基本信息:
- 专利标题: イオン生成装置およびイオン注入装置
- 专利标题(英):ION GENERATION APPARATUS AND ION IMPLANTATION APPARATUS
- 申请号:PCT/JP2022/027548 申请日:2022-07-13
- 公开(公告)号:WO2023058291A1 公开(公告)日:2023-04-13
- 发明人: 河津 翔 , 佐藤 正輝
- 申请人: 住友重機械イオンテクノロジー株式会社
- 申请人地址: 〒1416025 東京都品川区大崎2丁目1番1号 Tokyo
- 专利权人: 住友重機械イオンテクノロジー株式会社
- 当前专利权人: 住友重機械イオンテクノロジー株式会社
- 当前专利权人地址: 〒1416025 東京都品川区大崎2丁目1番1号 Tokyo
- 代理机构: 森下 賢樹
- 优先权: JP2021-166241 2021-10-08
- 主分类号: H01J27/14
- IPC分类号: H01J27/14 ; H01J37/08 ; H01J37/317
An ion generation apparatus 10 comprises: an arc chamber 50; a magnetic field generator 52 that generates a magnetic field B to be applied in the axial direction in an internal space S of the arc chamber 50; a first cathode cap 72 that protrudes toward the inside of the arc chamber 50 in the axial direction and emits thermal electrons toward the internal space S; and a first thermal shield 76 that includes a first extension portion which axially extends in a tubular shape on the radially outer side of the first cathode cap 72 and which is adjacent to the first cathode cap 72 with a gap interposed therebetween in the radial direction perpendicular to the axial direction, a first tip portion that protrudes toward the inside of the arc chamber, and a first tip opening that opens in the axial direction in the first tip portion. The first tip opening has a first opening width in the radial direction smaller than the maximum width of the first cathode cap 72 in the radial direction.