling including a final pass after which the sheet temperature becomes at least the recovery temperature of the sheet and the following rapid cooling, whereby an aluminum alloy substrate for a lithographic printing plate having a content of precipitated Si of up to 30 ppm and a tensile strength of from 145 to 180 MPa is produced. When the aluminum alloy is electrolytically grained and anodically oxidized, the resultant anodic oxide film can contain up to 200/mm2 of precipitated Si particles having an average particle size of at least 0.5 &mgr;m.
    • 本发明提供了对通过冷轧片材制备的平版印刷版的支持,同时省略了中间退火以节省能量,并且减少了冷轧步骤的数量以简化片材生产步骤并提供片材的期望强度 并且通过抑制衬底中的Si颗粒的沉淀,从而在印刷期间对非图像区域中的油墨染色产生非常优异的耐性,因此制造衬底的方法。 该制造方法包括对铝合金板进行均质化热处理,其包含0.10〜0.40重量%的Fe,0.03〜0.15重量%的Si,0.004〜0.03重量%的Cu,余量为Al和不可避免的杂质,热轧热 并且在不进行中间退火的情况下冷轧热轧带材,冷轧包括最终通过,其中片材温度至少为片材的回收温度和随后的快速冷却,由此形成用于 产生沉淀Si含量高达30ppm,拉伸强度为145-180MPa的平版印刷版。 当铝合金电解晶粒化并阳极氧化时,所得到的阳极氧化膜可含有至多200 / mm2的平均粒度至少为0.5μm的沉淀Si颗粒。
    • 5. 发明授权
    • Presensitized aluminum lithographic plate having thereon a positive or
negative working light sensitive layer
    • 其上具有正或负工作光敏层的致敏铝平版印刷板
    • US5061591A
    • 1991-10-29
    • US359344
    • 1989-05-31
    • Haruo NakanishiHirokazu Sakaki
    • Haruo NakanishiHirokazu Sakaki
    • B41N3/00B41N3/03
    • B41N3/034
    • The present invention relates to an aluminum support for a lithographic plate, whose surface is electrochemically roughened and has the following conditions:a) an arithmetic mean of the pit diameters of the electrolytically etched support is 4 .mu.m or less,b) a difference between an arithmetic mean (D.sub.L) of the maximum pit diameter of the support in the rolling direction and an arithmetic mean (D.sub.LT) of the maximum pit diameter of the support in the direction perpendicular to the rolling direction is larger than 10% of the maximum pit diameter (a larger one of D.sub.L and D.sub.LT),c) the number of pits detected with a surface roughness tester having a profilometer using a stylus having a tip radius of 1 .mu.m is at last 200/mm, andd) an average centerline roughness is 0.2 .mu.m to 1.0 .mu.m.According to the present invention, a lithographic plate having the aluminum support is excellent in both of a printing durability and a stain proofness.
    • 本发明涉及一种用于光刻板的铝支架,其表面经电化学粗糙化并具有以下条件:a)电解蚀刻载体的凹坑直径的算术平均值为4μm或更小,b) 支撑体在轧制方向上的最大凹坑直径的算术平均值(DL)和支撑件在垂直于轧制方向的方向上的最大凹坑直径的算术平均值(DLT)大于最大凹坑的10% 直径(DL和DLT中较大的一个),c)使用具有尖端半径为1μm的触针的具有轮廓仪的表面粗糙度测试仪检测到的凹坑的数量为最后200个/ mm,d)平均中心线 粗糙度为0.2〜1.0μm。 根据本发明,具有铝载体的平版印刷版在印刷耐久性和防污性方面均优异。